EP0222777B1 - Unit intended to restore the initial cleanness conditions in a quartz tube used as reaction chamber for fabricating integrated circuits - Google Patents

Unit intended to restore the initial cleanness conditions in a quartz tube used as reaction chamber for fabricating integrated circuits Download PDF

Info

Publication number
EP0222777B1
EP0222777B1 EP86901424A EP86901424A EP0222777B1 EP 0222777 B1 EP0222777 B1 EP 0222777B1 EP 86901424 A EP86901424 A EP 86901424A EP 86901424 A EP86901424 A EP 86901424A EP 0222777 B1 EP0222777 B1 EP 0222777B1
Authority
EP
European Patent Office
Prior art keywords
tube
enclosure
rinsing
tank
quartz tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP86901424A
Other languages
German (de)
French (fr)
Other versions
EP0222777A1 (en
Inventor
Philippe Lami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of EP0222777A1 publication Critical patent/EP0222777A1/en
Application granted granted Critical
Publication of EP0222777B1 publication Critical patent/EP0222777B1/en
Expired legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/163—Clean air work stations, i.e. selected areas within a space which filtered air is passed

Definitions

  • the present invention relates to an assembly intended to restore the initial conditions of cleanliness in a quartz tube used as a reaction chamber for the manufacture of integrated circuits.
  • the invention finds its application in particular in mass production units of integrated circuits.
  • a deposition furnace essentially comprises a quartz tube which serves as a reaction chamber and which must be periodically extracted and treated in order to remove from its surface the deposits which constitute it.
  • This cleaning operation or more exactly resetting to the initial cleanliness conditions, consists in immersing the tube in a stirred bath of extremely corrosive chemicals, generally a mixture of concentrated and hot HF and HN0 3 . In this way it is possible to remove the tungsten deposits which are particularly resistant.
  • Treatment outside the clean room involves handling the tube to take it out and back into the room, with the risk of depositing dust or pollutants on the tube during its stay outside the room.
  • the handling of the tube for its exit and entry into the clean room requires the significant opening of the room and therefore a consumption of filtered air and a pressure drop in the room .
  • the present invention relates to a quartz tube cleaning assembly which makes it possible to avoid both the aforementioned drawback and the drawbacks of treating the tube in the clean room and outside the clean room.
  • the cleaning assembly comprises a vertical separation panel delimiting, on one side an area in the workshop for manufacturing integrated circuits whose air is filtered to obtain an average level of cleanliness, and of the on the other hand an area in the manufacturing workshop whose air is filtered to obtain a maximum level of cleanliness, area called the clean room, this area being the one in which the main manufacturing operations are carried out and including the manufacturing machines using said quartz tubes, an elongated tank open at the top, located against the panel in the first zone and containing the chemical or chemicals intended to eliminate the undesirable elements covering said quartz tubes, an opening formed in the panel, in which is inserted in a sealed manner a parallelepiped enclosure of elongated shape, arranged vertically and intended to receive a quartz tube and perform on it a spray rinsing and drying, said enclosure further comprising a door opening onto the zone of average cleanliness and a door opening onto the zone of maximum cleanliness, these two doors being opposite one of the other and higher than the length of the quartz tube.
  • said tank is fixed, of cylindrical shape and is surmounted by a horizontal shaft of axis coinciding with the geometric axis of the tank, provided with two arches rigidly connected to it, these two arches having a curvature whose center coincides with the axis of the tank, the quartz tube being immersed in the chemical treatment liquid contained in the tank by resting on the two arches, the agitation of the tube being obtained by oscillating the shaft thus causing the oscillation of the quartz tube by rolling on the arches.
  • Said tank and the shaft are surrounded by a protective enclosure comprising at its upper part a vapor extraction hood and comprising on the outside of its side part an electric motor mechanism intended to give the oscillation movement to the 'tree.
  • the rinsing and drying enclosure is embedded in the panel so as to protrude on either side of the panel by a substantially identical distance; the tank is arranged near the rinsing and drying enclosure and the axis of this tank is arranged perpendicular to the vertical plane of the panel.
  • the rinsing and drying enclosure has a substantially flat and horizontal wall separating said enclosure into a lower compartment and an upper compartment, the quartz tube being able to rest on this wall in a vertical position when it is in the upper compartment, said wall comprising at least one opening opening inside the tube and at least one opening opening outside the tube when the latter rests on this wall in a vertical position.
  • the rinsing and drying enclosure comprises a rinsing tube having a first end connected to an inlet pipe for rinsing liquid from the quartz tube and a second end connected to a shower. comprising a first part capable of projecting the rinsing liquid radially inside the quartz tube and a second part capable of projecting the rinsing liquid radially on the outside of the quartz tube when the latter is in vertical position inside the enclosure.
  • said rinsing tube is mounted so as to slide longitudinally along its axis inside the enclosure.
  • At least one of said supports is fixed and at least one of said supports passes through a wall of the enclosure and is mounted to slide longitudinally.
  • FIG. 1 there is a set for cleaning the quartz tubes.
  • This assembly is mounted in a space corresponding to a clean room in a workshop for manufacturing integrated circuits.
  • a workshop for manufacturing integrated circuits.
  • machines each intended to perform one of the operations of processing wafers made of semiconductor material in order to produce integrated circuits on these wafers.
  • these machines are ovens with an essential piece of quartz tube serving as a reaction chamber.
  • the tube is removed from the oven and is brought for repair to the cleaning assembly according to the invention.
  • the assembly according to the invention comprises a panel 1 serving as a separation between two zones 2, 3 of the workshop, a zone 2 in which the air is of average cleanliness and the other zone 3 in which the air is of maximum cleanliness and is maintained at a slight overpressure compared to zone 2.
  • the two zones 2 and 3 of the workshop are delimited not only by the panel 1 but also by a set of partitions and watertight doors (not shown).
  • an opening 5 which is obstructed by an enclosure 6 of rectangular shape, elongated vertically and whose height is greater than the length of the quartz tubes.
  • This enclosure 6 comprises a door 7 of height greater than the length of the tubes, this door being disposed on the wall of the enclosure 6 located opposite zone 2.
  • the enclosure comprises another identical door 8 situated opposite zone 3
  • These two doors 7, 8 can be closed in a sealed manner, and in the same way the enclosure 6 is sealed as well as its connection with the panel 1. In this way, when the two doors 7, 8 are closed, both zones 2 and 3 are isolated from each other, which makes it easy to maintain the overpressure in zone 3.
  • the enclosure 6 makes it possible to receive a quartz tube in the vertical position after washing and pre-rinsing in the tank 4 and allows a complete rinsing and drying operation to be carried out on it.
  • a quartz tube whose internal surface condition is no longer satisfactory is extracted from the furnace which is in zone 3, also called the clean room.
  • the tube is transported to the other zone 2, also called the gray room, by passing it through the enclosure 6 which serves as an airlock, that is to say that the tube is first placed in the enclosure 6 by opening only the door 8, then the door 8 is closed, the door 7 is opened and the tube is removed from the enclosure 6 so it is found in zone 2.
  • This tube is then placed in the tank 4, a certain quantity of liquid product intended to dissolve the undesirable deposits on the internal face of the tube is placed in this tank. Then, the tank is emptied and filled with water to pre-rinse the tube.
  • the tube is replaced in a vertical position in the enclosure 6 by only opening the door 7.
  • the tube is rinsed using a shower that sends deionized water simultaneously to the inner and outer wall of the tube. Then cut off the water supply to the shower and circulate from the bottom to the top of the enclosure dry and hot air which dries the tube. This air comes from the air supply from the clean room, that is to say it is filtered through absolute filters.
  • the tube is dry, only door 8 is opened and the tube is removed to replace it in the corresponding machine.
  • the enclosure 6 serves both as a cabinet for rinsing and drying the tube as well as an airlock for the passage of the tube from the clean room to the gray room and vice versa, without significant consumption of ultra pure air from the clean room other than the amount of air needed to dry the tube.
  • the clean room 3 has always remained overpressure and isolated from the gray room 2, and that the polluting vapors from the tank 4 could not enter the clean room during the tube cleaning operation.
  • the sealed enclosure 6 is arranged in the form of an airlock for the passage in a vertical position of the tube 29 between the two zones 2 and 3.
  • the tube 29 is placed vertically in the center of the enclosure 6 and thus rests at mid height on a flat and horizontal wall 17, forming a partition in the enclosure 6.
  • This wall 17 has a central orifice 22 and orifices 21 distributed around and outside the tube 29.
  • the tube 29 is held in a vertical position thanks to two sets of three supports 18, 19 and 20 of which, for each set, one of the three supports 18 is fixed and is arranged horizontally in the extension of the panel 1, the second support 19 is horizontal and passes through the side wall of enclosure 6 to open into zone 3, the third support 20 is in a position symmetrical to that of support 19 relative to the plane of panel 1 and therefore opens into zone 2.
  • the two supports 19 and 20 are also mounted sliding longitudinally.
  • the device also includes a deionized filtered water inlet connected to a vertical rigid tube 23 in the enclosure 6, sliding longitudinally and connected at its end to a shower in two parts, the first part 24 coming to project the water radially to the inside the tube, and the second part 25 projecting the water radially onto the outside of the tube.
  • the water is cut and, by the pipe 26, is introduced into the lower part of the enclosure 6 of the hot ultrafiltered dry air which passes in a movement ascending through the openings 21 and 22 in and around the tube 29 to exit from the enclosure 6 in its upper part by a drain pipe ation 27.
  • a drain pipe ation 27 we close the pipes 26 and 27, we open the door 8, we pull out the supports 19, we go up the shower to release it from the upper part of the tube 29, we exit the tube and we close the door 8.
  • This part includes a frame 12, possibly Lely fixed to the panel 1 by its lateral part, at its upper part a tank 4 of cylindrical shape, open upwards, with a horizontal axis situated higher than the lateral edges of the tank, and a shaft 11 centered on the axis of the tank 4 and on which two arches 9, 10 are rigidly fixed, which extend radially from the shaft then in the form of an arc of a circle centered on the coincident axis of the shaft 11 and of the tank 4 and with a radius slightly smaller than that of the tank.
  • the machine also includes an extractor hood 13 connected by a duct 14 to the air extraction system, and a motor 15 intended to impart to the shaft 11 a periodic oscillating movement.
  • the tube to be treated 29 is placed in the tank 4 on the arches 9 and 10. Then the tank 4 is partially filled from a tank 30 by pipes 16 and pumps (not shown), then it is started. the motor 15: the shaft oscillates and drives the tubes through the hoops in an oscillating movement. Then the tank 4 is emptied, then it is filled and the water is emptied in order to pre-rinse the tube. The tube is then removed to bring it into the rinsing and drying cabinet 6, the arrangement and instructions for which have been described above.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)

