EP0124396B1 - Elektronenstrahlinjektionsgerät für einen Mikrowellengenerator - Google Patents

Elektronenstrahlinjektionsgerät für einen Mikrowellengenerator Download PDF

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Publication number
EP0124396B1
EP0124396B1 EP84400615A EP84400615A EP0124396B1 EP 0124396 B1 EP0124396 B1 EP 0124396B1 EP 84400615 A EP84400615 A EP 84400615A EP 84400615 A EP84400615 A EP 84400615A EP 0124396 B1 EP0124396 B1 EP 0124396B1
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EP
European Patent Office
Prior art keywords
magnetic field
zone
electron beam
axis
field
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Expired
Application number
EP84400615A
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English (en)
French (fr)
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EP0124396A1 (de
Inventor
Georges Mourier
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Thales SA
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Thomson CSF SA
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/02—Electrodes; Magnetic control means; Screens
    • H01J23/06—Electron or ion guns
    • H01J23/075—Magnetron injection guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J25/00—Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
    • H01J25/02—Tubes with electron stream modulated in velocity or density in a modulator zone and thereafter giving up energy in an inducing zone, the zones being associated with one or more resonators
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/88—Inductor

Definitions

  • the present invention relates to a device for injecting an electron beam for generators of radio waves for microwave frequencies. It relates more particularly to a device for injecting an electron beam propagating along an axis along a cycloidal trajectory under the action of a uniform electric field and subjected to a static magnetic field perpendicular to the axis and to the field electric.
  • This type of injection device can be used, in particular, in the new cyclotronic resonance masers proposed by the applicant in the new patent application filed on the same day as the present one and having for title "wave generator” microwave radio frequencies ”.
  • the injection device consists only of an electron gun subjected to a high magnetic field, identical to that prevailing in the structure resonant.
  • the electron gun used in this generator consists of two facing electrodes, one of which, the anode, is brought to a positive potential and the other, the sole, of which is brought to a negative or zero potential and by a cathode positioned in the plane of the hearth and brought to the same potential as the latter, at least one of the electrodes having a divergent profile such that the distance between electrodes is increasing from the cathode to the outside.
  • the voltage to be applied to the anode in order to obtain an electron beam propagating along a cycloidal trajectory with a substantially constant radius of rotation r L , the voltage to be applied to the anode must be substantially higher than the voltage of power supply giving the energy of the electron beam.
  • the object of the present invention is to remedy this drawback by proposing a new type of injection device.
  • the injection device is a device for injecting an electron beam along a cycloidal path for microwave radio wave generators using an electron beam propagating along an axis under the action of a uniform electric field and subjected to a static magnetic field perpendicular to the axis of propagation and to the electric field, as well as to the electromagnetic field of at least one resonant structure arranged along the axis.
  • This device is characterized in that it includes an electron gun placed in an area where the magnetic field has an intensity lower than that of the field necessary to obtain a cyclotronic type interaction and electrodes positioned between the gun and the area of interaction in an area where the magnetic field has an increasing intensity in the direction of propagation of the beam to create in this area, a static electric field having two components in the plane perpendicular to the magnetic field, namely an Ex component in the direction of l the axis and a component Ey perpendicular to the component Ex and to the magnetic field so as to compensate for the movement perpendicular to the axis due to the increase in the magnetic field, in said zone.
  • the generator represented in FIG. 1a essentially comprises three parts, namely an injection device 1, a resonant structure 2 and a collector 3, the assembly being placed inside a vacuum enclosure 4 brought to a potential no.
  • the injection device 1 is constituted by an electron gun 5 producing an electron beam in the direction x followed by means 6 to create an electric field E without component in the direction z but having two components E x and Ey in the plane of the figure.
  • the injection device 1 is placed in a static magnetic field perpendicular to the plane of the figure, that is to say in the z direction.
