EP0220693B1 - Composés acylaminosilicium, leur utilisation et leur préparation - Google Patents
Composés acylaminosilicium, leur utilisation et leur préparation Download PDFInfo
- Publication number
- EP0220693B1 EP0220693B1 EP19860114783 EP86114783A EP0220693B1 EP 0220693 B1 EP0220693 B1 EP 0220693B1 EP 19860114783 EP19860114783 EP 19860114783 EP 86114783 A EP86114783 A EP 86114783A EP 0220693 B1 EP0220693 B1 EP 0220693B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- denotes
- silicon
- formula
- sio
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- -1 Acylamino silicon compounds Chemical class 0.000 title claims description 163
- 238000002360 preparation method Methods 0.000 title description 21
- 239000000203 mixture Substances 0.000 claims description 70
- 238000000034 method Methods 0.000 claims description 67
- 229930195733 hydrocarbon Natural products 0.000 claims description 58
- 150000003254 radicals Chemical class 0.000 claims description 58
- 239000004215 Carbon black (E152) Substances 0.000 claims description 57
- 238000000576 coating method Methods 0.000 claims description 54
- 239000011248 coating agent Substances 0.000 claims description 53
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 40
- 150000001266 acyl halides Chemical class 0.000 claims description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 19
- 239000008199 coating composition Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims description 12
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 11
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- OBFQBDOLCADBTP-UHFFFAOYSA-N aminosilicon Chemical compound [Si]N OBFQBDOLCADBTP-UHFFFAOYSA-N 0.000 claims description 9
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 8
- 229920002554 vinyl polymer Chemical group 0.000 claims description 8
- 238000010894 electron beam technology Methods 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 5
- 239000003505 polymerization initiator Substances 0.000 claims description 5
- ODIGIKRIUKFKHP-UHFFFAOYSA-N (n-propan-2-yloxycarbonylanilino) acetate Chemical compound CC(C)OC(=O)N(OC(C)=O)C1=CC=CC=C1 ODIGIKRIUKFKHP-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 239000003799 water insoluble solvent Substances 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 2
- CREXVNNSNOKDHW-UHFFFAOYSA-N azaniumylideneazanide Chemical group N[N] CREXVNNSNOKDHW-UHFFFAOYSA-N 0.000 claims description 2
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 claims description 2
- 239000004447 silicone coating Substances 0.000 claims 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 60
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 48
- 239000000853 adhesive Substances 0.000 description 32
- 230000001070 adhesive effect Effects 0.000 description 32
- 239000002904 solvent Substances 0.000 description 27
- 230000009102 absorption Effects 0.000 description 25
- 238000010521 absorption reaction Methods 0.000 description 25
- 239000000047 product Substances 0.000 description 25
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 24
- 229920001296 polysiloxane Polymers 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 18
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 18
- 239000011541 reaction mixture Substances 0.000 description 17
- 150000001412 amines Chemical class 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 14
- 150000001408 amides Chemical class 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- 238000002329 infrared spectrum Methods 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 238000005452 bending Methods 0.000 description 12
- 238000003756 stirring Methods 0.000 description 12
- 239000012530 fluid Substances 0.000 description 11
- 239000002655 kraft paper Substances 0.000 description 11
- 230000007935 neutral effect Effects 0.000 description 11
- 239000007832 Na2SO4 Substances 0.000 description 9
- 239000012044 organic layer Substances 0.000 description 9
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 9
- 229910052938 sodium sulfate Inorganic materials 0.000 description 9
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 230000005012 migration Effects 0.000 description 7
- 238000013508 migration Methods 0.000 description 7
- 239000000123 paper Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000012074 organic phase Substances 0.000 description 6
- 239000003522 acrylic cement Substances 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 5
- 150000003377 silicon compounds Chemical class 0.000 description 5
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- 229910020388 SiO1/2 Inorganic materials 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 4
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 4
- 239000012346 acetyl chloride Substances 0.000 description 4
- 239000012433 hydrogen halide Substances 0.000 description 4
- 229910000039 hydrogen halide Inorganic materials 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229950000688 phenothiazine Drugs 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000012429 release testing Methods 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 229920003048 styrene butadiene rubber Polymers 0.000 description 4
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000002174 Styrene-butadiene Substances 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- AQIHMSVIAGNIDM-UHFFFAOYSA-N benzoyl bromide Chemical compound BrC(=O)C1=CC=CC=C1 AQIHMSVIAGNIDM-UHFFFAOYSA-N 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 229910020447 SiO2/2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 229910052909 inorganic silicate Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- AQIAIZBHFAKICS-UHFFFAOYSA-N methylaminomethyl Chemical compound [CH2]NC AQIAIZBHFAKICS-UHFFFAOYSA-N 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- 239000004753 textile Substances 0.000 description 2
- UROHSXQUJQQUOO-UHFFFAOYSA-M (4-benzoylphenyl)methyl-trimethylazanium;chloride Chemical compound [Cl-].C1=CC(C[N+](C)(C)C)=CC=C1C(=O)C1=CC=CC=C1 UROHSXQUJQQUOO-UHFFFAOYSA-M 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- OAMHTTBNEJBIKA-UHFFFAOYSA-N 2,2,2-trichloro-1-phenylethanone Chemical class ClC(Cl)(Cl)C(=O)C1=CC=CC=C1 OAMHTTBNEJBIKA-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- GAWAYYRQGQZKCR-UHFFFAOYSA-N 2-chloropropionic acid Chemical class CC(Cl)C(O)=O GAWAYYRQGQZKCR-UHFFFAOYSA-N 0.000 description 1
- WVRHNZGZWMKMNE-UHFFFAOYSA-N 2-hydroxy-1-[2-(2-methylpropyl)phenyl]-2-phenylethanone Chemical compound CC(C)CC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 WVRHNZGZWMKMNE-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 238000005917 acylation reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000005840 aryl radicals Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- DVECBJCOGJRVPX-UHFFFAOYSA-N butyryl chloride Chemical compound CCCC(Cl)=O DVECBJCOGJRVPX-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
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- 239000000919 ceramic Substances 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
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- 239000003086 colorant Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 125000004427 diamine group Chemical group 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
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- 238000001227 electron beam curing Methods 0.000 description 1
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- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- ORTFAQDWJHRMNX-UHFFFAOYSA-M oxidooxomethyl Chemical compound [O-][C]=O ORTFAQDWJHRMNX-UHFFFAOYSA-M 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000011120 smear test Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- ORGHESHFQPYLAO-UHFFFAOYSA-N vinyl radical Chemical compound C=[CH] ORGHESHFQPYLAO-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
- C07F7/0872—Preparation and treatment thereof
- C07F7/0889—Reactions not involving the Si atom of the Si-O-Si sequence
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- This invention relates generally to a method for preparing organosilicon compounds which contain silicon-bonded acylamino-substituted hydrocarbon radicals, to organosilicon compounds obtained therefrom, to curable coating compositions comprising the organosilicon compounds and to a process for providing a substrate with a coating of a cured organosilicon compound.
