GB2041569A - Apparatus and method for developing radiation sensitive devices - Google Patents
Apparatus and method for developing radiation sensitive devices Download PDFInfo
- Publication number
- GB2041569A GB2041569A GB7903523A GB7903523A GB2041569A GB 2041569 A GB2041569 A GB 2041569A GB 7903523 A GB7903523 A GB 7903523A GB 7903523 A GB7903523 A GB 7903523A GB 2041569 A GB2041569 A GB 2041569A
- Authority
- GB
- United Kingdom
- Prior art keywords
- developer liquid
- temperature
- developer
- output signal
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims abstract description 11
- 239000007788 liquid Substances 0.000 claims abstract description 84
- 230000001419 dependent effect Effects 0.000 claims abstract description 22
- 239000007921 spray Substances 0.000 claims description 16
- 238000007598 dipping method Methods 0.000 claims description 5
- 238000000576 coating method Methods 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 11
- 230000001276 controlling effect Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000002441 reversible effect Effects 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- -1 silver halide Chemical class 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
- G03D13/02—Containers; Holding-devices
- G03D13/04—Trays; Dishes; Tanks ; Drums
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
- G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Radiation sensitive devices such as printing plates are, after image-wise exposure, treated with developer liquid to selectively dissolve unwanted areas of coating from the plate. The effectiveness of the developer liquid varies with its temperature. Apparatus for carrying out this developing procedure comprises means for contacting the stationary device with developer liquid; a temperature sensitive element to sense the temperature of the developer liquid and produce an output signal in dependence on that temperature; and a control means for controlling the developing of the device in a manner dependent on the output signal so that the period over which the device is in contact with the developer liquid is dependent on the temperature of the developer liquid. Exposure of the device to overall radiation before or during development is additionally controlled in dependence on the developer liquid temperature. <IMAGE>
Description
SPECIFICATION
An apparatus and method for processing of radiation sensitive devices
This invention relates to the processing of radiation sensitive devices comprising a radiation sensitive coating on a substrate and is concerned with the processing of such devices using an apparatus comprising a container for developer liquid and a means for contacting the devices with the liquid.
Such radiation sensitive devices are used in the production of, for example, printing plates, in particular lithographic printing plates; printed circuits; and integrated circuits. Radiation sensitive devices for use in the production of lithographic printing plates usually consist of a substrate in the form of a metallic support sheet, which is mechanically and/or chemically treated to provide a suitable working surface and which carries the radiation sensitive coating. In use, the device is image-wise exposed to actinic radiation using either a negative or a positive transparency of an appropriate subject. The effect of actinic radiation is to alter the solubility of the radiation-sensitive coating. The image-wise exposed device is then processed.The processing step involves contacting the image-wise exposed device with a developer liquid to selectively dissolve unwanted areas of coating from the support sheet to leave an image constituted by the areas of the coating remaining on the support sheet. Other types of printing plates and printed and integrated circuits are produced in a similar manner.
The negative or positive transparency commonly comprises a silver halide layer which forms and provides a line image or a half-tone image or a continuous tone image, or any combination of such images. Of the numerous radiation sensitive coatings that can be used for the devices, poly(vinyl cinnamate) and diazo resins are typical of those that can be used in conjunction with negative transparencies, whilst dichromated gum and quinone diazides optionally in combination with novolak resins are representative of those that can be used when exposure is carried out beneath a suitable positive transparency.
The precise processing routine, and the developer liquids used, depend on the solubility and chemical characteristics of the radiation sensitive coating being processed. Whilst the processing maybe done manually it is increasingly being carried out automatically using apparatus such as those described in
British Patent Specifications No. 1,253,026 and No.
1,299,864 and United States Patent Specifications
No. 3,552,293 and No. 4,001,854.
Some radiation sensitive coating/developer combinations are significantly affected by the developer temperature and variation from the predetermined temperature results in incorrect development and unsatisfactory reproduction of the transparency. As is well known, a measure of the ability of a radiation sensitive plate to reproduce a transparency may be obtained by exposing the plate through an exposure guide known as a "grey-scale" or "step-wedge". A typical example of such an exposure guide consists of a number of steps of increasing optical density, the first step being clear. The actual steps that are reproduced on the plate depend on the particular radiation sensitive coating/developer conditions.
However it is desirable that for a given set of conditions the reproduction of the step-wedge is always the same. Variation in the temperature of the developer could prevent such results being obtained.
