EP0222777B1 - Vorrichtung zum saubermachen von quarzrohren, die als reaktionskammern bei der herstellung von integrierten schaltungen verwendet werden - Google Patents

Vorrichtung zum saubermachen von quarzrohren, die als reaktionskammern bei der herstellung von integrierten schaltungen verwendet werden Download PDF

Info

Publication number
EP0222777B1
EP0222777B1 EP86901424A EP86901424A EP0222777B1 EP 0222777 B1 EP0222777 B1 EP 0222777B1 EP 86901424 A EP86901424 A EP 86901424A EP 86901424 A EP86901424 A EP 86901424A EP 0222777 B1 EP0222777 B1 EP 0222777B1
Authority
EP
European Patent Office
Prior art keywords
tube
enclosure
rinsing
tank
quartz tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP86901424A
Other languages
English (en)
French (fr)
Other versions
EP0222777A1 (de
Inventor
Philippe Lami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of EP0222777A1 publication Critical patent/EP0222777A1/de
Application granted granted Critical
Publication of EP0222777B1 publication Critical patent/EP0222777B1/de
Expired legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/163—Clean air work stations, i.e. selected areas within a space which filtered air is passed

Definitions

  • the present invention relates to an assembly intended to restore the initial conditions of cleanliness in a quartz tube used as a reaction chamber for the manufacture of integrated circuits.
  • the invention finds its application in particular in mass production units of integrated circuits.
  • a deposition furnace essentially comprises a quartz tube which serves as a reaction chamber and which must be periodically extracted and treated in order to remove from its surface the deposits which constitute it.
  • This cleaning operation or more exactly resetting to the initial cleanliness conditions, consists in immersing the tube in a stirred bath of extremely corrosive chemicals, generally a mixture of concentrated and hot HF and HN0 3 . In this way it is possible to remove the tungsten deposits which are particularly resistant.
  • Treatment outside the clean room involves handling the tube to take it out and back into the room, with the risk of depositing dust or pollutants on the tube during its stay outside the room.
  • the handling of the tube for its exit and entry into the clean room requires the significant opening of the room and therefore a consumption of filtered air and a pressure drop in the room .
  • the present invention relates to a quartz tube cleaning assembly which makes it possible to avoid both the aforementioned drawback and the drawbacks of treating the tube in the clean room and outside the clean room.
  • the cleaning assembly comprises a vertical separation panel delimiting, on one side an area in the workshop for manufacturing integrated circuits whose air is filtered to obtain an average level of cleanliness, and of the on the other hand an area in the manufacturing workshop whose air is filtered to obtain a maximum level of cleanliness, area called the clean room, this area being the one in which the main manufacturing operations are carried out and including the manufacturing machines using said quartz tubes, an elongated tank open at the top, located against the panel in the first zone and containing the chemical or chemicals intended to eliminate the undesirable elements covering said quartz tubes, an opening formed in the panel, in which is inserted in a sealed manner a parallelepiped enclosure of elongated shape, arranged vertically and intended to receive a quartz tube and perform on it a spray rinsing and drying, said enclosure further comprising a door opening onto the zone of average cleanliness and a door opening onto the zone of maximum cleanliness, these two doors being opposite one of the other and higher than the length of the quartz tube.
  • said tank is fixed, of cylindrical shape and is surmounted by a horizontal shaft of axis coinciding with the geometric axis of the tank, provided with two arches rigidly connected to it, these two arches having a curvature whose center coincides with the axis of the tank, the quartz tube being immersed in the chemical treatment liquid contained in the tank by resting on the two arches, the agitation of the tube being obtained by oscillating the shaft thus causing the oscillation of the quartz tube by rolling on the arches.
  • Said tank and the shaft are surrounded by a protective enclosure comprising at its upper part a vapor extraction hood and comprising on the outside of its side part an electric motor mechanism intended to give the oscillation movement to the 'tree.
  • the rinsing and drying enclosure is embedded in the panel so as to protrude on either side of the panel by a substantially identical distance; the tank is arranged near the rinsing and drying enclosure and the axis of this tank is arranged perpendicular to the vertical plane of the panel.
  • the rinsing and drying enclosure has a substantially flat and horizontal wall separating said enclosure into a lower compartment and an upper compartment, the quartz tube being able to rest on this wall in a vertical position when it is in the upper compartment, said wall comprising at least one opening opening inside the tube and at least one opening opening outside the tube when the latter rests on this wall in a vertical position.
  • the rinsing and drying enclosure comprises a rinsing tube having a first end connected to an inlet pipe for rinsing liquid from the quartz tube and a second end connected to a shower. comprising a first part capable of projecting the rinsing liquid radially inside the quartz tube and a second part capable of projecting the rinsing liquid radially on the outside of the quartz tube when the latter is in vertical position inside the enclosure.
  • said rinsing tube is mounted so as to slide longitudinally along its axis inside the enclosure.
  • At least one of said supports is fixed and at least one of said supports passes through a wall of the enclosure and is mounted to slide longitudinally.
  • FIG. 1 there is a set for cleaning the quartz tubes.
  • This assembly is mounted in a space corresponding to a clean room in a workshop for manufacturing integrated circuits.
  • a workshop for manufacturing integrated circuits.
  • machines each intended to perform one of the operations of processing wafers made of semiconductor material in order to produce integrated circuits on these wafers.
  • these machines are ovens with an essential piece of quartz tube serving as a reaction chamber.
