EP0000995B1 - Apparatus and method for the controlled processing of radiation sensitive devices in dependence upon the temperature of the developer liquid - Google Patents

Apparatus and method for the controlled processing of radiation sensitive devices in dependence upon the temperature of the developer liquid Download PDF

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Publication number
EP0000995B1
EP0000995B1 EP78300279A EP78300279A EP0000995B1 EP 0000995 B1 EP0000995 B1 EP 0000995B1 EP 78300279 A EP78300279 A EP 78300279A EP 78300279 A EP78300279 A EP 78300279A EP 0000995 B1 EP0000995 B1 EP 0000995B1
Authority
EP
European Patent Office
Prior art keywords
developer liquid
temperature
motor
operably connected
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP78300279A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0000995A1 (en
Inventor
Leslie Edward Lawson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB34796/77A external-priority patent/GB1599301A/en
Application filed by Vickers Ltd filed Critical Vickers Ltd
Publication of EP0000995A1 publication Critical patent/EP0000995A1/en
Application granted granted Critical
Publication of EP0000995B1 publication Critical patent/EP0000995B1/en
Expired legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/006—Temperature control of the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/007—Processing control, e.g. test strip, timing devices

Definitions

  • This invention relates to the processing of radiation sensitive devices comprising a radiation sensitive coating on a substrate and is concerned with the processing of such devices using an apparatus comprising a container for developer liquid and a means for contacting the devices with the liquid.
  • Such radiation sensitive devices are used in the production of, for example, printing plates, in particular lithographic printing plates printed circuits; and integrated circuits.
  • Radiation sensitive devices for use in the production of lithographic printing plates usually consist of a substrate in the form of a metallic support sheet, which is mechanically and/or chemically treated to provide a suitable working surface and which carries the radiation sensitive coating.
  • the device is image-wise exposed to actinic radiation using either a negative or a positive transparency of an appropriate subject. The effect of actinic radiation is to alter the solubility of the radiation-sensitive coating.
  • the image-wise exposed device is then processed.
  • the processing step involves contacting the image-wise exposed device with a developer liquid to selectively dissolve unwanted areas of coating from the support sheet to leave an image constituted by the areas of the coating remaining on the support sheet.
  • a developer liquid to selectively dissolve unwanted areas of coating from the support sheet to leave an image constituted by the areas of the coating remaining on the support sheet.
  • Other types of printing plates and printed and integrated circuits are produced in a similar manner.
  • the negative or positive transparency commonly comprises a silver halide layer which forms and provides a line image or a half-tone image or a continuous tone image, or any combination of such images.
  • a silver halide layer which forms and provides a line image or a half-tone image or a continuous tone image, or any combination of such images.
  • poly(vinyl cinnamate) and diazo resins are typical of those that can be used in conjunction with negative transparencies, whilst quinone diazides optionally in combination with novolak resins are representative of those that can be used when exposure is carried out beneath a suitable positive transparency.
  • the developer bath temperature is adjusted by heating and cooling to ensure uniform development. It is also known from BE 771221 to determine the temperature of the developer bath by means of thermistors and to vary the dwell time of a photographic film in the bath in dependence on the temperature. DE 1271545 discloses a similar technique wherein the bath temperature is determined by measuring its viscosity. As is well known, a measure of the ability of a radiation sensitive plate to reproduce a transparency may be obtained by exposing the plate through an exposure guide known as a "grey-scale” or "step-wedge".
  • a typical example of such an exposure guide consists of a number of steps of increasing optical density, the first step being clear.
  • the actual steps that are reproduced on the plate depend on the particular radiation sensitive coating/developer conditions. However it is desirable that for a given set of conditions the reproduction of the step-wedge is always the same. Variation in the temperature of the developer could prevent such results being obtained.
  • a processing apparatus with a developer bath length of, for example, 12 inches (about 31 cm) will have an optimum plate speed of 35 inches (about 90 cm) per minute when used for developing a negative working radiation sensitive plate with an organic solvent developer and an optimum plate speed of 20 inches (about 51 cm) per minute when used for developing a positive working radiation-sensitive plate with an alkaline developer.