- this invention relates to organosilicon compounds bearing silicon-bonded acrylylamino-substituted hydrocarbon radicals.
- Organosilicon compounds which contain silicon-bonded acylamino-substituted hydrocarbon radicals, are well known.
- organosilicon compounds containing an acylamino group which is attached to a silicon atom through a polymethylene linkage that contains at least three carbon atoms can be prepared by the reaction of an organosilicon compound bearing an aminoalkyl group with a monocarboxylic acid or an ester, halide or anhydride thereof.
- a monocarboxylic acid halides the reaction is typically conducted in the presence of a hydrogen halide scavenger such as triethylamine. It is well known that the byproduced amine hydrohalide salt is frequently difficult to handle and remove completely from the desired product.
- organosilicon compounds that contain acylated N-(aminohydrocarbyl)-aminohydrocarbyl radicals can be prepared by a process which comprise mixing a monocarboxylic acid anhydride with an organosilicon compound which contains N-(aminohydrocarbyl)-aminohydrocarbyl radicals.
- the desired product is usually isolated by a vacuum distillation step which cannot be used on temperature sensitive compounds such as those containing acrylylated amino-substituted hydrocarbon radicals.
- JP-A- 74113/81 to Takamizawa et al. discloses photosetting organopolysiloxane compositions which comprise an organopolysiloxane bearing acylamino-substituted hydrocarbon radicals which contain unsaturation and are photopolymerizable.
- the photopolymerizable organopolysiloxane is produced by the method of Morehouse and has the shortcomings noted above.
- U.S. Patent No. 4,075,167 to Takamizawa et al. discloses maleimido group-containing organosilicon compounds which are photocurable. While this method provides fully acylated products from organosilicon compounds which contain monoaminohydrocarbyl radicals, such is not the case with organosilicon compounds which contain N-(aminohydrocarbyl)-aminohydrocarbyl radicals. In the latter case, either the secondary amine hydrogen is not acylated or, if it is, an unreacted carboxyl radical from the maleimide reaction remains in the product.
- organosilicon compounds which contain one or more fully acrylylated silicon-bonded N-(aminohydrocarbyl)aminohydrocarbyl radicals, herein also designated acrylylated diamine radicals. It is a particular object of this invention to provide organopolysiloxane compounds which contain at least one fully acrylylated silicon-bonded diamine radical. It is also an object of this invention to provide a method for preparing organosilicon compounds which contain at least one silicon-bonded acylamino-substituted hydrocarbon radical. It is a further object of this invention to provide curable organosilicon compositions and a process for providing a cured silicon-containing coating on a substrate.
- this invention comprises reacting an organosilicon compound containing at least one acylatable silicon-bonded amine-substituted hydrocarbon radical with an acyl halide in an aqueous alkaline system.
- the acyl halide is an acrylyl halide
- the present invention readily provides organosilicon compounds containing acrylylamine-substituted hydrocarbon radicals without many of the problems associated with the methods of the art, noted above.
- the amine-containing organosilicon compound is one which comprises one or more diamine radicals the method of this invention provides novel organosilicon compounds containing fully acrylylated diamine radicals.
- the acrylylated organosilicon compounds of this invention find particular utility as reactive components in curable compositions.
- the organosilicon compounds of this invention can have any structure provided that they contain at least one silicon atom having bonded thereto a hydrocarbon radical that bears a fully acrylylated diamine group, hereinafter delineated, and any other silicon bonds are satisfied by organic radicals, other than the acrylylamino-substituted hydrocarbon radicals noted above, and divalent oxygen atoms linking silicon atoms.
- the compounds of this invention include silanes, siloxanes, silcarbanes and silcarbane- siloxanes.
- Q radicals and Q' radicals include, but are not limited to, alkylene radicals such as -CH 2 CH 2 -, -CH 2 CHCH 3 , -CH 2 CH 2 CH 2 -, -CH 2 CH(CH 3 )CH 2 -, and -(CH 2 ) 6 -; and arylene radicals such as -C 6 H 4 -, -CH 2 C 6 H 4 - and CH 2 C 6 H 4 CH 2 -.
- hydrocarbon Z radicals examples include, but are not limited to, alkyl radicals such as methyl, ethyl, propyl, butyl, hexyl and octyl; cycloaliphatic radicals such as cyclohexyl; aryl radicals such as phenyl, benzyl, styryl, tolyl and xenyl; and alkenyl radicals such as vinyl and allyl.
- the compounds of this invention are prepared from silicon-containing precursors that have been prepared from ethylene diamine and a suitable silicon compound and thus contain silicon-bonded diamine radicals of the formula -QNHCH 2 CH 2 NH 2 . Therefore, in the compounds of this invention, Z preferably denotes H and Q' preferably denotes -CH 2 CH 2 -.
- Q can be the same as, or different from, Q' in the compounds of this invention.
- Q is an alkylene radical having from 3 to 10 carbon atoms and there are at least 3 carbon atoms between the silicon atom and the nitrogen bonded to the Q radical.
- An example of a preferred Q radical is -CH 2 CH(CH 3 )-CH 2 -.
- acrylylamino-substituted hydrocarbon radicals include, but are not limited to,
- Silicon-bonded radicals other than the above-noted acrylylamino-substituted hydrocarbon radicals, include organic radicals and divalent oxygen atoms linking silicon atoms.
- organic radicals include, but are not limited to, divalent hydrocarbon radicals linking silicon atoms such as Q and Q' radicals noted above, and halogenated derivatives thereof; monovalent hydrocarbon radicals such as R radicals noted above, and halogen derivatives thereof; hydrogen atoms, hydroxy radicals, -OA radicals and alkoxy radicals such as methoxy radicals.
