EP0190867B1 - Process for manufacturing a photomask - Google Patents

Process for manufacturing a photomask Download PDF

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Publication number
EP0190867B1
EP0190867B1 EP86300569A EP86300569A EP0190867B1 EP 0190867 B1 EP0190867 B1 EP 0190867B1 EP 86300569 A EP86300569 A EP 86300569A EP 86300569 A EP86300569 A EP 86300569A EP 0190867 B1 EP0190867 B1 EP 0190867B1
Authority
EP
European Patent Office
Prior art keywords
photomask
film
metal silicide
glass substrate
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP86300569A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0190867A3 (en
EP0190867A2 (en
Inventor
Yaichiro Mitsubishi Denki K. K. Lsi Watakabe
Tatsuo Mitsubishi Denki K. K. Lsi Okamoto
Shuichi Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of EP0190867A2 publication Critical patent/EP0190867A2/en
Publication of EP0190867A3 publication Critical patent/EP0190867A3/en
Application granted granted Critical
Publication of EP0190867B1 publication Critical patent/EP0190867B1/en
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Definitions

  • the present invention relates to a photomask and a process for manufacturing a photomask and, more particularly, to a photomask and process for manufacturing thereof for use with the manufacture of a semiconductor device.
  • Figs. 1A to 1D show steps of a conventional photomask manufacturing process.
  • a transparent glass substrate 1 is prepared and then a metal mask material 2 such as chromium is formed on the transparent glass substrate 1 by means of an evaporation process, sputtering process or the like, with a thickness of 800-1000 ⁇ .
  • a resist 3 is applied onto the metal mask material 2, a desired pattern is drawn thereon by light or an electron beam followed by a developing process, so that a resist pattern is thereby formed.
  • Fig. 1C an exposed portion of the metal mask material 2 is etched away by a gas plasma process or the like and then the resist pattern is removed, so that a photomask (a hard mask), is formed as shown in Fig. 1D.
  • a mask used for manufacturing a semiconductor device included a photographic emulsion dry plate using a transparent glass substrate.
  • a hard mask including a transparent glass substrate and a metal film such as chromium formed on the glass substrate has been widely used. More particularly, in case of a hard mask such as chromium, a thinner film of chromium can be used, as compared with a conventional emulsion mask and hence it becomes possible to obtain a finer pattern and the lifetime of the mask becomes greater.
  • an etching technique of a metal mask material 2 of a hard mask such as chromium is important.
  • a wet chemical etching process is generally used, in which a mixture solution of ammonium cerium (IV) nitrate and perchloric acid is employed.
  • a dry etching technique has been developed and utilized, in which a gas plasma or reactive ion etching is employed.
  • the chromium is etched by glow-discharging a mixed gas containing a halogen element such as chlorine and oxygen, the reaction being as follows; Cr + 2O + 2Cl ⁇ CrO2Cl2
  • a hard mask of chromium or the like is advantageous for forming a fine pattern, while there is a disadvantage that the rate of etching, particularly with dry etching using a gas plasma, is low. More particularly, in case of chromium, the etching rate is about 100 ⁇ /min (0.17nm/sec) in conditions of 300W and 0.2torr, and 8-10 minutes (480-600sec) of etching time is required (in the case of a 800-1000 ⁇ thickness). In addition, reduction in the thickness of the resist film due to the longer time required for etching is also a problem.