It is an object of this invention to provide an apparatus for processing image-wise exposed radiation sensitive devices which compensates for any changes in the operating temperature of the developing liquid.
Because of the variations in the processing routines, there are problems in providing apparatus capable of processing different radiation sensitive devices. Thus for example the period of time during which the device needs to be in contact with developer liquid will generally be greater when processing a negative working radiation sensitive plate with an organic solvent developer than when processing a positive working radiation-sensitive plate with an alkaline developer.
It has been found that if an image-wise exposed positive working radiation sensitive device is processed by including the step of giving it a brief overall uniform exposure to actinic radiation before or during the development, the development time can be decreased. When this exposure is given manually, it is difficult to obtain predictable and repeatable results because the exposure conditions are difficult to control. This problem can be solved by giving the device an overall exposure to relatively less intense actinic radiation for a relatively longer time. However, it has been found that the degree to which a given device needs to be subjected to an overall exposure in order to obtain a given result is dependent on the temperature of the developer liquid.
It is another object of the invention to provide an apparatus for processing an image-wise exposed radiation sensitive device by giving the device an overall exposure, before or during development, which overall exposure is controlled in dependence on the temperature of the developer liquid.
According to one aspect of the present invention there is provided an apparatus for processing an image-wise exposed radiation sensitive device which apparatus comprises
(i) a member for supporting the device in a stationary position in the apparatus,
(ii) spray means located above the member and arranged to spray developer liquid over the surface of a device supported by the member,
(iii)a temperature sensitive member for sensing the temperature of the developer liquid and for producing an output signal in dependence on that temperature, and
(iv) a means for controlling the processing of the device in a manner dependent on said output signal whereby the degree to which the device is processed is dependent on the temperature of the developer liquid.
The apparatus may include a valve in the liquid line delivering developer liquid to the outlets of the spray means, which valve is actuated by said controlling means in dependence on the developer liquid temperature. In an alternative embodiment, said controlling means may actuate a pump feeding developer liquid to the spray means outlets. In either case, the processing is controlled by controlling the degree of contact between the developer and the device, the arrangement being such that the lower the temperature of the developer liquid, the more pronounced is the treatment of the device with the developer liquid.
According to another aspect of the present invention there is provided an apparatus for processing an image-wise exposed radiation sensitive device which apparatus comprises
(i) a container for developer liquid,
(ii) a means of dipping the device into the developer liquid and for withdrawing the device after a time interval,
(iii) a temperature sensitive member for sensing the temperature of the developer liquid and for producing an output signal in dependence on that temperature, and
(iv) a means for controlling the processing of the device in a manner dependent on said output signal whereby the degree to which the device is processed is dependent on the temperature of the developer liquid.
In an embodiment of this aspect of the invention, said controlling means controls said time interval in a manner dependent on said output signal. In this case, the processing is controlled by controlling the residence time of the device in the developer liquid in dependence on the developer liquid temperature.
The higher is this temperature, the shorter is the residence time.
In accordance with either aspect of the invention, the apparatus may additionally include a member, such as a roller, arranged to move over the surface of the device to agitate the developer liquid in contact with the surface. This movement of the member, (and/or the rotational movement of the member when the member is a roller) may be controlled in dependence on the output signal so that the processing of the device is dependent on the developer liquid temperature.
In a further embodiment also applicable to either aspect of the invention, the apparatus additionally includes a source of actinic radiation arranged in or adjacent to the apparatus so that the processing also involves the step of subjecting the device to an overall uniform exposure priorto or during its contact with developer liquid. In this case, the degree to which the device is subjected to radiation from said source may be controlled in dependence on said output signal so that the processing of the device is dependent on the developer liquid temperature. This may conveniently be effected by interposing a variable aperture between the source and the device and regulating the size of the aperture in dependence on said output signal.It will, of course, be appreciated that the present invention envisages processing apparatus which include a developer liquid temperature controlled actinic radiation source irrespective of whether or not the degree of contact between the device and the developer liquid is also temperature dependent.
Positive working radiation-sensitive devices in the form of plates, typified by quinone diazide sensitised plates are used in the technique known as 'screenless lithography' i.e. the technique in which the plate is exposed directly through a continuous tone master, without the use of the conventional half tone screen. Processing the plate by subjecting it to an overall exposure before developing increases the range of tones that can be obtained. Again, however, it is difficult to obtain predictable and repeatable results when this is done manually. An apparatus of the invention including a source of actinic radiation as aforesaid can be used to process these plates, variations in the tonal range being produced by varying the duration or the intensity of the overall exposure.Clearly, variation of exposure duration and intensity and variation of the degree of contact between the developer liquid and the plate can be combined to give better control of the tonal range.