- said organic radicals contain no more than 6 carbon atoms, such as methyl, 3,3,3-trifluoropropyl, phenyl and vinyl radicals.
- the organic radicals are methyl radicals.
- the compounds of this invention are preferably silanes or sitoxanes having the average unit formula wherein c denotes a number having a value of from 0 to 3, such as 0, 0.5, 1.01, 2, 2.1 and 3, d denotes a number having a value of from >0 to 4, such as 0.01, 0.5, 1, 2 and 3, and c + has a value of from 1 to 4 such as 1.5, 1.99, 2.01, 3 and 4.
- the silane or siloxane compounds of this invention must contain an average of at least one fully acrylylated silicon-bonded diamine radical per molecule.
- the siloxanes can contain siloxane units which are free of acrylylamino-substituted hydrocarbon radicals such as R c SiO (4-c) /2 such as MeSiO 3/2 , Me 2 SiO 2/2 , MeViSi0 2/2 , MePhSi0 2/2 , Me 3 SIO 1/2 , Me 2 (OA)-SiO 1/2 , ViMe 2 SiO l/2 and Si0 4/2 units, in addition to siloxane unit which contain the required acylamino-substituted hydrocarbon radicals.
- the siloxane of this invention can also contain partially acrylylated diamine radicals such as NAHCH 2 CH 2 NHCH 2 CH(CH 3 )CH 2 Si(CH 3 )0 2/2 .
- Preferred silanes of this invention have the formula (R) e Si(QNACH 2 CH 2 NAH) 4-e wherein e denotes a number having a value of 0, 1, 2 or 3, such as
- Preferred siloxanes of this invention have the formula YR 2S iO(R 2S iO) x (YRSiO)ySiR 2Y wherein each Y denotes, independently, an R radical or a -QNACH 2 CH 2 NAH radical and x and y denote numbers having average values of from 0 to 5000 and 0 to 500, respectively.
- Examples of preferred siloxanes of this invention include, but are not limited to,
- Siloxanes of this invention can also have a cyclic or branched structure such as (YMe 2 SiO) 4 Si and (YMeSiO) 4 , in addition to the linear structure noted above.
- Me methyl, phenyl and vinyl, respectively.
- organosilicon compounds of this invention can be prepared by the method of this invention. While the method of this invention was developed specifically for the preparation of the compounds of this invention, it has been found to have general utility for the preparation of organosilicon compounds containing any silicon-bonded acylamine-substituted hydrocarbon radical.
- this invention relates to a method for preparing an organosilicon compound containing at least one silicon-bonded acylamino-substituted hydrocarbon radical, said method comprising (I) admixing (i) a composition comprising an acyl halide to (ii) a composition comprising an aminosilicon compound having at least one silicon-bonded amino-substituted hydrocarbon radical containing at least one nitrogen-bonded hydrogen, all other silicon valences therein being satisfied by radicals selected from the group consisting of organic radicals and divalent oxygen atoms linking silicon atoms, said admixing being done in the presence of (iii) an aqueous solution of a water-soluble alkaline material and (iv) a water-insoluble solvent for (ii), the amounts of components (i), (ii) and (iii) being sufficient to acylate at least one amino nitrogen atom containing at least one nitrogen-bonded hydrogen atom per molecule of aminosilicon compound and to provide at
- the acyl halide that is used can have any structure such as a linear, branched or cyclic structure having aromatic, heterocyclic, olefinic or paraffinic bonding and containing one or more carbon-bonded -COX radicals, wherein X denotes a halogen atom.
- the acyl halide has the structure R"COX wherein X denotes a halogen atom, preferably chlorine, and R" denotes a substituted or unsubstituted monovalent hydrocarbon radical.
- R" radicals examples include, but are not limited to, those delineated above for hydrocarbon radicals (R radicals).
- R radicals hydrocarbon radicals
- corresponding acyl halides thus include acetyl chloride, benzoyl chloride and, most preferably, acrylyl chloride and methacrylyl chloride.
- the aminosilicon compound that is to be acylated can have any structure as long as it contains at least one silicon atom having bonded thereto an amino-substituted hydrocarbon radical that bears one or more amino radicals, at least one of which bears a nitrogen-bonded hydrogen atom, and any other silicon bonds are satisfied by organic radicals, other than the amine radicals noted above, and divalent oxygen atoms linking silicon atoms.
- the aminosilicon compound can be a silane, a siloxane, a silcarbane or a silcarbanesiloxane.
- the silicon-bonded amino-substituted hydrocarbon radical has the formula -Q(NHQ') a NHZ wherein Q, Q' and Z have the general and preferred meanings denoted above for the compounds of this invention and a has a value of 0 or 1.
- amino-substituted hydrocarbon radicals include, but are not limited to, NH 2 CH 2 CH 2 CH 2 -, CH 3 NHCH 2 CH 2 CH 2 -, NH 2 CH 2 CH(CH 3 )CH 2 -, NH 2 CH 2 CH 2 NHCH 2 CH 2 CH 2 -, NH 2 CH 2 CH 2 NHCH 2 CH(CH 3 )-CH 2 -, NH 2 (CH 2 ) 6 NH(CH 2 ) 3 - and NH 2 (CH 2 ) 6 NHCH 2 CH(CH 3 )CH 2 -.
- Silicon-bonded radicals other than the above-noted amino-substituted hydrocarbon radicals, include organic radicals and divalent oxygen atoms linking silicon atoms.
- organic radicals include, but are not limited to, divalent hydrocarbon radicals linking silicon atoms such as Q and Q' radicals noted above, and halogenated derivatives thereof, monovalent hydrocarbon radicals such as R radicals noted above, and halogenated derivatives thereof, alkoxy radicals such as methoxy radicals, hydroxy radicals, -OA radicals and hydrogen atoms.
- said organic radicals contain no more than 6 carbon atoms, such as methyl, 3,3,3-trifluoropropyl, phenyl and vinyl radicals, and most preferably are methyl radicals.
- the aminosilicon compounds to be acylated by the process of this invention are preferably silanes or siloxanes having the average formula R c (NH 2 (Q'NH) a Q) d SiO (4-c-d)/2 wherein c denotes a number having a value of from 0 to 3, such as 0, 0.5, 1.01, 2, 2.1 and 3, d denotes a number having a value of from >0 to 4, such as 0.01, 0.5, 1, 2 and 3, and c + has a value of from 1 to 4 such as 1.5, 1.99, 2.01, 3 and 4.