  • the magnetic field applied in the present invention is such that the electron gun 5 is subjected to a magnetic field 8 1 of low value and the means 6 to a magnetic field B 2 progressively increasing from the value 8 1 to a value B 3 representing the magnetic field prevailing at the level of the resonant structure 2, as represented respectively by the parts 1, II, III in FIG. 1 b.
  • the electron gun 5 consists of two planar electrodes 7, 8 facing each other, one of which 7, called the anode, is brought to a positive potential V and the other, called sole, is formed of two parts 8, 8 ′ and is brought to a negative potential V c and of a cathode 9 heated by a filament 10 and brought to the same potential V c as the sole 8.
  • This type of electron gun provides in known manner a beam following, in the direction x, a cycloidal path.
  • the means 6 are produced by four electrodes 11, 12, 13, 14 brought to continuous potentials such as, for example,
  • the electrons being in an electric field having two components Ex and Ey and being subjected to a uniformly increasing static magnetic field of direction x, are brought to follow a cycloidal trajectory whose the radius of rotation gradually decreases as shown in Figure 1a.
  • the electron beam is then injected into the resonant structure 2 in which it interacts with a high frequency electromagnetic field.
  • the enclosure 4 has the shape of a cylinder of axis z inside which the static magnetic field B 3 is almost uniform.
  • the resonant structure 2 is constituted, in a known manner, by two spherical mirrors 15, 16 facing each other and positioned so that the distance H verifies the relationship with n an integer and At the operating wavelength.
  • the two mirrors 15, 16 constitute a "quasi-optical" resonator.
  • One of the mirrors, namely the mirror 15, is provided with an orifice 17 connected to a waveguide 18.
  • This waveguide 18 is used to send out, the electromagnetic energy given off by the electron beam to the electromagnetic beam which appears as a standing wave in the y direction with a high frequency electric field polarized in the x direction.
  • the two mirrors 15, 16 are preceded and followed by grids 19, 20 which are non-reflective at the operating frequency of the resonator and separated from a distance h such that
  • the two mirrors 15 and 16 are brought respectively to ground and to a negative potential so as to create between them a continuous electric field Ec of direction y which ensures the drift of the electron beam in the direction x.
  • the cylindrical part of the envelope 4 is preferably covered with absorbent substances 21 at the operating frequency to avoid parasitic resonances.
  • absorbent substances 21 are, for example, in "carberlox” (brand).
  • the electrons having given up energy are then evacuated towards a collector 3 constituted by a part of the envelope 4 having a section in section in the plane x y in the shape of U.
  • Figure 2a shows an alternative embodiment of the generator of Figure la which then constitutes an amplifier. In this embodiment, only the resonant structure has been modified, the other parts remaining identical.
  • the new structure is formed by two flat parallel plates 22, 23 spaced from each other by a distance H 'such that so as to guide in the x direction a high frequency traveling wave having at least one high frequency electric field component in the x y plane.
  • the traveling wave is injected into the structure via the input one guide 24 and it is discharged, after having received the energy given up by the electron beam, via the wave guide. output 25.
  • the two plates are polarized so as to create between them a continuous electric field of direction y.
  • FIG. 2b it is identical to FIG. 1b and gives the variation of the static magnetic field B in the direction x.
  • the magnetic field is created in known manner using superconductive coils, for example.
  • the electron gun 5 placed in a region of weak magnetic field B 1 produces a beam of electrons progressing towards the central region of said field, where it is maximum, by moving perpendicular to its direction.
  • the progression along a cycloidal trajectory is ensured by the electrodes placed in the vicinity of its trajectory and brought to appropriate potentials, which creates between the electrodes a uniform continuous electric field giving the electrons a speed of drift.
  • the electron beam is then subjected in the region of the means 6 to a magnetic field of direction B z progressively increasing.
  • the different potentials of the electrodes 11, 12, 13, 14 have been chosen so as to create an electric field having components in the directions x and y and to satisfy the equations below. with so that the electron beam propagates in the x direction.
  • the electron beam will be brought into the region of the increasing magnetic field to follow a cycloidal trajectory whose radius decreases progressively due to equation (1) in the direction x with a constant drift speed if the component Ey believes as B z whose variation along x is given in Figures 1b and 2b.
  • equation (5) avoids transverse drift and allows electrons to enter the increasing magnetic field which normally tends to repel electrons endowed with a speed of rotation towards the regions where B is more small, namely towards the barrel.

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  • Surgical Instruments (AREA)

Claims (3)