  • the tube is removed from the oven and is brought for repair to the cleaning assembly according to the invention.
  • the assembly according to the invention comprises a panel 1 serving as a separation between two zones 2, 3 of the workshop, a zone 2 in which the air is of average cleanliness and the other zone 3 in which the air is of maximum cleanliness and is maintained at a slight overpressure compared to zone 2.
  • the two zones 2 and 3 of the workshop are delimited not only by the panel 1 but also by a set of partitions and watertight doors (not shown).
  • an opening 5 which is obstructed by an enclosure 6 of rectangular shape, elongated vertically and whose height is greater than the length of the quartz tubes.
  • This enclosure 6 comprises a door 7 of height greater than the length of the tubes, this door being disposed on the wall of the enclosure 6 located opposite zone 2.
  • the enclosure comprises another identical door 8 situated opposite zone 3
  • These two doors 7, 8 can be closed in a sealed manner, and in the same way the enclosure 6 is sealed as well as its connection with the panel 1. In this way, when the two doors 7, 8 are closed, both zones 2 and 3 are isolated from each other, which makes it easy to maintain the overpressure in zone 3.
  • the enclosure 6 makes it possible to receive a quartz tube in the vertical position after washing and pre-rinsing in the tank 4 and allows a complete rinsing and drying operation to be carried out on it.
  • a quartz tube whose internal surface condition is no longer satisfactory is extracted from the furnace which is in zone 3, also called the clean room.
  • the tube is transported to the other zone 2, also called the gray room, by passing it through the enclosure 6 which serves as an airlock, that is to say that the tube is first placed in the enclosure 6 by opening only the door 8, then the door 8 is closed, the door 7 is opened and the tube is removed from the enclosure 6 so it is found in zone 2.
  • This tube is then placed in the tank 4, a certain quantity of liquid product intended to dissolve the undesirable deposits on the internal face of the tube is placed in this tank. Then, the tank is emptied and filled with water to pre-rinse the tube.
  • the tube is replaced in a vertical position in the enclosure 6 by only opening the door 7.
  • the tube is rinsed using a shower that sends deionized water simultaneously to the inner and outer wall of the tube. Then cut off the water supply to the shower and circulate from the bottom to the top of the enclosure dry and hot air which dries the tube. This air comes from the air supply from the clean room, that is to say it is filtered through absolute filters.
  • the tube is dry, only door 8 is opened and the tube is removed to replace it in the corresponding machine.
  • the enclosure 6 serves both as a cabinet for rinsing and drying the tube as well as an airlock for the passage of the tube from the clean room to the gray room and vice versa, without significant consumption of ultra pure air from the clean room other than the amount of air needed to dry the tube.
  • the clean room 3 has always remained overpressure and isolated from the gray room 2, and that the polluting vapors from the tank 4 could not enter the clean room during the tube cleaning operation.
  • the sealed enclosure 6 is arranged in the form of an airlock for the passage in a vertical position of the tube 29 between the two zones 2 and 3.
  • the tube 29 is placed vertically in the center of the enclosure 6 and thus rests at mid height on a flat and horizontal wall 17, forming a partition in the enclosure 6.
  • This wall 17 has a central orifice 22 and orifices 21 distributed around and outside the tube 29.
  • the tube 29 is held in a vertical position thanks to two sets of three supports 18, 19 and 20 of which, for each set, one of the three supports 18 is fixed and is arranged horizontally in the extension of the panel 1, the second support 19 is horizontal and passes through the side wall of enclosure 6 to open into zone 3, the third support 20 is in a position symmetrical to that of support 19 relative to the plane of panel 1 and therefore opens into zone 2.
  • the two supports 19 and 20 are also mounted sliding longitudinally.
  • the device also includes a deionized filtered water inlet connected to a vertical rigid tube 23 in the enclosure 6, sliding longitudinally and connected at its end to a shower in two parts, the first part 24 coming to project the water radially to the inside the tube, and the second part 25 projecting the water radially onto the outside of the tube.
  • the water is cut and, by the pipe 26, is introduced into the lower part of the enclosure 6 of the hot ultrafiltered dry air which passes in a movement ascending through the openings 21 and 22 in and around the tube 29 to exit from the enclosure 6 in its upper part by a drain pipe ation 27.
  • a drain pipe ation 27 we close the pipes 26 and 27, we open the door 8, we pull out the supports 19, we go up the shower to release it from the upper part of the tube 29, we exit the tube and we close the door 8.
  • This part includes a frame 12, possibly Lely fixed to the panel 1 by its lateral part, at its upper part a tank 4 of cylindrical shape, open upwards, with a horizontal axis situated higher than the lateral edges of the tank, and a shaft 11 centered on the axis of the tank 4 and on which two arches 9, 10 are rigidly fixed, which extend radially from the shaft then in the form of an arc of a circle centered on the coincident axis of the shaft 11 and of the tank 4 and with a radius slightly smaller than that of the tank.
  • the machine also includes an extractor hood 13 connected by a duct 14 to the air extraction system, and a motor 15 intended to impart to the shaft 11 a periodic oscillating movement.
  • the tube to be treated 29 is placed in the tank 4 on the arches 9 and 10. Then the tank 4 is partially filled from a tank 30 by pipes 16 and pumps (not shown), then it is started. the motor 15: the shaft oscillates and drives the tubes through the hoops in an oscillating movement. Then the tank 4 is emptied, then it is filled and the water is emptied in order to pre-rinse the tube. The tube is then removed to bring it into the rinsing and drying cabinet 6, the arrangement and instructions for which have been described above.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Claims (11)