For a better understanding of the invention and to show how the same may be carried into effect, reference will now be made, by way of example, to the accompanying drawings, in which:
Figure 1 is a schematic diagram of an apparatus in accordance with the present invention;
Figure 2 is a block diagram of the control circuit of the apparatus of Figure 1;
Figure 3 is a circuit diagram of a part of the control circuit shown in Figure 2, and
Figure 4 is a schematic diagram of another apparatus in accordance with the present invention.
Referring now to Figure 1, the apparatus comprises a support member 1 mounted in a catch tray 2 for developer liquid. The apparatus also includes a separate reservoir 3 for developer liquid and a pump 4 for delivering developer liquid to a plurality of spray bars 5 arranged above the support member 1.
The line between the pump 4 and the spray bars 5 includes a valve 6 actuated by a timer 7. A temperature sensitive probe 8 containing a thermistor is located in the reservoir 3 so that it is immersed in the developer liquid. The probe is operably connected to the timer 7 by means of an electrical control circuit.
The electrical control circuit is shown in Figure 2 and consists of a constant voltage source 9 in the form of an integrated circuit voltage regulator, a temperature voltage converter 10 incorporating the thermistor, and a servo device 11 in the form of a d.c.
thyristor controller, the output of which controls the timer. As shown in Figure 3, the regulated voltage from the source 9 is fed through the thermistor 12 to a pair of d.c. amplifiers 13 and 14. Variation in the temperature of the termistor 12 causes a change in its resistance which in turn produces a change in the input voltage to the amplifier 13. The output of the amplifier 14 is connected to the servo device 11. A variable resistor 15 is provided to vary the gain of the amplifier 13. The arrangement is such that the higher the temperature of the developer, the shorter the period during which valve 6 is open.
In use, the image-wise exposed radiation sensitive plate is placed on the support member faceupwards. (The plate may be placed in position manual ly or automatically). Developer liquid is then sprayed under pressure onto the plate from the spray bars 5 so that the entire surface of the stationary plate is contacted with developer liquid. After contacting the plate the developer liquid is returned to the reservoir 8 by the catch tray 2. The period of time during which developer liquid issues from the spray bars 5 is dependent on the developer liquid temperature.
Clearly, the temperature compensation that will be suitable for one combination of radiation sensitive coating and developer liquid will not necessarily be suitable for another. Suitable control of the timer 7 with temperature may be obtained by adjusting the potentiometer 15. Further, in the case of a given radiation sensitive coating/developer liquid combination the potentiometer 15 may be adjusted to vary the contrast of the developed plate. Moreover, the setting of the potentiometer 15 may be varied to allow for an alteration in the activity of the developer liquid as a result of partial exhaustion.
Referring now to Figure 4, parts corresponding to parts of Figure 1 to 3 are denoted by like reference numerals. The apparatus comprises a tank 21 for developer liquid and a means of dipping an imagewise exposed radiation sensitive plate 22 into the developer liquid and for withdrawing the same after a time interval. This dipping and withdrawing means comprises a reversible electric motor 23 arranged to drive a shaft 24. Wound around shaft 24 is a pair of winding cables 25 which pass over a pair of pulleys 26 mounted above the tank 21. The free ends of the cables 25 are connected to a supporting bar 27 for the plate 22. A switch 28 is located so as to be actuated by the bar 27 when it reaches its highest point. The switch 28 is arranged so that, when actuated, it automatically cuts off the electric power supply to the motor 23 and reverses the polarity.A similar switch 29 is located so as to be actuated by the bar 27 when it reaches its lowest point. This switch also automatically cuts off the power supply to the motor and reverses the polarity when actuated. The probe 8 is immersed in the developer liquid tank and is operably connected to the automatic timer 7 in a manner similar to that previously described. Timer 7 is operably connected to the motor 23 so that, after elapse of a predetermined adjustable time period, electric power is supplied to the motor 23. The apparatus also includes a switch arranged to actuate the timer 7 and to supply power to the motor 23.