Abstract

The unit comprises a vertical panel (1) separating the workshop into a medium cleanness area (2) and a maximum cleanness area (3), an elongated container (4) in the area (2) and a housing (6) inserted in an opening (5) of the panel (1); the tubes are cleaned and pre-rinsed in the container (4), and than rinsed and dried in the housing (6) which is also used as lock-chamber for transferring the tubes between the areas (2) and (3). Application to the making of integrated circuits.

Description

La présente invention concerne un ensemble destiné à redonner les conditions initiales de propreté dans un tube de quartz utilisé comme chambre de réaction pour la fabrication des circuits intégrés.The present invention relates to an assembly intended to restore the initial conditions of cleanliness in a quartz tube used as a reaction chamber for the manufacture of integrated circuits.

L'invention trouve son application en particulier dans les unités de production en série de circuits intégrés.The invention finds its application in particular in mass production units of integrated circuits.

Dans de telles unités, l'une des conditions essentielles à respecter est la propreté absolue de l'air ambiant. Cette propreté est évaluée par la détection d'un nombre très faible de particules de dimension supérieure à 0,5 Micron dans un volume unitaire d'air, et par l'absence pratiquement totale de gaz corrosif dans cet air. De telles salles, appelées "salles blanches", sont d'un coût de réalisation et de fonctionnement très élevé. En conséquence, il convient de limiter les facteurs suivants:

  • - le volume ou la surface au sol occupé par les machines contenues dans la salle blanche;
  • - la quantité d'air extrait de force de la salle blanche, parce que cela implique l'introduction dans la salle d'une quantité égale d'air traité et filtré par des filtres absolus, donc très onéreux; une telle extraction d'air provient principalement des hottes aspirantes des machines produisant des émanations polluantes;
  • - la quantité d'air s'échappant de la salle durant son ouverture, en particulier lors de l'introduction dans la salle de pièces de grandes dimensions, puisque la salle est en surpression:
  • - la fréquence d'ouverture de la salle, parce qu'à chaque fois, cela fait chuter la surpression et provoque des mouvements introduisant des poussières;
  • - la quantité de liquide ou de gaz corrosif pouvant s'echapper dans l'air de la salle.
In such units, one of the essential conditions to be respected is the absolute cleanliness of the ambient air. This cleanliness is evaluated by the detection of a very small number of particles of dimension greater than 0.5 Micron in a unit volume of air, and by the practically total absence of corrosive gas in this air. Such rooms, called "clean rooms", have a very high production and operating cost. Consequently, the following factors should be limited:
  • - the volume or floor space occupied by the machines contained in the clean room;
  • - the amount of air forcibly extracted from the clean room, because this implies the introduction into the room of an equal amount of air treated and filtered by absolute filters, therefore very expensive; such air extraction comes mainly from the extractor hoods of machines producing polluting fumes;
  • - the quantity of air escaping from the room during its opening, in particular when large rooms are introduced into the room, since the room is under overpressure:
  • - the frequency of opening of the room, because each time, it drops the overpressure and causes movements introducing dust;
  • - the quantity of corrosive liquid or gas which can escape into the air of the room.