  • an image-wise exposed positive working radiation sensitive device is processed by including the step of giving it a brief overall uniform exposure to actinic radiation before or during the development, the development time can be decreased.
  • this exposure is given manually, it is difficult to obtain predictable and repeatable results because the exposure conditions are difficult to control.
  • This problem can be solved by giving the device an overall exposure to relatively less intense actinic radiation for a relatively longer time whilst the plate moves along a path past the source of radiation.
  • the degree to which a given device needs to be subjected to an overall exposure in order to obtain a given result is dependent on the temperature of the developer liquid.
  • an apparatus for processing an image-wise exposed radiation sensitive device which apparatus comprises a container for developer liquid, a means for contacting the device with the developer liquid, and a temperature sensitive member for sensing the temperature of the developer liquid and for producing an output signal in dependence on that temperature characterised in that the apparatus additionally includes a roller for agitating the developer liquid in contact with the device and a motor for driving the agitating roller, said temperature sensitive member being operably connected to the motor for driving the agitator roller so that said output signal controls the speed of the motor whereby the degree to which the developer liquid is agitated in contact with the device is dependent on the temperature of the developer liquid.
  • the apparatus includes a means of moving the device with respect to the developer liquid, the output signal being used, in addition to controlling the agitating roller motor, to control a motor for driving the device moving means.
  • the device moving means comprises a pair of rollers for feeding the device at an appropriate speed along a path through the developer liquid.
  • the device moving means comprises a mechanism for dipping the device into the developer liquid in the container and for withdrawing the same after an appropriate time interval. In either case not only the degree of agitation but also the residence time of the device in the apparatus is dependent upon the output signal i.e. upon the temperature of the developer liquid.
  • the developer liquid is fed to the device for a period of time dependent on the output signal, which of course is also used to control the speed of the agitator roller motor.
  • the device and the developer liquid are in contact for a time dependent on the temperature of the developer liquid.
  • the apparatus additionally includes a source of actinic radiation arranged so that the processing also involves the step of subjecting the device to an overall uniform exposure prior to or during its contact with developer liquid.
  • a source of actinic radiation arranged so that the processing also involves the step of subjecting the device to an overall uniform exposure prior to or during its contact with developer liquid.
  • the degree to which the device is subjected to radiation from said source may be controlled in dependence on said output signal. This may conveniently be effected by interposing a variable aperture between the source and the device and regulating the size of the aperture in dependence on said output signal.
  • Positive working radiation-sensitive devices typified by quinone diazide sensitised devices are used in the technique known as 'screen(ess lithography' i.e. the technique in which the device is exposed directly through a continuous tone master, without the use of the conventional half tone screen. Processing the plate by subjecting it to an overall exposure before developing increases the range of tones that can be obtained. Again, however, it is difficult to obtain predictable and repeatable results when this is done manually.
  • An apparatus of the invention including a source of actinic radiation as aforesaid can be used to process these plates, variations in the tonal range being produced by varying the duration or the intensity of the overall exposure. Alternatively if it is desired to keep these parameters constant, the tonal range can be varied by altering the speed at which the plates pass the radiation source. Clearly, variation of exposure duration and intensity and variation of plate speed can be combined to give better control of the tonal range.
  • the apparatus includes a pair of rubber covered input rollers 20 and 20a, a pair of rubber covered output rollers 30 and 30a, and a d.c. electric motor 40 for driving the rollers 20 and 20a.
  • the apparatus includes a separate container 21 for developer liquid and a pump 25 for delivering developer liquid to a spray bar 26 located between a pair of plush covered rollers 23 and 23a driven by a separate motor 24.