- the aminosilane or siloxane must contain an average of at least one silicon-bonded, amine-substituted hydrocarbon radical per molecule.
- the siloxanes can contain siloxane unit which are free of amino-substituted hydrocarbon radicals such as R c SiO( 4 . c ) /2 such as MeSiO 3/2 , Me 2 SiO 2/2 ,Me 3 SiO 1/2 , MeViSi0 2/2 , MePhSi0 2/2 , Me 2 (OA)SiO 1/2 , ViMe 2 SiO 1/2 and Si0 4/2 units, in addition to siloxane unit which contain the required amino-substituted hydrocarbon radicals.
- R c SiO( 4 . c ) /2 such as MeSiO 3/2 , Me 2 SiO 2/2 ,Me 3 SiO 1/2 , MeViSi0 2/2 , MePhSi0 2/2 , Me 2 (OA)SiO 1/2 , ViMe 2 SiO 1/2 and Si0 4/2 units, in addition to siloxane unit which contain the required amino-substituted hydrocarbon radicals.
- Preferred aminosilanes to be acylated have the formula (R) e Si(QNHCH 2 CH 2 NH 2 ) 4 . e wherein e denotes a number having a value of 0, 1, 2 or 3, such as Me 3 SiCH 2 CH(CH 3 )CH 2 NHCH 2 CH 2 NH 2 .
- Preferred aminosiloxanes to be acylated have the formula Y'R 2 SiO(R 2 SiO) x (Y'RSiO)ySiR 2 Y' wherein each Y' denotes, independently, an R radical or a -QNHCH 2 CH 2 NH 2 radical and x and y denote numbers having average values of from 0 to 5000 and 0 to 500, respectively.
- Examples of preferred aminosiloxanes to be acylated include, but are not limited to,
- Aminosilicon compounds are well known in the organosilicon art and need no detailed description herein as to their preparation. Some are commercially available.
- the disclosures of U.S. Patent Nos. 2,557,803; 2,738,357; 2,754,312; 2,762,823; 2,998,406; 3,045,036; 3,087,909; 3,355,424; 3,560,543; 3,890,269; 4,036,868; 4,152,346 and 4,507,455 further teach how to prepare aminosilicon compounds that can be used in the method of this invention.
- the acyl halide is admixed to the aminosilicon compound in the presence of an aqueous solution of an alkaline material.
- the alkaline material can be any water-soluble material having a pKb value greater than the pKb of the amine radicals in the amino-substituted hydrocarbon radicals to be acylated.
- the alkaline material is preferably an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide.
- a water-insoluble solvent for the aminosilicon when the acyl halide is admixed to the aminosilicon compound.
- Said solvent can be any suitable liquid that will not react with the components of the reaction.
- the solvent is also a solvent for the organosilicon product of the reaction as well.
- solvents include, but are not limited to, hydrocarbons such as toluene, xylene, hexane, cyclohexane and heptane; halogenated hydrocarbons such as methylene chloride, chloroform, trichloroethylene and trichloroethane; and oxygenated compounds such as ethyl ether and ethyl acetate.
- hydrocarbons such as toluene, xylene, hexane, cyclohexane and heptane
- halogenated hydrocarbons such as methylene chloride, chloroform, trichloroethylene and trichloroethane
- oxygenated compounds such as ethyl ether and ethyl acetate.
- Mixtures of two or more solvents can also be used, it only being required in this instance that the mixture, and not necessarily all the components in the mixture, be a solvent for the aminosilicon compound.
- the necessary components of the reaction mixture i.e. the acyl halide, the aminosilicon compound, the aqueous solution of alkaline material and solvent
- the necessary components of the reaction mixture i.e. the acyl halide, the aminosilicon compound, the aqueous solution of alkaline material and solvent
- the acyl halide, or a solution thereof is added to a well agitated mixture of aqueous alkaline material and solvent solution of aminosilicon material.
- the method of this invention can be practiced at any reasonable temperature.
- this method proceeds readily at room temperature.
- this method should be practiced at as low a temperature as possible to minimize the formation of byproducts.
- the reaction should be conducted at a temperature of from 0 to 10°C. Lower reaction temperatures are suitable provided the water does not freeze, but higher reaction temperatures will substantially reduce the yield of desired product.
- the amounts of the necessary components to be used in this method are not narrowly critical, it only being necessary to have present a sufficient amount of alkaline material to neutralize all hydrogen halide as it is produced when the acyl halide reacts with the nitrogen-bonded hydrogen atoms and a sufficient amount of acyl halide to acylate every molecule of aminosilicon compound at least once.
- the alkaline material and the acyl halide are preferably used in equivalent amounts; e.g. one molecule of sodium hydroxide for every molecule of acrylyl chloride, although an excess of the alkaline material relative to the amount of hydrogen halide produced has not been found to be detrimental to the desired result of the reaction. A deficiency of alkaline material relative to the amount of hydrogen halide produced is to be avoided.
- the acyl halide and the aminosilicon compound should be used in equivalent amounts; e.g. one acrylyl chloride molecule for every molecule of aminosilicon compound which bears an acylatable amino group, although an excess of the acyl halide relative to acylatable amino groups has not been found to be detrimental to the desired result of the reaction.
- the amount of water that is used in the method of this invention should be sufficient to dissolve the alkaline material and, preferably, provide a less-than-saturated solution thereof.
- a 2% solution of sodium hydroxide has been found to be desirable.
- the amount of solvent that is used in the method of this invention should be sufficient to dissolve the aminosilicon compound and, preferably, the organosilicon product as well.
- the reaction mixture should be thoroughly agitated to maintain an intimate contact between the aqueous and nonaqueous phases.
- the usual low shear means such as stirrers, paddles and impellers are sufficient to maintain sufficient agitation. Agitation is maintained until the acylation reaction is finished, typically within an hour.
- the product of the reaction can be separated from the solvent or allowed to remain in the solvent as desired.
- a polymerization inhibitor it is desirable to add a polymerization inhibitor to the solution prior to any separating action such as distilling or fractionating.
- the products of the method of this invention are useful as polar silicon-containing additives for cosmetic compositions, coating compositions, textile treating compositions and paints.