Par ailleurs, certaines machines telles que les fours de dépôt sont présentes dans la salle blanche. Un four de dépôt comporte essentiellement un tube de quartz qui sert de chambre de réaction et qu'il faut périodiquement extraire et traiter afin de retirer de sa surface les dépôts qui s'y constituent. Cette opération de nettoyage ou plus exactement de remise aux conditions initiales de propreté consiste à immerger le tube dans un bain agité de produits chimiques extrêmement corrosifs, généralement un mélange de HF et HN03 concentré et chaud. On peut de la sorte enlever les dépôts de tungstène qui sont particulièrement résistants.In addition, some machines such as deposit ovens are present in the clean room. A deposition furnace essentially comprises a quartz tube which serves as a reaction chamber and which must be periodically extracted and treated in order to remove from its surface the deposits which constitute it. This cleaning operation, or more exactly resetting to the initial cleanliness conditions, consists in immersing the tube in a stirred bath of extremely corrosive chemicals, generally a mixture of concentrated and hot HF and HN0 3 . In this way it is possible to remove the tungsten deposits which are particularly resistant.

Comme les tubes de quartz sont très fragiles et longs d'environ deux à trois mètres, l'opération de nettoyage est délicate. Un traitement du tube dans la salle blanche prend de la place, nécessite une extraction d'air importante pour limiter la contamination de l'air par les émanations corrosives, et n'élimine pas totalement ce risque.As the quartz tubes are very fragile and about two to three meters long, the cleaning operation is delicate. A tube treatment in the clean room takes up space, requires significant air extraction to limit contamination of the air by corrosive fumes, and does not completely eliminate this risk.

Un traitement hors de la salle blanche implique une manutention du tube pour le sortir et le rentrer dans la salle, avec le risque de dépôt de poussières ou matières polluantes sur le tube lors de son séjour hors de la salle. D'autre part, dans ce cas, les manutentions du tube pour sa sortie et son entrée dans la salle blanche nécessitent l'ouverture importante de la salle et par conse- quent une consommation d'air filtré et une chute de pression dans la salle.Treatment outside the clean room involves handling the tube to take it out and back into the room, with the risk of depositing dust or pollutants on the tube during its stay outside the room. On the other hand, in this case, the handling of the tube for its exit and entry into the clean room requires the significant opening of the room and therefore a consumption of filtered air and a pressure drop in the room .

Bien sûr, il est connu du domaine de décontamination microbiologique (voir DE-A-2 818 895) de disposer d'un ensemble pour rinçage d'objets qui sont transférés d'un premier milieu d'un niveau de propreté moyen à un deuxième milieu d'un niveau de propreté maximum en utilisant une cabine en forme de sas fixée dans une paroi séparant les deux milieux, la cabine étant équipée de moyens de remplissage d'un liquide stérilisateur. Le principal inconvénient de cet ensemble est qu'il ne remplit pas la fonction de rinçage ni celle de séchage.Of course, it is known in the field of microbiological decontamination (see DE-A-2 818 895) to have an assembly for rinsing objects which are transferred from a first medium of a medium level of cleanliness to a second middle of a maximum level of cleanliness by using an airlock-shaped cabin fixed in a wall separating the two environments, the cabin being equipped with means for filling a sterilizing liquid. The main drawback of this set is that it does not fulfill the function of rinsing or that of drying.

La présente invention concerne un ensemble de nettoyage des tubes de quartz qui permet d'éviter à la fois l'inconvénient précité et les inconvénients d'un traitement du tube dans la salle blanche et hors de la salle blanche.The present invention relates to a quartz tube cleaning assembly which makes it possible to avoid both the aforementioned drawback and the drawbacks of treating the tube in the clean room and outside the clean room.

Selon l'invention, l'ensemble de nettoyage comporte un panneau vertical de séparation délimitant, d'un côté une zone dans l'atelier de fabrication des circuits intégrés dont l'air est filtré pour obtenir un niveau de propreté moyen, et de l'autre côté une zone dans l'atelier de fabrication dont l'air est filtré pour obtenir un niveau de propreté maximum, zone appelée salle blanche, cette zone étant celle dans laquelle sont effectuées les opérations principales de fabrication et comprenant les machines de fabrication utilisant lesdits tubes de quartz, une cuve allongée ouverte en partie su périeure, située contre le panneau dans la première zone et contenant le ou les produits chimiques destinés à éliminer les éléments indésirables recouvrant lesdits tubes de quartz, une ouverture ménagée dans le panneau, dans laquelle est insérée de façon étanche une enceinte parallélépipédique de forme allongée, disposée verticalement et destinée à recevoir un tube de quartz et effectuer sur lui une opération de rinçage par aspersion et de séchage, ladite enceinte comprenant en outre une porte s'ouvrant sur la zone de propreté moyenne et une porte s'ouvrant sur la zone de propreté maximum, ces deux portes étant en regard l'une de l'autre et d'une hauteur supérieure à la longueur du tube de quartz. De préférence, le panneau, la cuve et l'enceinte sont réalisés séparément et assemblés rigidement pour former l'installation de nettoyage complète.According to the invention, the cleaning assembly comprises a vertical separation panel delimiting, on one side an area in the workshop for manufacturing integrated circuits whose air is filtered to obtain an average level of cleanliness, and of the on the other hand an area in the manufacturing workshop whose air is filtered to obtain a maximum level of cleanliness, area called the clean room, this area being the one in which the main manufacturing operations are carried out and including the manufacturing machines using said quartz tubes, an elongated tank open at the top, located against the panel in the first zone and containing the chemical or chemicals intended to eliminate the undesirable elements covering said quartz tubes, an opening formed in the panel, in which is inserted in a sealed manner a parallelepiped enclosure of elongated shape, arranged vertically and intended to receive a quartz tube and perform on it a spray rinsing and drying, said enclosure further comprising a door opening onto the zone of average cleanliness and a door opening onto the zone of maximum cleanliness, these two doors being opposite one of the other and higher than the length of the quartz tube. Preferably, the panel, the tank and the enclosure are produced separately and rigidly assembled to form the complete cleaning installation.

