DK129950B - Fremgangsmåde og apparat til vakuumovertrækning af genstande af f.eks. metal, keramik, plastmateriale ved forstøvning med tynde lag af ledende eller halvledende materiale. - Google Patents

Fremgangsmåde og apparat til vakuumovertrækning af genstande af f.eks. metal, keramik, plastmateriale ved forstøvning med tynde lag af ledende eller halvledende materiale.

Info

Publication number
DK129950B
DK129950B DK643766AA DK643766A DK129950B DK 129950 B DK129950 B DK 129950B DK 643766A A DK643766A A DK 643766AA DK 643766 A DK643766 A DK 643766A DK 129950 B DK129950 B DK 129950B
Authority
DK
Denmark
Prior art keywords
ceramics
sputtering
conductive
metal
thin layers
Prior art date
Application number
DK643766AA
Other languages
Danish (da)
English (en)
Other versions
DK129950C (pt
Inventor
J Wurm
P Beucherie
M Block
Original Assignee
Euratom
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Euratom filed Critical Euratom
Publication of DK129950B publication Critical patent/DK129950B/da
Application granted granted Critical
Publication of DK129950C publication Critical patent/DK129950C/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Closures For Containers (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DK643766AA 1965-12-17 1966-12-12 Fremgangsmåde og apparat til vakuumovertrækning af genstande af f.eks. metal, keramik, plastmateriale ved forstøvning med tynde lag af ledende eller halvledende materiale. DK129950B (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
BE21744 1965-12-17
CH1750265A CH456294A (de) 1965-12-17 1965-12-18 Anordnung zur Zerstäubung von Stoffen mittels einer elektrischen Niederspannungsentladung
DE19742459030 DE2459030B2 (de) 1965-12-17 1974-12-13 Sicherheitsverschluss fuer behaelter

Publications (2)

Publication Number Publication Date
DK129950B true DK129950B (da) 1974-12-02
DK129950C DK129950C (pt) 1975-05-20

Family

ID=27158372

Family Applications (2)

Application Number Title Priority Date Filing Date
DK643766AA DK129950B (da) 1965-12-17 1966-12-12 Fremgangsmåde og apparat til vakuumovertrækning af genstande af f.eks. metal, keramik, plastmateriale ved forstøvning med tynde lag af ledende eller halvledende materiale.
DK565675A DK136767C (da) 1965-12-17 1975-12-12 Sikkerhedslukke for beholdere,isaer for kemikalie og medicinflasker

Family Applications After (1)

Application Number Title Priority Date Filing Date
DK565675A DK136767C (da) 1965-12-17 1975-12-12 Sikkerhedslukke for beholdere,isaer for kemikalie og medicinflasker

Country Status (17)

Country Link
US (3) US3540993A (pt)
JP (1) JPS5184381A (pt)
AR (1) AR207605A1 (pt)
BE (2) BE673939A (pt)
CH (3) CH456294A (pt)
DD (1) DD122355A5 (pt)
DE (3) DE1515296A1 (pt)
DK (2) DK129950B (pt)
ES (1) ES330812A1 (pt)
FR (3) FR1505170A (pt)
GB (3) GB1162832A (pt)
IT (1) IT1051344B (pt)
LU (1) LU51389A1 (pt)
NL (3) NL6600953A (pt)
NO (1) NO116568B (pt)
SE (3) SE320247B (pt)
SU (1) SU569277A3 (pt)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1765850A1 (de) * 1967-11-10 1971-10-28 Euratom Verfahren und Vorrichtung zum Aufbringen von duennen Schichten
US3669871A (en) * 1969-09-10 1972-06-13 Ibm Sputtering apparatus having a concave source cathode
BE766345A (fr) * 1971-04-27 1971-09-16 Universitaire De L Etat A Mons Dispositif pour fabriquer des couches minces de substances minerales.
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere
CH551497A (de) * 1971-10-06 1974-07-15 Balzers Patent Beteilig Ag Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung.
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
DE2735525A1 (de) * 1977-08-06 1979-02-22 Leybold Heraeus Gmbh & Co Kg Katodenanordnung mit target fuer zerstaeubungsanlagen zum aufstaeuben dielektrischer oder amagnetischer schichten auf substrate
JPS57174467A (en) * 1981-04-20 1982-10-27 Inoue Japax Res Inc Ion working device
DE3206421A1 (de) * 1982-02-23 1983-09-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase
GB2138410B (en) * 1983-04-22 1986-07-16 Metal Closures Group Plc Safety closure with click mechanism
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4559125A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Apparatus for evaporation arc stabilization during the initial clean-up of an arc target
US4491509A (en) * 1984-03-09 1985-01-01 At&T Technologies, Inc. Methods of and apparatus for sputtering material onto a substrate
US4489834A (en) * 1984-07-02 1984-12-25 Thackrey James D Counting cap for medicine bottles
IT1181798B (it) * 1984-12-13 1987-09-30 Taplast Di Evans Santagiuliana Tappo per bottiglie con sigillo e apertura di sicurezza realizzato preferibilmente in materia plastica
DE3503398A1 (de) * 1985-02-01 1986-08-07 W.C. Heraeus Gmbh, 6450 Hanau Sputteranlage zum reaktiven beschichten eines substrates mit hartstoffen
US5020681A (en) * 1990-02-01 1991-06-04 Owens-Illinois Closure Inc. Child resistant closure
AU662349B2 (en) * 1991-07-30 1995-08-31 Warner-Lambert Company Tamper-evident cap for a container
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
JPH07257425A (ja) * 1994-03-18 1995-10-09 Honda Motor Co Ltd 自動車用車体のサブフレーム取付け構造
DE19625577A1 (de) * 1996-06-27 1998-01-02 Vaw Motor Gmbh Aluminium-Gußteil und Verfahren zu seiner Herstellung
US5917285A (en) * 1996-07-24 1999-06-29 Georgia Tech Research Corporation Apparatus and method for reducing operating voltage in gas discharge devices
US6217715B1 (en) * 1997-02-06 2001-04-17 Applied Materials, Inc. Coating of vacuum chambers to reduce pump down time and base pressure
IT1291620B1 (it) * 1997-04-18 1999-01-11 Phaba Srl Chiusura antibambino per flaconi in genere ad azionamento facilitato e a sicurezza incrementata
US6382444B1 (en) * 1999-03-17 2002-05-07 Sentinel Packaging Systems, Inc. Tamper-evident plastic closure system with snap-on band
US6551471B1 (en) 1999-11-30 2003-04-22 Canon Kabushiki Kaisha Ionization film-forming method and apparatus
FR2814724B1 (fr) * 2000-10-04 2003-04-04 Airsec Sa Dispositif de fermeture de securite a l'epreuve d'enfants par vissage d'un conteneur muni d'une embouchure a filet de vis
US7141145B2 (en) * 2003-10-02 2006-11-28 Seagate Technology Llc Gas injection for uniform composition reactively sputter-deposited thin films
US20050145086A1 (en) * 2004-01-05 2005-07-07 Mohr Monte D. Combination pencil sharpener bottle cap
IT1394229B1 (it) * 2009-04-16 2012-06-01 Tapi S R L Tappo a vite per contenitori per liquidi
EP3260390B1 (en) * 2016-06-22 2019-12-04 Clariant Healthcare Packaging (France) SAS Outer cap for a child-resistant closure, child-resistant closure, container with such closure and its use