  • Japanese Patent Application No. 42176/1981, filed March 23, 1981 and laid open for public inspection September 28, 1982 and Japanese Patent Application No. 42183/1981, filed March 23, 1981 and laid open for public inspection September 28, 1982 disclose a system where a silicon layer and a metal layer are deposited on a glass substrate so that a pattern of silicide is formed by an electron beam.
  • the present invention provides a method defined by claim 1 hereinbelow.
  • the etching rate of the mask material is increased and a good adhesion between the mask material and the substrate is obtained, because a metal silicide film is used as a metal mask material for forming a mask pattern.
  • the transparent glass substrate is a silica glass substrate and the metal silicide film is a thin film of about 1000 ⁇ in thickness.
  • Figs. 2A to 2D are cross-sectional views showing a process of manufacturing a photomask of one embodiment of the present invention.
  • a transparent glass substrate 1 such as a silica glass
  • a metal silicide film 4 is formed on the transparent glass substrate 1, with about 1000 ⁇ in thickness, using a sputtering process or electron beam and the like in which metal such as molybdenum (Mo), tungsten (W) and the like are used as a target.
  • Mo molybdenum
  • W tungsten
  • a resist 3 is applied onto the metal silicide film 4.
  • a desired pattern is drawn by light or electron beam so that a resist pattern is formed, as shown in Fig. 2C.
  • metal silicide film 4 is etched away using a dry etching process and then the resist pattern is removed, so that a mask pattern of a metal silicide is formed, completing the formation of a photomask for use in a process of a semiconductor device.
  • metal silicide film 4 as a mask material permits the provision of a photomask with a good quality, since a dry etching process can be easily used and joining ability between a transparent glass substrate 1 and a mask material increases.
  • a value of resistance of the metal silicide film 4 is about 1K ⁇ and hence there is no charge up phenomenon in an electron beam drawing.
  • a dry etching process is applied more easily to the metal silicide film 4, as compared with a chromium film.
  • etching rate of about 500-1000 ⁇ /min is obtained, with a mixed gas of CF4 + O2 (2%), vacuum of 0.2torr and 300W, which rate is about 5 to 10 times the conventional dry etching rate for chromium film.
  • This sufficiently meets requirement of mass production and to that end, size control can be made easier.
  • the metal silicide film 4 contains silicon (Si) as a main constituent element, the film 4 has characteristics in common with a silica substrate including SiO2, Al2O3 or the like and hence there is no problem of the mask pattern being stripped from the substrate, and a photomask with high reliability is therefor produced.
  • a transparent glass substrate such as a silica glass is used and a metal silicide film is formed on the transparent substrate, so that a dry etching process can be used with ease, whereby mass production of photomask with high accuracy and high reliability becomes possible.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
EP86300569A 1985-01-28 1986-01-28 Process for manufacturing a photomask Expired - Lifetime EP0190867B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP16203/85 1985-01-28
JP60016203A JPS61173251A (ja) 1985-01-28 1985-01-28 フオトマスクの製造方法