- the compositions of this invention are useful as comonomers with polymerizable vinyl monomers such as styrene, butadiene, methyl methacrylate, ethyl acrylate, vinyl acetate, vinyl chloride, vinylidene chloride and acrylonitrile.
- the compounds of this invention bearing acrylylamine-substituted hydrocarbon radicals are useful as a reactive component in free radical curable compositions such as radiation curable compositions.
- this invention relates to a curable coating composition
- compositions of this invention comprise a fully acrylylated diamine-substituted silicon compound which can be any of the compounds of this invention, including preferred embodiments thereof, delineated above.
- curable compositions of this invention which are useful for coating a flexible substrate such as paper, polymer films and metal foils should comprise, as the acrylylated silicon compound, a fully acrylylated siloxane having the formula YR 2 SiO(R 2 SiO) z (YRSiO)gSiR 2 Y wherein Y and R have the meanings noted above, z has a value of from 10 to 2000 and g has a value of from 0 to 0.1 z.
- the siloxane having the above formula has a viscosity of from one hundred to ten thousand centistokes when the curable composition is to be used as a solventless coating composition.
- siloxanes having the above formula include YMe 2 SiO(Me 2 SiO),SiMe 2 y , Me 3 SiO(Me 2 SiO) z (YMeSiO) h SiMe 3 and YMe 2 SiO(Me 2 SiO) z (YMeSiO) h SiMe 2 Y, wherein h has a value of from greater than 0 to 0.1z and z has the meaning noted above.
- h has a value such that the siloxane contains at least one, and preferably at least two, acrylylamine-substituted hydrocarbon radicals.
- the curable compositions of this invention consist of said fully acrylylated silicon compound, with or without the addition of curing agents.
- a polymerization initiator such as a free radical generator or a photoinitiator to facilitate the curing thereof when the composition is to be cured by thermal and/or ultraviolet radiation.
- the particular initiator to be included depends upon the method to be used for curing the composition.
- a free radical initiator be added to the curable composition.
- suitable free radical initiators include, but are not limited to, redox pairs, perborates, percarbonates, photochemical systems, azo compounds such as azo-bis-(isobutyronitrile), acyl peroxides such as benzoyl peroxide, alkyl peroxides such as di-t-butyl peroxide and hydroperoxides such as cumene hydroperoxide.
- a photoinitiator be added to the composition.
- suitable photoinitiators include, but are not limited to, benzoin, benzoin alkyl ethers such as methyl, ethyl, isopropyl or isobutyl benzoin ether, acetophenone derivatives such as dialkoxyacetophenone such as diethoxyacetophenone, di- and trichloroacetophenones, ⁇ , ⁇ -dimethoxy-a-phenylacetophenone, 1-hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, methylphenyl glyoxylate, 4-benzoylbenzyl-trimethylammonium chloride, a-acyloxime esters such as 1-phenyi-1,2-propanedione-2-(0-ethoxycarbonyioxime), thioxanthane and its derivatives, benzo
- the curable compositions of this invention can further comprise optional components which are commonly used in curable silicon-containing compositions.
- optional components include, but are not limited to, solvents such as those used to prepare the acrylylated silicon compound used therein, polymerizable vinyl monomers such as those delineated above, emulsion-forming components such as water and surfactants, colorants, stabilizers, fillers such as silica and carbon, adhesion promoters and surface modifiers such as lubricants and release agents.
- the curable coating compositions of this invention thus have many of the utilities of curable compositions such as molding, encapsulating, sealing and coating.
- they find utility for coating flexible substrates such as paper, metal foil, polymer films, optical fibers and textiles and relatively non-flexible substrates such as polymer laminates, such as circuit boards, siliceous substrates such as ceramic, glass and brick, wood substrates and molded, cast and stamped metal articles.
- the curable coatings of this invention are useful in the adhesive release art, the electronic art such as encapsulating and photoresist, the graphic art etc.
- the present invention relates to a process for providing a cured silicon-containing coating on a substrate, said process comprising (A) applying the curable coating composition of this invention to the substrate and thereafter (B) curing the applied coating.
- the curable coating composition of this invention is applied to a substrate as a thin layer by any suitable manner such as brushing, spraying, rolling, dipping or spreading.
- a thin layer it is meant from a monomolecular layer to a hundred mils.
- Curable coating compositions of this invention comprising siloxane compounds of this invention are typically applied in a layer having a thickness of from 0.01 to 100 mils.
- the applied coating can be cured by any suitable means such as chemical, radiant or thermal means. As noted above, when the applied coating is to be cured by thermal or ultraviolet radiation, the applied composition should contain a polymerization initiator. In a preferred embodiment of this invention, the applied composition is cured with electron beam radiation and the composition needs no added initiator.
- the coating composition of this invention can be applied to substrates of various compositions, shapes, sizes and uses.
- a flexible substrate is coated for the purpose of providing for the substrate an adhesive-releasing surface.
- a flexible substrate such as paper, polymer film, polymer-coated paper or metal foil is rendered adhesive-releasing by the application of a curable fluid composition to the flexible substrate at a coating weight of from 0.5 to 2 pounds per ream of substrate.
- the thus-treated surface is brought into adhesive contact with an adhesive, either free or disposed on a surface of an article.
- the adhesive-releasing surface thereby serves as a protective layer for one surface of the adhesive until the adhesive is to be used, whereupon it can be readily removed from the adhesive.
- the state of cure of an adhesive-release coating was determined by the ruboff, migration and smear tests.
- Smear of a coating was measured by lightly rubbing the coating with a finger and looking for hazing of the coating.
- the degree of haze (none, very slight, slight, moderate, gross) that was observed indicated the degree of smear of the coating.
- a fully cured coating shows no haze and therefore has no smear.
- Ruboff of a coating was measured by vigorously rubbing the coating with the index finger tip, trying to remove the coating from the paper. The extent of ruboff was described as none, very slight, slight, moderate or gross. A fully cured coating demonstrates no ruboff.
- Migration of a coating was measured by placing a test strip of No. 5910 3M@ (St. Paul, Minnesota) brand transparent tape on the coating, adhesive-bearing surface in contact with the coating, and rubbing the strip 5 to 20 times with a finger to adhere it to the coating. The strip of transparent tape was then removed from the coating and its adhesive-bearing surface was doubled, end to end, onto itself and pressed firmly together. For a coating having no migration, the force needed to separate the doubled test strip was approximately the same as the force needed to separate a doubled strip of unexposed tape. Other ratings include very slight, slight, moderate and gross migration. A fully cured coating demonstrates no migration.
