JPH0548922B2 - - Google Patents

Info

Publication number
JPH0548922B2
JPH0548922B2 JP62208928A JP20892887A JPH0548922B2 JP H0548922 B2 JPH0548922 B2 JP H0548922B2 JP 62208928 A JP62208928 A JP 62208928A JP 20892887 A JP20892887 A JP 20892887A JP H0548922 B2 JPH0548922 B2 JP H0548922B2
Authority
JP
Japan
Prior art keywords
trimming
resistive film
electrode
notch
slit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62208928A
Other languages
Japanese (ja)
Other versions
JPS6451602A (en
Inventor
Mitsuhiro Hoshii
Koji Sato
Masao Yonezawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP62208928A priority Critical patent/JPS6451602A/en
Publication of JPS6451602A publication Critical patent/JPS6451602A/en
Publication of JPH0548922B2 publication Critical patent/JPH0548922B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、混成集積回路等を構成している絶縁
基板上に形成された抵抗膜のトリミング方法に関
する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for trimming a resistive film formed on an insulating substrate constituting a hybrid integrated circuit or the like.

(従来の技術) 混成集積回路等においては、例えば第2図に示
すように絶縁基板1上に設けた一対の電極2,2
間にまたがつてスクリーン印刷等によつて抵抗膜
3が形成されている。この抵抗膜3は通常その抵
抗値を調節するために、その端部から電極2,2
に沿うようなスリツト4が形成される。この場
合、スリツト4を形成する位置、つまりトリミン
グ位置は、電極2,2を切つてしまつて接続不良
等をおこるのを防止するために、抵抗膜3の中央
付近が選ばれる。
(Prior Art) In a hybrid integrated circuit, for example, a pair of electrodes 2, 2 provided on an insulating substrate 1 as shown in FIG.
A resistive film 3 is formed across the gap by screen printing or the like. This resistive film 3 is normally connected to the electrodes 2 and 2 from its ends in order to adjust its resistance value.
A slit 4 is formed along the . In this case, the position for forming the slit 4, that is, the trimming position, is selected near the center of the resistive film 3 in order to prevent the electrodes 2, 2 from being cut and causing a connection failure.

(発明が解決しようとする問題点) ところが、第3図にも示すように、抵抗膜をト
リミングする場合、中央付近でトリミングするよ
りも電極に近い位置でトリミングする方が抵抗値
のバラツキが小さくなつて、より好ましいことに
なる。つまり、第3図はトリミング位置を変えた
場合のトリミング長さLに対する抵抗膜3の抵抗
変化率を示すものである。ここでいう抵抗変化率
とは次の式によつて算定されるものをいう。すな
わち、抵抗変化率=(トリミング後の抵抗値−ト
リミング前の抵抗値)トリミング前の抵抗値 ま
た、図中のカーブは抵抗膜3の中央付近でトリ
ミングしたものであり、のカーブは電極に近い
位置でトリミングしたものである。これらのカー
ブのうち、電極に近い位置でトリミングしたの
カーブの方がその傾きが小さく、このことから電
極に近い位置でトリミングした方が微調整が可能
でバラツキを小さくすることができることが理解
される。
(Problem to be solved by the invention) However, as shown in Figure 3, when trimming a resistive film, the variation in resistance value is smaller when trimming at a position closer to the electrode than when trimming near the center. As a result, it becomes more desirable. That is, FIG. 3 shows the rate of change in resistance of the resistive film 3 with respect to the trimming length L when the trimming position is changed. The resistance change rate here is calculated by the following formula. In other words, resistance change rate = (resistance value after trimming - resistance value before trimming) resistance value before trimming Also, the curve in the figure is the one obtained by trimming near the center of the resistive film 3, and the curve in is close to the electrode. It is cropped at the position. Of these curves, the slope of the curve trimmed close to the electrode is smaller, and this suggests that trimming closer to the electrode allows for finer adjustment and less variation. Ru.

