EP0044758B1 - Abschlussvorrichtung für eine Mikrowellenleitung mit minimalem Stehwellenfaktor - Google Patents
Abschlussvorrichtung für eine Mikrowellenleitung mit minimalem Stehwellenfaktor Download PDFInfo
- Publication number
- EP0044758B1 EP0044758B1 EP81400958A EP81400958A EP0044758B1 EP 0044758 B1 EP0044758 B1 EP 0044758B1 EP 81400958 A EP81400958 A EP 81400958A EP 81400958 A EP81400958 A EP 81400958A EP 0044758 B1 EP0044758 B1 EP 0044758B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- capacitors
- line
- resistive layer
- micro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/24—Terminating devices
- H01P1/26—Dissipative terminations
- H01P1/268—Strip line terminations
Definitions
- the invention relates to a transmission line termination device in which it is sought to minimize the standing wave rate originating from the reflection of microwaves on a resistive load placed at the end of the line.
- Fréquemmen is carried out t of such fillers re- sistives, value equal to the transmission line of the characteristic impedance module in the form of an engraved deposition on an insulator, in particular an alloy layer of nickel and of chromium deposited on an insulating ceramic.
- the first condition is easy to achieve, in the case of charges deposited by etching using a conventional adjustment process which can be erosion by sandblasting or attack by laser beam.
- the second condition is more difficult to achieve because we observe capacitive or inductive effects from the non-negligible surface and irregularities of the nickel-chromium layer.
- This surface cannot be reduced either in width, in length or in two dimensions without observing certain drawbacks.
- a thinner layer of nickel-chromium, and of smaller surface, therefore more resistive cannot withstand certain thermal dissipations, which limits the power withstand of the device;
- a layer of normal thickness but for example, narrower and longer, to present the same surface would give a discontinuity, and therefore an energy reflection, producing undesirable standing waves, at the transition point between the conductor of the microstrip line and the resistive layer.
- the invention aims to remedy these drawbacks by seeking to correct the impedance of the resistive load, either by modifying its shape, or by adding a capacitance thereto, or finally by combining the two aforementioned means.
- a microstrip line element comprises a dielectric substrate 1, for example made of pure alumina, in the form of an elongated and flat parallelepiped having two large faces: one of these faces is entirely metallized and constitutes the ground plane 2. The other n 'is metallized only over part of its width and constitutes a strip 3 which is none other than the upper conductor of the microstrip line.
- This strip is produced for example by depositing successive layers of chromium, copper and gold. She is connects along a transverse straight line 11 to a layer 4 of resistive alloy constituting a termination charge.
- This layer 4 is itself connected along a transverse straight line 12 to a metallization 5 forming a ground electrode and connected to the ground plane by a connection of negligible ohmic resistance.
- the connection to the ground plane can be carried out either by etching a metal layer deposited on the terminal face 6 of the substrate, or by welding a flexible metal strip, not shown, or even by a metallized hole (not shown) between metallizations 5 and 2.
- Layer 4 is constituted for example by a deposit of nickel and chromium alloy, carried out by evaporation under vacuum and reaching a few hundred angstroms (a few dezames of nancreters). It is known to obtain a layer resistance of 25 ohms per square by this method. To obtain a resistance of 50 ohms between lines 11 and 12, a deposit twice as long as wide is then carried out, that is to say in the case of an alumina substrate 0.4 mm thick, with a strip 3 of 0.35 mm in width giving substantially a microstrip line of 50 ohms, a layer 4 of 0.7 mm in length.
- the deposit of nickel and chromium alloy can advantageously be carried out over a longer length than is necessary so that the useful length can then be easily adjusted by depositing a layer of gold on the parts. to short-circuit, by protecting, during the gilding operation, the useful part of the load using a resin layer obtained by photomasking.
- the standing wave rate observed for a frequency of 18 GHz, is greater than 3. This is due in particular to the fact that at such frequency, the wavelength in the propagation medium (l alumina of the substrate) is 6.5 mm, length before which that of a resistive layer of 0.7 mm is by no means negligible. The resistance therefore does not act as a localized constant, which partly explains the importance of the standing wave rate observed.
- layer 4 is given in the form of a trapezoid, the large base of which is the connection line 11 and the small base MN is connected to the metallization 5 over a length as small as possible while obtaining good return contact. mass is about 0.03 mm.
- R (ohms) of the load is given by the formula: in which R o denotes the resistance per square (in ohms) of the resistive layer 4, h is the height of the trapezoid formed by this layer, and "In" means that we take a natural logarithm of the ratio a / b. For example, if we have: a 50 ohm load is obtained and a standing wave rate of the order of 1.7 for a frequency of 18 GHz.
- a transverse conductive strip 30 is inserted, closer to the microstrip 3 than to the metallized layer 5, leading to two metallizations 31 and 32, which constitute the armatures of capacitors, the other armature of which is the ground plane.
- the two metallizations measure 100 microns in width by 300 microns in length and are connected together by a band 30 of width equal to one hundred microns, distant about 200 microns from line 11.
- the standing wave rate observed is for example 1.6 to 18 GHz.
- the preceding characteristics are combined.
- a standing wave rate of 1.3 is observed for a frequency of 18 GHz.
- the invention also applies to lines of the "stripline" type where two ground planes are separated from a single central strip by two dielectric substrates.