Selon une autre caractéristique de l'invention, ladite cuve est fixe, de forme cylindrique et est surmontée d'un arbre horizontal d'axe confondu avec l'axe géométrique de la cuve, muni de deux arceaux liés rigidement à lui, ces deux arceaux ayant une courbure dont le centre est confondu avec l'axe de la cuve, le tube de quartz venant s'immerger dans le liquide de traitement chimique contenu dans la cuve en reposant sur les deux arceaux, l'agitation du tube étant obtenue en faisant osciller l'arbre entraînant ainsi par roulement sur les arceaux l'oscillation du tube de quartz. Ladite cuve et l'arbre sont entourés par une enceinte de protection comportant à sa partie supérieure une hotte d'aspiration des vapeurs et comportant à l'extérieur de sa partie latérale un mécanisme à moteur électrique destiné à donner le mouvement d'oscillation à l'arbre.According to another characteristic of the invention, said tank is fixed, of cylindrical shape and is surmounted by a horizontal shaft of axis coinciding with the geometric axis of the tank, provided with two arches rigidly connected to it, these two arches having a curvature whose center coincides with the axis of the tank, the quartz tube being immersed in the chemical treatment liquid contained in the tank by resting on the two arches, the agitation of the tube being obtained by oscillating the shaft thus causing the oscillation of the quartz tube by rolling on the arches. Said tank and the shaft are surrounded by a protective enclosure comprising at its upper part a vapor extraction hood and comprising on the outside of its side part an electric motor mechanism intended to give the oscillation movement to the 'tree.

Selon un mode de réalisation de l'invention, l'enceinte de rinçage et séchage est encastrée dans le panneau de manière à dépasser de part et d'autre du panneau d'une distance sensiblement identique; la cuve est disposée à proximité de l'enceinte de rinçage et de séchage et l'axe de cette cuve est disposé perpendiculairement au plan vertical du panneau.According to one embodiment of the invention, the rinsing and drying enclosure is embedded in the panel so as to protrude on either side of the panel by a substantially identical distance; the tank is arranged near the rinsing and drying enclosure and the axis of this tank is arranged perpendicular to the vertical plane of the panel.

Selon une autre caractéristique de l'invention, l'enceinte de rinçage et séchage comporte une paroi sensiblement plane et horizontale séparant ladite enceinte en un compartiment inférieur et un compartimént supérieur, le tube de quartz pouvant reposer sur cette paroi en position verticale lorsqu'il est dans le compartiment supérieur, ladite paroi comportant au moins un orifice débouchant à l'intérieur du tube et au moins un orifice découchant à l'extérieur du tube lorsque ce dernier repose sur cette paroi en position verticale.According to another characteristic of the invention, the rinsing and drying enclosure has a substantially flat and horizontal wall separating said enclosure into a lower compartment and an upper compartment, the quartz tube being able to rest on this wall in a vertical position when it is in the upper compartment, said wall comprising at least one opening opening inside the tube and at least one opening opening outside the tube when the latter rests on this wall in a vertical position.

Dans ce cas, l'enceinte de rinçage et séchage peut comporter en outre:

  • - une canalisation d'arrivée d'un gaz de séchage du tube, débouchant dans ledit compartiment inférieur, et
  • - une canalisation d'évacuation du gaz de séchage communiquant avec le compartiment supérieur.
In this case, the rinsing and drying enclosure may also include:
  • an inlet pipe for a drying gas from the tube, opening into said lower compartment, and
  • - a drying gas evacuation pipe communicating with the upper compartment.

Selon une autre caractéristique de l'invention, l'enceinte de rinçage et séchage comprend un tube de rinçage ayant une première extrémité reliée à une conduite d'arrivée d'un liquide de rinçage du tube de quartz et une deuxième extrémité reliée à une douche comportant une première partie apte à projeter le liquide de rinçage radialement à l'intérieur du tube de quartz et une deuxième partie apte à projeter le liquide de rinçage radialement sur l'extérieur du tube de quartz lorsque ce dernier est en position verticale à l'intérieur de l'enceinte.According to another characteristic of the invention, the rinsing and drying enclosure comprises a rinsing tube having a first end connected to an inlet pipe for rinsing liquid from the quartz tube and a second end connected to a shower. comprising a first part capable of projecting the rinsing liquid radially inside the quartz tube and a second part capable of projecting the rinsing liquid radially on the outside of the quartz tube when the latter is in vertical position inside the enclosure.

De préférence, dans ce cas, ledit tube de rinçage est monté de manière à coulisser longitudinalement suivant son axe à l'intérieur de l'enceinte.Preferably, in this case, said rinsing tube is mounted so as to slide longitudinally along its axis inside the enclosure.

Enfin, selon une dernière caractéristique de l'invention, l'enceinte de rinçage et séchage comporte des moyens de maintien du tube en position verticale, ces moyens de maintien comprenant:

  • - un premier ensemble de supports de forme allongée et situés sensiblement dans un premier plan horizontal, et
  • - un deuxième ensemble de supports de forme allongée et situés sensiblement dans un deuxième plan horizontal différent du premier.
Finally, according to a last characteristic of the invention, the rinsing and drying enclosure comprises means for holding the tube in a vertical position, these holding means comprising:
  • a first set of elongated supports located substantially in a first horizontal plane, and
  • - A second set of elongated supports and located substantially in a second horizontal plane different from the first.

De préférence, dans ce cas, l'un au moins desdits supports est fixe et l'un au moins desdits supports traverse une paroi de l'enceinte et est monté coulissant longitudinalement.Preferably, in this case, at least one of said supports is fixed and at least one of said supports passes through a wall of the enclosure and is mounted to slide longitudinally.

D'autres caractéristiques et avantages de l'invention seront mieux compris à la lumière de la description de l'exemple de réalisation qui va suivre, illustré par les dessins annexes.

  • La figure 1 représente en vue perspective le schéma général de l'ensemble;
  • la figure 2 représente en coupe selon AA de la figure 3 la partie de l'ensemble de nettoyage correspondant aux opérations de rinçage et séchage;
  • la figure 3 est une vue en coupe suivant la ligne BB de la figure 2;
  • la figure 4 représente en vue perspective la partie de l'ensemble de nettoyage correspondant à l'opération de traitement chimique; et
  • la figure 5 représente la partie selon la figure 4 en coupe transversale.
Other characteristics and advantages of the invention will be better understood in the light of the description of the embodiment which follows, illustrated by the accompanying drawings.
  • Figure 1 shows in perspective view the general diagram of the assembly;
  • Figure 2 shows in section along AA of Figure 3 the part of the cleaning assembly corresponding to the rinsing and drying operations;
  • Figure 3 is a sectional view along line BB of Figure 2;
  • Figure 4 shows in perspective view the part of the cleaning assembly corresponding to the chemical treatment operation; and
  • Figure 5 shows the part according to Figure 4 in cross section.