  • a planar member 22 is located under the rollers 23 and 23a and bar 26 and a catch tray 27 is provided to return developer liquid to the container 21.
  • the apparatus includes a temperature sensitive member in the form of a probe 28 containing a thermistor and this is preferably located in the container 21 as shown.
  • the apparatus also includes an electrical control circuit as shown in Figures 2 and 3; the output from the servo device of the circuit is fed to motor 24 and, optionally, to motor 40.
  • the electrical control circuit consists of a constant voltage source 9 in the form of an integrated circuit voltage regulator, a temperature voltage converter 10 incorporating the thermistor, and a servodevice 11 in the form of a d.c. thyristor controller, the output of which controls the speed of the motor 24.
  • the regulated voltage from the source 9 ( Figure 2) is fed through the thermistor 12 to a pair of d.c. amplifiers 13 and 14. Variation in the temperature of the thermistor 12 causes a change in its resistance which in turn produces a change in the input voltage to the amplifier 13.
  • the output of the amplifier 14 is connected to the servo device 11 ( Figure 2).
  • a variable resistor 15 is provided to vary the gain of the amplifier 13.
  • an image-wise exposed radiation sensitive plate is fed face upwards along a path between the input rollers 20 and 20a, between the rollers 23 and 23a and the member 22, and then between the output rollers 30 and 30a.
  • the exposed radiation sensitive coating of the plate is contacted by the rollers 23 and 23a and development, i.e. removal of the more soluble areas of the image-wise exposed radiation sensitive coating of the plate, is carried out by a combined scrubbing and solvent action.
  • the arrangement of the apparatus as shown is such that with increased developer liquid temperature, (i) motor 24 (and hence rollers 23 and 23a) rotate slower and hence the developer liquid on the exposed coating is subjected to a less severe agitation; and (ii) motor 40 (and hence rollers 20 and 20a) rotate faster and hence the residence time of the plate in the apparatus is shorter.
  • the degree to which the plate is processed is thus dependent on the temperature of the developer liquid. This relationship can be adjusted as desired.
  • variable resistor 15 may be adjusted to vary the contrast of the developed plate.
  • the setting of the variable resistor 15 may be varied to allow for an alteration in the activity of the developer liquid as a result of partial exhaustion.
  • the scope of the invention also includes a method of processing a radiation sensitive device which comprises passing the device through an apparatus as defined above.
  • Devices which may be processed in the apparatus of the invention using particular developers include for example positive working presensitised plates consisting of a grained and anodised substrate such as aluminium coated with a radiation sensitive mixture of a naphthoquinone diazide sulphonic acid ester and a novolak resin using aqueous sodium metasilicate developer, optionally with polyethylene glycol; deep-etch plates consisting of an anodised substrate having a radiation sensitive coating based on dichromated gum arabic using aqueous calcium chloride developer; smooth surfaced sheets of photoengraving zinc coated with positive working radiation sensitive compositions using aqueous sodium metasilicate developer; negative working presensitised printing plates consisting of a grained and anodised substrate having a radiation sensitive coating comprising the cin- namylidene-malonic acid half ester of poly(2,3,- epoxy-propyl methacrylate) using aqueous sodium silicate developer; film such as "alus X" panchromatic
  • the apparatus of the present invention provides several advantages over conventional processors. It is possible to obtain repeatable plate processing accurately without having to monitor and adjust the working temperature of the developer, which thus can always be at the ambient temperature. Time is saved when the developer temperature is low e.g. at the start of processing in a cold environment, as it is not necessary to wait until the developer is heated to the normal working temperature as is the case with conventional developers. Further, in the case where the ambient temperature is higher than the normal working temperature, there is no need to provide a means of cooling the developer. This is particularly important in the case of large processors containing 30 or 40 litres of developer.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photographic Developing Apparatuses (AREA)
EP78300279A 1977-08-18 1978-08-11 Apparatus and method for the controlled processing of radiation sensitive devices in dependence upon the temperature of the developer liquid Expired EP0000995B1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB34796/77A GB1599301A (en) 1977-08-18 1977-08-18 Processing of radiation sensitive devices
GB840278 1978-03-02
GB840278 1978-03-02
GB3479677 1978-05-26