- the strip can be engraved on one of the substrates according to the same characteristics as those shown in fig. 2 to 5.
- FIG. 6 one end of such a line, comprising, on a substrate 1, visible only between the metallizations, a conductive strip 3 deposited by etching between two lateral strips 61 and 62 deposited at the same time as the strip 3 and connected together by a deposit 60 of the same kind, constituting a mass return.
- a resistive layer 4 of trapezoidal shape is deposited so as to be connected to the strip 3 on the one hand and to the deposit 60 on the other hand.
- Capacities 63 and 64 consist of insulating deposits on the strips 61 and 62, deposits then covered with a conductive layer connected to layer 4 by connections 65 and 66, connected to layer 4 by two small pads 67 and 68 constituted by deposit of gold.
- capacitors 63 and 64 It is also possible to use bare pads of ceramic capacitors to form the capacitors 63 and 64.
Landscapes
- Non-Reversible Transmitting Devices (AREA)
- Waveguides (AREA)
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8015497 | 1980-07-11 | ||
FR8015497A FR2486720A1 (fr) | 1980-07-11 | 1980-07-11 | Dispositif de terminaison d'une ligne de transmission, en hyperfrequence, a taux d'ondes stationnaires minimal |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0044758A1 EP0044758A1 (de) | 1982-01-27 |
EP0044758B1 true EP0044758B1 (de) | 1984-05-16 |
Family
ID=9244122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP81400958A Expired EP0044758B1 (de) | 1980-07-11 | 1981-06-16 | Abschlussvorrichtung für eine Mikrowellenleitung mit minimalem Stehwellenfaktor |
Country Status (4)
Country | Link |
---|---|
US (1) | US4413241A (de) |
EP (1) | EP0044758B1 (de) |
DE (1) | DE3163615D1 (de) |
FR (1) | FR2486720A1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2525383A1 (fr) * | 1982-04-16 | 1983-10-21 | Cables De Lyon Geoffroy Delore | Resistances en constantes reparties pour charges a forte dissipation en hyperfrequence |
US4670723A (en) * | 1985-03-18 | 1987-06-02 | Tektronix, Inc. | Broad band, thin film attenuator and method for construction thereof |
CA1323911C (en) * | 1988-10-14 | 1993-11-02 | Diethard Hansen | Reflection-free termination of a tem-waveguide |
WO1990009040A1 (fr) * | 1989-02-02 | 1990-08-09 | Fujitsu Limited | Terminaison de resistance pelliculaire |
FR2779577B1 (fr) * | 1998-06-09 | 2001-01-05 | Deti | Composant passif hyperfrequence a charge resistive comportant des elements d'adaptation hyperfrequence integres |
US6600384B2 (en) | 2001-05-18 | 2003-07-29 | Endwave Corporation | Impedance-compensating circuit |
GB2383199B (en) * | 2001-12-11 | 2005-11-16 | Marconi Optical Components Ltd | Transmission line structures |
US20040085150A1 (en) * | 2002-10-30 | 2004-05-06 | Dove Lewis R. | Terminations for shielded transmission lines fabricated on a substrate |
DE10350033A1 (de) * | 2003-10-27 | 2005-05-25 | Robert Bosch Gmbh | Bauelement mit Koplanarleitung |
KR20140037456A (ko) * | 2012-09-18 | 2014-03-27 | 한국전자통신연구원 | 소형 도파관 종단기 |
WO2017122269A1 (ja) * | 2016-01-12 | 2017-07-20 | 三菱電機株式会社 | 終端器及び高周波回路 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3582833A (en) * | 1969-12-23 | 1971-06-01 | Bell Telephone Labor Inc | Stripline thin-film resistive termination wherein capacitive reactance cancels out undesired series inductance of resistive film |
JPS5132946B1 (de) * | 1970-05-04 | 1976-09-16 | ||
US3678417A (en) * | 1971-07-14 | 1972-07-18 | Collins Radio Co | Planar r. f. load resistor for microstrip or stripline |
DE2421784C3 (de) * | 1974-05-06 | 1980-07-17 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Streckengerät für Übertragungsstrecken mit Koaxialkabeln zur Übertragung digitaler Signale |
DE2634812C2 (de) * | 1976-08-03 | 1983-05-05 | Spinner-GmbH Elektrotechnische Fabrik, 8000 München | HF-Leistungsabschlußwiderstand |
US4118112A (en) * | 1976-12-03 | 1978-10-03 | Xerox Corporation | Method for reducing power dissipation in tapered resistor devices |
JPS5376728A (en) * | 1976-12-20 | 1978-07-07 | Toshiba Corp | Microwave circuit |
JPS5930323B2 (ja) * | 1976-12-27 | 1984-07-26 | 日本電気株式会社 | ストリツプ線路用無反射終端 |
-
1980
- 1980-07-11 FR FR8015497A patent/FR2486720A1/fr active Granted
-
1981
- 1981-06-16 DE DE8181400958T patent/DE3163615D1/de not_active Expired
- 1981-06-16 EP EP81400958A patent/EP0044758B1/de not_active Expired
- 1981-07-08 US US06/281,393 patent/US4413241A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2486720B1 (de) | 1984-08-10 |
US4413241A (en) | 1983-11-01 |
EP0044758A1 (de) | 1982-01-27 |
FR2486720A1 (fr) | 1982-01-15 |
DE3163615D1 (en) | 1984-06-20 |
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