In use, the plate 22 to be processed is mounted on the bar 27 and the start switch is actuated. This energises the motor 23 which then turns shaft 24 in a manner such that the cables 25 unwind from the shaft and the plate 22 descends into the developer liquid in the tank and also starts the timer 7. When the bar 27 reaches its lowest position i.e. a position wherein the entire plate 22 is immersed in the developer liquid, it actuates switch 29 to cut off power to the motor 23 and reverse the polarity. After the period of time to which the timer 7 is set has elapsed, the power to the motor 23 is restored and it then commences to rotate the shaft 24 in the reverse direction so as to wind the cables 25 onto shaft 24 and thereby withdraw the plate from the developer liquid.When the bar 27 reaches its highest position, it actuates switch 28 and this stops the motor 23 and reverses the polarity so that the apparatus is ready for the next processing cycle.
The timer 7 is preset, by adjustment of potentiometer 15, so that the immersion time of the plate in the developer liquid is correct for a given standard temperature. Any deviations of the developer liquid temperature from this standard temperature are then automatically compensated for by the control circuit so that the immersion time is dependent on the developer liquid temperature.
The apparatus of the present invention provides several advantages over conventional processors. It is possible to obtain repeatable plate processing accurately without having to monitor and adjust the working temperature of the developer, which thus can always be at the ambient temperature. Tine is saved when the developer temperature is low e.g. at the start of processing in a cold environment, as it is not necessary to wait until the developer is heated to the normal working temperature as is the case with conventional developers. Further, in the case where the ambient temperature is higher than the normal working temperature, there is no need to provide a means of cooling the developer. This is particularly important in the case of large processors containing 30 or 40 litres of developer.
Claims (21)
1. Apparatus for developing an image-wise exposed radiation sensitive device which comprises when in use:
(i) means for contacting the device, in a stationary position, with developer liquid;
(ii) a temperature sensitive element for sensing the temperature of the developer liquid and for producing an output signal in dependence on that temperature; and
(iii) a means for controlling the developing of the device in a manner dependent on said output signal whereby the period over which the device is in contact with the developer liquid is dependent on the temperature of the developer liquid.
2. Apparatus according to claim 1 wherein the contacting means comprises a spray element arranged to spray developer liquid over the device.
3. Apparatus according to claim 2 wherein the spray element includes a liquid line for delivering developer liquid to the outlets of the spray element and the control means comprises a valve in the line which is actuated in dependence on the output signal of the temperature sensitive element.
4. Apparatus according to claim 2 wherein the spray element includes a liquid line for delivering developer liquid to the outlets of the spray element and the control means comprises a pump feeding developer liquid through the line which is actuated for a time period which depends on the output signal of the temperature sensitive element.
5. Apparatus according to claim 1 wherein the contacting means comprises a container for the developer liquid and a means of dipping the device into the developer liquid and for withdrawing the device after a contact time interval controlled by the control means.
6. Apparatus according to any one of the preceding claims which additionally includes an agitating member adapted to move in contact with the surface of the device to agitate the developer liquid on the surface.
7. Apparatus according to claim 6 wherein the agitating member comprises a roller.
8. Apparatus according to claim 6 or 7 which additionally includes a means for controlling the movement of the agitating member in a manner dependent on the temperature of the developer liquid.
9. Apparatus according to any one of the preceding claims, which additionally includes a source of actinic radiation arranged to subject the device to an overall uniform exposure priorto or during its contact with the developer liquid.
10. Apparatus according to claim 9 which additionally includes a means for controlling the duration of the exposure and/or the intensity of the radiation in dependence on the temperature of the developer liquid.
11. Apparatus according to claim 10 wherein the control means for the radiation source comprises a variable aperture between the source and the plate, the size of the aperture being dependent on the temperature of the developer liquid.
12. Apparatus according to claim 1 substantially as described with reference to Figure 1 of the accompanying drawings.
13. Apparatus according to claim 1 substantially as described with reference to Figure 4 of the accompanying drawings.
14. Apparatus according to claim 1 substantially as herein described.
15. Apparatus for developing an image-wise exposed radiation sensitive device which comprises
(i) a container for developer liquid,
(ii) a means of dipping the device into the developer liquid and for withdrawing the device after a time interval,
(iii) a temperature sensitive member for sensing the temperature of the developer liquid and for producing an output signal in dependence on that temperature, and
(iv) a means for controlling the developing of the device in a manner dependent on said output signal whereby the degree to which the device is developed is dependent on the temperature of the developer liquid.