- Adhesive release for a coating was measured on a fully cured coating.
- Each cured coating was prepared for release testing according to the following procedure.
- the cured coating was coated with adhesive using either a solution of Monsantoe (St. Louis, Missouri) GMS-263 acrylic adhesive (hereinafter acrylic adhesive) or National Starcho (New York, New York) 36-6045 styrenebutadiene rubber adhesive (hereinafter SBR adhesive).
- the adhesive solution was applied to the cured coating at a wet thickness of 76.2 ⁇ m (3 mils) using a draw down bar.
- the applied adhesive was air-dried at room temperature for one minute, heated at 70 C. for one minute and then cooled to room temperature again for 1 minute.
- a sheet of 60 pound matte litho was applied to the dried adhesive and the resulting laminate was pressed with a 4.5 pound rubber coated roller.
- Release testing of the laminates was accomplished by cutting the laminates into 25.4 mm (1 inch) strips and pulling the matte/adhesive laminate from the kraft paper/coating laminate at an angle of 180° at 0.17 m/s. (400 inches/minute)
- the force, in grams per inch, that was required to separate the laminae was noted as adhesive release. This value was converted to newtons per meter (N/m) for this disclosure by multiplying by 0.3860885 in•N/g•m and rounding off to three significant figures.
- An infrared spectrum showed absorptions at 3300 cm- 1 for amide NH stretching vibration, amide carbonyl stretching absorption at 1680-1620 cm- 1 , and amide NH bending vibration at 1550 cm -1 .
- Example 3 was repeated except 1.52 g (14.4 mmols) of butyryl chloride was used in place of the benzoyl bromide.
- An infrared spectrum showed absorptions at 3300 cm -1 due to amide NH stretching vibration, at 1670 to 1630 cm- 1 due to amide carbonyl stretching and at 1540 cm- 1 due to amide NH bending vibrations.
- the infrared spectrum showed -NH stretching vibration at 3300 cm -1 ; -NH bending vibration at 1550 cm -1 ; carbonyl stretching at 1680-1630 cm -1 ; and bending vibration for conjugated carbon-carbon double bond at 1610 cm -1 . All the above infrared absorptions were absent in the original aminoalkyl-substituted organopolysiloxane. Starting and final organopolysiloxanes also showed absorption bands at 1120-1010 cm- 1 for siloxane linkages.
- the product had the nominal structure shown in Table I.
- Example 7 Paper Coating, Electron Beam Curing and Adhesive Release Testing.
- Example 8 Paper Coating, UV Curing and Adhesive Release Testing
- le was mixed with 5 wt % of a 50/50 mixture of benzophenone and 1-hydroxycyclohexylphenyl ketone as a photoinitiator.
- the mixture was coated onto kraft paper at a coating weight of 226.8 - 453.6 g (0.5 to 1 pound) per ream and the coating was irradiated for about 3 seconds at a distance of 50.8 - 76.2 mm (2 to 3 inches) with the ultraviolet light from 2 medium pressure mercury vapor lamps having output of 200 watts/25.4 mm (watts/inch).
- the thus-cured coating was immediately laminated with SBR adhesive.
- the release force of the laminate as measured by the release test noted above, was 42.5 N/m.
- the lamination was also done with acrylic adhesive and a release force of 67.6 N/m was observed.
- the above fluid was mixed with 5 wt % of the photoinitiator used in Example 8, coated on supercalendered kraft sheet and on polyethylene-coated kraft sheet and cured under two 200w/inch medium pressure mercury lamp at 30-40 ft/min. They were laminated with adhesive and release force was determined.
- the coated supercalendered kraft substrate released acrylic adhesive with a force of 48.3 N/m and SBR adhesive with a force of 27 N/m.
- the reaction mixture was agitated, maintaining the temperature at 0 C, and 4.32 g (48.0 mmols) of acrylyl chloride was added gradually. After the addition, the mixture was stirred for five minutes, the organic layer was separated, dried over anhydrous Na 2 SO 4 and solvent was removed. The product had an amine neutral equivalent of 128535 indicating that the 99.2% of the amine was acylated.
- This organopolysiloxane was coated on polyethylene coated kraft paper using a lab blade coater, and cured under 5 Mrad of electron-beam radiation to a smear, migration and ruboff-free coating.
- this organopolysiloxane was coated onto polyethylene coated kraft paper and was found to cure to give a migration-, smear- and ruboff-free coating at 2 Mrad dosage.
- the above fluid was mixed with 5 wt % of the photoinitiator used in Example 8, coated on supercalendered kraft paper and cured under two 200 watts/25.4 mm w/inch medium pressure mercury lamps at a speed of 0.1/sec (20 ft/min) to obtain a smear-free coating.
- the reaction mixture was cooled to 0° C and acrylyl chloride 6.13 g (68 mmols) was slowly added maintaining the temperature between 0 and 5° C. After addition was over, the stirring continued for a few minutes.
- the organic layer was separated. To the organic layer, 2 ml of tetrahydrofuran and 100 ppm hydroquinone were added. Solvent was removed and the fluid filtered to remove any residual sodium chloride.
- the product had a viscosity of 48 mm 2 /sec (cs) at 25 °C.
- An infrared spectrum showed carbonyl stretching vibration at 1655 cm -1 and carbon-carbon double bond stretch at 1620 cm- 1 .
- the starting and final fluid also showed absorptions at 1110 to 1020 cm- 1 for SiOSi linkage.
- a one liter three-necked flask equipped with a thermometer, stirring paddle and a dropping funnel was charged with 100 g of the above organopolysiloxane (93.4 mmols of NH) and 350 ml of chloroform and 4.93 g (123.25 mmols) of sodium hydroxide in 80 ml of water.
- the above reaction mixture was cooled to 0°C.
- Acrylyl chloride 10.1 g (112 mmols) was added to the above mixture, while maintaining the temperature between 0-5° C. After the addition, the mixture was stirred for five minutes.
- the organic layer was separated and 4 ml of ethanol and 100 ppm hydroquinone were added to it. Solvent was removed under reduced pressure.
