EP0196251B1 - Vorrichtung zur Erzeugung einer elektrolytischen Metallschicht konstanter Dicke - Google Patents

Vorrichtung zur Erzeugung einer elektrolytischen Metallschicht konstanter Dicke Download PDF

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Publication number
EP0196251B1
EP0196251B1 EP86400498A EP86400498A EP0196251B1 EP 0196251 B1 EP0196251 B1 EP 0196251B1 EP 86400498 A EP86400498 A EP 86400498A EP 86400498 A EP86400498 A EP 86400498A EP 0196251 B1 EP0196251 B1 EP 0196251B1
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EP
European Patent Office
Prior art keywords
bath
rod
anode
plate
covers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP86400498A
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English (en)
French (fr)
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EP0196251A1 (de
Inventor
Michel Anzola
Daniel Lefevre
Patrick Massicot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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Publication date
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Publication of EP0196251A1 publication Critical patent/EP0196251A1/de
Application granted granted Critical
Publication of EP0196251B1 publication Critical patent/EP0196251B1/de
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/04—Tubes; Rings; Hollow bodies

Definitions

  • the electrolytic coatings are carried out on conductive parts at least on the surface, placed in baths of precise composition and connected to the negative pole of a direct current source.
  • the positive pole of the source is itself connected to conductive parts called anodes, immersed in the bath.
  • the orientation of the parts with respect to the current lines in the electrolytic bath does not lead to the deposition of an additional thickness in certain places of the part.
  • the orientation of the part does not favor any part of its periphery. This could be achieved by rotating the part on itself, but it would require complex installation.
  • the apparatus comprises means for simultaneously controlling the movement of each of the covers, these means being constituted by a plate which engages said covers and by a control rod fixed to said plate.
  • the anode is constituted by a crown and by a flat plate located in the center of the crown and electrically connected to the latter, the height of said crown being proportional to the length of the part to be treated.
  • the installation shown in FIG. 1 comprises a column 2 which supports an arm 4 cantilevered at the end of the column 2.
  • the column 2 is movable in rotation around its vertical axis. It is controlled in rotation by a device 6 shown diagrammatically, for example a motor driving a toothed wheel which drives a crown secured to the column 2.
  • the arm 4 can be raised and lowered by means of a raising and lowering device such as a jack 8.
  • a raising and lowering device such as a jack 8.
  • FIG. 1 the arm has been shown in the high position.
  • the arm 4 supports an apparatus, represented schematically and designated by the general reference 10, which will be described in more detail later.
  • This apparatus is mounted to rotate relative to the arm 4. It is rotated by a motor 12 connected to the apparatus 10 by a transmission device such as a chain or a belt 14.
  • the apparatus 10 supports a plurality of parts 16 which must be coated with an electrolytic metallic deposit. These pieces are elongated and have a shape of revolution.
  • the parts 16 can be immersed in successive baths 18, 20, 22, 24 and 26.
  • a rotation of the arm 4 makes it possible to pass from one bath to the other when this arm is raised.
  • Bath 18 is an anode pickling bath with a pad. It is constituted by sulfuric acid H2SO4 of concentration 2N.
  • the anode voltage when empty, that is to say when the parts 16 are not immersed, is 4 volts.
  • the bath 18 is followed by a rinsing bath 20 and then by an anodic electrochemical attack bath 22 with metal salts.
  • This last bath consists, in a known manner, for example of FR-A-1 564 575, of Li2 SO4 H2 O at a concentration of 255 g per liter and of H2SO4 at a concentration of 65 ml per liter.
  • the pH is between 0.5 and 1.
  • the temperature of the bath is equal to room temperature.
  • the anode current density J is equal to 4 amperes per square decimeter.
  • This electrochemical etching bath is followed by a rinsing bath 22, then a nickel-plating bath 24.
  • This bath contains 140 g per liter of nickel sulfate 7H2O and 160 g per liter of sodium sulfate 10H2O, 19 g / l of KCl, 37 g / l of H3BO4, 0.5 g / l of Duponol.
  • the pH is adjusted to 4.25 by H2SO4.
  • the temperature is 45 ° C and the current density J is 3 A / dm2.
  • FIG. 2 a detail view which shows in section the tank 27 containing the nickel plating bath 26 whose composition was given above.
  • An anode composed of two parts 28 and 30 is immersed in the bath.
  • the first part of anode 28 has the shape of a crown of rectangular section while the second part of anode 30 is a vertical plate placed in the center of the crown 28.
  • the anodes 28 and 30 are electrically connected to each other. the other by feet integral with a cross 32 comprising four horizontal branches located at 90 ° from one another.
  • the four feet of the anode 28 are connected to the tops of the branches of the cross 32 while the foot 31 of the anode 30 is fixed to the center of this cross.
  • the feet 31 are electrically isolated from the bath 26.
  • the anodes 28 and 30 are electrically connected to the positive terminal 59 of a direct current source by the wire 34.
  • the height of the anodes 28 and 30 is a function of the length of the parts to be treated. This is why only parts of equal length can be treated in the same operation.
  • the anodes 28 and 30 have a height which is slightly less than the length of the part to be treated.
  • Two superimposed crowns 28 fulfill the same function as an anode having a height equal to the sum of the heights of each of these anodes.
  • the apparatus designated by the reference 10 which makes it possible to immerse and remove the pieces 16 from the different baths (a single piece has been shown in FIG. 2), comprises a plate 36.
  • This plate is mounted to rotate about an axis A. It has eight holes 35 of square section distributed at 45 ° on a circle concentric with the axis A.
