EA200400525A1 - Устройство электрода, способ его изготовления и его применение - Google Patents
Устройство электрода, способ его изготовления и его применениеInfo
- Publication number
- EA200400525A1 EA200400525A1 EA200400525A EA200400525A EA200400525A1 EA 200400525 A1 EA200400525 A1 EA 200400525A1 EA 200400525 A EA200400525 A EA 200400525A EA 200400525 A EA200400525 A EA 200400525A EA 200400525 A1 EA200400525 A1 EA 200400525A1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- electrode
- manufacture
- application
- surface coating
- pore
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/137—Spraying in vacuum or in an inert atmosphere
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/097—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
- C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
- C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
- C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
- C02F2001/46133—Electrodes characterised by the material
- C02F2001/46138—Electrodes comprising a substrate and a coating
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- General Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Coating By Spraying Or Casting (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Secondary Cells (AREA)
- Manufacture Of Alloys Or Alloy Compounds (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Описано устройство электрода, включающего сердечник и поверхностное покрытие из электропроводного материала, которое отличается тем, что это поверхностное покрытие включает один или несколько слоев с беспористой поверхностью, каждый из которых имеет толщину от 0,005 до 0,050 мм и формируется напылением, особенно предпочтительно способом вакуум-плазменного напыления.Международная заявка была опубликована вместе с отчетом о международном поиске.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20014941A NO324550B1 (no) | 2001-10-10 | 2001-10-10 | Anordning ved elektrode, fremgangsmate til fremstilling derav samt anvendelse derav |
PCT/NO2002/000364 WO2003038155A1 (en) | 2001-10-10 | 2002-10-08 | Arrangement of an electrode, method for making same, and use thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
EA200400525A1 true EA200400525A1 (ru) | 2004-12-30 |
EA007032B1 EA007032B1 (ru) | 2006-06-30 |
Family
ID=19912908
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EA200400525A EA007032B1 (ru) | 2001-10-10 | 2002-10-08 | Устройство электрода, способ его изготовления и его применение |
Country Status (12)
Country | Link |
---|---|
US (1) | US7374647B2 (ru) |
EP (1) | EP1446516B1 (ru) |
CN (1) | CN100378251C (ru) |
AT (1) | ATE349558T1 (ru) |
BR (1) | BR0213166A (ru) |
DE (1) | DE60217167T2 (ru) |
DK (1) | DK1446516T3 (ru) |
EA (1) | EA007032B1 (ru) |
ES (1) | ES2279886T3 (ru) |
MX (1) | MXPA04003324A (ru) |
NO (1) | NO324550B1 (ru) |
WO (1) | WO2003038155A1 (ru) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080274372A1 (en) * | 2005-06-15 | 2008-11-06 | Danfoss A/S | Corrosion Resistant Object Having an Outer Layer of a Precious Metal |
DE102005033836B4 (de) * | 2005-07-20 | 2009-11-19 | Institut für Rundfunktechnik GmbH | Verfahren zum Weiterleiten von Nutzungsberechtigungsinformationen |
CN102033144B (zh) * | 2009-09-30 | 2013-10-23 | 株式会社神户制钢所 | 电接点构件 |
US20140209466A1 (en) * | 2013-01-31 | 2014-07-31 | Wyatt Technology Corporation | Corrosion resistant electrodes for electrophoretic mobility measurements and method for their fabrication |
US11072356B2 (en) | 2016-06-30 | 2021-07-27 | Transportation Ip Holdings, Llc | Vehicle control system |