1. Anordnung zum Einleiten eines Elektronenstrahlenbündels in eine zyklotronische Wechselwirkungszone, das sich längs einer zykloidischen Bahn in Richtung einer Achse (x) unter Einwirkung eines gleichmässigen elektrischen Feldes und eines statischen Magnetfeldes (B) ausbreitet, das senkrecht zur Ausbreitungsachse und zum elektrischen Feld verläuft, gekennzeichnet durch eine Elektronenkanone (5), die in einer Zone (I) angeordnet ist, in der das Magnetfeld eine Intensität (B1) hat, die kleiner als die Intensität (B3) des Feldes ist, die zur Erzielung einer zyklotronischen Wechselwirkung erforderlich ist, und Elektroden (11-14), die zwischen der Elektronenkanone und der Wechselwirkungszone in einer Zone (11) angebracht sind, in der das Magnetfeld eine Intensität (B2) hat, die in der Ausbreitungsrichtung des Elektronenstrahlenbündels zunimmt, damit in dieser Zone ein statisches elektrisches Feld geschaffen wird, das in der zum Magnetfeld senkrechten Ebene zwei Komponenten (Ex, Ey) aufweist, nämlich eine Komponente Ex in Richtung der Achse und eine Komponente Ey senkrecht zur Komponente Ex und zum Magnetfeld, damit die senkrecht zu der Achse verlaufende Bewegung kompensiert wird, die auf die Vergrösserung des Magnetfeldes in der Zone (11) zurückzuführen ist.
2. Anordnung nach Anspruch 1, dadurch gekennzeichnet, dass vier Elektroden (11-14) einander paarweise gegenüber vorgesehen sind und dass zwischen diese Elektroden unterschiedliche zunehmende Potentiale (V11 < V12 < V13 < V14) so angelegt sind, dass ein elektrisches Feld geschaffen wird, das in den Richtungen x und y Komponenten aufweist und so gewählt ist, dass die folgenden Gleichungen erfüllt sind:
Figure imgb0018
Figure imgb0019
mit
Figure imgb0020
3. Anordnung nach Anspruch 2, dadurch gekennzeichnet, dass die Änderung der Komponente Ey so gewählt ist, dass in der Zone mit dem wachsenden Magnetfeld gilt:
Figure imgb0021
 = const.
EP84400615A 1983-04-06 1984-03-27 Elektronenstrahlinjektionsgerät für einen Mikrowellengenerator Expired EP0124396B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8305604 1983-04-06
FR8305604A FR2544128B1 (fr) 1983-04-06 1983-04-06 Dispositif d'injection d'un faisceau d'electrons pour generateur d'ondes radioelectriques pour hyperfrequences

Publications (2)

Publication Number Publication Date
EP0124396A1 EP0124396A1 (de) 1984-11-07
EP0124396B1 true EP0124396B1 (de) 1988-01-27

Family

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EP84400615A Expired EP0124396B1 (de) 1983-04-06 1984-03-27 Elektronenstrahlinjektionsgerät für einen Mikrowellengenerator

Country Status (5)

Country Link
US (1) US4567402A (de)
EP (1) EP0124396B1 (de)
JP (1) JPS59197179A (de)
DE (1) DE3469102D1 (de)
FR (1) FR2544128B1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3863661D1 (de) * 1987-03-03 1991-08-22 En Physique Des Plasmas Centre Hochleistungs-gyrotron zur erzeugung elektromagnetischer millimeter- oder submillimeterwellen.
FR2625836B1 (fr) * 1988-01-13 1996-01-26 Thomson Csf Collecteur d'electrons pour tube electronique
FR2672730B1 (fr) * 1991-02-12 1993-04-23 Thomson Tubes Electroniques Dispositif convertisseur de modes et diviseur de puissance pour tube hyperfrequence et tube hyperfrequence comprenant un tel dispositif.
US6504393B1 (en) 1997-07-15 2003-01-07 Applied Materials, Inc. Methods and apparatus for testing semiconductor and integrated circuit structures
US6252412B1 (en) 1999-01-08 2001-06-26 Schlumberger Technologies, Inc. Method of detecting defects in patterned substrates
US7528614B2 (en) * 2004-12-22 2009-05-05 Applied Materials, Inc. Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2632130A (en) * 1947-11-28 1953-03-17 Joseph F Hull High current density beam tube
US2970241A (en) * 1958-01-08 1961-01-31 Klein Gerald Backward wave tube amplifieroscillator
NL257375A (de) * 1959-10-29
FR1342263A (fr) * 1961-09-18 1963-11-08 Varian Associates Perfectionnements aux canons électroniques
JPS4921458B1 (de) * 1963-10-29 1974-06-01
US3325677A (en) * 1963-11-08 1967-06-13 Litton Prec Products Inc Depressed collector for crossed field travelling wave tubes
FR89788E (fr) * 1966-03-31 1967-08-18 Csf Perfectionnements aux lignes à retard électroniques
US3619709A (en) * 1970-07-06 1971-11-09 Ratheon Co Gridded crossed field traveling wave device
US4021697A (en) * 1975-12-10 1977-05-03 Warnecke Electron Tubes, Inc. Crossed-field amplifier

Also Published As

Publication number Publication date
JPS59197179A (ja) 1984-11-08
FR2544128B1 (fr) 1985-06-14
DE3469102D1 (en) 1988-03-03
EP0124396A1 (de) 1984-11-07
FR2544128A1 (fr) 1984-10-12
US4567402A (en) 1986-01-28

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