EP0024764A1 - Procédé de fabrication d'une anode tournante pour tubes à rayons X et anode obtenue selon ce procédé - Google Patents
Procédé de fabrication d'une anode tournante pour tubes à rayons X et anode obtenue selon ce procédé Download PDFInfo
- Publication number
- EP0024764A1 EP0024764A1 EP80200778A EP80200778A EP0024764A1 EP 0024764 A1 EP0024764 A1 EP 0024764A1 EP 80200778 A EP80200778 A EP 80200778A EP 80200778 A EP80200778 A EP 80200778A EP 0024764 A1 EP0024764 A1 EP 0024764A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- target layer
- support
- tungsten
- anode
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
- H01J35/108—Substrates for and bonding of emissive target, e.g. composite structures
Definitions
- the invention relates to a method of producing a rotary anode for an X-ray tube, wherein a tungsten or a tungsten alloy target layer is provided on a support by plasma spraying.
- the invention also relates to an anode thus produced.
- Rotary anodes produced by a method embodying the invention are particularly suitable for X-ray tubes to which a high load is applied during use, such as X-ray tubes for medical purposes.
- German Patent Application 2346925 discloses a method of producing a rotary anode for an X-ray tube wherein a tungsten or a tungsten-rhenium alloy target layer, that is to say the layer which is bombarded by the electrons when the rotary anode is used in an X-ray tube, is provided on a molybdenum or a molybdenum alloy support by plasma spraying.
- a graphite support is used is described in German Auslegeschrift 2251656.
- a method of producing a rotary anode for an X-ray tube wherein a target layer consisting of tungsten or a tungsten alloy is provided on a support by plasma spraying is characterized in that the target layer is provided by plasma spraying in an oxygen-free medium at a pressure of 2 - 55 kPa.
- a target layer having a density of over 97 % can be obtained.
- Plasma spraying W at a reduced pressure is known per se from Moses A. Levinstein, Cienca Y technica de la Soldadura (Madrid) 12, No. 66, pages 1-9 (1962) (see also Chemical Abstracts, 58, 4243f 1963), but in contrast with the results obtained by the Applicants, a density of not more than 92.7 % was then obtained. It was also reported that a reduction in pressure resulted in lower densities.
- the support is preferably preheated to a temperature above 1000°C prior to the provision of the target layer. This results in an improved adhesion and density of the target layer on the support.
- Plasma spraying with a power of more than 30 kW generally results in a higher density of the target layer.
- the tungsten or tungsten alloy to be sprayed is preferably used in the form of a powder having a particle size of not more than 45 / um.
- a spraying distance (i.e. the distance between the spray gun nozzle and the support) of not less than 150 mm is preferred.
- the drawing shows a rotary anode comprising a support 1 and a target layer 2.
- the portion of the target layer denoted by 3 is the place onto which the electron beam in the X-ray tube is focused (i.e. the focal path).
- the support 1 may consist of molybdenum or of a molybdenum alloy known to be suitable for X-ray rotary anodes. Particularly suitable is a molybdenum alloy having 0.40-0.55 % by weight of Ti, 0.06 - 0.12 % by weight of Zr and 0.01 - 0.03 % by weight of C.
- the support may alternatively consist of graphite. In that case a carbon transfer inhibiting layer, for example a rhenium layer, should be provided between the support and the target layer.
- One or more further layers may be present between the target layer and the support, for example a layer of pure tungsten.
- the target layer 2 consists of tungsten or a tungsten alloy. All alloys known to be suitable for this purpose are very satisfactory. Particularly good results (high density) have been obtained with tungsten-rhenium alloys (0.7 % by weight or rhenium) and with tungsten-rhenium-tantalum alloys (0-7 % by weight of rhenium, 0-4 % by weight of tantalum).
- the surface of the target layer (except the focal path 3) and/or the surface of the support may be roughened, or these surfaces may be coated with heat-radiation improving material (for example rough tungsten).
- the target layer prefferably has a composition which varies from the inside to the outside (for example in respect of the rhenium content).
- the rotary anode is produced in the following manner.
- a support 1 is produced in a manner which is known per se, for example by casting, forging and pressing. The surface of the support is properly cleaned.
- the support is then placed in a special, hermetically sealable chamber of the type described in the-above- mentioned article by E. Muehlberger.
- the chamber is evacuated and filled with Ar. He or N 2 may alternatively be used. These gases may be mixed together and/or be mixed with H 2 (0 - 10 % by volume). This cycle is preferably repeated a few times to remove any residual oxygen.
- the chamber is filled with one of the above- mentioned gases or gas mixtures to the desired pressure (2 - 50 kPa). A pressure of 2 - 25 kPa is preferably used.
- the material for the target layer is sprayed onto the support with a plasma gun. (Approximately 35 kW of power is supplied to the plasma gun).