16. Apparatus for developing an image-wise exposed radiation sensitive device which comprises
(i) a member for supporting the device in a stationary position in the apparatus,
(ii) spray means located above the member and arranged to spray developer liquid over the surface of a device supported by the member,
(iii) a temperature sensitive member for sensing the temperature of the developer liquid and for producing an output signal in dependence on that temperature, and
(iv) a means for controlling the developing of the device in a manner dependent on said output signal whereby the degree to which the device is developed is dependent on the temperature of the developer liquid.
17. A method of developing an image-wise exposed radiation sensitive device which comprises contacting the device with a developer liquid whilst in a stationary position for a time period which is dependent on the temperature of the developer liquid.
18. A method according to claim 17 substantially as described with reference to Figure 1 of the accompanying drawings.
19. A method according to claim 17 substantially as described with reference to Figure 4 of the accompanying drawings.
20. A method according to claim 17 substantially as herein described.
21. A developed device whenever produced by the method according to any one of claims 17 to 20.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB7903523A GB2041569B (en) | 1979-02-01 | 1979-02-01 | Apparatus and method for developing radiation sensitive devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB7903523A GB2041569B (en) | 1979-02-01 | 1979-02-01 | Apparatus and method for developing radiation sensitive devices |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB2041569A true GB2041569A (en) | 1980-09-10 |
| GB2041569B GB2041569B (en) | 1983-02-09 |
Family
ID=10502875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB7903523A Expired GB2041569B (en) | 1979-02-01 | 1979-02-01 | Apparatus and method for developing radiation sensitive devices |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB2041569B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2124409A (en) * | 1982-07-30 | 1984-02-15 | Dainippon Screen Mfg | Method and device for automatically developing photosensitive material |
| US4857430A (en) * | 1987-12-17 | 1989-08-15 | Texas Instruments Incorporated | Process and system for determining photoresist development endpoint by effluent analysis |
| US5541698A (en) * | 1993-11-29 | 1996-07-30 | Agfa-Gevaert N. V. | Apparatus for processing photographic material and a method of regenerating a process liquid therein |
-
1979
- 1979-02-01 GB GB7903523A patent/GB2041569B/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2124409A (en) * | 1982-07-30 | 1984-02-15 | Dainippon Screen Mfg | Method and device for automatically developing photosensitive material |
| US4857430A (en) * | 1987-12-17 | 1989-08-15 | Texas Instruments Incorporated | Process and system for determining photoresist development endpoint by effluent analysis |
| US5541698A (en) * | 1993-11-29 | 1996-07-30 | Agfa-Gevaert N. V. | Apparatus for processing photographic material and a method of regenerating a process liquid therein |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2041569B (en) | 1983-02-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0000995B1 (en) | Apparatus and method for the controlled processing of radiation sensitive devices in dependence upon the temperature of the developer liquid | |
| US4577948A (en) | Method and apparatus for controlling the processing of radiation sensitive plates with a liquid by monitoring the electrical conductivity of the liquid | |
| DE2622327C3 (en) | Electrostatic printing method | |
| DE3328578A1 (en) | PROJECTION ADJUSTMENT | |
| JPS5692536A (en) | Pattern formation method | |
| GB2041569A (en) | Apparatus and method for developing radiation sensitive devices | |
| US2590699A (en) | Drive for photographic material | |
| GB2059813A (en) | Automatic film developer | |
| DE3736549A1 (en) | IMAGE TRANSFER SYSTEM AND RECORDING METHOD FOR PRODUCING IMAGES | |
| US2864725A (en) | Fluid and system for preparing hydrogen sulfide sensitive tape | |
| US6784911B2 (en) | Heat developing apparatus and its control method | |
| GB1599301A (en) | Processing of radiation sensitive devices | |
| JP3008717B2 (en) | Photo printing and developing equipment | |
| DE3322911C2 (en) | Process for automatically developing photosensitive material | |
| JP2922921B2 (en) | Coating device and coating method | |
| JP2002202570A (en) | Image exposure-recording equipment and method | |
| JP2614456B2 (en) | Development processing method | |
| JPH03175510A (en) | Heater temperature controller | |
| US3533694A (en) | Process control strip exposing device | |
| JPS58194033A (en) | Method and device for direct plate making by pulse laser light | |
| JP2566678B2 (en) | Image forming device | |
| JPS581783Y2 (en) | film processing equipment | |
| JP2561484B2 (en) | Photographic roll film, automatic developing device and film image printing device | |
| JPS5922060A (en) | Picture controller of copying machine | |
| JPH0789216B2 (en) | Development method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
| PCNP | Patent ceased through non-payment of renewal fee |