ところが、従来はトリミング位置を単なる目測
で決めるため、不可避的にその位置を予定位置よ
りもずれてしまい、電極に近い位置でトリミング
することになると、電極2を切つてしまう恐れが
生じる。
However, conventionally, since the trimming position is determined simply by visual measurement, the trimming position inevitably deviates from the planned position, and if trimming is performed at a position close to the electrode, there is a risk of cutting the electrode 2.

本発明は、このような点に鑑みてなされたもの
であつて、確実に抵抗膜の電極に近い位置におい
てトリミングすることができ、精度よく抵抗値の
調整が行えるトリミング方法の提供を目的として
いる。
The present invention has been made in view of these points, and aims to provide a trimming method that can reliably trim the resistive film at a position close to the electrode and adjust the resistance value with high precision. .

(問題点を解決するための手段) 本発明は、このような目的を達成するために、
絶縁基板上に設けられている一対の電極間に形成
した抵抗膜の電極に近い位置の端部に切欠きを設
け、この切欠きを狙つて抵抗膜にスリツトを形成
することを特徴としている。
(Means for solving the problems) In order to achieve such an object, the present invention has the following features:
It is characterized in that a notch is provided at the end of a resistive film formed between a pair of electrodes provided on an insulating substrate at a position close to the electrode, and a slit is formed in the resistive film aiming at this notch.

(作用) 抵抗膜の電極に近い位置に設けた切欠きを狙つ
てスリツトを形成するので、スリツト形成位置精
度が向上するとともに、トリミングによる抵抗変
化率が低くなる。
(Function) Since the slit is formed aiming at the notch provided in the resistive film at a position close to the electrode, the accuracy of the slit formation position is improved and the rate of change in resistance due to trimming is reduced.

(実施例) 以下、本発明の実施例を図面を参照して詳細に
説明する。第1図は混成集積回路等を構成してい
る絶縁基板の要部を示す平面図である。同図にお
いて、11はアルミナ等からなる絶縁基板で、そ
の所定の位置に一対の電極12,12が設けられ
ており、この一対の電極12,12にまたがつて
スクリーン印刷等の手段で抵抗膜13が形成され
ている。この抵抗膜13には一方の電極12に近
い位置の端部に三角形状の微少な切欠き14があ
らかじめ形成されており、本発明はこの切欠き1
4を狙つてスリツト15を形成するものである。
なお、切欠き14の形状は必ずしも上記のような
ものに限定されるものではなく他の形状であつて
もよい。
(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings. FIG. 1 is a plan view showing the main parts of an insulating substrate constituting a hybrid integrated circuit or the like. In the figure, reference numeral 11 denotes an insulating substrate made of alumina or the like, and a pair of electrodes 12, 12 are provided at predetermined positions on the insulating substrate 11. A resistive film is formed across the pair of electrodes 12, 12 by means such as screen printing. 13 is formed. This resistive film 13 has a triangular minute notch 14 formed in advance at the end near one of the electrodes 12, and the present invention is directed to this notch 14.
The slit 15 is formed aiming at the hole 4.
Note that the shape of the notch 14 is not necessarily limited to the above-mentioned shape, and may have other shapes.

このように本発明の方法によれば、従来の単な
る目測によるトリミングとは異なり抵抗膜13の
電極に近い位置に確実にトリミングすることがで
きるようになる。また、切欠き14に相当する分
だけ、抵抗膜13の材料を削減することができる
とともに、切欠き14は目視による場合だけでは
なく、センサーの目標にもなり、トリミングの自
動化を実現する上で有用なものともなる。
As described above, according to the method of the present invention, it is possible to reliably trim the resistive film 13 to a position close to the electrode, unlike the conventional trimming performed simply by visual measurement. In addition, the material of the resistive film 13 can be reduced by the amount corresponding to the notch 14, and the notch 14 can be used not only for visual inspection, but also as a sensor target, which is useful for realizing trimming automation. It can also be useful.

