EP0250490A1 - Opto/elektronisches verfahren zur inspektion von oberflächen - Google Patents
Opto/elektronisches verfahren zur inspektion von oberflächenInfo
- Publication number
- EP0250490A1 EP0250490A1 EP19870900036 EP87900036A EP0250490A1 EP 0250490 A1 EP0250490 A1 EP 0250490A1 EP 19870900036 EP19870900036 EP 19870900036 EP 87900036 A EP87900036 A EP 87900036A EP 0250490 A1 EP0250490 A1 EP 0250490A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- filters
- information
- disturbances
- principle
- electronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 18
- 230000005693 optoelectronics Effects 0.000 title 1
- 238000005259 measurement Methods 0.000 claims abstract description 5
- 230000035945 sensitivity Effects 0.000 claims abstract description 4
- 239000007788 liquid Substances 0.000 claims abstract description 3
- 239000007787 solid Substances 0.000 claims abstract description 3
- 238000005516 engineering process Methods 0.000 claims description 4
- 238000007689 inspection Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 claims description 2
- 230000001360 synchronised effect Effects 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000010606 normalization Methods 0.000 claims 1
- 230000007547 defect Effects 0.000 abstract 2
- 238000011156 evaluation Methods 0.000 description 3
- 230000010365 information processing Effects 0.000 description 2
- 238000010291 electrical method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
Definitions
- the aim of the invention is to detect and localize very small disturbances in solid and liquid surfaces.
- the method is suitable for. For example, very good - in order to detect faults already during the production process (in-line) and to intervene in the process if necessary (regulation).
- the speed of the inspection is practically only limited by the mechanical movement of the material to be inspected.
- Figure 1 shows an example of a measuring channel.
- a measuring channel In principle, it is a modified Schlieren optics.
- the emitted light is parallellated from a point-shaped light source 1 with the aid of a parabolic mirror 2. It passes through a beam splitter 3, then the strip mirror 4 and falls perpendicularly onto the surface to be examined 7. If the surface is completely smooth and without any interferences, the light from 7 will travel back the same way through the open strips of «4 and at the beam splitter 3 divided and a part fall on the detector 5. If there is a disturbance 9 (elevation) on the surface 7, the light is deflected in the region of the elevation or its edges. Part of the light now falls on the playful strips 4 and is deflected to the detector 6. If the disturbance involves many very small increases v (roughness), then instead of one or a few light beams, many of these are deflected. It is therefore possible to use the described method to obtain information about the basic roughness as well as individual disturbances in surfaces.
- v
- FIG. 2 shows schematically the structure of a measuring channel with a possible arrangement of different filters for information processing.
- An alternating current generator 15 drives the punctiform lamp 1.
- the measuring channel 10 with the detectors 5 and 6 corresponds to the arrangement described above in FIG. cause a difference or a division of the two detector signals 5 and 6.
- the filters 12 and 13 can be narrowband amplifiers, tuned to the frequency of the generator 15.
- the evaluation circuit 14 removes the carrier frequency of the generator 15 and supplies the information about a possible disturbance under the measuring channel on the surface 7 to be examined.
- Figure 3 shows an arrangement like Figure 2, which has an additional detector 16 for detecting holes.
- the signal of 16 is processed in a similar manner to the signals of 5 and 6.
- Figure 4 shows the known method of synchronous demodulation.
- the generator 15 is coupled to the evaluation circuit 14.
- the information about the faults from the evaluation circuit 14 can be used for the monitoring, display, storage, regulation and automation by means of suitable electronic / information technology apparatus.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH536385A CH669663A5 (enrdf_load_stackoverflow) | 1985-12-17 | 1985-12-17 | |
| CH5363/85 | 1985-12-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP0250490A1 true EP0250490A1 (de) | 1988-01-07 |
Family
ID=4292308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19870900036 Withdrawn EP0250490A1 (de) | 1985-12-17 | 1986-12-15 | Opto/elektronisches verfahren zur inspektion von oberflächen |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0250490A1 (enrdf_load_stackoverflow) |
| AU (1) | AU6726987A (enrdf_load_stackoverflow) |
