DK53087A - Fremgangsmaade til fremstilling af carbonfilm - Google Patents
Fremgangsmaade til fremstilling af carbonfilmInfo
- Publication number
- DK53087A DK53087A DK053087A DK53087A DK53087A DK 53087 A DK53087 A DK 53087A DK 053087 A DK053087 A DK 053087A DK 53087 A DK53087 A DK 53087A DK 53087 A DK53087 A DK 53087A
- Authority
- DK
- Denmark
- Prior art keywords
- movies
- procedure
- making carbon
- carbon
- making
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1956686A JPH079059B2 (ja) | 1986-01-31 | 1986-01-31 | 炭素薄膜の製造方法 |
JP1956686 | 1986-01-31 | ||
JP1956986 | 1986-01-31 | ||
JP1956886 | 1986-01-31 | ||
JP1956786 | 1986-01-31 | ||
JP1957086 | 1986-01-31 | ||
JP61019567A JPS62180054A (ja) | 1986-01-31 | 1986-01-31 | 炭素薄膜の製造方法 |
JP61019568A JPS62180055A (ja) | 1986-01-31 | 1986-01-31 | 炭素薄膜の製造方法 |
JP61019570A JPS62180057A (ja) | 1986-01-31 | 1986-01-31 | 炭素薄膜の製造方法 |
JP61019569A JPH0742570B2 (ja) | 1986-01-31 | 1986-01-31 | 炭素薄膜の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
DK53087D0 DK53087D0 (da) | 1987-02-02 |
DK53087A true DK53087A (da) | 1987-08-01 |
DK168337B1 DK168337B1 (da) | 1994-03-14 |
Family
ID=27520149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK053087A DK168337B1 (da) | 1986-01-31 | 1987-02-02 | Fremgangsmåde til fremstilling af carbonhinder |
Country Status (6)
Country | Link |
---|---|
US (1) | US5073241A (da) |
EP (1) | EP0231894B1 (da) |
KR (1) | KR940002750B1 (da) |
CA (1) | CA1309057C (da) |
DE (1) | DE3775076D1 (da) |
DK (1) | DK168337B1 (da) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5275850A (en) * | 1988-04-20 | 1994-01-04 | Hitachi, Ltd. | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias |
DE3821614A1 (de) * | 1988-06-27 | 1989-12-28 | Licentia Gmbh | Deckschicht aus amorphem kohlenstoff auf einem substrat, verfahren zur herstellung der deckschicht und verwendung der deckschicht |
US5266409A (en) * | 1989-04-28 | 1993-11-30 | Digital Equipment Corporation | Hydrogenated carbon compositions |
US5045165A (en) * | 1990-02-01 | 1991-09-03 | Komag, Inc. | Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk |
US5232570A (en) * | 1991-06-28 | 1993-08-03 | Digital Equipment Corporation | Nitrogen-containing materials for wear protection and friction reduction |
US5281851A (en) * | 1992-10-02 | 1994-01-25 | Hewlett-Packard Company | Integrated circuit packaging with reinforced leads |
JPH06279185A (ja) * | 1993-03-25 | 1994-10-04 | Canon Inc | ダイヤモンド結晶およびダイヤモンド結晶膜の形成方法 |
TW366367B (en) * | 1995-01-26 | 1999-08-11 | Ibm | Sputter deposition of hydrogenated amorphous carbon film |
RU2095464C1 (ru) * | 1996-01-12 | 1997-11-10 | Акционерное общество закрытого типа "Тетра" | Биокарбон, способ его получения и устройство для его осуществления |
US5827408A (en) * | 1996-07-26 | 1998-10-27 | Applied Materials, Inc | Method and apparatus for improving the conformality of sputter deposited films |
US6063246A (en) * | 1997-05-23 | 2000-05-16 | University Of Houston | Method for depositing a carbon film on a membrane |
US6835279B2 (en) * | 1997-07-30 | 2004-12-28 | Hitachi Kokusai Electric Inc. | Plasma generation apparatus |
US6352430B1 (en) | 1998-10-23 | 2002-03-05 | Goodrich Corporation | Method and apparatus for cooling a CVI/CVD furnace |
US6440220B1 (en) * | 1998-10-23 | 2002-08-27 | Goodrich Corporation | Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation |
US6162298A (en) * | 1998-10-28 | 2000-12-19 | The B. F. Goodrich Company | Sealed reactant gas inlet for a CVI/CVD furnace |
US6964731B1 (en) | 1998-12-21 | 2005-11-15 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US6660365B1 (en) | 1998-12-21 | 2003-12-09 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
US6974629B1 (en) | 1999-08-06 | 2005-12-13 | Cardinal Cg Company | Low-emissivity, soil-resistant coating for glass surfaces |
DE60005888T2 (de) | 1999-06-04 | 2004-07-29 | Goodrich Corp. | Verfahren und Vorrichtung zur Druckmessung in einer CVD/CVI-Kammer |