Publications (2)

Publication Number Publication Date
EP0000995A1 EP0000995A1 (en) 1979-03-07
EP0000995B1 true EP0000995B1 (en) 1981-12-16

Family

ID=26242148

Family Applications (1)

Application Number Title Priority Date Filing Date
EP78300279A Expired EP0000995B1 (en) 1977-08-18 1978-08-11 Apparatus and method for the controlled processing of radiation sensitive devices in dependence upon the temperature of the developer liquid

Country Status (10)

Country Link
US (1) US4240737A (enrdf_load_stackoverflow)
EP (1) EP0000995B1 (enrdf_load_stackoverflow)
JP (1) JPS5456431A (enrdf_load_stackoverflow)
AU (1) AU520944B2 (enrdf_load_stackoverflow)
CA (1) CA1109315A (enrdf_load_stackoverflow)
DE (1) DE2861444D1 (enrdf_load_stackoverflow)
DK (1) DK363178A (enrdf_load_stackoverflow)
IT (1) IT1098107B (enrdf_load_stackoverflow)
NO (1) NO146379C (enrdf_load_stackoverflow)
NZ (1) NZ188167A (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5639542A (en) * 1979-09-10 1981-04-15 Dainippon Screen Mfg Co Ltd Stationary developing method with automatic developing apparatus
DE3020976C2 (de) * 1980-06-03 1983-01-27 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zur Erhöhung der Verarbeitungsbreite von lichthärtbaren Aufzeichnungsmaterialien
DE8028682U1 (de) * 1980-10-28 1981-02-12 Hoechst Ag, 6000 Frankfurt Entwicklungsgeraet
US4505565A (en) * 1981-12-22 1985-03-19 Hiroshi Tanaka Device for detecting aging of developer for automatic film developing apparatus
US4600287A (en) * 1982-07-30 1986-07-15 Dainippon Screen Seizo Kabushiki Kaisha Method and device for automatically developing photosensitive material
DE3381022D1 (de) * 1982-10-21 1990-02-01 Vickers Plc Verarbeitung von lichtempfindlichen vorrichtungen.
US4740074A (en) * 1987-10-30 1988-04-26 Powell Charles S Film development system
JPH0795191B2 (ja) * 1988-08-19 1995-10-11 富士写真フイルム株式会社 写真現像装置
US5148206A (en) * 1988-10-07 1992-09-15 Fuji Photo Film Co., Ltd. Automatic film processor using ultrasonic wave generators
US4994837A (en) * 1990-03-16 1991-02-19 Eastman Kodak Company Processor with temperature responsive film transport lockout
JPH05190583A (ja) * 1992-01-16 1993-07-30 Fujitsu Ltd 半導体装置の製造方法
GB9415430D0 (en) * 1994-07-30 1994-09-21 Kodak Ltd Method of processing photographic silver halide materials
GB9600112D0 (en) * 1996-01-04 1996-03-06 Kodak Ltd Improvements in or relating to photographic processsing apparatus
JP4773608B2 (ja) * 2000-09-28 2011-09-14 株式会社オハラ ガラスセラミックス及び温度補償部材
GB0026953D0 (en) * 2000-11-03 2000-12-20 Eastman Kodak Co Processing photographic material
JP4704757B2 (ja) * 2005-01-05 2011-06-22 三菱製紙株式会社 導電性パタンを形成するための処理方法及びその処理装置
ES2587024T3 (es) * 2008-11-21 2016-10-20 Hydro Aluminium Rolled Products Gmbh Banda de aluminio para soportes de plancha de impresión litográfica con alta resistencia a la flexión alternante
WO2017220170A1 (en) * 2016-06-24 2017-12-28 Hewlett-Packard Development Company, L.P. Connection determination in printing apparatus

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US2794377A (en) * 1954-05-12 1957-06-04 Polaroid Corp Self-developing camera, including temperature-compensated timing means
DE1098362B (de) * 1957-04-18 1961-01-26 Meteor Appbau Paul Schmeck G M Vorrichtung zum Einstellen der Verdampfungsgeschwindigkeit von Verdampfungsvorrichtungen fuer Ammoniakloesung
GB923883A (en) * 1958-04-24 1963-04-18 Ozalid Co Ltd Improvements in and relating to developing photographic materials by means of ammoniacal vapours
US3133490A (en) * 1961-01-19 1964-05-19 Arthur W Buck Apparatus for developing radiographic films
US3147687A (en) * 1961-10-05 1964-09-08 Ozalid Co Ltd Method of and apparatus for the development of light sensitive diazotype materials
US3174420A (en) * 1963-04-22 1965-03-23 Aizawa Tatsuo Automatic electronic control system in the continuous printing and ammonia gas developing machine for sensitive papers
DE1271545B (de) * 1963-11-29 1968-06-27 Eastman Kodak Co Vorrichtung zur Anzeige der bei einer bestimmten Temperatur einzuhaltenden Solldrehzahl eines mit einem Antriebsglied von Filmentwicklungsvorrichtungen gekuppelten Koerpers
GB1198073A (en) * 1966-08-26 1970-07-08 Agfa Gevaert Nv Photographic Processing Device
DE1772512A1 (de) * 1968-05-28 1971-12-02 Ewald Puls Vorrichtung zum selbsttaetigen Entwickeln von Druckplatten
US3623416A (en) * 1968-06-24 1971-11-30 Claes Johan Anderberg Processing system for photographic material
BE771221A (fr) * 1971-08-12 1971-12-16 Oussatoff Victor Ensemble electronique a temps variable et asservi a la temperature de traitement chimique, pour la photographie en couleurs
US4081211A (en) * 1973-05-25 1978-03-28 Canon Kabushiki Kaisha Processing condition control system for a multi-purpose film handling cartridge
GB1476559A (en) * 1974-05-28 1977-06-16 Hoechst Ag Apparatus for developing electrophotographic materials
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Also Published As

Publication number Publication date
DE2861444D1 (en) 1982-02-11
IT7826826A0 (it) 1978-08-18
AU3906578A (en) 1980-02-21
EP0000995A1 (en) 1979-03-07
NO146379B (no) 1982-06-07
NO782797L (no) 1979-02-20
JPS5456431A (en) 1979-05-07
IT1098107B (it) 1985-09-07
AU520944B2 (en) 1982-03-11
NO146379C (no) 1982-09-15
US4240737A (en) 1980-12-23
NZ188167A (en) 1983-02-15
DK363178A (da) 1979-02-19
JPS6236214B2 (enrdf_load_stackoverflow) 1987-08-06
CA1109315A (en) 1981-09-22

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