1. Vorrichtung zum Wiederherstellen der ursprünglichen Reinheitsbedingungen in einem Quarzrohr, das als Reaktionskammer für die Herstellung von integrierten Schaltungen verwendet wird, dadurch gekennzeichnet, daß sie enthält: eine vertikale Trennplatte (1), die auf der einen Seite eine Zone (2) in der Herstellungswerkstatt der integrierten Schaltungen, deren Luft gefiltert wird, um ein mittleres Reinheitsniveau zu erzielen, und auf der anderen Seite eine Zone (3) in der Herstellungswerkstatt begrenzt, deren Luft gefiltert wird, um ein maximales Reinheitsniveau zu erzielen, wobei diese Zone (3) diejenige ist, in der die Hauptverrichtungen bei der Herstellung ausgeführt werden und die Herstellungsmaschinen enthält, die das genannte Quarzrohr verwenden, eine oben offene, länglich Wanne (4), dien der Zone (2) an der Platte (1) anliegt und das oder die chemische(n) Produkt(e) aufnimmt, das bzw. die zur Beseitigung unerwünschter Elemente bestimmt ist bzw. sind, die das Quarzrohr bedecken, eine Öffnung (5), die in der Platte (1) ausgebildet ist und in die ein länglicher quaderförmiger Behälter (6) abgedichtet eingesetzt ist, der vertikal angeordnet ist und dazu bestimmt ist, das Quarzrohr aufzunehmen und an diesem einen Reinigungsvorgang durch Besprengung und Trocknung auszuführen, welcher Behälter (6) darüber hinaus eine Tür (7) aufweist, die sich in die Zone (2) öffnet, und eine Tür (8), die sich in die Zone (3) öffnet, wobei diese zwei Türen einander gegenüberstehen und eine Höhe haben, de größer als die Länge des Quarzrohrs ist.
2. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die Platte (1), die Wanne (4) und der Behälter (6) getrennt hergestellt und starr miteinander vereinigt sind, um die vollständige Reinigungsanlage zu bilden.
3. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die genannte Wanne (4) fest ist, zylindrische Gestalt hat und über ihr eine horizontale Welle (11) angeordnet ist, deren Achse mit der geometrischen Achse der Wanne zusammenfällt und die mit zwei Bügeln (9, 10) versehen ist, die starr mit ihr verbunden sind und die eine Krümmung haben, deren Mittelpunkt mit der Achse der Wanne zusammenfällt, wobei das Quarzrohr in die chemische Behandlungsflüssigkeit, die sich in der Wanne befindet, untergetaucht wird, wobe sie auf den zwei Bügeln (9, 10) ruht, und daß die Bewegung des Rohres dadurch erzielt wird, daß man die Welle (11) schwngen läßt, so daß diese durch Abrollen auf den Bügeln (9, 10) die Schwingung des Quarzrohrs hervorruft.
4. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die genannte Wanne (4) und die Welle (11) von einem Schutzbehälter (12) umgeben sind, der in seinem oberen Abschnitt eine Dampfabsaughaube aufweist und außerhalb seines Seitenabschnitts einen Mechanismus mit Elektromotor enthält, der dazu bestimmt ist, der Welle (11) die Schwingungsbewegung zu verleihen.
5. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß der Spül- und Trocknungsbehälter (6) in die Platte (1) so eingelassen ist, daß er zu beden Seiten der Platte von dieser im wesentlichen gleich weit vorsteht, und daß die Wanne (4) in der Nähe des Spül- und Trocknungsbehälters (6) angeordnet ist und daß die Achse dieser Wanne (4) senkrecht zur Vertikalebene der Platte (1) angeordnet ist.
6. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß der Spül- und Trocknungsbehälter (6) eine im wesentlichen ebene und horizontale Wand (17) enthält, die den Behälter (6) in ein unteres Abteil und in ein oberes Abteil unterteilt, wobei das Rohr (29) auf dieser Wand (17) in vertikaler Position ruhen kann, wenn es sich in dem oberen Abteil befindet, welche Wand (17) außerdem wenigstens eine Öffnung (22) aufweist, die in das Innere des Rohres (29) mündet, und wenigstens eine Öffnung (21) aufweist, die außerhalb des Rohres (29) mündet, wenn letzteres auf deser Wand in vertikaler Position ruht.
7. Vorrichtung nach Anspruch 6, dadurch gekennzeichnet, daß der Spül- und Trocknungsbehälter (6) darüber hinaus enthält:
- eine Zuführungsleitung (26) für ein Gas zum Trocknen des Rohres, die in das genannte untere Abteil mündet, und
- eine Abzugsleitung (27) für das Trocknungsgas, die mit dem oberen Abteil in Verbindung steht.
8. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß der Spül- und Trocknungsbehälter (6) ein Spülrohr (23) enthält, das ein erstes Ende hat, das mit einer Zuführleitung für eine Spülflüssigkeit für das Quarzrohr (29) verbunden ist, und ein zweites Ende hat, das mit einer Spüleinrichtung verbunden ist, die einen ersten Abschnitt (24) hat, der dazu eingerichtet ist, die Spülflüssigkeit radial, in das Innere des Quarzrohrs (29) zu richten, und einen zweiten Abschnitt (25) hat, der dazu engerichtet ist, de Spülflüssigkeit radial auf das Äußere des Quarzrohrs (29) zu richten, wenn letzteres sich in vertikaler Position im Innern des Behälters (6) befindet.
9. Vorrichtung nach Anspruch 8, dadurch gekennzeichnet, daß das Spülrohr (23) in Längsrichtung längs seiner Achse im Innern des Behälters (6) verschiebbar montiert ist.
10. Vorrichtung nach Anspruch 1, dadurch gekennzeichnet, daß der Spül- und Trocknungsbehälter (6) Einrichtungen zum Halten des Rohrs (29) in vertikaler Lage aufweist, umfassend:
- eine erste Gruppe von Haltern (18, 19, 20) von länglicher Gestalt, de im wesentlichen in einer ersten horizontalen Ebene angeordnet sind, und
- eine zweite Gruppe vor Haltern (18, 19, 20) von länglicher Gestalt, die im wesentlichen in einer zweiten horizontalen, von der ersten verschiedenen Ebene angeordnet sind.
11. Vorrichtung nach Anspruch 10, dadurch gekennzeichnet, daß wenigstens einer (18) der genannten Halter fest ist und wenigstens einer (19) der genannten Halter eine Wand des Behälters (6) durchquert und in Längsrichtung verschiebbar montiert ist.
EP86901424A 1985-03-08 1986-03-04 Vorrichtung zum saubermachen von quarzrohren, die als reaktionskammern bei der herstellung von integrierten schaltungen verwendet werden Expired EP0222777B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8503433A FR2578455B1 (fr) 1985-03-08 1985-03-08 Ensemble destine a redonner les conditions initiales de proprete dans un tube de quartz utilise comme chambre de reaction pour la fabrication des circuits integres
FR8503433 1985-03-08

