DK1357577T3 - Buecoatingfremgangsmåde med roterende katoder - Google Patents

Buecoatingfremgangsmåde med roterende katoder

Info

Publication number
DK1357577T3
DK1357577T3 DK02008914T DK02008914T DK1357577T3 DK 1357577 T3 DK1357577 T3 DK 1357577T3 DK 02008914 T DK02008914 T DK 02008914T DK 02008914 T DK02008914 T DK 02008914T DK 1357577 T3 DK1357577 T3 DK 1357577T3
Authority
DK
Denmark
Prior art keywords
magnetic field
field source
cathode
relation
coating
Prior art date
Application number
DK02008914T
Other languages
Danish (da)
English (en)
Inventor
Marcus Morstein
Tibor Cselle
Pavel Holubar
Peter Bloesch
Mojmir Jilek
Original Assignee
Pivot A S
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pivot A S filed Critical Pivot A S
Application granted granted Critical
Publication of DK1357577T3 publication Critical patent/DK1357577T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Inert Electrodes (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Coating By Spraying Or Casting (AREA)
DK02008914T 2002-04-22 2002-04-22 Buecoatingfremgangsmåde med roterende katoder DK1357577T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02008914A EP1357577B1 (de) 2002-04-22 2002-04-22 Bogenbeschichtung mit Drehkathoden

Publications (1)

Publication Number Publication Date
DK1357577T3 true DK1357577T3 (da) 2008-06-02

Family

ID=28685867

Family Applications (1)

Application Number Title Priority Date Filing Date
DK02008914T DK1357577T3 (da) 2002-04-22 2002-04-22 Buecoatingfremgangsmåde med roterende katoder

Country Status (7)

Country Link
US (1) US6926811B2 (de)
EP (1) EP1357577B1 (de)
AT (1) ATE386334T1 (de)
DE (1) DE60224984T2 (de)
DK (1) DK1357577T3 (de)
ES (1) ES2300396T3 (de)
PT (1) PT1357577E (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2410255A (en) * 2004-01-21 2005-07-27 Nanofilm Technologies Int Arc deposition method and apparatus
CN100577874C (zh) 2004-04-19 2010-01-06 皮沃特公司 硬质耐磨的氮化铝基涂层
EP1628322A1 (de) * 2004-08-17 2006-02-22 Applied Films GmbH & Co. KG Haltevorrichtung für eine Blende
ES2774167T3 (es) * 2008-09-02 2020-07-17 Oerlikon Surface Solutions Ag Pfaeffikon Dispositivo de revestimiento para el revestimiento de un sustrato, así como un procedimiento para el revestimiento de un sustrato
EP2163661B1 (de) 2008-09-05 2012-08-01 LMT Fette Werkzeugtechnik GmbH & Co. KG Wälzfräswerkzeug mit einer Beschichtung und Verfahren zur Neubeschichtung eines Wälzfräswerkzeuges
CZ304905B6 (cs) * 2009-11-23 2015-01-14 Shm, S.R.O. Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu
EP2521159A1 (de) 2011-05-06 2012-11-07 Pivot a.s. Glimmentladungsvorrichtung und Verfahren mit seitlich rotierenden Lichtbogenkathoden
US9761424B1 (en) 2011-09-07 2017-09-12 Nano-Product Engineering, LLC Filtered cathodic arc method, apparatus and applications thereof
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
WO2014151788A1 (en) 2013-03-15 2014-09-25 United Technologies Corporation Spallation-resistant thermal barrier coating
RU2554252C2 (ru) * 2013-11-18 2015-06-27 Аскар Джамилевич Мингажев Способ нанесения покрытия и электродуговой испаритель для осуществления способа

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179351A (en) * 1976-09-09 1979-12-18 Hewlett-Packard Company Cylindrical magnetron sputtering source
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
NL8700620A (nl) * 1987-03-16 1988-10-17 Hauzer Holding Kathode boogverdampingsinrichting alsmede werkwijze voor het bedrijven daarvan.
EP0298157B1 (de) * 1987-06-29 1992-09-02 Hauzer Holding B.V. Verfahren und Vorrichtung zur Beschichtung von Aushöhlungen von Gegenständen
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus

Also Published As

Publication number Publication date
PT1357577E (pt) 2008-04-22
ATE386334T1 (de) 2008-03-15
DE60224984T2 (de) 2009-02-12
US6926811B2 (en) 2005-08-09
DE60224984D1 (de) 2008-03-27
US20040007455A1 (en) 2004-01-15
EP1357577B1 (de) 2008-02-13
EP1357577A8 (de) 2003-12-17
ES2300396T3 (es) 2008-06-16
EP1357577A1 (de) 2003-10-29

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