DK2906739T3 - Apparat og fremgangsmåde til påføring af overfladecoatinger - Google Patents

Apparat og fremgangsmåde til påføring af overfladecoatinger Download PDF

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Publication number
DK2906739T3
DK2906739T3 DK13776455.1T DK13776455T DK2906739T3 DK 2906739 T3 DK2906739 T3 DK 2906739T3 DK 13776455 T DK13776455 T DK 13776455T DK 2906739 T3 DK2906739 T3 DK 2906739T3
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Denmark
Prior art keywords
plasma chamber
electrode layers
fabric
electrode
plasma
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DK13776455.1T
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English (en)
Inventor
Eva Rogge
Filip Legein
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Europlasma Nv
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Priority claimed from GB201218054A external-priority patent/GB201218054D0/en
Priority claimed from GBGB1316113.8A external-priority patent/GB201316113D0/en
Application filed by Europlasma Nv filed Critical Europlasma Nv
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Publication of DK2906739T3 publication Critical patent/DK2906739T3/da

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/52—Polymerisation initiated by wave energy or particle radiation by electric discharge, e.g. voltolisation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32403—Treating multiple sides of workpieces, e.g. 3D workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/04—Additives and treatments of the filtering material
    • B01D2239/0471—Surface coating material
    • B01D2239/0478—Surface coating material on a layer of the filter
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)

Claims (13)

1. Plasmakammer (10) til coating af en bane af stof (16), såsom et tekstilmateriale, med et polymerlag, idet plasmakammeret har en flerhed af elektrodelag (RF, M) 5 hver med en generelt plan- eller pladelignende form anbragt successivt inde i plasmakammeret, flerheden af elektrodelag omfattende et par radiofrekvenselektrodelag (RF) og et par jordelektrodelag (M), hvor mindst to tilgrænsende elektrodelag enten er radiofrekvenselektrodelag eller jordelektrodelag, hvor elektrodelagene er anbragt på hver side af en passage til at modtage et stof, og hvor plasmakammeret omfatter en flerhed af ruller (101, 102) til at lede en bane af stof, i brug, mellem elektrodelagene.
2. Plasmakammer ifølge krav 1, omfattende et første elektrodesæt og et andet elektrodesæt, de første og anden elektrodesæt er anbragt på hver side af en passage til at modtage et stof, elektrodesættene omfattende et indre elektrodelag og et par af ydre elektrodelag, hvor de første og anden elektrodesæt har enten det indre elektrodelag værende en radiofrekvenselektrode og de ydre elektrodelag værende jordelektroder, eller det indre elektrodelag værende en jordelektrode og de ydre elektrodelag værende radiofrekvenselektroder.
3. Plasmakammer ifølge et hvilket som helst af de foregående krav, hvor radiofrekvenselektrodelagene omfatter varmereguleringsorgan (21).
4. Plasmakammer ifølge et hvilket som helst af de foregående krav, yderligere omfattende ét eller flere rum (12,14), det ene eller hvert rum tilpasset til at modtage én eller flere ruller (120, 140) stof.
5. Plasmakammer ifølge et hvilket som helst af de foregående krav hvor rullerne er indrettet til at virke til at bevæge stoffet til at blive afrullet eller oprullet ved en hastighed på mellem 0,1 m/min og 20 m/min.
6. Plasmakammer ifølge et hvilket som helst af de foregående krav, hvor rullerne er operable til at blive drevet uafhængigt af hinanden og fin-indstillelige uafhængigt af hinanden.
7. Plasmakammer ifølge et hvilket som helst af de foregående krav, hvor rullerne er i stand til at blive afkølet eller opvarmet til at bidrage til en mere i det væsentlige ensartet temperatur i plasmakammeret og derved undgå kondensation af monomeren inde i plasmakammeret, fortrinsvis hvor afkølingen eller opvarmningen er tilvejebragt ved hjælp af væske fx vand eller olie, mere fortrinsvis hvor rullerne kan opvarmes fra 20°C til 85°C.
8. Plasmakammer ifølge et hvilket som helst af de foregående krav, med én eller flere vejeceller der kan kalibreres så snart et forudbestemt lavbasistryk nås og før det første bearbejdningstrin.
9. Plasmakammer ifølge krav 8, hvor for hver individuel coatingkørsel kalibreres vejecellerne så snart basistrykket nås og før det første bearbejdningstrin, fx før udgasning, eller før gasindløbet og før tilslutning af det elektromagnetiske felt til en forbehandling, eller før gasindløbet og før tilslutning af det elektromagnetiske felt til coatingtrinnet, uanset hvilket måtte komme først.
10. Plasmakammer ifølge et hvilket som helst af kravene 8 eller 9, hvor, i brug, spændingen ved hvilken stoffet er opviklet er mellem 0,2 til 250 kg (2 til 2500 N).
11. Fremgangsmåde til coating af en bane af stof (16), såsom et tekstilmateriale, med et polymerlag, hvilken fremgangsmåde omfatter trinnene at tilvejebringe et plasmakammer (10) 25 med flerhed af elektrodelag (RF, M) anbragt successivt inde i plasmakammeret, plasmakammeret omfattende et par radiofrekvens-elektrodelag (RF) og et par jordelektrodelag (M), hvor mindst to tilgrænsende elektrodelag er radiofrekvenselektrodelag eller mindst to tilgrænsende elektrodelag er jordelektrodelag; og føre en bane stof mellem disse elektrodelag.
12. Fremgangsmåde ifølge krav 11, hvor trinnet at lede en bane stof mellem disse involverer anvendelsen af en flerhed af ruller (101, 102).
13. En bane stof (16) coatet med et polymerlag under anvendelse af et plasmakammer (10) ifølge et hvilket som helst af kravene 1 til 10, og/eller under anvendelse af fremgangsmåden ifølge et hvilket som helst af kravene 11 eller 12.
DK13776455.1T 2012-10-09 2013-10-09 Apparat og fremgangsmåde til påføring af overfladecoatinger DK2906739T3 (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB201218054A GB201218054D0 (en) 2012-10-09 2012-10-09 Apparatus and method of using same
GBGB1316113.8A GB201316113D0 (en) 2013-09-10 2013-09-10 Apparatus and method for applying surface coatings
PCT/EP2013/071020 WO2014056968A1 (en) 2012-10-09 2013-10-09 Apparatus and method for applying surface coatings