  • Support rods 38 having an upper end of square section, are engaged in the holes 35. This arrangement makes it possible to immobilize them in rotation (secondary).
  • the rods 38 are internally threaded at their two ends. These threads can be of the same diameter or of different diameters.
  • a screw 39 is engaged in the upper end of the thread of the rod 38.
  • This screw passes through a nut 40 fixed to the upper face of the plate 36, concentrically to the holes 35.
  • a lock nut 42 makes it possible to immobilize the screw 39 in rotation.
  • a thread provided at the lower part of the rod 38 is intended to receive a threaded end piece 44 formed on the part 16.
  • the part 16 is a sealing plug intended for an irradiation device. This shutter plug is also called a "thermowell".
  • the plate 36 being in the low position, the height of the rod 38 can be adjusted so that the shoulder 46 of the part is flush with the surface 48 of the bath.
  • the lock nut 42 is then blocked to immobilize the screw 39 in this position.
  • the nut 40 is electrically connected by means of a wire 50 to the negative terminal 53 of the DC source mentioned above. These wires 50 are covered with an insulating layer 52.
  • a clearance 52 is provided around each rod 38 on the underside of the plate 36.
  • a cover 54 comprising vents 55 is slidably mounted around the screw 38. The cover 54 can be moved between a low position, in which it is shown in FIG. 2, and a high position which it occupies when its upper part enters the clearance 52 concentric with the rod 38. In the embodiment described, the cover 54 is mounted with a slightly hard friction on the outside diameter of the rod 38 so that it remains in the position, high or low, in which it is placed, without any other fixing means.
  • FIG. 2 shows the particular means which make it possible to simultaneously raise or lower all of the covers, for example eight, of each of the parts to be coated.
  • Each cover 54 includes a flange 56 projecting externally.
  • Each flange 56 engages a plate for raising and lowering the covers 54.
  • the movement of the plate 58 is controlled by means of a control rod 60 fixed to said plate.
  • Each of the covers 54 has the function of avoiding the formation of an excess thickness of deposit at the level of the shoulder 46 on the part 16.
  • the covers are in the high position during the step corresponding to the surface preparation, it is that is to say when the parts to be treated are immersed in the baths 18, 20, 22, 24.
  • the covers are placed in the low position, as shown in FIG. 2.
  • a nickel deposit is made on a uranium or uranium alloy part.
  • gold, silver or chromium is made on a uranium or uranium alloy part.
  • silver or chromium is made on a uranium or uranium alloy part.
  • the thickness of the deposit will be between 50 and 100 micrometers. In the embodiment shown, a thickness of 60 micrometers is deposited with an accuracy of ⁇ 5 micrometers. It is therefore found that this thickness is perfectly uniform, all the more so since the temperature of the bath is quite low _ of the order of 60 ° C. _ and therefore does not deform the parts to be coated.
  • FIG. 3 shows a schematic perspective view which illustrates the distribution of the current lines between the anodes 28 and 30 immersed in the electrolytic bath 26 and eight pieces 16 distributed at 45 °.
  • the anode 30 has a rectangular section.
  • the short sides 30a of the rectangle have a dimension much smaller than the long sides 30b of the rectangle.
  • the current lines 59 are more spaced opposite the long sides 30b of the rectangle and the parts 16b.
  • the plate 36 is animated with a uniform rotational movement so that each of the pieces 16 is located alternately and for equal spaces of time opposite the short sides 30a and the long sides 30b of the rectangle, so as to obtain a uniform distribution of the deposit along a circumference of these parts.
  • This result is thus obtained in a simple manner without it being necessary to rotate each of the parts around its axis of revolution.
  • An overall rotation of the plate 36 is sufficient to ensure a uniform distribution of the nickel deposit over a set of eight parts.
  • the solution which would consist in rotating each of the parts to be coated by means of a particular motor would pose a problem of supplying the current because a movable contact would be necessary. Thanks to the invention, a single mobile contact is sufficient.
  • FIG. 4 shows a very schematic view of an irradiation device 66 for example by means of a source 72 of X-rays.
  • the source 72 is mounted in a cavity of a rotating barrel 71 which makes it possible to make pass the source from a first position shown in Figure 4 in which the source is in the storage position to a second position 72a from which it can be brought into a working position 72b, for example by means of a cane transfer 74.
  • a plug 16 can be brought by known means 80 into the orifice 76 of the shield 78.
  • the shutter plug 16 is made in depleted uranium because this metal has a very high mass and therefore has a high radiation absorption power.
  • the depleted uranium is fragile, it must be coated externally with a layer of a protective metal resistant to friction, for example nickel.
  • a protective metal resistant to friction for example nickel.
  • FIG. 6 a second application of a part of revolution 90 to be coated with a protective metal.
  • This part 90 is a conical positioner which can be positioned with great precision relative to a frame 92.
  • the positioner 90 supports a mirror 94 inclined at 45 °.
  • a radioactive source 96 is mounted on a support 98 whose position relative to the frame 92 must be adjusted.
  • the assembly also includes a collimator 100 and a target 102 located behind the collimator.
  • the position of the source 96 can be adjusted so that it is located exactly in the axis of the collimator 100.
  • the position adjustment is carried out by using the mirror 94 and observing the position of the source at through a reticle 104.
  • the positioner is sought by means of a fork 106 shown in phantom which allows it to be retracted, so that the source 96 comes into action.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Claims (4)

1. Anlage zur Herstellung einer metallischen Abscheldung einer konstanten Dicke auf länglichen, metallischen Drehstücken, die umfaßt:
- angeordnet in einem Kreis um die Achse einer sich drehenden, vertikalen Säule (2), die mit einem radialen Ast (4) versehen ist, der von der Säule (2) in der Drehbewegung mitgenommen wird:
- ein ätzendes, anodisches Pufferbad (18);
- ein Spülbad (20);
- ein Bad (22) zum anodischen, elektrochemischen Angreifen mit metallischen Salzen;
- ein Spülbad (24);
- einen Behälter (27), der eine Menge eines Elektrolyten und eine Anode (28, 30) in der Form einer Krone (28) mit kreisförmigem Querschnitt umfaßt, die elektrisch mit einer in der Mitte der Krone angeordneten, vertikalen Platte (30) verbunden ist, wobei die Anode in dem Elektrolyten eingetaucht ist und mit dem positiven Anschluß (59) einer Gleichstromquelle verbunden ist;
- Vorrichtung (6), um die Säule in Drehung zu versetzen, um einen Apparat (10) der Reihe nach über jedes Bad (18, 20, 22, 24, 27) zu bringen, der am Ende des radialen Arms (4) aufgehängt ist und drehend um eine in seiner Mitte angeordnete, vertikale Achse (A) montiert ist und vertellt auf einem mit dieser Achse (A) konzentrischen Umfang eine Reihe von peripheren, In der Höhe regelbaren Stäben (38), wobei jeder Stab eine Bohrung aufweist, die geeignet ist, ein Gewindeansatzstück eines zu bearbeitenden Tells (16) aufzunehmen, eine um Jeden Stab (38) montierte Abdeckung (54), die auf dem Stab (38) zwischen eine hohen und einer tiefen Stellung gleitet, und Vorrichtungen (50) zum Verbinden jedes Stabs (38) mit dem negativen Anschluß (53) der Gleichstromquelle umfaßt;
- Vorrichtungen (8) zum Montieren und Absenken des Apparats (10) bezüglich jedes der Bäder (18, 20, 22, 24) und des Elektrolytbehälters (27).
2. Anlage nach Anspruch 1, dadurch gekennzeichnet, daß sie Vorrichtungen zum gleichzeitigen Steuern der Bewegung jeder der Abdeckungen (54) aufweist, wobei die Vorrichtungen aus einer Tragplatte (58), die die Abdeckungen (54) ergreift, und aus einem an der Tragplatte befestigten Steuerstab (60) bestehen.
3. Anlage nach einem der Ansprüche 1 und 2, dadurch gekennzeichnet zeichnet, daß die Abdeckungen und die Tragplatte aus Lucoflex® bestehen.
4. Verwendung der Anlage nach einem der Ansprüche 1 bis 3 für den Fall, wo das zu bearbeitende Werkstück (16) aus eine Uranlegierung oder aus nicht legiertem Uran besteht und das auf dem Werkstück abgeschiedene Metall Nickel ist.
EP86400498A 1985-03-12 1986-03-10 Vorrichtung zur Erzeugung einer elektrolytischen Metallschicht konstanter Dicke Expired - Lifetime EP0196251B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8503590A FR2578859B1 (fr) 1985-03-12 1985-03-12 Appareillage et installation de realisation d'un depot metallique electrolytique d'epaisseur constante.
FR8503590 1985-03-12

