EP0209651B1 - Verfahren zum Herstellen von Spinndüsenplatten - Google Patents

Verfahren zum Herstellen von Spinndüsenplatten Download PDF

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Publication number
EP0209651B1
EP0209651B1 EP86105992A EP86105992A EP0209651B1 EP 0209651 B1 EP0209651 B1 EP 0209651B1 EP 86105992 A EP86105992 A EP 86105992A EP 86105992 A EP86105992 A EP 86105992A EP 0209651 B1 EP0209651 B1 EP 0209651B1
Authority
EP
European Patent Office
Prior art keywords
layer
resist material
nozzle
case
funnel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP86105992A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0209651A2 (de
EP0209651A3 (en
Inventor
Wolfgang Dr. Ehrfeld
Peter Dr. Hagmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Karlsruhe GmbH
Original Assignee
Kernforschungszentrum Karlsruhe GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungszentrum Karlsruhe GmbH filed Critical Kernforschungszentrum Karlsruhe GmbH
Priority to AT86105992T priority Critical patent/ATE66254T1/de
Publication of EP0209651A2 publication Critical patent/EP0209651A2/de
Publication of EP0209651A3 publication Critical patent/EP0209651A3/de
Application granted granted Critical
Publication of EP0209651B1 publication Critical patent/EP0209651B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49428—Gas and water specific plumbing component making
    • Y10T29/49432—Nozzle making