- the support is preheated with the plasma gun to a temperature above 1000 0 C before the material of the target layer is sprayed. It is possible to vary the composition of the sprayed material continuously during spraying in order to obtain a gradient in the composition of the target layer.
- a target layer of a thickness of 1.5 - 2.0 mm is preferably applied. It is possible to provide the target layer only in the region of the focal path 3 by using a mask.
- the support together with the target layer is allowed to cool in the chamber. Finally, the product obtained is removed from the chamber and worked further, the focal path 3 then being ground.
Landscapes
- Coating By Spraying Or Casting (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7906417 | 1979-08-27 | ||
NL7906417A NL7906417A (nl) | 1979-08-27 | 1979-08-27 | Werkwijze voor het vervaardigen van een draaianode voor roentgenbuizen en zo verkregen anode. |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0024764A1 true EP0024764A1 (fr) | 1981-03-11 |
Family
ID=19833732
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP80200778A Ceased EP0024764A1 (fr) | 1979-08-27 | 1980-08-19 | Procédé de fabrication d'une anode tournante pour tubes à rayons X et anode obtenue selon ce procédé |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0024764A1 (fr) |
NL (1) | NL7906417A (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2521776A1 (fr) * | 1982-02-18 | 1983-08-19 | Plansee Metallwerk | Anode tournante pour tube a rayon x |
EP0116385A1 (fr) * | 1983-01-25 | 1984-08-22 | Koninklijke Philips Electronics N.V. | Procédé de fabrication d'une anode tournante pour tubes à rayons X et anode ainsi obtenue |
EP0177079A1 (fr) * | 1984-09-14 | 1986-04-09 | Koninklijke Philips Electronics N.V. | Procédé de fabrication d'une anode rotative pour tubes à rayons X et anode rotative fabriquée selon ce procédé |
EP0850899A1 (fr) * | 1996-12-24 | 1998-07-01 | Sulzer Metco AG | Procédé de revêtement d'un substrat en carbone ou d'un substrat nonmétallique comprenant du carbone et substrat revêtu selon ce procédé |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3010009A (en) * | 1958-09-29 | 1961-11-21 | Plasmadyne Corp | Method and apparatus for uniting materials in a controlled medium |
US3243636A (en) * | 1963-01-30 | 1966-03-29 | Tubix Soc | Rotary anode for X-ray tubes |
FR2204041A1 (fr) * | 1972-10-20 | 1974-05-17 | Siemens Ag | |
FR2210009A1 (fr) * | 1972-12-06 | 1974-07-05 | Philips Nv | |
US3839618A (en) * | 1972-01-03 | 1974-10-01 | Geotel Inc | Method and apparatus for effecting high-energy dynamic coating of substrates |
-
1979
- 1979-08-27 NL NL7906417A patent/NL7906417A/nl not_active Application Discontinuation
-
1980
- 1980-08-19 EP EP80200778A patent/EP0024764A1/fr not_active Ceased
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3010009A (en) * | 1958-09-29 | 1961-11-21 | Plasmadyne Corp | Method and apparatus for uniting materials in a controlled medium |
US3243636A (en) * | 1963-01-30 | 1966-03-29 | Tubix Soc | Rotary anode for X-ray tubes |
US3839618A (en) * | 1972-01-03 | 1974-10-01 | Geotel Inc | Method and apparatus for effecting high-energy dynamic coating of substrates |
FR2204041A1 (fr) * | 1972-10-20 | 1974-05-17 | Siemens Ag | |
FR2210009A1 (fr) * | 1972-12-06 | 1974-07-05 | Philips Nv |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2521776A1 (fr) * | 1982-02-18 | 1983-08-19 | Plansee Metallwerk | Anode tournante pour tube a rayon x |
EP0116385A1 (fr) * | 1983-01-25 | 1984-08-22 | Koninklijke Philips Electronics N.V. | Procédé de fabrication d'une anode tournante pour tubes à rayons X et anode ainsi obtenue |
EP0177079A1 (fr) * | 1984-09-14 | 1986-04-09 | Koninklijke Philips Electronics N.V. | Procédé de fabrication d'une anode rotative pour tubes à rayons X et anode rotative fabriquée selon ce procédé |
EP0850899A1 (fr) * | 1996-12-24 | 1998-07-01 | Sulzer Metco AG | Procédé de revêtement d'un substrat en carbone ou d'un substrat nonmétallique comprenant du carbone et substrat revêtu selon ce procédé |
Also Published As
Publication number | Publication date |
---|---|
NL7906417A (nl) | 1981-03-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Designated state(s): AT DE FR NL |
|
17P | Request for examination filed |
Effective date: 19810325 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN REFUSED |
|
18R | Application refused |
Effective date: 19820712 |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: TE RAA, GERHARDUS ALBERTUS Inventor name: MAGENDANS, FREDERIK |