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DK2906739T3 true DK2906739T3 (da) 2017-03-13

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US (1) US10366868B2 (da)
EP (1) EP2906739B1 (da)
JP (2) JP2016502588A (da)
KR (1) KR102184276B1 (da)
CN (1) CN104822859B (da)
AU (1) AU2013328747A1 (da)
BR (1) BR112015007957A2 (da)
CA (1) CA2887871A1 (da)
DK (1) DK2906739T3 (da)
IL (1) IL238193A0 (da)
RU (1) RU2015117763A (da)
WO (1) WO2014056968A1 (da)

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GB201316113D0 (en) * 2013-09-10 2013-10-23 Europlasma Nv Apparatus and method for applying surface coatings
EP3101170B1 (en) 2015-06-03 2018-08-22 Europlasma NV Surface coatings
CN107177835B (zh) * 2017-05-21 2018-06-19 江苏菲沃泰纳米科技有限公司 一种循环大占空比脉冲放电制备多功能性纳米防护涂层的方法
WO2020168382A1 (en) * 2019-02-19 2020-08-27 Xefco Pty Ltd System for treatment and/or coating of substrates
CN114502252A (zh) * 2019-10-24 2022-05-13 纱帝股份公司 一种用于制备复合过滤介质的方法和用该方法获得的复合过滤介质
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CA2887871A1 (en) 2014-04-17
BR112015007957A2 (pt) 2017-07-04
CN104822859A (zh) 2015-08-05
JP2016502588A (ja) 2016-01-28
EP2906739A1 (en) 2015-08-19
AU2013328747A1 (en) 2015-05-28
JP2019035153A (ja) 2019-03-07
EP2906739B1 (en) 2016-11-30
KR102184276B1 (ko) 2020-12-01
KR20150065890A (ko) 2015-06-15
US10366868B2 (en) 2019-07-30
US20150255252A1 (en) 2015-09-10
CN104822859B (zh) 2019-03-12
WO2014056968A1 (en) 2014-04-17
IL238193A0 (en) 2015-05-31
JP6998852B2 (ja) 2022-01-18
RU2015117763A (ru) 2016-12-10

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