EP0154796B1 - Verfahren zur Herstellung geschichteter Vielkanalplatten aus Metall für Bilderverstärker und Verwendung der so hergestellten Vielkanalplatten - Google Patents

Verfahren zur Herstellung geschichteter Vielkanalplatten aus Metall für Bilderverstärker und Verwendung der so hergestellten Vielkanalplatten Download PDF

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Publication number
EP0154796B1
EP0154796B1 EP85101037A EP85101037A EP0154796B1 EP 0154796 B1 EP0154796 B1 EP 0154796B1 EP 85101037 A EP85101037 A EP 85101037A EP 85101037 A EP85101037 A EP 85101037A EP 0154796 B1 EP0154796 B1 EP 0154796B1
Authority
EP
European Patent Office
Prior art keywords
layers
produced
plate
channels
intermediate layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP85101037A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0154796A3 (en
EP0154796A2 (de
Inventor
Erwin Prof. Dr. Becker
Wolfgang Dr. Ehrfeld
Frank Dr. Becker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Karlsruhe GmbH
Original Assignee
Kernforschungszentrum Karlsruhe GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungszentrum Karlsruhe GmbH filed Critical Kernforschungszentrum Karlsruhe GmbH
Priority to AT85101037T priority Critical patent/ATE38451T1/de
Publication of EP0154796A2 publication Critical patent/EP0154796A2/de
Publication of EP0154796A3 publication Critical patent/EP0154796A3/de
Application granted granted Critical
Publication of EP0154796B1 publication Critical patent/EP0154796B1/de
Expired legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
    • H01J43/04—Electron multipliers
    • H01J43/06—Electrode arrangements
    • H01J43/18—Electrode arrangements using essentially more than one dynode
    • H01J43/24—Dynodes having potential gradient along their surfaces
    • H01J43/246—Microchannel plates [MCP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
    • H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/32—Secondary emission electrodes

Definitions

  • the invention relates to a method for producing layered multi-channel plates with metal dynodes for amplifying optical images or other areal signal distributions by means of secondary electron multiplication, and to the use of multi-channel plates produced in this way.
  • the invention is based on the object of proposing a method for producing layered multi-channel image intensifier plates of the generic type in which the separate production of the dynodes and their subsequent stacking and mutual alignment are avoided.
  • layered multi-channel plates with metal dynodes can be produced, with which a similarly high spatial resolution and a similarly high transparency can be achieved as with the known image intensifier plates made of glass, without the limitations in amplification factor and in typical for glass image intensifier plates the signal repetition frequency must be accepted.
  • a metallic positive mold is produced with a primary negative mold of the layered multi-channel plate using a metal electrode connected to it by galvanic molding and subsequent removal of the primary negative mold, after which several secondary moldings are made by repeated molding of the metallic positive mold
  • Negative forms of the layered multi-channel plate are produced, which assume the role of the primary negative form in the further implementation of the method.
  • Non-adhesive reactive resins are particularly suitable as impression materials. Further details relating to the impression can be found, for example, in DE-PS-3 206 820.
  • the dynodes are mutually electrically isolated by removing the intermediate layers. If layered multi-channel plates with a larger diameter are to be produced in this way, it can be advantageous to mount electrically insulating supports not only on the channel-free edge, but also within the image field of the multi-channel plate, which is penetrated by channels.
  • the supports in the area of the layered multi-channel plates, which are interspersed with channels cover only about 1 per mille of the image field, they can be perceived as a disadvantage if the transmission quality is particularly high.
  • a modification of the method of the invention according to claim 4 is provided.
  • Aluminum is particularly suitable for the subsequent conversion of the intermediate layer into an electrical insulator described there.
  • the small wall thicknesses typical of multi-channel plates with high transparency it can be converted in a known manner with oxidizing agent working in the liquid and / or gaseous phase into the electrically excellent insulating A1 2 0 3 .
  • the area penetrated by channels is to be surrounded by a channel-free area to facilitate assembly or the electrical connections, this area must consist of numerous thin walls to ensure the conversion of the more easily oxidizable material into an insulator.
  • the limitation to thin walls does not apply if the intermediate layers, according to claim 5, by complete or partial Oxidation of galvanically deposited aluminum layers can be produced.
  • the oxidation of the aluminum layers can be carried out both chemically and electrochemically.
  • an inclination of the channels against the plate surface favors the collision of the primary particles with the channel walls and thus the desired electron release.
  • the inclination of the channels is achieved by mutual displacement of the dynodes during stacking.
  • dislocations occur between the mutually assigned channels of the adjacent dynodes, which lead to a reduction in transparency and / or the spatial resolution.
  • the inclination of the channels can be brought about by appropriate orientation of the plate surface with respect to the direction of propagation of the high-energy radiation without loss of transparency and / or spatial resolution.
  • a channel curvature aimed at suppressing the acceleration of parasitic ions can likewise only be achieved in the previously known methods for producing layered multi-channel plates only by mutually displacing the dynodes with the disadvantages mentioned above.
  • these disadvantages can be avoided in that, according to claim 7, before the formation of the dynodes and intermediate layers, the negative shapes of the channels are bent at a higher temperature by a uniformly acting force, for example a centrifugal force.
  • the layered multi-channel plates can be assembled in such a way that the channel openings of layered multi-channel plates lying one on top of the other are aligned with one another. This avoids losses in transparency and / or spatial resolution.
  • Both corpuscular rays and electromagnetic waves can be considered as high-energy radiation. While the use of electromagnetic waves to produce the desired structures uses masks in a known manner, the structures can also be produced by electromagnetic control when using corpuscular beams.
  • the X-ray radiation (“synchrotron radiation”) generated by the electron synchrotons, which is characterized by high intensity with a small aperture angle, has proven particularly useful.
  • the choice of the material which can be changed by high-energy radiation depends on the type of high-energy radiation, corresponding regulations being found, for example, in DE-PS-2 922 642 and DE-OS-3 221 981.
  • synchrotron radiation polymethyl methacrylate (PMMA) has proven particularly useful, it being possible to use a developer according to DE-OS-3 039 110 to remove the irradiated areas.
  • the secondary electron yield factor of those with channels can be known in a manner known per se provided metal layers may be increased considerably.
  • the inventive method is in
  • the PMMA plate 1 is shown in FIG. 2 via an X-ray mask with synchrotron radiation 3 irradiated, which is directed obliquely to the surfaces of the PMMA plate 1 and the X-ray mask.
  • the X-ray mask consists of a carrier 4, which only weakly absorbs the X-radiation, and an absorber 5, which strongly absorbs the X-radiation, by means of which the cross-sectional shapes and the positions of the negative shapes of the channels are defined.
  • the individual structures of the absorber 5 correspond to the cross-sectional shapes of the negative shapes of the channels. Due to the high-intensity parallel synchrotron radiation, the PMMA in the areas 6 not covered by the absorber will undergo chemical radiation changes. These areas 6 irradiated in this way are removed by introducing the PMMA plate into a developer solution, so that a multichannel negative shape with columnar PMMA structures 7 and lattice-shaped free spaces 8 according to FIG. 3 is produced.
  • the columnar PMMA structures 7 have lm a hexagonal cross-sectional shape having a width of about 30 I, the width of the free spaces 8 between the PMMA structures 7 is approximately 4 to.
  • FIG. 4 When producing a multi-channel plate with individual dynodes, which are firmly connected to electrically insulating supports, the negative form shown in FIG. 4 is assumed, which, in addition to the metal electrode 2a, the columnar PMMA structures 7a with lattice-free spaces 8a, as they are were already shown in Figure 3, additionally contains supports 9 made of electrically insulating material. Layers of nickel 10 and copper 11 are alternately galvanically deposited in the free spaces 8a, so that a structure according to FIG. 5 is produced.
  • the PMMA structures 7a with an organic solvent and the copper layers 11 and the electrode 2a with an etch which does not attack the nickel layers 10 are first removed, so that a sequence of mutually insulated dynode layers which are fixed to the electrically insulating supports 9 connected, remains.
  • the negative mold 7 shown in FIG. 3 is used in the production of layered multi-channel plates made of dynodes and intermediate layers subsequently produced. 6, layers of nickel 12 and aluminum 13 are alternately deposited in the free spaces 8 of the negative mold 7. After removal of the negative mold 7 with an organic solvent and the electrode 2 with an etch which does not attack the nickel layers 12 or the aluminum layers 13, the aluminum layers are converted in a known manner by oxidation into aluminum oxide, so that according to FIG Layered multi-channel plate made of nickel dynodes 12 and insulating intermediate layers 13a made of aluminum oxide.
  • the negative mold 7 shown in FIG. 3 is again assumed.
  • An aluminum layer 14 made of an organic electrolyte is deposited into the free spaces 8b between the columnar PMMA structures 7b, as can be seen from the simplified illustration in FIG. 8, using the metal electrode 2b.
  • This layer is partially converted into aluminum oxide in a second electrolyte containing sulfuric acid by anodic oxidation, so that a firmly adhering aluminum oxide layer 15 is formed as shown in FIG. 9.
  • This is activated and coated by chemical reduction deposition with a thin metal layer 16 onto which an aluminum layer 14a is again galvanically deposited. This process sequence is repeated until the desired number of layer sequences is reached, whereupon the negative mold 7b and the electrode 2b are removed.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Tubes For Measurement (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Particle Accelerators (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
  • Paper (AREA)
EP85101037A 1984-03-10 1985-02-01 Verfahren zur Herstellung geschichteter Vielkanalplatten aus Metall für Bilderverstärker und Verwendung der so hergestellten Vielkanalplatten Expired EP0154796B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT85101037T ATE38451T1 (de) 1984-03-10 1985-02-01 Verfahren zur herstellung geschichteter vielkanalplatten aus metall fuer bilderverstaerker und verwendung der so hergestellten vielkanalplatten.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3408849 1984-03-10
DE3408849A DE3408849A1 (de) 1984-03-10 1984-03-10 Verfahren zur herstellung geschichteter vielkanalplatten aus metall fuer bildverstaerker

Publications (3)

Publication Number Publication Date
EP0154796A2 EP0154796A2 (de) 1985-09-18
EP0154796A3 EP0154796A3 (en) 1986-12-30
EP0154796B1 true EP0154796B1 (de) 1988-11-02

Family

ID=6230129

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85101037A Expired EP0154796B1 (de) 1984-03-10 1985-02-01 Verfahren zur Herstellung geschichteter Vielkanalplatten aus Metall für Bilderverstärker und Verwendung der so hergestellten Vielkanalplatten

Country Status (6)

Country Link
US (1) US4563251A (ja)
EP (1) EP0154796B1 (ja)
JP (1) JPS60208040A (ja)
AT (1) ATE38451T1 (ja)
BR (1) BR8501057A (ja)
DE (1) DE3408849A1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5189777A (en) * 1990-12-07 1993-03-02 Wisconsin Alumni Research Foundation Method of producing micromachined differential pressure transducers
US5206983A (en) * 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
US5190637A (en) * 1992-04-24 1993-03-02 Wisconsin Alumni Research Foundation Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers
US5378583A (en) * 1992-12-22 1995-01-03 Wisconsin Alumni Research Foundation Formation of microstructures using a preformed photoresist sheet
US5412265A (en) * 1993-04-05 1995-05-02 Ford Motor Company Planar micro-motor and method of fabrication
GB9717210D0 (en) * 1997-08-14 1997-10-22 Central Lab Of The Research Co Electron multiplier array
US5943223A (en) * 1997-10-15 1999-08-24 Reliance Electric Industrial Company Electric switches for reducing on-state power loss
DE10305427B4 (de) * 2003-02-03 2006-05-24 Siemens Ag Herstellungsverfahren für eine Lochscheibe zum Ausstoßen eines Fluids
GB0307526D0 (en) * 2003-04-01 2003-05-07 Council Cent Lab Res Councils Electron multiplier array
EP1611594A2 (en) * 2003-04-01 2006-01-04 Council For The Central Laboratory Of The Research Councils Large area detectors and displays
US20060291882A1 (en) * 2003-07-09 2006-12-28 Council For The Centeral Laboratory Of The Researc Imaging machine using a large area electron multiplier

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1434053A (en) * 1973-04-06 1976-04-28 Mullard Ltd Electron multipliers
US4193176A (en) * 1978-10-30 1980-03-18 Hughes Aircraft Company Multiple grid fabrication method
DE2922642C2 (de) * 1979-06-02 1981-10-01 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Verfahren zum Herstellen von Platten für den Aufbau von Trenndüsenelementen
DE3007385A1 (de) * 1980-02-27 1981-09-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zur kontinuierlichen galvanoplastischen fertigung von praezisionsflachteilen
DE3039110A1 (de) * 1980-10-16 1982-05-13 Siemens AG, 1000 Berlin und 8000 München Verfahren fuer die spannungsfreie entwicklung von bestrahlten polymethylmetacrylatschichten
GB2108314A (en) * 1981-10-19 1983-05-11 Philips Electronic Associated Laminated channel plate electron multiplier
DE3150257A1 (de) * 1981-12-18 1983-06-30 Siemens AG, 1000 Berlin und 8000 München Bildverstaerker
DE3206820C2 (de) * 1982-02-26 1984-02-09 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Verfahren zum Herstellen von Trenndüsenelementen
DE3221981C2 (de) * 1982-06-11 1985-08-29 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Verfahren zum Herstellen von aus Trennkörpern mit Abschlußplatten bestehenden Trenndüsenelementen zur Trennung gas- oder dampfförmiger Gemische

Also Published As

Publication number Publication date
DE3408849C2 (ja) 1987-04-16
JPS60208040A (ja) 1985-10-19
DE3408849A1 (de) 1985-09-19
JPH0535542B2 (ja) 1993-05-26
BR8501057A (pt) 1985-10-29
ATE38451T1 (de) 1988-11-15
US4563251A (en) 1986-01-07
EP0154796A3 (en) 1986-12-30
EP0154796A2 (de) 1985-09-18

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