Publications (2)

Publication Number Publication Date
EP0196251A1 EP0196251A1 (de) 1986-10-01
EP0196251B1 true EP0196251B1 (de) 1991-06-05

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EP86400498A Expired - Lifetime EP0196251B1 (de) 1985-03-12 1986-03-10 Vorrichtung zur Erzeugung einer elektrolytischen Metallschicht konstanter Dicke

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US (1) US4659447A (de)
EP (1) EP0196251B1 (de)
DE (1) DE3679580D1 (de)
FR (1) FR2578859B1 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4720330A (en) * 1987-07-06 1988-01-19 The Dow Chemical Company Device and method for electroplating a workpiece having axial symmetry
US6168691B1 (en) 1996-08-09 2001-01-02 Atotech Deutschland Gmbh Device for electrochemical treatment of elongate articles
ES2142690T3 (es) * 1996-08-09 2000-04-16 Atotech Deutschland Gmbh Procedimiento y dispositivo para el tratamiento electroquimico de objetos extendidos.
WO1999026664A1 (en) * 1997-11-26 1999-06-03 Iowa State University Research Foundation, Inc. Recombinant mycoplasma hyopneumoniae vaccine
SG145591A1 (en) * 2007-02-27 2008-09-29 Turbine Overhaul Services Pte System and method for electroplating metal components
CN107385496B (zh) * 2017-06-29 2019-05-03 西北核技术研究所 一种水相电沉积装置及其应用在钽片上正反面制备铀靶的方法
FR3082761B1 (fr) * 2018-06-22 2020-05-29 Safran Aircraft Engines Outillage de rincage a chaud

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3941674A (en) * 1974-05-31 1976-03-02 Monroe Belgium N.V. Plating rack
JPS59190383A (ja) * 1983-04-11 1984-10-29 Nippon Denso Co Ltd 高速部分めつき方法およびその装置
FR2563540B1 (fr) * 1984-04-26 1989-05-05 Alsthom Atlantique Dispositif pour effectuer un depot metallique sur les parties frottantes d'un rotor de turbine

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Publication number Publication date
FR2578859A1 (fr) 1986-09-19
FR2578859B1 (fr) 1989-09-08
EP0196251A1 (de) 1986-10-01
US4659447A (en) 1987-04-21
DE3679580D1 (de) 1991-07-11

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