| CH (1) | CH669663A5 (enrdf_load_stackoverflow) |
| WO (1) | WO1987003957A1 (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2626383B1 (fr) * | 1988-01-27 | 1991-10-25 | Commissariat Energie Atomique | Procede de microscopie optique confocale a balayage et en profondeur de champ etendue et dispositifs pour la mise en oeuvre du procede |
| JP2741416B2 (ja) * | 1988-10-31 | 1998-04-15 | シュヴァイツァリッシェ アイトゲノッセンシャフト ピー エス アイ パウル シェラー インスティチュート | 試験体の多点を同時に無接触試験する装置およびその使用 |
| JPH03503472A (ja) * | 1989-01-19 | 1991-08-01 | テスラー，ウラジミール エフィモビチ | テレビジョン方式 |
| DE10125751C2 (de) * | 2001-05-18 | 2003-04-03 | Willing Gmbh Dr Ing | Leuchte zur Abmusterung von Flächen |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1534762A (fr) * | 1967-05-18 | 1968-08-02 | Cilas | Procédé et dispositif de palpage optique |
| US3736065A (en) * | 1972-05-09 | 1973-05-29 | Philco Ford Corp | Radiation sensitive means for detecting optical flaws in glass |
| CA1089551A (en) * | 1978-06-27 | 1980-11-11 | John M. Lucas | Graininess sensor |
| DE3037622C2 (de) * | 1980-10-04 | 1987-02-26 | Theodor Prof. Dr.-Ing. 1000 Berlin Gast | Einrichtung zur Bestimmung der Oberflächengüte |
| DE3428435A1 (de) * | 1984-08-01 | 1986-02-06 | Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch | Rauheitssonde |
-
1985
- 1985-12-17 CH CH536385A patent/CH669663A5/de not_active IP Right Cessation
-
1986
- 1986-12-15 EP EP19870900036 patent/EP0250490A1/de not_active Withdrawn
- 1986-12-15 WO PCT/CH1986/000175 patent/WO1987003957A1/de active Application Filing
- 1986-12-15 AU AU67269/87A patent/AU6726987A/en not_active Abandoned
Non-Patent Citations (1)
| Title |
|---|
| See references of WO8703957A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1987003957A1 (en) | 1987-07-02 |
| CH669663A5 (enrdf_load_stackoverflow) | 1989-03-31 |
| AU6726987A (en) | 1987-07-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69029723T2 (de) | Verfahren zur bestimmung von grösse und geschwindigkeit kugelförmiger teilchen unter benutzung der phase und intensität gestreuten lichtes | |
| DE3876487T2 (de) | Geraet und verfahren zur detektion und bestaetigung oberflaechenfehler. | |
| DE69414630T2 (de) | Vorrichtung zur optischen Beleuchtung und Untersuchung von Defekten in Halbleiterscheiben und Solarzellen | |
| DE69531776D1 (de) | Vorrichtung und verfahren zur bestimmung eines ersten parameters eines objektes | |
| Harris | Effect of defect rate on inspection accuracy. | |
| DE2535543C3 (de) | Vorrichtung zur Feststellung von Herstellungsfehlern in einer bewegten Materialbahn | |
| DE3402855C2 (enrdf_load_stackoverflow) | ||
| DE69723997T3 (de) | Wafer inspektionsystem für die unterscheidung von löchern und staubpartikeln | |
| DE3043849A1 (de) | Verfahren zum beschauen einer reflektierenden und/oder transparenten, sich bewegenden bahn und beschaumaschine zur durchfuehrung des verfahrens | |
| DE2817333A1 (de) | Photometrische vorrichtung | |
| DE69014273T2 (de) | Verfahren und Vorrichtung zur Feststellung von Unreinheiten in Halbleitern. | |
| EP0310740A3 (de) | Vorrichtung zum Messen des Fremdstoffanteils in strömenden Flüssigkeiten | |
| DE3486120T2 (de) | Atemanalysevorrichtung. | |
| DE3230442A1 (de) | Verfahren zur messung der eigenschaften einer kunststoff-folie mittels infrarotstrahlung | |
| DE68902271T2 (de) | Verfahren und vorrichtung zur erfassung des verdrahtungsmusters. | |
| DE3643108C2 (enrdf_load_stackoverflow) | ||
| EP0250490A1 (de) | Opto/elektronisches verfahren zur inspektion von oberflächen | |
| EP0218151B1 (de) | Messverfahren und Vorrichtung zur berührungslosen Durchmesserbestimmung dünner Drähte | |
| EP0555508B1 (de) | Verfahren und Vorrichtung zur simultanen Bestimmung der Konzentrationen von Molekülverbindungen in Gasen und Flüssigkeiten | |
| DE6900450U (de) | Vorrichtung zum pruefen von filmbahnen | |
| JPS57204437A (en) | Measuring method for interval of inspection body in concentration measuring apparatus | |
| DE102009042404B3 (de) | Verfahren zur Bestimmung der Geschwindigkeit eines bewegten Fluids unter Einsatz einer Eigenkalibrierung eines Doppler-Global-Velozimeters mit Laserfrequenzmodulation | |
| EP0317697A3 (de) | Vorrichtung zum Messen des Fremdstoffanteils in einer strömenden Flüssigkeit | |
| DE2053007A1 (de) | Verfahren und Vorrichtung zur kolori metrischen Konzentrationsbestimmung | |
| EP0333017A1 (de) | Verfahren zur optischen Konzentrationsmessung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH DE FR GB IT LI LU NL SE |
|
| 17P | Request for examination filed |
Effective date: 19871216 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
| 18D | Application deemed to be withdrawn |
Effective date: 19870918 |
|
| RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: SCHOEPS, WILFRIED |