Definitions

  • the invention relates to a method for producing spinneret plates with funnel-shaped pre-channels and to the nozzle capillaries connected thereafter using deep lithographic and galvanic methods according to the preamble of claim 1.
  • spinneret plates are required for the production of fibers, the raw material of organic or inorganic material in a flowable state being pressed through a large number of spinneret channels in the plates.
  • the spinneret channels consist of nozzle capillaries through which the material emerges as a fiber, and much more pre-channels to which the material to be spun is fed.
  • the pre-channels are often in the form of funnels which taper towards the nozzle capillaries in order to finally merge into the latter.
  • a generic method for producing an ink jet nozzle arrangement is known from US-A-4246076.
  • a layer of a photopolimerizable material is applied to a substrate with an electrically conductive, passivated surface and is irradiated with a perforated pattern via a mask.
  • a further layer of the same material is then applied to this layer and irradiated through a second mask with a smaller hole pattern, so that after removal of the non-irradiated areas on the substrate, a columnar, step-shaped negative form of the ink jet nozzle remains.
  • An electroplating layer enclosing the negative mold is then produced on the substrate, whereupon the substrate is separated from the electroplating layer and the negative mold is removed by a solvent.
  • the object of the invention is to provide a method of the generic type by which a continuous transition from the pre-channels to the nozzle capillaries is ensured.
  • nozzle capillaries can also be produced in the form of tubular approaches using the same solution principle.
  • Spinneret plates with tubular nozzle capillaries are particularly advantageously used as components for the production of spinneret devices for the production of hollow or multicomponent fibers.
  • Such spinneret devices generally consist of a plurality of spinneret plates arranged one above the other.
  • the nozzle capillaries can be manufactured with extreme precision and uniformity both in their individual cross-section and in their mutual position according to the method according to the invention and the mutual adjustment of several relatively large spinneret plates for assembling the spinneret devices is not a major problem, the production of hollow or Multi-component fibers with any cross-section and structure possible. This makes it possible to produce fibers with new and unusual uses.
  • the continuous transition from the pre-channels to the nozzle capillaries that can be achieved with the invention is not only with circular cross sections, but also with profiled, e.g. Star-shaped cross sections of the nozzle capillaries possible.
  • FIG. 1 shows a metallic plate with funnel-shaped pre-channels 144.
  • the side of the plate 141 at which the tapered ends of the pre-channels 144 open is connected to a layer 142 made of a radiation-sensitive negative resist material.
  • This layer 142 is partially irradiated through the pre-channels 144 with X-rays 143 of an electron synchrotron, so that regions 145 which are difficult to dissolve are formed, the shape of which corresponds to that of the nozzle capillaries.
  • the pre-channels 144 are then filled with a removable filling material 152 which connects to the regions 145 (FIG. 2).
  • columnar negative shapes 151 of the nozzle capillaries are formed on the plate 141.
  • an electroplating layer 162 including the negative molds 151 is produced on the metallic plate 141 serving as the electroplating electrode (FIG. 3).
  • the filling material 152 and the negative molds 151 of the nozzle capillaries are removed after the electroplating layer 162 has been leveled, so that a spinneret plate 163 consisting of the parts 141 and 162 is formed, in which the nozzle capillaries 161 connect seamlessly to the funnel-shaped pre-channels 144 (FIG. 4).
  • the irradiated areas 142b are first coated with a liquid developer removed ( Figure 2a) and then the removed areas and the pre-channels 144 filled with a removable filler 152a, which is less soluble than the positive resist material of the layer 142a ( Figure 2b). Then the non-irradiated areas of the layer 142a are removed, so that columnar negative shapes 151a of the nozzle capillaries are also formed in this case on the metallic plate 141 according to FIG. 2c.
  • the further steps incrementating and leveling the electroplating layer 162, FIG. 3a, removing the filling material 152a) correspond to those described above, so that in this case too a spinneret plate 163 is produced, as is shown schematically in FIG.
  • the method according to the invention can also be used for the production of spinneret plates with tubular nozzle capillaries.
  • the metallic plate 141 with the pre-channels 144 is used as an irradiation mask (FIG. 5), whereupon the layer 142 is again partially irradiated from the opposite side.
  • a mask is used for the irradiation with the high-energy radiation 181 (FIG. 6), the absorber structures 182 of which correspond to the outer diameters of the tubular attachments of the nozzle capillaries, so that the irradiated areas 174 and 175 are non-irradiated tubular areas 183 Wrap layer 142.
  • the non-irradiated tubular areas 183 are removed with a liquid developer, so that tubular cavities 192 are formed (FIG. 7). In these cavities 192 is under Using the plate 141 as an electrode produces an electroplating structure in the form of tubular, metallic lugs 202 (FIG. 8). Then, after leveling the electroplating structure, the remaining resist material of layer 142 and filler 191 are removed, so that a spinneret plate 211 consisting of plate 141 with funnel-shaped pre-channels 144 and tubular nozzle capillaries 202 is formed (FIG. 9).
  • the irradiated areas corresponding to the interior of the nozzle capillaries are first removed with a liquid developer and replaced by a radiation-insensitive filling material 191a, which also fills the pre-channels 144 (FIG. 6a). Then there is repeated partial irradiation of the layer 142a with high-energy radiation 181 via a mask, the absorber structures 182a of which have openings 182b which correspond to the outer diameters of the tubular attachments for the nozzle capillaries.
  • tubular, irradiated areas 183a are formed between the filling material 191a and the non-irradiated resist material of the layer 142a, which are removed with a liquid developer, so that tubular cavities 192a are formed (FIG. 7a).
  • the further treatment is carried out analogously to the description of FIGS. 8 and 9.
  • the metallic plate with the funnel-shaped pre-channels is also produced by deep lithographic-galvanic means can be.
  • a layer 121 made of a negative resist material is applied to a plate 12 serving as a galvanic electrode.
  • This layer 121 is partially irradiated with parallel X-ray radiation 123 from an electron synchrotron via a mask 122 arranged at a short distance.
  • the unit consisting of mask 122, resist layer 121 and plate 12 executes a wobble movement (arrows) relative to the beam direction.
  • the openings 125 in the absorber structure of the mask 122 have a cross section that corresponds to that of the nozzle capillaries.
  • the radiation 123 creates areas 124 in the resist layer 121 with a funnel-shaped cross section which widens to form the plate 12 and, owing to the radiation, are less soluble than the non-irradiated areas of the layer 121.
  • negative forms 131 of the funnel-shaped pre-channels are formed on the plate 12.
  • the plate 12 and the negative molds 131 are removed, so that a metallic plate 141 provided with funnel-shaped pre-channels 144 according to FIG. 12 is produced.
  • the metallic plate with funnel-shaped pre-channels can also be produced by deep lithographic-galvanic means when using a positive resist material.
  • the areas which have been created during the irradiation with a wobble movement according to FIG. 10 are removed and replaced by a filler material. After removing the remaining resist material with a This gives developers negative forms of the funnel-shaped pre-channels from the filling material, which are processed further in accordance with FIGS. 11 and 12.
  • a wobble movement can take the place of a wobble movement.
  • PMMA is used as the positive resist material, which after the irradiation is dissolved in a liquid developer of butyl diglycol, morpholine, ethanolamine and water.
  • the negative resist material is based on polystyrene, the developer required for this consists of a mixture of ketones and higher alcohols.
  • the galvanic deposition of metal takes place in a chloride-free nickel sulfamate bath at a temperature of 52 ° C.
  • the removable radiation-insensitive filling material consists of a mixture of an epoxy resin and an internal release agent.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Spinning Methods And Devices For Manufacturing Artificial Fibers (AREA)
  • Micromachines (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Building Environments (AREA)
  • Seasonings (AREA)
EP86105992A 1985-07-09 1986-04-30 Verfahren zum Herstellen von Spinndüsenplatten Expired - Lifetime EP0209651B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT86105992T ATE66254T1 (de) 1985-07-09 1986-04-30 Verfahren zum herstellen von spinnduesenplatten.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3524411 1985-07-09
DE19853524411 DE3524411A1 (de) 1985-07-09 1985-07-09 Verfahren zum herstellen von spinnduesenplatten

Publications (3)

Publication Number Publication Date
EP0209651A2 EP0209651A2 (de) 1987-01-28
EP0209651A3 EP0209651A3 (en) 1988-09-14
EP0209651B1 true EP0209651B1 (de) 1991-08-14

Family

ID=6275266

Family Applications (1)

Application Number Title Priority Date Filing Date
EP86105992A Expired - Lifetime EP0209651B1 (de) 1985-07-09 1986-04-30 Verfahren zum Herstellen von Spinndüsenplatten