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2069835A (en) * 1935-04-25 1937-02-09 Bell Telephone Labor Inc Coating apparatus
NL46111C (pt) * 1935-10-12
NL50072C (pt) * 1935-12-28
DE672664C (de) * 1936-06-17 1939-03-08 Bernhard Berghaus Verfahren zur Kathodenzerstaeubung mittels zusaetzlich geheizter Kathode
US2920002A (en) * 1952-06-25 1960-01-05 Auwarter Max Process for the manufacture of thin films
US3021271A (en) * 1959-04-27 1962-02-13 Gen Mills Inc Growth of solid layers on substrates which are kept under ion bombardment before and during deposition
US3250694A (en) * 1962-10-17 1966-05-10 Ibm Apparatus for coating articles by cathode sputtering
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3386909A (en) * 1964-12-08 1968-06-04 Air Force Usa Apparatus for depositing material on a filament from ionized coating material
US3369990A (en) * 1964-12-31 1968-02-20 Ibm Cathodic sputtering apparatus including thermionic means for increasing sputtering efficiency
US3287243A (en) * 1965-03-29 1966-11-22 Bell Telephone Labor Inc Deposition of insulating films by cathode sputtering in an rf-supported discharge
US3394829A (en) * 1967-04-10 1968-07-30 Harris M. Peterson Safety cap
US3857505A (en) * 1973-10-01 1974-12-31 Owens Illinois Inc Safety closure

Also Published As

Publication number Publication date
ES330812A1 (es) 1969-08-16
DE1515296A1 (de) 1969-08-14
US3540993A (en) 1970-11-17
GB1162832A (en) 1969-08-27
NL149234B (nl) 1976-04-15
GB1505170A (en) 1978-03-30
NL6600953A (pt) 1967-06-19
LU51389A1 (pt) 1966-08-22
SU569277A3 (ru) 1977-08-15
DK136767B (da) 1977-11-21
CH593836A5 (pt) 1977-12-15
DK129950C (pt) 1975-05-20
DE1515294C3 (de) 1973-01-04
BE673939A (pt) 1966-06-17
NL6610803A (pt) 1967-06-19
DD122355A5 (pt) 1976-10-05
US3516919A (en) 1970-06-23
GB1113579A (en) 1968-05-15
JPS5184381A (pt) 1976-07-23
FR1502647A (pt) 1968-02-07
SE423520B (sv) 1982-05-10
FR2294100B1 (pt) 1982-03-19
DE1515294B2 (de) 1972-06-08
BE691083A (pt) 1967-05-16
SE320247B (pt) 1970-02-02
DE1515294A1 (de) 1969-08-14
DK136767C (da) 1978-05-08
NL130959C (pt)
FR1505170A (fr) 1967-12-08
FR2294100A1 (fr) 1976-07-09
AR207605A1 (es) 1976-10-15
IT1051344B (it) 1981-04-21
NO116568B (pt) 1969-04-14
DE2459030B2 (de) 1976-11-11
DE2459030A1 (de) 1976-06-24
CH456294A (de) 1968-05-15
SE324684B (pt) 1970-06-08
SE7513992L (sv) 1976-06-14
CH478255A (fr) 1969-09-15
DK565675A (da) 1976-06-14
US3972436A (en) 1976-08-03

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