Publications (3)

Publication Number Publication Date
EP0190867A2 EP0190867A2 (en) 1986-08-13
EP0190867A3 EP0190867A3 (en) 1988-01-07
EP0190867B1 true EP0190867B1 (en) 1991-05-08

Family

ID=11909948

Family Applications (1)

Application Number Title Priority Date Filing Date
EP86300569A Expired - Lifetime EP0190867B1 (en) 1985-01-28 1986-01-28 Process for manufacturing a photomask

Country Status (4)

Country Link
US (2) US4876164A (enrdf_load_stackoverflow)
EP (1) EP0190867B1 (enrdf_load_stackoverflow)
JP (1) JPS61173251A (enrdf_load_stackoverflow)
DE (1) DE3679078D1 (enrdf_load_stackoverflow)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61173251A (ja) * 1985-01-28 1986-08-04 Mitsubishi Electric Corp フオトマスクの製造方法
JPS6385553A (ja) * 1986-09-30 1988-04-16 Toshiba Corp マスク基板およびマスクパタ−ンの形成方法
US5306601A (en) * 1988-06-29 1994-04-26 Matsushita Electric Industrial Co., Ltd. Fine pattern forming material and pattern forming method
JPH0827534B2 (ja) * 1990-09-11 1996-03-21 三菱電機株式会社 フォトマスク
US5153083A (en) * 1990-12-05 1992-10-06 At&T Bell Laboratories Method of making phase-shifting lithographic masks
JPH06504628A (ja) * 1990-12-20 1994-05-26 エクソン・ケミカル・パテンツ・インク リソグラフィー及び腐食防止コーティング用途向けのｕｖ／ｅｂ硬化性ブチルコポリマー
JPH04368947A (ja) * 1991-06-18 1992-12-21 Mitsubishi Electric Corp 位相シフトマスクの作成方法
JPH07159974A (ja) * 1993-12-09 1995-06-23 Ryoden Semiconductor Syst Eng Kk パターン転写マスクおよびその製造方法
JP2878143B2 (ja) * 1994-02-22 1999-04-05 インターナショナル・ビジネス・マシーンズ・コーポレイション 減衰位相シフト・マスク作成用の薄膜材料及びその作成方法
KR0151427B1 (ko) * 1994-03-04 1999-02-18 문정환 위상 반전마스크 및 그의 제조방법
US5786114A (en) * 1997-01-10 1998-07-28 Kabushiki Kaisha Toshiba Attenuated phase shift mask with halftone boundary regions
JP3347670B2 (ja) * 1998-07-06 2002-11-20 キヤノン株式会社 マスク及びそれを用いた露光方法
US6410453B1 (en) * 1999-09-02 2002-06-25 Micron Technology, Inc. Method of processing a substrate
US6811959B2 (en) 2002-03-04 2004-11-02 International Business Machines Corporation Hardmask/barrier layer for dry etching chrome films and improving post develop resist profiles on photomasks
US7575692B2 (en) * 2003-04-11 2009-08-18 Hoya Corporation Method for etching chromium thin film and method for producing photomask
US7588866B2 (en) * 2005-06-01 2009-09-15 Kinoptics Technologies Inc. Filter arrays for liquid crystal displays and methods of making the same
JP2007183048A (ja) * 2006-01-10 2007-07-19 Sansyu Sangyo Co Ltd 燃焼装置および燃焼装置の運転方法
US7754394B2 (en) * 2006-11-14 2010-07-13 International Business Machines Corporation Method to etch chrome for photomask fabrication
JP5709564B2 (ja) * 2011-02-09 2015-04-30 キヤノン株式会社 半導体装置の製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3600243A (en) * 1966-11-09 1971-08-17 Us Army Method of making chromium mask for photoresist application
US3721584A (en) * 1970-04-13 1973-03-20 A Diem Silicon coated substrates and objects fabricated therefrom
US4113486A (en) * 1973-10-22 1978-09-12 Fuji Photo Film Co., Ltd. Method for producing a photomask
JPS51105821A (en) * 1975-03-14 1976-09-20 Fuji Photo Film Co Ltd Masukugazono keiseihoho
JPS5185380A (enrdf_load_stackoverflow) * 1975-05-21 1976-07-26 Dainippon Printing Co Ltd
JPS5269269A (en) * 1975-12-05 1977-06-08 Dainippon Printing Co Ltd Photomask
US4051297A (en) * 1976-08-16 1977-09-27 Shatterproof Glass Corporation Transparent article and method of making the same
JPS5642183A (en) * 1979-09-13 1981-04-20 Tokyo Shibaura Electric Co Shielding plug
JPS5642176A (en) * 1979-09-14 1981-04-20 Rhythm Watch Co Ltd Time correction device of timepiece
WO1982000794A1 (en) * 1980-08-28 1982-03-18 Alumni Res Found Wisconsin Use of metallic glasses for fabrication of structures with submicron dimensions
EP0048291B1 (de) * 1980-09-19 1985-07-03 Ibm Deutschland Gmbh Struktur mit einem eine durchgehende Öffnung aufweisenden Siliciumkörper und Verfahren zu ihrer Herstellung
JPS57157247A (en) * 1981-03-23 1982-09-28 Nec Corp Optical exposure mask
JPS57157249A (en) * 1981-03-23 1982-09-28 Nec Corp Preparation of optical exposure mask
JPS57160127A (en) * 1981-03-27 1982-10-02 Nec Corp Manufacture of transcribe mask for x-ray exposure
JPS59162276A (ja) * 1983-03-07 1984-09-13 Toshiba Corp 反応性イオンエツチング方法
JPS60176235A (ja) * 1984-02-22 1985-09-10 Nippon Kogaku Kk <Nikon> Ｘ線露光用マスク原板
JPS61173251A (ja) * 1985-01-28 1986-08-04 Mitsubishi Electric Corp フオトマスクの製造方法

Also Published As

Publication number Publication date
DE3679078D1 (de) 1991-06-13
JPH0434141B2 (enrdf_load_stackoverflow) 1992-06-05
EP0190867A3 (en) 1988-01-07
US4985319A (en) 1991-01-15
EP0190867A2 (en) 1986-08-13
JPS61173251A (ja) 1986-08-04
US4876164A (en) 1989-10-24

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