Country Status (8)

Country Link
US (1) US4694548A (enrdf_load_stackoverflow)
EP (1) EP0209651B1 (enrdf_load_stackoverflow)
JP (1) JPH0747249B2 (enrdf_load_stackoverflow)
AT (1) ATE66254T1 (enrdf_load_stackoverflow)
AU (1) AU585624B2 (enrdf_load_stackoverflow)
BR (1) BR8603196A (enrdf_load_stackoverflow)
CA (1) CA1258572A (enrdf_load_stackoverflow)
DE (2) DE3524411A1 (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5189437A (en) * 1987-09-19 1993-02-23 Xaar Limited Manufacture of nozzles for ink jet printers
DE3841621A1 (de) * 1988-12-10 1990-07-12 Draegerwerk Ag Elektrochemische messzelle mit mikrostrukturierten kapillaroeffnungen in der messelektrode
US5119550A (en) * 1989-07-03 1992-06-09 Eastman Kodak Company Method of making transfer apparatus having vacuum holes
US5189777A (en) * 1990-12-07 1993-03-02 Wisconsin Alumni Research Foundation Method of producing micromachined differential pressure transducers
DE4042125A1 (de) * 1990-12-28 1992-07-02 Maxs Ag Verfahren zum herstellen eines mikrooeffnungen aufweisenden, verstaerkten flachen gegenstandes
US5206983A (en) * 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
US5190637A (en) * 1992-04-24 1993-03-02 Wisconsin Alumni Research Foundation Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers
US5378583A (en) * 1992-12-22 1995-01-03 Wisconsin Alumni Research Foundation Formation of microstructures using a preformed photoresist sheet
US5412265A (en) * 1993-04-05 1995-05-02 Ford Motor Company Planar micro-motor and method of fabrication
US5413668A (en) * 1993-10-25 1995-05-09 Ford Motor Company Method for making mechanical and micro-electromechanical devices
DE19530193A1 (de) * 1995-08-17 1997-02-20 Bosch Gmbh Robert Düsenplatte, insbesondere für Kraftstoffeinspritzventile, und Verfahren zur Herstellung einer Düsenplatte
CA2233163A1 (en) * 1995-10-30 1997-05-09 Kimberly-Clark Corporation Fiber spin pack
GB9623185D0 (en) * 1996-11-09 1997-01-08 Epigem Limited Improved micro relief element and preparation thereof
WO1999014214A1 (en) * 1997-09-15 1999-03-25 The Procter & Gamble Company Antimicrobial quinolones, their compositions and uses
US6272275B1 (en) 1999-06-25 2001-08-07 Corning Incorporated Print-molding for process for planar waveguides
DE10305427B4 (de) * 2003-02-03 2006-05-24 Siemens Ag Herstellungsverfahren für eine Lochscheibe zum Ausstoßen eines Fluids
DE10305425B4 (de) * 2003-02-03 2006-04-27 Siemens Ag Herstellungsverfahren für eine Lochscheibe zum Ausstoßen eines Fluids
CN111702323B (zh) * 2020-06-30 2022-05-10 苏州锐涛光电科技有限公司 熔喷板模头喷丝孔的加工方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3192136A (en) * 1962-09-14 1965-06-29 Sperry Rand Corp Method of preparing precision screens
US3512247A (en) * 1966-11-16 1970-05-19 Celanese Corp Process for producing spinnerettes
US3449221A (en) * 1966-12-08 1969-06-10 Dynamics Res Corp Method of making a monometallic mask
US4246076A (en) * 1979-12-06 1981-01-20 Xerox Corporation Method for producing nozzles for ink jet printers
US4430784A (en) * 1980-02-22 1984-02-14 Celanese Corporation Manufacturing process for orifice nozzle devices for ink jet printing apparati
DE3042483A1 (de) * 1980-11-11 1982-06-16 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren und anordnung zur herstellung einer duesenplatte fuer tintenstrahlschreibwerke
DE3206820C2 (de) * 1982-02-26 1984-02-09 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Verfahren zum Herstellen von Trenndüsenelementen
NL8203521A (nl) * 1982-09-10 1984-04-02 Philips Nv Werkwijze voor het vervaardigen van een inrichting.
US4552831A (en) * 1984-02-06 1985-11-12 International Business Machines Corporation Fabrication method for controlled via hole process

Also Published As

Publication number Publication date
EP0209651A2 (de) 1987-01-28
EP0209651A3 (en) 1988-09-14
US4694548A (en) 1987-09-22
DE3680837D1 (de) 1991-09-19
DE3524411C2 (enrdf_load_stackoverflow) 1989-05-03
DE3524411A1 (de) 1987-01-15
AU5988886A (en) 1987-01-15
BR8603196A (pt) 1987-02-24
ATE66254T1 (de) 1991-08-15
AU585624B2 (en) 1989-06-22
CA1258572A (en) 1989-08-22
JPS6244322A (ja) 1987-02-26
JPH0747249B2 (ja) 1995-05-24

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