Publications (2)

Publication Number Publication Date
EP0222777A1 EP0222777A1 (de) 1987-05-27
EP0222777B1 true EP0222777B1 (de) 1989-07-12

Family

ID=9317008

Family Applications (1)

Application Number Title Priority Date Filing Date
EP86901424A Expired EP0222777B1 (de) 1985-03-08 1986-03-04 Vorrichtung zum saubermachen von quarzrohren, die als reaktionskammern bei der herstellung von integrierten schaltungen verwendet werden

Country Status (6)

Country Link
US (1) US4756322A (de)
EP (1) EP0222777B1 (de)
JP (1) JPS62502107A (de)
DE (1) DE3664264D1 (de)
FR (1) FR2578455B1 (de)
WO (1) WO1986005129A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6902628B2 (en) * 2002-11-25 2005-06-07 Applied Materials, Inc. Method of cleaning a coated process chamber component
US7964085B1 (en) 2002-11-25 2011-06-21 Applied Materials, Inc. Electrochemical removal of tantalum-containing materials
US20060105182A1 (en) * 2004-11-16 2006-05-18 Applied Materials, Inc. Erosion resistant textured chamber surface
US7910218B2 (en) * 2003-10-22 2011-03-22 Applied Materials, Inc. Cleaning and refurbishing chamber components having metal coatings
US7579067B2 (en) * 2004-11-24 2009-08-25 Applied Materials, Inc. Process chamber component with layered coating and method
US8617672B2 (en) 2005-07-13 2013-12-31 Applied Materials, Inc. Localized surface annealing of components for substrate processing chambers
US7762114B2 (en) 2005-09-09 2010-07-27 Applied Materials, Inc. Flow-formed chamber component having a textured surface
US7981262B2 (en) 2007-01-29 2011-07-19 Applied Materials, Inc. Process kit for substrate processing chamber
US7942969B2 (en) 2007-05-30 2011-05-17 Applied Materials, Inc. Substrate cleaning chamber and components
CN112695508B (zh) * 2021-01-24 2022-04-15 扬州苏油油成商贸实业有限公司 一种棉织物服装表面绒毛除杂工艺