En se reportant à la figure 1, on distingue un ensemble destiné au nettoyage des tubes de quartz. Cet ensemble est monté dans un espace correspondant à une salle blanche d'un atelier de fabrication des circuits intégrés. Dans un tel atelier (non représenté), se trouve un ensemble de machines destinées chacune à effectuer une des opérations de traitement des plaquettes en matériau semi-conducteur afin de réaliser sur ces plaquettes des circuits intégrés. Parmi ces machines se trouvent des fours comportant comme pièce essentielle un tube de quartz servant de chambre de réaction. Dans un tel tube, on peut par exemple effectuer un dépôt de tungstène sur les plaquettes. Au bout d'un certain nombre d'opérations, le tube est extrait du four et est amené pour remise en état dans l'ensemble de nettoyage conforme à l'invention. L'ensemble conforme à l'invention comporte un panneau 1 servant de séparation entre deux zones 2, 3 de l'atelier, une zone 2 dans laquelle l'air est d'une propreté moyenne et l'autre zone 3 dans laquelle l'air est d'une propreté maximum et est maintenu à une légère surpression par rapport à la zone 2. Bien entendu, les deux zones 2 et 3 de l'atelier sont délimitées non seulement par le panneau 1 mais aussi par un ensemble de cloisons et de portes étanches (non représentées). Du côté du panneau 1 correspondant à la zone 2 est fixée une cuve 4 de forme allongée, de longueur intérieure supérieure à celle des tubes de quartz et contenant successivement le ou les bains de produits chimiques destinés au décapage et au prérinçage du tube qui repose dans la cuve et qui est soumis à une agitation. Dans le panneau 1 est ménagée une ouverture 5 que vient obstruer une enceinte 6 de forme parallélépipédique, allongée verticalement et dont la hauteur est supérieure à la longueur des tubes de quartz. Cette enceinte 6 comporte une porte 7 de hauteur supérieure à la longueur des tubes, cette porte étant disposée sur la paroi de l'enceinte 6 située face à la zone 2. L'enceinte comporte une autre porte identique 8 située face à la zone 3. Ces deux portes 7, 8 peuvent se fermer de façon étanche, et de la même façon l'enceinte 6 est étanche ainsi que sa liaison avec le panneau 1. De cette manière, lorsque les deux portes 7, 8 sont fermées, les deux zones 2 et 3 sont isolées l'une de l'autre, ce qui permet de maintenir sans difficulté la surpression dans la zone 3. L'enceinte 6 permet de recevoir en position verticale un tube de quartz après son lavage et prérinçage dans la cuve 4 et permet d'effectuer sur lui une opération de rinçage complet et de séchage.Referring to Figure 1, there is a set for cleaning the quartz tubes. This assembly is mounted in a space corresponding to a clean room in a workshop for manufacturing integrated circuits. In such a workshop (not shown), there is a set of machines each intended to perform one of the operations of processing wafers made of semiconductor material in order to produce integrated circuits on these wafers. Among these machines are ovens with an essential piece of quartz tube serving as a reaction chamber. In such a tube, one can for example deposit a tungsten on the wafers. After a certain number of operations, the tube is removed from the oven and is brought for repair to the cleaning assembly according to the invention. The assembly according to the invention comprises a panel 1 serving as a separation between two zones 2, 3 of the workshop, a zone 2 in which the air is of average cleanliness and the other zone 3 in which the air is of maximum cleanliness and is maintained at a slight overpressure compared to zone 2. Of course, the two zones 2 and 3 of the workshop are delimited not only by the panel 1 but also by a set of partitions and watertight doors (not shown). On the side of the panel 1 corresponding to the zone 2 is fixed a tank 4 of elongated shape, of internal length greater than that of the quartz tubes and successively containing the bath or baths of chemicals intended for the pickling and pre-rinsing of the tube which rests in the tank and which is subjected to agitation. In the panel 1 is formed an opening 5 which is obstructed by an enclosure 6 of rectangular shape, elongated vertically and whose height is greater than the length of the quartz tubes. This enclosure 6 comprises a door 7 of height greater than the length of the tubes, this door being disposed on the wall of the enclosure 6 located opposite zone 2. The enclosure comprises another identical door 8 situated opposite zone 3 These two doors 7, 8 can be closed in a sealed manner, and in the same way the enclosure 6 is sealed as well as its connection with the panel 1. In this way, when the two doors 7, 8 are closed, both zones 2 and 3 are isolated from each other, which makes it easy to maintain the overpressure in zone 3. The enclosure 6 makes it possible to receive a quartz tube in the vertical position after washing and pre-rinsing in the tank 4 and allows a complete rinsing and drying operation to be carried out on it.

L'ensemble est utilisé de la manière suivante: Un tube de quartz dont l'état de surface interne n'est plus satisfaisant est extrait du four qui se trouve dans la zone 3, encore appelée salle blanche. Le tube est transporté dans l'autre zone 2, encore appelée salle grise, en le faisant passer par l'enceinte 6 qui sert de sas, c'est-à-dire que l'on place d'abord le tube dans l'enceinte 6 en ouvrant seulement la porte 8, puis on ferme la porte 8, on ouvre la porte 7 et on sort le tube de l'enceinte 6 il se retrouve donc dans la zone 2. On place alors ce tube dans la cuve 4, on met dans cette cuve une certaine quantité de produit liquide destiné à dissoudre les dépôts indésirables sur la face interne du tube. Ensuite, on vidange la cuve et on la remplit d'eau pour effectuer un prérinçage du tube. On vidange à nouveau, puis on replace le tube en position verticale dans l'enceinte 6 en ouvrant seulement la porte 7. Après avoir refermé cette porte 7, l'autre porte étant restée fermée, on procède au rinçage du tube à l'aide d'une douche qui envoie de l'eau désionisée simultanément sur la paroi interne et externe du tube. Ensuite on coupe l'arrivée d'eau à la douche et on fait circuler depuis le bas vers le haut de l'enceinte de l'air sec et chaud qui sèche le tube. Cet air provient de l'arrivée d'air de la salle blanche, c'est-à-dire qu'il est filtré à travers des filtres absolus. Quand le tube est sec, on ouvre seulement la porte 8 et on sort le tube pour le replacer dans la machine correspondante.The assembly is used in the following manner: A quartz tube whose internal surface condition is no longer satisfactory is extracted from the furnace which is in zone 3, also called the clean room. The tube is transported to the other zone 2, also called the gray room, by passing it through the enclosure 6 which serves as an airlock, that is to say that the tube is first placed in the enclosure 6 by opening only the door 8, then the door 8 is closed, the door 7 is opened and the tube is removed from the enclosure 6 so it is found in zone 2. This tube is then placed in the tank 4, a certain quantity of liquid product intended to dissolve the undesirable deposits on the internal face of the tube is placed in this tank. Then, the tank is emptied and filled with water to pre-rinse the tube. It is drained again, then the tube is replaced in a vertical position in the enclosure 6 by only opening the door 7. After having closed this door 7, the other door having remained closed, the tube is rinsed using a shower that sends deionized water simultaneously to the inner and outer wall of the tube. Then cut off the water supply to the shower and circulate from the bottom to the top of the enclosure dry and hot air which dries the tube. This air comes from the air supply from the clean room, that is to say it is filtered through absolute filters. When the tube is dry, only door 8 is opened and the tube is removed to replace it in the corresponding machine.