EP1063319B1 (en) | 1999-06-04 | 2005-12-07 | Goodrich Corporation | Method and apparatus for cooling a CVI/CVD furnace |
EP1063318B1 (en) | 1999-06-04 | 2004-08-25 | Goodrich Corporation | Combination CVI/CVD and heat treat susceptor lid |
BR0105474A (pt) * | 2001-09-26 | 2003-09-23 | Fundacao De Amparo A Pesquisa | Processo de deposição de filme de carbono amorfo hidrogenado, filme de carbono amorfo hidrogenado e artigo revestido com filme de carbono amorfo hidrogenado |
KR20030064942A (ko) * | 2002-01-29 | 2003-08-06 | 오승준 | 스크래치 방지막을 가지는 조리 기구 및 그 제조방법 |
US7294404B2 (en) | 2003-12-22 | 2007-11-13 | Cardinal Cg Company | Graded photocatalytic coatings |
CA2570369C (en) | 2004-07-12 | 2008-02-19 | Cardinal Cg Company | Low-maintenance coatings |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
DE102005057833B4 (de) * | 2005-01-12 | 2016-11-17 | Frato Gmbh | Aromabehältnis oder Aromafolie aus Aluminium |
EP1911859A4 (en) * | 2005-07-04 | 2009-08-05 | Nat Inst Of Advanced Ind Scien | CARBON FILM |
US7989094B2 (en) * | 2006-04-19 | 2011-08-02 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
EP2261186B1 (en) | 2007-09-14 | 2017-11-22 | Cardinal CG Company | Low maintenance coating technology |
EP2279283A1 (de) * | 2008-03-27 | 2011-02-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur herstellung eines mehrkomponentigen, polymer- und metallhaltigen schichtsystems, vorrichtung und beschichteter gegenstand |
CN102102171A (zh) * | 2011-01-28 | 2011-06-22 | 南通扬子碳素股份有限公司 | 表面沉积非晶碳薄膜降低石墨电极消耗的方法 |
US9763287B2 (en) * | 2011-11-30 | 2017-09-12 | Michael R. Knox | Single mode microwave device for producing exfoliated graphite |
DE112013002366A5 (de) * | 2012-06-22 | 2015-02-26 | Von Ardenne Gmbh | Verfahren und Vorrichtung zur Vorbehandlung eines beschichteten oder unbeschichteten Substrats |
WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
KR20200102484A (ko) * | 2017-12-27 | 2020-08-31 | 가부시키가이샤 알박 | 스퍼터링 방법 및 스퍼터링 장치 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU411037A1 (ru) * | 1971-10-28 | 1974-08-05 | В. М. Гол ЯНОВ , А. П. Демидов | Способ получения искусственных алмазов |
US4365015A (en) * | 1979-08-20 | 1982-12-21 | Canon Kabushiki Kaisha | Photosensitive member for electrophotography composed of a photoconductive amorphous silicon |
US4414085A (en) * | 1981-10-08 | 1983-11-08 | Wickersham Charles E | Method of depositing a high-emissivity layer |
US4486286A (en) * | 1982-09-28 | 1984-12-04 | Nerken Research Corp. | Method of depositing a carbon film on a substrate and products obtained thereby |
CA1235087A (en) * | 1983-11-28 | 1988-04-12 | Akio Hiraki | Diamond-like thin film and method for making the same |
CA1232228A (en) * | 1984-03-13 | 1988-02-02 | Tatsuro Miyasato | Coating film and method and apparatus for producing the same |
US4565711A (en) * | 1984-06-29 | 1986-01-21 | Wedtech Corp. | Method of and apparatus for the coating of quartz crucibles with protective layers |
-
1987
- 1987-01-28 US US07/007,747 patent/US5073241A/en not_active Expired - Fee Related
- 1987-01-30 CA CA000528655A patent/CA1309057C/en not_active Expired - Fee Related
- 1987-01-30 DE DE8787101271T patent/DE3775076D1/de not_active Expired - Fee Related
- 1987-01-30 EP EP87101271A patent/EP0231894B1/en not_active Expired - Lifetime
- 1987-01-31 KR KR1019870000779A patent/KR940002750B1/ko not_active IP Right Cessation
- 1987-02-02 DK DK053087A patent/DK168337B1/da not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DK168337B1 (da) | 1994-03-14 |
EP0231894B1 (en) | 1991-12-11 |
KR940002750B1 (ko) | 1994-04-02 |
DE3775076D1 (de) | 1992-01-23 |
EP0231894A1 (en) | 1987-08-12 |
KR870007298A (ko) | 1987-08-18 |
DK53087D0 (da) | 1987-02-02 |
US5073241A (en) | 1991-12-17 |
CA1309057C (en) | 1992-10-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B1 | Patent granted (law 1993) | ||
PBP | Patent lapsed |