- the product had a viscosity of 1096 mm 2 /sec (cs) at 25 C.
- the infrared spectrum showed absorptions for -NH stretching at 3300 cm -1 ; -NH bending vibration at 1550 cm- 1 ; carbonyl stretching at 1650 cm- 1 ; and bending vibration for conjugated carbon-carbon double bond at 1610 cm- 1 . All the above absorptions were absent on the original alkylaminofunctional organopolysiloxane. Starting and final organopolysiloxanes also showed absorption bands at 1120 to 1020 cm- 1 for siloxane linkages.
- This aminoalkylor- ganopolysiloxane had a viscosity of 86 mm2/sec (cs) at 25° C and an amine neutral equivalent of 709.
- a 1 liter three-necked flask, fitted with a thermometer stirring paddle and a dropping funnel was charged with 100 g (0.141 mol of amine) of the above organopolysiloxane, 350 ml of chloroform and 8.16 g (0.204 mol) of sodium hydroxide in 75 ml of water.
- the above mixture was cooled to 0° C and 15.3 g (0.17 mol) of acrylyl chloride was added to it, maintaining the temperature between 0°C and 5°C. After the addition of acrylyl chloride, the reaction mixture was stirred for another five minutes.
- the organic layer was separated, 3 ml of ethanol and 100 ppm hydroquinone were added to it, solvent was removed under reduced pressure to obtain the product having a viscosity of 1558 mm 2 /sec (cs) at 25 C.
- the infrared spectrum showed absorptions at 3300 cm- 1 due to amide - N -H stretching vibration; amide - N -H bending vibration at 1550 cm-', carbonyl stretching vibration at 1680-1630 cm -1 .
- a small portion of the above fluid was mixed with 5% by weight of benzoyl peroxide and this was coated on aluminum and glass sheets and was cured by heating to 150° C for 2 minutes.
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Claims (35)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/791,484 US4608270A (en) | 1985-10-25 | 1985-10-25 | Acylamino silicon compounds, their use and preparation |
US791484 | 1985-10-25 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0220693A2 EP0220693A2 (fr) | 1987-05-06 |
EP0220693A3 EP0220693A3 (en) | 1990-02-07 |
EP0220693B1 true EP0220693B1 (fr) | 1991-11-27 |
Family
ID=25153884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19860114783 Expired - Lifetime EP0220693B1 (fr) | 1985-10-25 | 1986-10-24 | Composés acylaminosilicium, leur utilisation et leur préparation |
Country Status (5)
Country | Link |
---|---|
US (1) | US4608270A (fr) |
EP (1) | EP0220693B1 (fr) |
JP (1) | JPS62187475A (fr) |
CA (1) | CA1314555C (fr) |
DE (1) | DE3682654D1 (fr) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4822890A (en) * | 1983-05-20 | 1989-04-18 | Hoffmann-La Roche Inc. | Method for the production of amino terminus protected naturally occurring amino acids |
US4698406A (en) * | 1986-11-04 | 1987-10-06 | Dow Corning Corporation | Curable organopolysiloxane composition |
JP2657249B2 (ja) * | 1986-11-25 | 1997-09-24 | 東レ・ダウコーニング・シリコーン株式会社 | 密着性向上剤 |
CA1292831C (fr) * | 1986-12-22 | 1991-12-03 | Dow Corning Corporation | Compositions d'organopolysiloxane durcissables aux ultraviolets |
US4831064A (en) * | 1986-12-22 | 1989-05-16 | Dow Corning Corporation | Organopolysiloxane compositions curable by ultraviolet radiation |
US4911986A (en) * | 1987-02-09 | 1990-03-27 | Dow Corning Corporation | Curable silicone compositions comprising vinyl monomer |
US4788310A (en) * | 1987-07-13 | 1988-11-29 | General Electric Company | N-Silylalkylamides and their use as adhesion promoters in room temperature vulcanizable polydiorganosiloxane compositions |
US4956221A (en) * | 1987-11-06 | 1990-09-11 | Dow Corning Corporation | UV curable conformal coating with moisture shadow cure |
CA1337224C (fr) * | 1987-11-06 | 1995-10-03 | Beth I. Gutek | Substances durcissables a l'ultraviolet et a l'humidite |
US4824875A (en) * | 1987-11-06 | 1989-04-25 | Dow Corning Corporation | UV curable conformal coating with moisture shadow cure |
US5070118A (en) * | 1988-03-21 | 1991-12-03 | General Electric Company | Radiation-self-sensitized silicone polymers |
US4988743A (en) * | 1988-03-21 | 1991-01-29 | General Electric Company | Radiation self-sensitized silicone polymers |
US4921880A (en) * | 1988-08-15 | 1990-05-01 | Dow Corning Corporation | Adhesion promoter for UV curable siloxane compositions and compositions containing same |
US5188864A (en) * | 1988-08-15 | 1993-02-23 | Dow Corning Corporation | Adhesion promoter for UV curable siloxane compositions and compositions containing same |
EP0363071A3 (fr) * | 1988-10-03 | 1991-01-30 | Dow Corning Corporation | Gels durcissables par irradiation UV |
JPH02107650A (ja) * | 1988-10-17 | 1990-04-19 | Toshiba Silicone Co Ltd | 無機ケイ素質充填剤用処理剤 |
US5008301A (en) * | 1989-02-21 | 1991-04-16 | Dow Corning Corporation | Ultraviolet curing conformal coating with dual shadow cure |
US5036114A (en) * | 1989-04-10 | 1991-07-30 | Dow Corning Corporation | Acrylamide polysiloxane composition with improved heat stability |
US4861906A (en) * | 1989-04-10 | 1989-08-29 | Dow Corning Corporation | Process for the synthesis of acylamino organosilicon compounds |
US4933413A (en) * | 1989-04-10 | 1990-06-12 | Dow Corning Corporation | Process for synthesis of acylamino organosilicon compounds |
US4861907A (en) * | 1989-04-10 | 1989-08-29 | Dow Corning Corporation | Process for synthesis of acylamino silicon compounds |