On voit que l'enceinte 6 sert à la fois d'armoire de rinçage et séchage du tube ainsi que de sas pour le passage du tube de la salle blanche à la salle grise et vice versa, sans consommation significative d'air ultra pur de la salle blanche autre que la quantité d'air nécessaire au séchage du tube. On voit aussi que la salle blanche 3 est restée toujours en surpression et isolée de la salle grise 2, et que les vapeurs polluantes provenant de la cuve 4 n'ont pu rentrer dans la salle blanche durant l'opération de nettoyage du tube. Par ailleurs, il est possible d'installer au-dessus de la cuve 4 une hotte aspirante de fort débit qui provoque un renouvellement d'air seulement dans la salle grise 2, c'est-à-dire un air peu filtré et bon marché, sans provoquer de consommation d'air dans la salle blanche, air qui est beaucoup plus cher puisqu'ultra pur.It can be seen that the enclosure 6 serves both as a cabinet for rinsing and drying the tube as well as an airlock for the passage of the tube from the clean room to the gray room and vice versa, without significant consumption of ultra pure air from the clean room other than the amount of air needed to dry the tube. We also see that the clean room 3 has always remained overpressure and isolated from the gray room 2, and that the polluting vapors from the tank 4 could not enter the clean room during the tube cleaning operation. Furthermore, it is possible to install above the tank 4 a high-flow extractor hood which causes a renewal of air only in the gray room 2, that is to say a little filtered and cheap air. , without causing consumption of air in the clean room, air which is much more expensive since ultra pure.

En se reportant aux figures 2 et 3, on distingue la partie de l'ensemble de nettoyage destinée aux opérations de rinçage et séchage du tube de quartz. On voit que l'enceinte étanche 6 est disposée en forme de sas pour le passage en position verticale du tube 29 entre les deux zones 2 et 3. Le tube 29 est placé verticalement au centre de l'enceinte 6 et repose ainsi à mi- hauteur sur une paroi 17 plane et horizontale, formant cloison de séparation dans l'enceinte 6. Cette paroi 17 comporte un orifice central 22 et des orifices 21 répartis autour et à l'extérieur du tube 29. Le tube 29 est maintenu en position verticale grâce à deux ensembles de trois supports 18, 19 et 20 dont, pour chaque ensemble, l'un des trois supports 18 est fixe et est disposé horizontalement dans le prolongement du panneau 1, le deuxième support 19 est horizontal et traverse la paroi latérale de l'enceinte 6 pour déboucher dans la zone 3, le troisième support 20 est dans une position symétrique de celle du support 19 par rapport au plan du panneau 1 et débouche donc dans la zone 2. Les deux supports 19 et 20 sont en outre montés coulissants longitudinalement. Le dispositif comporte encore une arrivée d'eau filtrée désionisée raccordée à un tube rigide vertical 23 dans l'enceinte 6, coulissant longitudinalement et raccordé à son extrémité à une douche en deux parties, la première partie 24 venant projeter l'eau radialement à l'intérieur du tube, et la deuxième partie 25 venant projeter l'eau radialement sur l'extérieur du tube.Referring to Figures 2 and 3, we can distinguish the part of the cleaning assembly intended for rinsing and drying operations of the quartz tube. We see that the sealed enclosure 6 is arranged in the form of an airlock for the passage in a vertical position of the tube 29 between the two zones 2 and 3. The tube 29 is placed vertically in the center of the enclosure 6 and thus rests at mid height on a flat and horizontal wall 17, forming a partition in the enclosure 6. This wall 17 has a central orifice 22 and orifices 21 distributed around and outside the tube 29. The tube 29 is held in a vertical position thanks to two sets of three supports 18, 19 and 20 of which, for each set, one of the three supports 18 is fixed and is arranged horizontally in the extension of the panel 1, the second support 19 is horizontal and passes through the side wall of enclosure 6 to open into zone 3, the third support 20 is in a position symmetrical to that of support 19 relative to the plane of panel 1 and therefore opens into zone 2. The two supports 19 and 20 are also mounted sliding longitudinally. The device also includes a deionized filtered water inlet connected to a vertical rigid tube 23 in the enclosure 6, sliding longitudinally and connected at its end to a shower in two parts, the first part 24 coming to project the water radially to the inside the tube, and the second part 25 projecting the water radially onto the outside of the tube.

Pour traiter un tube, on ouvre la porte 7, on met la douche en position haute, on fait glisser les deux supports 20 vers l'extérieur, on installe le tube 29, on ramène les supports 20 en contact avec le tube de sorte que le tube est maintenu par le contact latéral des deux ensembles de supports 19, 20, 21, on fait descendre la douche 24, 25 de façon à ce qu'elle entoure par l'intérieur et par l'extérieur l'extrémité haute du tube, on ferme la porte 7, on ouvre l'arrivée d'eau pour rincer le tube, l'eau s'évacuant par gravité à travers les orifices 21 et 22 dans la partie inférieure de l'enceinte 6 dont le fond est incliné, puis dans la canalisation de vidange 28. Quand le rinçage est achevé, l'eau est coupée et, par la canalisation 26, on introduit dans la partie basse de l'enceinte 6 de l'air sec ultrafiltré et chaud qui passe dans un mouvement ascendant par les orifices 21 et 22 dans et autour du tube 29 pour ressortir de l'enceinte 6 dans sa partie haute par une canalisation d'évacuation 27. Quand le tube est sec, on ferme les canalisations 26 et 27, on ouvre la porte 8, on tire vers l'extérieur les supports 19, on remonte la douche pour la dégager de la partie haute du tube 29, on sort le tube et on referme la porte 8.To treat a tube, we open the door 7, we put the shower in the high position, we slide the two supports 20 outwards, we install the tube 29, we bring the supports 20 in contact with the tube so that the tube is held by the lateral contact of the two sets of supports 19, 20, 21, the shower 24, 25 is lowered so that it surrounds the inside and outside of the high end of the tube , the door 7 is closed, the water inlet is opened to rinse the tube, the water evacuating by gravity through the orifices 21 and 22 in the lower part of the enclosure 6, the bottom of which is inclined, then in the drain pipe 28. When the rinsing is complete, the water is cut and, by the pipe 26, is introduced into the lower part of the enclosure 6 of the hot ultrafiltered dry air which passes in a movement ascending through the openings 21 and 22 in and around the tube 29 to exit from the enclosure 6 in its upper part by a drain pipe ation 27. When the tube is dry, we close the pipes 26 and 27, we open the door 8, we pull out the supports 19, we go up the shower to release it from the upper part of the tube 29, we exit the tube and we close the door 8.