(効果) 本発明の抵抗膜のトリミング方法は以上説明し
た通りであり、抵抗膜の電極に近い位置に設けた
切欠きを狙つてスリツトを形成するので、トリミ
ングによる抵抗変化率が低くなつた。そのため、
抵抗の微調整が可能になるとともに、トリミング
工程のばらつきが小さくなり、抵抗値の調整精度
が向上した。
(Effects) The method for trimming a resistive film of the present invention is as described above, and since the slit is formed aiming at the notch provided in the resistive film near the electrode, the rate of change in resistance due to trimming is reduced. Therefore,
This makes it possible to finely adjust the resistance, reduces variations in the trimming process, and improves the accuracy of resistance value adjustment.

さらには、このような位置にスリツトを形成す
る場合、電極を切断してしまうことが考えられる
が、スリツト形成の目標となる切欠きを抵抗膜に
形成しているので、このような不都合が起こるこ
ともない。
Furthermore, if a slit is formed at such a position, it is possible that the electrode will be cut, but this inconvenience occurs because the notch that is the target of the slit formation is formed in the resistive film. Not at all.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係るトリミング方法の一実施
例を説明するための要部平面図、第2図は従来例
のトリミング方法を説明するための要部平面図、
第3図はトリミング長さと抵抗変化率の関係を説
明するグラフである。 11……絶縁基板、12……電極、13……抵
抗膜、14……切欠き、15……スリツト。
FIG. 1 is a plan view of main parts for explaining an embodiment of the trimming method according to the present invention, FIG. 2 is a plan view of main parts for explaining a conventional trimming method,
FIG. 3 is a graph illustrating the relationship between trimming length and resistance change rate. 11...Insulating substrate, 12...Electrode, 13...Resistive film, 14...Notch, 15...Slit.

Claims (1)

【特許請求の範囲】 1 絶縁基板上に設けられている一対の電極間に
形成した抵抗膜の前記電極に近い位置の端部に切
欠きを設け、 この切欠きを狙つて抵抗膜にスリツトを形成す
ることを特徴とする抵抗膜のトリミング方法。
[Claims] 1. A notch is provided at the end of a resistive film formed between a pair of electrodes provided on an insulating substrate at a position close to the electrode, and a slit is made in the resistive film aiming at this notch. A method for trimming a resistive film, the method comprising: forming a resistive film;
JP62208928A 1987-08-21 1987-08-21 Trimming method for resistance film Granted JPS6451602A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62208928A JPS6451602A (en) 1987-08-21 1987-08-21 Trimming method for resistance film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62208928A JPS6451602A (en) 1987-08-21 1987-08-21 Trimming method for resistance film

Publications (2)

Publication Number Publication Date
JPS6451602A JPS6451602A (en) 1989-02-27
JPH0548922B2 true JPH0548922B2 (en) 1993-07-22

Family

ID=16564448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62208928A Granted JPS6451602A (en) 1987-08-21 1987-08-21 Trimming method for resistance film

Country Status (1)

Country Link
JP (1) JPS6451602A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58210653A (en) * 1982-06-01 1983-12-07 Nec Corp Film circuit device
JPS6041073B2 (en) * 1981-05-26 1985-09-13 ザ・ハルコン・エス・デイ−・グル−プ・インコ−ポレ−テツド Method for producing alkylene carbonate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041073U (en) * 1983-08-29 1985-03-23 株式会社村田製作所 thick film circuit board

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041073B2 (en) * 1981-05-26 1985-09-13 ザ・ハルコン・エス・デイ−・グル−プ・インコ−ポレ−テツド Method for producing alkylene carbonate
JPS58210653A (en) * 1982-06-01 1983-12-07 Nec Corp Film circuit device

Also Published As

Publication number Publication date
JPS6451602A (en) 1989-02-27

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