US10819462B2 (en) | 2017-10-23 | 2020-10-27 | General Electric Company | System and method for protecting communication in time-sensitive networks using shared secret information |
US10814893B2 (en) | 2016-03-21 | 2020-10-27 | Ge Global Sourcing Llc | Vehicle control system |
CN110818198B (zh) * | 2019-11-26 | 2022-04-29 | 重庆龙健金属制造有限公司 | 一种高盐重金属废水复合处理方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3071799D1 (en) | 1979-12-26 | 1986-11-20 | Asahi Chemical Ind | A hydrogen-evolution electrode |
EP0213708B1 (en) * | 1985-08-02 | 1993-09-22 | Daiki Engineering Co., Ltd. | Surface activated amorphous and supersaturated solid solution alloys for electrodes in the electrolysis of solutions and the method for their surface activation |
US4702813A (en) * | 1986-12-16 | 1987-10-27 | The Standard Oil Company | Multi-layered amorphous metal-based oxygen anodes |
JPH03116490A (ja) * | 1989-09-28 | 1991-05-17 | Nec Corp | スタティックram |
JP3044797B2 (ja) * | 1991-02-04 | 2000-05-22 | ダイソー株式会社 | 酸素発生用陽極の製法 |
EP0546714B1 (en) | 1991-12-13 | 1999-08-04 | Imperial Chemical Industries Plc | Cathode for use in electrolytic cell |
JP3116490B2 (ja) * | 1991-12-24 | 2000-12-11 | ダイソー株式会社 | 酸素発生用陽極の製法 |
GB9316926D0 (en) * | 1993-08-13 | 1993-09-29 | Ici Plc | Electrode |
JP3259870B2 (ja) * | 1993-08-24 | 2002-02-25 | ペルメレック電極株式会社 | 電解用電極基体及びその製造方法 |
JP3259869B2 (ja) * | 1993-08-24 | 2002-02-25 | ペルメレック電極株式会社 | 電解用電極基体及びその製造方法 |
JPH09125292A (ja) * | 1995-11-01 | 1997-05-13 | Permelec Electrode Ltd | 電極基体 |
RU2140466C1 (ru) | 1996-04-19 | 1999-10-27 | Седельников Николай Георгиевич | Иридиево-титановый электрод и способ его изготовления |
JPH10165956A (ja) * | 1996-12-16 | 1998-06-23 | Hitachi Plant Eng & Constr Co Ltd | 有機成分の除去方法及び装置 |
JP2001181536A (ja) * | 1999-12-22 | 2001-07-03 | Risuisha:Kk | 貴金属含有無機質コーティング剤及びコーティング層 |
-
2001
- 2001-10-10 NO NO20014941A patent/NO324550B1/no not_active IP Right Cessation
-
2002
- 2002-10-08 DE DE60217167T patent/DE60217167T2/de not_active Expired - Lifetime
- 2002-10-08 MX MXPA04003324A patent/MXPA04003324A/es active IP Right Grant
- 2002-10-08 WO PCT/NO2002/000364 patent/WO2003038155A1/en active IP Right Grant
- 2002-10-08 AT AT02770333T patent/ATE349558T1/de not_active IP Right Cessation
- 2002-10-08 EP EP02770333A patent/EP1446516B1/en not_active Expired - Lifetime
- 2002-10-08 EA EA200400525A patent/EA007032B1/ru not_active IP Right Cessation
- 2002-10-08 CN CNB02822342XA patent/CN100378251C/zh not_active Expired - Fee Related
- 2002-10-08 BR BR0213166-8A patent/BR0213166A/pt not_active Application Discontinuation
- 2002-10-08 US US10/491,848 patent/US7374647B2/en not_active Expired - Fee Related
- 2002-10-08 DK DK02770333T patent/DK1446516T3/da active
- 2002-10-08 ES ES02770333T patent/ES2279886T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1446516B1 (en) | 2006-12-27 |
EA007032B1 (ru) | 2006-06-30 |
DK1446516T3 (da) | 2007-05-07 |
NO20014941L (no) | 2003-07-14 |
CN1585837A (zh) | 2005-02-23 |
DE60217167T2 (de) | 2007-10-31 |
NO20014941D0 (no) | 2001-10-10 |
BR0213166A (pt) | 2004-09-14 |
WO2003038155A1 (en) | 2003-05-08 |
NO324550B1 (no) | 2007-11-19 |
US7374647B2 (en) | 2008-05-20 |
DE60217167D1 (de) | 2007-02-08 |
MXPA04003324A (es) | 2005-01-25 |
ES2279886T3 (es) | 2007-09-01 |
US20040251129A1 (en) | 2004-12-16 |
ATE349558T1 (de) | 2007-01-15 |
EP1446516A1 (en) | 2004-08-18 |
CN100378251C (zh) | 2008-04-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): AM AZ BY KZ KG MD TJ TM |
|
MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): RU |