En se reportant aux figures 4 et 5, on distingue la partie de l'ensemble de nettoyage des tubes de quartz destinée au décapage chimique du tube. Cette partie comporte un bâti 12, éventuellement fixé au panneau 1 par sa partie latérale, à sa partie supérieure une cuve 4 de forme cylindrique, ouverte vers le haut, d'axe horizontal situé plus haut que les bords latéraux de la cuve, et un arbre 11 centré sur l'axe de la cuve 4 et sur lequel sont fixés rigidemenent deux arceaux 9, 10, qui s'étendent radialement depuis l'arbre puis en forme d'arc de cercle centré sur l'axe confondu de l'arbre 11 et de la cuve 4 et de rayon légèrement inférieur à celui de la cuve. La machine comporte encore une hotte aspirante 13 reliée par un conduit 14 au système d'extraction d'air, et un moteur 15 destiné à imprimer à l'arbre 11 un mouvement périodique oscillant.Referring to Figures 4 and 5, we distinguish the part of the quartz tube cleaning assembly intended for chemical pickling of the tube. This part includes a frame 12, possibly Lely fixed to the panel 1 by its lateral part, at its upper part a tank 4 of cylindrical shape, open upwards, with a horizontal axis situated higher than the lateral edges of the tank, and a shaft 11 centered on the axis of the tank 4 and on which two arches 9, 10 are rigidly fixed, which extend radially from the shaft then in the form of an arc of a circle centered on the coincident axis of the shaft 11 and of the tank 4 and with a radius slightly smaller than that of the tank. The machine also includes an extractor hood 13 connected by a duct 14 to the air extraction system, and a motor 15 intended to impart to the shaft 11 a periodic oscillating movement.

Le tube à traiter 29 est disposé dans la cuve 4 sur les arceaux 9 et 10. On remplit alors partiel- lementa cuve 4 à partir d'un réservoir 30 par des canalisations 16 et des pompes (non représentées), puis on met en route le moteur 15: l'arbre oscille et entraîne par les arceaux le tube dans un mouvement d'oscillation. Ensuite on vidange la cuve 4, puis on la remplit et on la vide d'eau pour faire un pré-rinçage du tube. On retire alors le tube pour l'amener dans l'armoire de rinçage et séchage 6 dont l'agencement et le mode d'emploi ont été décrits plus haut.The tube to be treated 29 is placed in the tank 4 on the arches 9 and 10. Then the tank 4 is partially filled from a tank 30 by pipes 16 and pumps (not shown), then it is started. the motor 15: the shaft oscillates and drives the tubes through the hoops in an oscillating movement. Then the tank 4 is emptied, then it is filled and the water is emptied in order to pre-rinse the tube. The tube is then removed to bring it into the rinsing and drying cabinet 6, the arrangement and instructions for which have been described above.

Claims (11)

1. Means for restoring the initial cleanness conditions in a qurtz tube used as a reaction chamber for the production of integrated circuits, characterized in that it comprises a vertical separating panel (1) defining on the one side (2) a zone in the integrated circuit production shop, whose air is filtered to obtain an average cleanness level and on the other side a zone (3) in the production shop, whose air is filtered to obtain a maximum cleanness level, said zone (3) being that in which the main production operations are performed and including production machines using said quartz tube, an elongated tank (4) which is open in its upper part and positioned against panel (1) in zone (2) and containing the chemical product or products for eliminating the undesirable elements covering said quartz tube, an opening (5) made in panel (1) in which is sealingly inserted an elongated, vertically positioned, parallelepipedic enclosure (6) for receiving the quartz tube and for performing thereon a rinsing operation by sprinkling and drying, said enclosure (6) also having a door (7) opening onto zone (2) and a door (8) opening onto zone (3), said two doors facing one another and having a height exceeding the length of the quartz tube.
2. Means according to claim 1, characterized in that panel (1), tank (4) and enclosure (6) are produced separately and rigidly assembled to form the complete cleaning installation.
3. Means according to claim 1, characterized in that tank (4) is fixed, cylindrical and surmounted by a horizontal shaft (11), whose axis coincides with the geometrical of the tank, provided with two arches (9, 10) rigidly joined thereto, whereby said two arches have a curvature whose centre coincides with the tank axis, the quartz tube being immersed in the chemical treatment liquid contained in the tank resting on the two arches (9, 10) and in that the agitation of the tube is obtained by oscillating shaft (11), so that by running on arches (9, 10) it produces the oscillation of the quartz tube.
4. Means according to claim 1, characterized in that said tank (4) and shaft (5) are surrounded by a protective enclosure (12) provided in its upper part with a vapour exhauster hood and provided on the outside of its lateral part with an electric motor mechanism for giving the oscillating movement to shaft (11).
5. Means according to claim 1, characterized in that the rinsing and drying enclosure (6) is fitted into panel (1), so as to project on either side thereof by a substantially identical distance and in that the tank (4) is located in the vicinity of the rinsing and drying enclosure (6) and that the axis of tank (4) is perpendicular to the vertical plane of panel (1).
6. Means according to claim 1, characterized in that the rinsing and drying enclosure (6) comprises a substantially planar, horizontal wall (17) subdividing the enclosure (6) into a lower compartment and an upper compartment, whereby tube (29) can rest on said wall (17) in the vertical position when in the upper compartment, the wall (17) having at least one opening (22) issuing into the tube (29) and at least one opening (21) issuing outside tube (29) when the latter rests on said wall in the vertical position.
7. Means according to claim 6, characterized in that the rinsing and drying enclosure (6) also comprises an admission duct (26) for the drying gas form the tube issuing into said lower compartment and a duct (27) for discharging the drying gas communicating with the upper compartment.
8. Means according to claim 1, characterized in that the rinsing and drying enclosure (6) comprises a rinsing tube (23) having a first end connected to a pipe for supplying a rinsing liquid from the quartz tube (29) and a second end connected to a sprayer having a first part (24) able to spray the rinsing liquid radially within the quartz tube (29) and a second part (25) able to spray the rinsing liquid radially on the outside of the quartz tube (29) when the latter is in the vertical position within enclosure (6).
9. Means according to claim 8, characterized in that the rinsing tube (23) is mounted so as to slide longitudinally along its axis within enclosure (6).
10. Means according to claim 1, characterized in that the rinsing and drying enclosure (6) comprises means for maintaining the tube (29) in the verticalposition and which comprise a first group of elongated supports (18, 19, 20) located substantially in a first horizontal plane and a second group of elongated supports (18, 19, 20) located substantially in a second horizontal plane differing from the first.
11. Means according to claim 10, characterized in that at least one (18) of said supports is fixed and at least one (19) of said supports traverses a wall of enclosure (6) and is longitudinally slidingly mounted.
EP86901424A 1985-03-08 1986-03-04 Unit intended to restore the initial cleanness conditions in a quartz tube used as reaction chamber for fabricating integrated circuits Expired EP0222777B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8503433 1985-03-08
FR8503433A FR2578455B1 (en) 1985-03-08 1985-03-08 ASSEMBLY FOR RETURNING INITIAL CLEANLINESS CONDITIONS IN A QUARTZ TUBE USED AS A REACTION CHAMBER FOR THE MANUFACTURE OF INTEGRATED CIRCUITS