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3893869A (en) * 1974-05-31 1975-07-08 Rca Corp Megasonic cleaning system
FR2418034A1 (fr) * 1978-02-28 1979-09-21 Sagem Perfectionnements apportes aux appareils pour le traitement de surfaces impliquant l'utilisation d'au moins un solvant
DE2818895C3 (de) * 1978-04-28 1981-01-22 Metall + Plastic Gmbh, 7760 Radolfzell Vorrichtung zum Überführen von Gegenständen zwischen Räumen unterschiedlichen Keimgehaltes
US4294271A (en) * 1979-11-30 1981-10-13 Dexon, Inc. Apparatus for removing deposited matter from a diffusion tube
JPS58127035A (ja) * 1982-01-25 1983-07-28 Hitachi Ltd 清浄室装置
US4561268A (en) * 1984-07-02 1985-12-31 G. A. Braun Inc. Wall adapter for tilt type washer-extractor machine

Also Published As

Publication number Publication date
JPS62502107A (ja) 1987-08-20
FR2578455B1 (fr) 1987-05-07
FR2578455A1 (fr) 1986-09-12
EP0222777A1 (de) 1987-05-27
WO1986005129A1 (fr) 1986-09-12
US4756322A (en) 1988-07-12
DE3664264D1 (en) 1989-08-17

Similar Documents

Publication Publication Date Title
US11167322B2 (en) Cleaning systems and methods for semiconductor substrate storage articles
EP0222777B1 (de) Vorrichtung zum saubermachen von quarzrohren, die als reaktionskammern bei der herstellung von integrierten schaltungen verwendet werden
JP2012531035A (ja) 統合されたクリーナ及びドライヤシステム
FR2520268A1 (fr) Procede de lavage de pieces metalliques et non metalliques et machine pour la mise en oeuvre de ce procede
WO2002049920A1 (fr) Procede et installation de vidange de futs
EP0195703A1 (de) Anlage für staubfreies Arbeiten, insbesondere für die Herstellung und Kontrolle elektronischer Bauteile,sowie ihre Handhabung
US20050217705A1 (en) Methods for removing silicon and silicon-nitride contamination layers from deposition tubes
JPH0695509B2 (ja) 洗浄方法およびその装置
JPH02250324A (ja) 半導体装置の製造方法およびそれに使用される洗浄装置
JP2002520132A (ja) 基板をクリーニングする方法及び装置
EP0610207B1 (de) Verfahren und vorrichtung zur behandlung und reinigung von platten mit einem zentralen reaktor
CH655271A5 (fr) Procede de traitement par brassage en vrac de pieces brutes moulees ou usinees et machine pour la mise en oeuvre de ce procede.
JPH01111338A (ja) 洗浄方法及び洗浄装置
FR2668401A1 (fr) Dispositif de traitement de surfaces et procede de mise en óoeuvre de ce dispositif.
JP3273339B2 (ja) 脱脂洗浄方法および装置
JP3423461B2 (ja) 真空脱脂洗浄方法
EP3939710B1 (de) Vorrichtung zur reinigung von behältern
FR2678848A1 (fr) Installation de nettoyage de pieces industrielles.
JPH01226157A (ja) 半導体基板の乾燥方法
RU2036734C1 (ru) Установка для очистки изделий
FR2600637A1 (fr) Procede et installation de depolissage chimique de verreries notamment de luminaires
JPH06246244A (ja) 多槽式自動洗浄装置
JPH04334579A (ja) 洗浄装置
JPH0727883B2 (ja) ウェーハ等の乾燥装置
JPH06333854A (ja) 成膜装置

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19861015

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): DE GB IT NL

17Q First examination report despatched

Effective date: 19880103

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE GB IT NL

REF Corresponds to:

Ref document number: 3664264

Country of ref document: DE

Date of ref document: 19890817

ITF It: translation for a ep patent filed

Owner name: JACOBACCI & PERANI S.P.A.

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Effective date: 19900304

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19901001

GBPC Gb: european patent ceased through non-payment of renewal fee
NLV4 Nl: lapsed or anulled due to non-payment of the annual fee
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Effective date: 19901201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 20050304