EP0070809A3 - Adjustment to desired value (trimming) on thin film resistors by ion sputtering - Google Patents
Adjustment to desired value (trimming) on thin film resistors by ion sputtering Download PDFInfo
- Publication number
- EP0070809A3 EP0070809A3 EP82830171A EP82830171A EP0070809A3 EP 0070809 A3 EP0070809 A3 EP 0070809A3 EP 82830171 A EP82830171 A EP 82830171A EP 82830171 A EP82830171 A EP 82830171A EP 0070809 A3 EP0070809 A3 EP 0070809A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- thin film
- desired value
- trimming
- adjustment
- film resistors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
- H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
- H01C17/2404—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
A technique for adjusting to the desired value, thin film
integrated resistors is made known. This method consists in
exposing a resistor, whose thickness is greater than that neces
sary for the desired resistance, to ionic sputtering of the resistive
material until a the resistor thickness is such as to correspond to
the desired electric resistance.
Ion-sputter etching is realised iether by means of a plasma
or by means of an ion-gun.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT48932/81A IT1171401B (en) | 1981-07-20 | 1981-07-20 | TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION |
IT4893281 | 1981-07-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0070809A2 EP0070809A2 (en) | 1983-01-26 |
EP0070809A3 true EP0070809A3 (en) | 1983-07-13 |
Family
ID=11269073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP82830171A Withdrawn EP0070809A3 (en) | 1981-07-20 | 1982-06-15 | Adjustment to desired value (trimming) on thin film resistors by ion sputtering |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0070809A3 (en) |
IT (1) | IT1171401B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2213986A (en) * | 1987-12-16 | 1989-08-23 | Philips Electronic Associated | Fabrication of resistors in microwave and other circuits |
US6475400B2 (en) * | 2001-02-26 | 2002-11-05 | Trw Inc. | Method for controlling the sheet resistance of thin film resistors |
DE10162540A1 (en) * | 2001-12-19 | 2003-07-10 | Infineon Technologies Ag | Component and method for its production |
US10680056B1 (en) | 2018-12-26 | 2020-06-09 | Texas Instruments Incorporated | IC with ion milled thin-film resistors |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2111511A5 (en) * | 1970-10-19 | 1972-06-02 | Western Electric Co | |
DE2144656A1 (en) * | 1971-09-07 | 1973-03-15 | Hottinger Messtechnik Baldwin | PROCEDURE AND ARRANGEMENT FOR CHANGING THE ELECTRICAL RESISTANCE |
FR2253280A1 (en) * | 1973-12-03 | 1975-06-27 | Hewlett Packard Co | |
FR2354617A1 (en) * | 1976-06-08 | 1978-01-06 | Electro Resistance | PROCESS FOR THE MANUFACTURE OF ELECTRICAL RESISTORS FROM METAL SHEETS OR FILMS AND RESISTANCES OBTAINED |
-
1981
- 1981-07-20 IT IT48932/81A patent/IT1171401B/en active
-
1982
- 1982-06-15 EP EP82830171A patent/EP0070809A3/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2111511A5 (en) * | 1970-10-19 | 1972-06-02 | Western Electric Co | |
DE2144656A1 (en) * | 1971-09-07 | 1973-03-15 | Hottinger Messtechnik Baldwin | PROCEDURE AND ARRANGEMENT FOR CHANGING THE ELECTRICAL RESISTANCE |
FR2253280A1 (en) * | 1973-12-03 | 1975-06-27 | Hewlett Packard Co | |
FR2354617A1 (en) * | 1976-06-08 | 1978-01-06 | Electro Resistance | PROCESS FOR THE MANUFACTURE OF ELECTRICAL RESISTORS FROM METAL SHEETS OR FILMS AND RESISTANCES OBTAINED |
Also Published As
Publication number | Publication date |
---|---|
IT8148932A0 (en) | 1981-07-20 |
EP0070809A2 (en) | 1983-01-26 |
IT1171401B (en) | 1987-06-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Designated state(s): DE FR GB NL SE |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Designated state(s): DE FR GB NL SE |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19840621 |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: MISIANO, CARLO Inventor name: SIMONETTI, ENRICO |