EP0154797A3 - Manufacturing process for multichannel plates, and their use - Google Patents
Manufacturing process for multichannel plates, and their use Download PDFInfo
- Publication number
- EP0154797A3 EP0154797A3 EP85101038A EP85101038A EP0154797A3 EP 0154797 A3 EP0154797 A3 EP 0154797A3 EP 85101038 A EP85101038 A EP 85101038A EP 85101038 A EP85101038 A EP 85101038A EP 0154797 A3 EP0154797 A3 EP 0154797A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- plate
- mold
- portions
- metal
- easily removable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
- H01J43/04—Electron multipliers
- H01J43/06—Electrode arrangements
- H01J43/18—Electrode arrangements using essentially more than one dynode
- H01J43/24—Dynodes having potential gradient along their surfaces
- H01J43/246—Microchannel plates [MCP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
- H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/32—Secondary emission electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electron Tubes For Measurement (AREA)
- Blow-Moulding Or Thermoforming Of Plastics Or The Like (AREA)
- Paper (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT85101038T ATE37757T1 (de) | 1984-03-10 | 1985-02-01 | Verfahren zur herstellung von vielkanalplatten und deren verwendung. |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3408848A DE3408848C2 (de) | 1984-03-10 | 1984-03-10 | Verfahren zur Herstellung von Vielkanalplatten |
| DE3408848 | 1984-03-10 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0154797A2 EP0154797A2 (de) | 1985-09-18 |
| EP0154797A3 true EP0154797A3 (en) | 1986-12-30 |
| EP0154797B1 EP0154797B1 (de) | 1988-10-05 |
Family
ID=6230128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP85101038A Expired EP0154797B1 (de) | 1984-03-10 | 1985-02-01 | Verfahren zur Herstellung von Vielkanalplatten und deren Verwendung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4563250A (de) |
| EP (1) | EP0154797B1 (de) |
| JP (1) | JPS60208041A (de) |
| AT (1) | ATE37757T1 (de) |
| BR (1) | BR8501058A (de) |
| DE (1) | DE3408848C2 (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3841621A1 (de) * | 1988-12-10 | 1990-07-12 | Draegerwerk Ag | Elektrochemische messzelle mit mikrostrukturierten kapillaroeffnungen in der messelektrode |
| DE69030145T2 (de) * | 1989-08-18 | 1997-07-10 | Galileo Electro Optics Corp | Kontinuierliche Dünnschicht-Dynoden |
| US5189777A (en) * | 1990-12-07 | 1993-03-02 | Wisconsin Alumni Research Foundation | Method of producing micromachined differential pressure transducers |
| US5206983A (en) * | 1991-06-24 | 1993-05-04 | Wisconsin Alumni Research Foundation | Method of manufacturing micromechanical devices |
| US5190637A (en) * | 1992-04-24 | 1993-03-02 | Wisconsin Alumni Research Foundation | Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers |
| US5378583A (en) * | 1992-12-22 | 1995-01-03 | Wisconsin Alumni Research Foundation | Formation of microstructures using a preformed photoresist sheet |
| EP0872331A1 (de) | 1997-04-16 | 1998-10-21 | Matsushita Electric Industrial Co., Ltd. | Prägeplatten-Schutzschicht für eine Vorrichtung zum Spritzgiessen eines optischen Informationsträgers, Vorrichtung zum Spritzgiessen eines optischen Informationsträgers, Verfahren zum Spritzgiesen eines optischen Informationsträgers mit dem Prägeplatten-Schutzschicht |
| US6521149B1 (en) * | 2000-06-06 | 2003-02-18 | Gerald T. Mearini | Solid chemical vapor deposition diamond microchannel plate |
| DE10305427B4 (de) * | 2003-02-03 | 2006-05-24 | Siemens Ag | Herstellungsverfahren für eine Lochscheibe zum Ausstoßen eines Fluids |
| US7154086B2 (en) * | 2003-03-19 | 2006-12-26 | Burle Technologies, Inc. | Conductive tube for use as a reflectron lens |
| US20080073516A1 (en) * | 2006-03-10 | 2008-03-27 | Laprade Bruce N | Resistive glass structures used to shape electric fields in analytical instruments |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4031423A (en) * | 1969-04-30 | 1977-06-21 | American Optical Corporation | Channel structure for multi-channel electron multipliers and method of making same |
| GB2029088A (en) * | 1978-08-21 | 1980-03-12 | Philips Nv | Microchannel plate multipliers |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1434053A (en) * | 1973-04-06 | 1976-04-28 | Mullard Ltd | Electron multipliers |
| DE2922642C2 (de) * | 1979-06-02 | 1981-10-01 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zum Herstellen von Platten für den Aufbau von Trenndüsenelementen |
| DE3039110A1 (de) * | 1980-10-16 | 1982-05-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren fuer die spannungsfreie entwicklung von bestrahlten polymethylmetacrylatschichten |
| DE3150257A1 (de) * | 1981-12-18 | 1983-06-30 | Siemens AG, 1000 Berlin und 8000 München | Bildverstaerker |
| DE3206820C2 (de) * | 1982-02-26 | 1984-02-09 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zum Herstellen von Trenndüsenelementen |
| DE3221981C2 (de) * | 1982-06-11 | 1985-08-29 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe | Verfahren zum Herstellen von aus Trennkörpern mit Abschlußplatten bestehenden Trenndüsenelementen zur Trennung gas- oder dampfförmiger Gemische |
-
1984
- 1984-03-10 DE DE3408848A patent/DE3408848C2/de not_active Expired