Publications (2)

Publication Number Publication Date
EP0222777A1 EP0222777A1 (en) 1987-05-27
EP0222777B1 true EP0222777B1 (en) 1989-07-12

Family

ID=9317008

Family Applications (1)

Application Number Title Priority Date Filing Date
EP86901424A Expired EP0222777B1 (en) 1985-03-08 1986-03-04 Unit intended to restore the initial cleanness conditions in a quartz tube used as reaction chamber for fabricating integrated circuits

Country Status (6)

Country Link
US (1) US4756322A (en)
EP (1) EP0222777B1 (en)
JP (1) JPS62502107A (en)
DE (1) DE3664264D1 (en)
FR (1) FR2578455B1 (en)
WO (1) WO1986005129A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964085B1 (en) 2002-11-25 2011-06-21 Applied Materials, Inc. Electrochemical removal of tantalum-containing materials
US6902628B2 (en) * 2002-11-25 2005-06-07 Applied Materials, Inc. Method of cleaning a coated process chamber component
US20060105182A1 (en) * 2004-11-16 2006-05-18 Applied Materials, Inc. Erosion resistant textured chamber surface
US7910218B2 (en) * 2003-10-22 2011-03-22 Applied Materials, Inc. Cleaning and refurbishing chamber components having metal coatings
US7579067B2 (en) * 2004-11-24 2009-08-25 Applied Materials, Inc. Process chamber component with layered coating and method
US8617672B2 (en) 2005-07-13 2013-12-31 Applied Materials, Inc. Localized surface annealing of components for substrate processing chambers
US7762114B2 (en) 2005-09-09 2010-07-27 Applied Materials, Inc. Flow-formed chamber component having a textured surface
US7981262B2 (en) 2007-01-29 2011-07-19 Applied Materials, Inc. Process kit for substrate processing chamber
US7942969B2 (en) 2007-05-30 2011-05-17 Applied Materials, Inc. Substrate cleaning chamber and components
CN112695508B (en) * 2021-01-24 2022-04-15 扬州苏油油成商贸实业有限公司 Impurity removing process for surface fluff of cotton fabric clothes

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3893869A (en) * 1974-05-31 1975-07-08 Rca Corp Megasonic cleaning system
FR2418034A1 (en) * 1978-02-28 1979-09-21 Sagem IMPROVEMENTS MADE TO APPLIANCES FOR THE TREATMENT OF SURFACES INVOLVING THE USE OF AT LEAST ONE SOLVENT
DE2818895C3 (en) * 1978-04-28 1981-01-22 Metall + Plastic Gmbh, 7760 Radolfzell Device for transferring objects between rooms with different germ content
US4294271A (en) * 1979-11-30 1981-10-13 Dexon, Inc. Apparatus for removing deposited matter from a diffusion tube
JPS58127035A (en) * 1982-01-25 1983-07-28 Hitachi Ltd Clean working room
US4561268A (en) * 1984-07-02 1985-12-31 G. A. Braun Inc. Wall adapter for tilt type washer-extractor machine

Also Published As

Publication number Publication date
JPS62502107A (en) 1987-08-20
WO1986005129A1 (en) 1986-09-12
US4756322A (en) 1988-07-12
FR2578455B1 (en) 1987-05-07
DE3664264D1 (en) 1989-08-17
FR2578455A1 (en) 1986-09-12
EP0222777A1 (en) 1987-05-27

Similar Documents

Publication Publication Date Title
EP0222777B1 (en) Unit intended to restore the initial cleanness conditions in a quartz tube used as reaction chamber for fabricating integrated circuits
US10065222B2 (en) Cleaning systems and methods for semiconductor substrate storage articles
JP5606607B2 (en) Apparatus and method for delivering a multi-part article
FR2520268A1 (en) METHOD OF WASHING METAL AND NON-METALLIC PARTS AND MACHINE FOR CARRYING OUT SAID METHOD
WO2002049920A1 (en) Method and installation for emptying casks
EP0195703B1 (en) Installation for dust-free work, especially for the production and checking of electronic components, and method for operating it
US20050217705A1 (en) Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
JPH0695509B2 (en) Cleaning method and its apparatus
JP2002520132A (en) Method and apparatus for cleaning a substrate
FR2604627A1 (en) Steriliser
CH655271A5 (en) PROCESS FOR THE TREATMENT BY BULK BREWING OF RAW MOLDED OR MACHINED PARTS AND MACHINE FOR CARRYING OUT SAID METHOD.
JPH01111338A (en) Cleaning and cleaning apparatus
FR2668401A1 (en) Device for treating surfaces and method for operating this device
JP3273339B2 (en) Degreasing cleaning method and apparatus
JP3423461B2 (en) Vacuum degreasing cleaning method
FR2676666A1 (en) METHOD AND DEVICE FOR TREATING AND CLEANING PLATES WITH CENTRAL REACTOR.
EP3939710B1 (en) Device for cleaning containers
FR2678848A1 (en) Installation for cleaning industrial components
JPH01226157A (en) Method of drying semiconductor substrate
RU2036734C1 (en) Device for article cleaning
FR2600637A1 (en) Process and plant for chemical matting of glass articles, especially lights
JPH06246244A (en) Multitank type automatic cleaning apparatus
JPH04334579A (en) Cleaning apparatus
JPH0727883B2 (en) Wafer drying equipment
JPH06333854A (en) Film forming device

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19861015

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): DE GB IT NL

17Q First examination report despatched

Effective date: 19880103

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE GB IT NL

REF Corresponds to:

Ref document number: 3664264

Country of ref document: DE

Date of ref document: 19890817

ITF It: translation for a ep patent filed
GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Effective date: 19900304

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19901001

GBPC Gb: european patent ceased through non-payment of renewal fee
NLV4 Nl: lapsed or anulled due to non-payment of the annual fee
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Effective date: 19901201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 20050304