US4889942A (en) * | 1989-04-12 | 1989-12-26 | Dow Corning Corporation | Process for synthesis of acylamino organosilicon compounds |
EP0404324B1 (fr) * | 1989-06-19 | 1994-10-26 | Dow Corning Corporation | Composés de cilicium à fonction acrylamidoaryloxy |
AU630732B2 (en) * | 1989-09-22 | 1992-11-05 | Minnesota Mining And Manufacturing Company | Radiation-curable silicone elastomers and pressure sensitive adhesives |
US5237082A (en) * | 1989-09-22 | 1993-08-17 | Minnesota Mining And Manufacturing Company | Radiation-curable silicone elastomers and pressure sensitive adhesives |
DE69005283D1 (de) * | 1990-01-09 | 1994-01-27 | Dow Corning | Siloxanzusammensetzung für die Haarpflege. |
US5087716A (en) * | 1990-01-22 | 1992-02-11 | Dow Corning Corporation | Novel synthesis of difunctional halo organo noncarbon group IV main group element amides |
US5013577A (en) * | 1990-08-22 | 1991-05-07 | Dow Corning Corporation | Siloxane soluble (CH3)3 SIO1/2 /SIO2 (M/Q) resins with amine and amide organofunctionality |
US5101056A (en) * | 1990-12-26 | 1992-03-31 | Dow Corning Corporation | Process for converting amino organosilicon compounds to acrylamide organosilicon compounds |
EP0583259B1 (fr) * | 1991-03-20 | 1996-01-31 | Minnesota Mining And Manufacturing Company | Revetements a liberation vinyle/silicone polymerisable aux radiations |
JPH06508862A (ja) * | 1991-03-20 | 1994-10-06 | ミネソタ マイニング アンド マニュファクチャリング カンパニー | 放射線硬化性アクリレート/シリコーン感圧接着剤配合物 |
US5308887A (en) * | 1991-05-23 | 1994-05-03 | Minnesota Mining & Manufacturing Company | Pressure-sensitive adhesives |
US5464659A (en) * | 1991-05-23 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Silicone/acrylate vibration dampers |
US5246979A (en) * | 1991-05-31 | 1993-09-21 | Dow Corning Corporation | Heat stable acrylamide polysiloxane composition |
US5300613A (en) * | 1992-06-02 | 1994-04-05 | Shin-Etsu Chemical Co., Ltd. | Fluorine-containing organosilicon compounds |
EP0678542B1 (fr) * | 1994-04-20 | 1999-07-07 | Three Bond Co., Ltd. | Composition de polysiloxane photodurcissable |
US5625023A (en) * | 1994-12-09 | 1997-04-29 | Dow Corning Corporation | Aerosol suppressant compositions for silicone coatings |
JP3177410B2 (ja) * | 1995-07-17 | 2001-06-18 | 信越化学工業株式会社 | 放射線硬化性オルガノポリシロキサン組成物 |
US5994454A (en) * | 1996-10-25 | 1999-11-30 | Dow Corning Corporation | Aerosol suppressant compositions for silicone coatings |
FR2908993A1 (fr) * | 2006-11-27 | 2008-05-30 | Oreal | Compositions cosmetiques contenant un derive ester ou amide d'arylalkyl benzoate siloxanique ; utilisation dudit derive comme solvant dans les huiles ; nouveaux derives esters ou amides d'arylalkyl benzoate siloxaniques. |
FR2908992A1 (fr) * | 2006-11-27 | 2008-05-30 | Oreal | Composition cosmetique contenant un derive de dibenzoylmethane et un derive ester ou amide d'arylalkyl benzoate siloxanique ; procede de photostabilisation du derive de dibenzoylmethane. |
WO2008064979A2 (fr) * | 2006-11-27 | 2008-06-05 | L'oreal | Compositions cosmétiques contenant un dérivé d'arylalkyl benzoate amide contenant du siloxane; utilisation dudit dérivé comme solvant dans les huiles; nouveaux dérivés d'arylalkyl benzoate ester ou amide contenant du siloxane |
AT504860B1 (de) | 2007-02-06 | 2012-02-15 | Mondi Release Liner Austria Gmbh | (meth)acrylamid-derivate von polysiloxanen |
DE102010041503A1 (de) * | 2010-09-28 | 2012-03-29 | Wacker Chemie Ag | Vollständig acylierte aminofunktionelle Organopolysiloxane |
EP2780395B1 (fr) * | 2011-11-14 | 2015-01-07 | BYK-Chemie GmbH | Utilisation de polysiloxanes modifiés dans des compositions de produits de revêtement et masses de formage |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2929829A (en) * | 1956-10-12 | 1960-03-22 | Union Carbide Corp | Organosilicon acylamino compounds and process for producing the same |
US3249461A (en) * | 1962-01-24 | 1966-05-03 | Grotenhuis Theodore A Te | Article having reinforcing coupled to matrix and reinforcing for same |
JPS51125277A (en) * | 1974-12-28 | 1976-11-01 | Shin Etsu Chem Co Ltd | Aprocess for preparing organosilane compounds |
JPS55112262A (en) * | 1979-02-23 | 1980-08-29 | Shin Etsu Chem Co Ltd | Photosetting organopolysiloxane compostion |
JPS5674113A (en) * | 1979-11-22 | 1981-06-19 | Shin Etsu Chem Co Ltd | Photosetting organopolysiloxane composition |
US4543398A (en) * | 1983-04-28 | 1985-09-24 | Minnesota Mining And Manufacturing Company | Ophthalmic devices fabricated from urethane acrylates of polysiloxane alcohols |
US4507455A (en) * | 1984-05-11 | 1985-03-26 | Dow Corning Corporation | Silicones bearing acylated diaminohydrocarbyl radicals and method therefor |
-
1985
- 1985-10-25 US US06/791,484 patent/US4608270A/en not_active Expired - Lifetime
-
1986
- 1986-08-19 CA CA 516258 patent/CA1314555C/fr not_active Expired - Fee Related
- 1986-10-24 DE DE8686114783T patent/DE3682654D1/de not_active Expired - Fee Related
- 1986-10-24 JP JP61252089A patent/JPS62187475A/ja active Granted
- 1986-10-24 EP EP19860114783 patent/EP0220693B1/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62187475A (ja) | 1987-08-15 |
JPH0547550B2 (fr) | 1993-07-19 |
US4608270A (en) | 1986-08-26 |
EP0220693A2 (fr) | 1987-05-06 |
DE3682654D1 (de) | 1992-01-09 |
CA1314555C (fr) | 1993-03-16 |
EP0220693A3 (en) | 1990-02-07 |
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