-
1985
- 1985-02-01 AT AT85101038T patent/ATE37757T1/de not_active IP Right Cessation
- 1985-02-01 EP EP85101038A patent/EP0154797B1/de not_active Expired
- 1985-03-06 US US06/708,841 patent/US4563250A/en not_active Expired - Fee Related
- 1985-03-08 BR BR8501058A patent/BR8501058A/pt not_active IP Right Cessation
- 1985-03-11 JP JP60046718A patent/JPS60208041A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4031423A (en) * | 1969-04-30 | 1977-06-21 | American Optical Corporation | Channel structure for multi-channel electron multipliers and method of making same |
| GB2029088A (en) * | 1978-08-21 | 1980-03-12 | Philips Nv | Microchannel plate multipliers |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0154797A2 (de) | 1985-09-18 |
| BR8501058A (pt) | 1985-10-29 |
| ATE37757T1 (de) | 1988-10-15 |
| DE3408848C2 (de) | 1987-04-16 |
| EP0154797B1 (de) | 1988-10-05 |
| DE3408848A1 (de) | 1985-09-19 |
| US4563250A (en) | 1986-01-07 |
| JPS60208041A (ja) | 1985-10-19 |
| JPH0552618B2 (de) | 1993-08-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS52103209A (en) | Method of producing lithographic press plate using laser beam | |
| EP0154797A3 (en) | Manufacturing process for multichannel plates, and their use | |
| MY100637A (en) | Embossing tool and method of producing same. | |
| GB2166888B (en) | Process for producing negative pressure sliders using a photoresist | |
| EP0154796A3 (en) | Manufacturing process for layered metallic multichannel plates for an image intensifier, and use of plates so manufactured | |
| GB2022855B (en) | Method of producing a negative resist pattern | |
| ATE20650T1 (de) | Verfahren zur herstellung lithographischer druckplatten. | |
| GB2046461B (en) | Method for producing photosensitive printing plate precursor | |
| JPS52150103A (en) | Method of producing lithographic printing form and press plate | |
| AU581987B2 (en) | Method for producing a spinning nozzle plate | |
| JPS5314006A (en) | Method and means of producing lithographic press plate | |
| JPS5391803A (en) | Method of producing lithographic printing plate | |
| JPS53120905A (en) | Method of producing lithographic printing plate | |
| JPS5226904A (en) | Method of making lithographic press plate made of aluminium by electrochemically roughening surface | |
| JPS5288402A (en) | Method of making lithographic press plate | |
| JPS52107390A (en) | Method of producing negative plate with deformed pattern | |
| JPS53100006A (en) | Method of producing lithographic printing plate | |
| JPS53143175A (en) | Electron beam drawing apparatus | |
| DE2860625D1 (en) | Process for manufacturing a permeable diaphragm for an electrolytic cell | |
| JPS5315906A (en) | Method of producing photoosensitive lithographic press plate | |
| JPS5515125A (en) | Halftone gravure engraving method | |
| JPS6429827A (en) | Reticle and its manufacture | |
| ES8200677A1 (es) | Proceso para producir derivados de propionamida de dibenzo- tiopina | |
| JPS5413334A (en) | Exposure | |
| JPS54106828A (en) | Method of producing cadmium cathode plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Designated state(s): AT CH FR GB IT LI NL SE |
|
| 17P | Request for examination filed |
Effective date: 19850805 |
|
| PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
| AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT CH FR GB IT LI NL SE |
|
| 17Q | First examination report despatched |
Effective date: 19880311 |
|
| ITF | It: translation for a ep patent filed | ||
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT CH FR GB IT LI NL SE |
|
| REF | Corresponds to: |
Ref document number: 37757 Country of ref document: AT Date of ref document: 19881015 Kind code of ref document: T |
|
| ET | Fr: translation filed | ||
| GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) | ||
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| 26N | No opposition filed | ||
| ITTA | It: last paid annual fee | ||
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 19940224 Year of fee payment: 10 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 19941116 Year of fee payment: 11 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 19941221 Year of fee payment: 11 |
|
| EAL | Se: european patent in force in sweden |
Ref document number: 85101038.9 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Effective date: 19950201 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 19950216 Year of fee payment: 11 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 19950228 Year of fee payment: 11 Ref country code: FR Payment date: 19950228 Year of fee payment: 11 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Effective date: 19960201 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Effective date: 19960202 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19960228 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19960228 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Effective date: 19960901 |
|
| GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 19960201 |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Effective date: 19961031 |
|
| NLV4 | Nl: lapsed or anulled due to non-payment of the annual fee |
Effective date: 19960901 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST |