EP0070809A3 - Adjustment to desired value (trimming) on thin film resistors by ion sputtering - Google Patents

Adjustment to desired value (trimming) on thin film resistors by ion sputtering Download PDF

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Publication number
EP0070809A3
EP0070809A3 EP82830171A EP82830171A EP0070809A3 EP 0070809 A3 EP0070809 A3 EP 0070809A3 EP 82830171 A EP82830171 A EP 82830171A EP 82830171 A EP82830171 A EP 82830171A EP 0070809 A3 EP0070809 A3 EP 0070809A3
Authority
EP
European Patent Office
Prior art keywords
thin film
desired value
trimming
adjustment
film resistors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP82830171A
Other languages
German (de)
French (fr)
Other versions
EP0070809A2 (en
Inventor
Carlo Misiano
Enrico Simonetti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leonardo SpA
Original Assignee
Selenia Industrie Elettroniche Associate SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Selenia Industrie Elettroniche Associate SpA filed Critical Selenia Industrie Elettroniche Associate SpA
Publication of EP0070809A2 publication Critical patent/EP0070809A2/en
Publication of EP0070809A3 publication Critical patent/EP0070809A3/en
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/2404—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching

Abstract

A technique for adjusting to the desired value, thin film integrated resistors is made known. This method consists in exposing a resistor, whose thickness is greater than that neces­ sary for the desired resistance, to ionic sputtering of the resistive material until a the resistor thickness is such as to correspond to the desired electric resistance.
Ion-sputter etching is realised iether by means of a plasma or by means of an ion-gun.
EP82830171A 1981-07-20 1982-06-15 Adjustment to desired value (trimming) on thin film resistors by ion sputtering Withdrawn EP0070809A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT4893281 1981-07-20
IT48932/81A IT1171401B (en) 1981-07-20 1981-07-20 TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION

Publications (2)

Publication Number Publication Date
EP0070809A2 EP0070809A2 (en) 1983-01-26
EP0070809A3 true EP0070809A3 (en) 1983-07-13

Family

ID=11269073

Family Applications (1)

Application Number Title Priority Date Filing Date
EP82830171A Withdrawn EP0070809A3 (en) 1981-07-20 1982-06-15 Adjustment to desired value (trimming) on thin film resistors by ion sputtering

Country Status (2)

Country Link
EP (1) EP0070809A3 (en)
IT (1) IT1171401B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2213986A (en) * 1987-12-16 1989-08-23 Philips Electronic Associated Fabrication of resistors in microwave and other circuits
US6475400B2 (en) * 2001-02-26 2002-11-05 Trw Inc. Method for controlling the sheet resistance of thin film resistors
DE10162540A1 (en) * 2001-12-19 2003-07-10 Infineon Technologies Ag Component and method for its production
US10680056B1 (en) 2018-12-26 2020-06-09 Texas Instruments Incorporated IC with ion milled thin-film resistors

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2111511A5 (en) * 1970-10-19 1972-06-02 Western Electric Co
DE2144656A1 (en) * 1971-09-07 1973-03-15 Hottinger Messtechnik Baldwin PROCEDURE AND ARRANGEMENT FOR CHANGING THE ELECTRICAL RESISTANCE
FR2253280A1 (en) * 1973-12-03 1975-06-27 Hewlett Packard Co
FR2354617A1 (en) * 1976-06-08 1978-01-06 Electro Resistance PROCESS FOR THE MANUFACTURE OF ELECTRICAL RESISTORS FROM METAL SHEETS OR FILMS AND RESISTANCES OBTAINED

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2111511A5 (en) * 1970-10-19 1972-06-02 Western Electric Co
DE2144656A1 (en) * 1971-09-07 1973-03-15 Hottinger Messtechnik Baldwin PROCEDURE AND ARRANGEMENT FOR CHANGING THE ELECTRICAL RESISTANCE
FR2253280A1 (en) * 1973-12-03 1975-06-27 Hewlett Packard Co
FR2354617A1 (en) * 1976-06-08 1978-01-06 Electro Resistance PROCESS FOR THE MANUFACTURE OF ELECTRICAL RESISTORS FROM METAL SHEETS OR FILMS AND RESISTANCES OBTAINED

Also Published As

Publication number Publication date
EP0070809A2 (en) 1983-01-26
IT1171401B (en) 1987-06-10
IT8148932A0 (en) 1981-07-20

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Legal Events

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PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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Effective date: 19840621

RIN1 Information on inventor provided before grant (corrected)

Inventor name: MISIANO, CARLO

Inventor name: SIMONETTI, ENRICO