DK1258990T3 - Fremgangsmåde og system til afstemning på waferniveau af akustiske volumenbölgeresonatorer og -filtre - Google Patents

Fremgangsmåde og system til afstemning på waferniveau af akustiske volumenbölgeresonatorer og -filtre

Info

Publication number
DK1258990T3
DK1258990T3 DK02008098T DK02008098T DK1258990T3 DK 1258990 T3 DK1258990 T3 DK 1258990T3 DK 02008098 T DK02008098 T DK 02008098T DK 02008098 T DK02008098 T DK 02008098T DK 1258990 T3 DK1258990 T3 DK 1258990T3
Authority
DK
Denmark
Prior art keywords
filters
wafer level
wave resonators
tuning method
acoustic volume
Prior art date
Application number
DK02008098T
Other languages
English (en)
Inventor
Juha Ellae
Pasi Tikka
Jyrki Kaitila
Original Assignee
Nokia Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nokia Corp filed Critical Nokia Corp
Application granted granted Critical
Publication of DK1258990T3 publication Critical patent/DK1258990T3/da

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414Resonance frequency
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414Resonance frequency
    • H03H2003/0478Resonance frequency in a process for mass production
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/42Piezoelectric device making

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
DK02008098T 2001-04-27 2002-04-11 Fremgangsmåde og system til afstemning på waferniveau af akustiske volumenbölgeresonatorer og -filtre DK1258990T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/844,264 US6441702B1 (en) 2001-04-27 2001-04-27 Method and system for wafer-level tuning of bulk acoustic wave resonators and filters

Publications (1)

Publication Number Publication Date
DK1258990T3 true DK1258990T3 (da) 2008-03-17

Family

ID=25292248

Family Applications (1)

Application Number Title Priority Date Filing Date
DK02008098T DK1258990T3 (da) 2001-04-27 2002-04-11 Fremgangsmåde og system til afstemning på waferniveau af akustiske volumenbölgeresonatorer og -filtre

Country Status (4)

Country Link
US (1) US6441702B1 (da)
EP (1) EP1258990B1 (da)
JP (1) JP4171241B2 (da)
DK (1) DK1258990T3 (da)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19947081A1 (de) * 1999-09-30 2001-04-05 Infineon Technologies Ag Akustischer Spiegel und Verfahren zu dessen Herstellung
GB0012439D0 (en) * 2000-05-24 2000-07-12 Univ Cranfield Improvements to filters
US20020074897A1 (en) * 2000-12-15 2002-06-20 Qing Ma Micro-electromechanical structure resonator frequency adjustment using radient energy trimming and laser/focused ion beam assisted deposition
US6601276B2 (en) * 2001-05-11 2003-08-05 Agere Systems Inc. Method for self alignment of patterned layers in thin film acoustic devices
WO2002095085A1 (de) * 2001-05-22 2002-11-28 Infineon Technologies Ag Frequenzabgleich für bulk-acoustic-wave resonatoren durch lokales ionenstrahlätzen
US7275292B2 (en) * 2003-03-07 2007-10-02 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Method for fabricating an acoustical resonator on a substrate
US20040227578A1 (en) * 2003-05-14 2004-11-18 Miikka Hamalainen Acoustic resonance-based frequency synthesizer using at least one bulk acoustic wave (BAW) or thin film bulk acoustic wave (FBAR) device
US7262070B2 (en) 2003-09-29 2007-08-28 Intel Corporation Method to make a weight compensating/tuning layer on a substrate
KR100568284B1 (ko) * 2003-12-09 2006-04-05 삼성전기주식회사 Fbar 소자의 주파수 튜닝 방법 및 이를 포함한 제조방법
US7114252B2 (en) * 2004-06-17 2006-10-03 Toko, Inc. Large scale simultaneous circuit encapsulating apparatus
US20060017352A1 (en) * 2004-07-20 2006-01-26 Aram Tanielian Thin device and method of fabrication
US7388454B2 (en) 2004-10-01 2008-06-17 Avago Technologies Wireless Ip Pte Ltd Acoustic resonator performance enhancement using alternating frame structure
US8981876B2 (en) 2004-11-15 2015-03-17 Avago Technologies General Ip (Singapore) Pte. Ltd. Piezoelectric resonator structures and electrical filters having frame elements
US7202560B2 (en) 2004-12-15 2007-04-10 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Wafer bonding of micro-electro mechanical systems to active circuitry
US7791434B2 (en) 2004-12-22 2010-09-07 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Acoustic resonator performance enhancement using selective metal etch and having a trench in the piezoelectric
US7369013B2 (en) 2005-04-06 2008-05-06 Avago Technologies Wireless Ip Pte Ltd Acoustic resonator performance enhancement using filled recessed region
US7868522B2 (en) * 2005-09-09 2011-01-11 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Adjusted frequency temperature coefficient resonator
US7737807B2 (en) * 2005-10-18 2010-06-15 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Acoustic galvanic isolator incorporating series-connected decoupled stacked bulk acoustic resonators
US7675390B2 (en) 2005-10-18 2010-03-09 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Acoustic galvanic isolator incorporating single decoupled stacked bulk acoustic resonator
US7463499B2 (en) 2005-10-31 2008-12-09 Avago Technologies General Ip (Singapore) Pte Ltd. AC-DC power converter
US20070139140A1 (en) * 2005-12-20 2007-06-21 Rao Valluri R Frequency tuning of film bulk acoustic resonators (FBAR)
US7746677B2 (en) * 2006-03-09 2010-06-29 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. AC-DC converter circuit and power supply
US20070210748A1 (en) * 2006-03-09 2007-09-13 Mark Unkrich Power supply and electronic device having integrated power supply
US7479685B2 (en) 2006-03-10 2009-01-20 Avago Technologies General Ip (Singapore) Pte. Ltd. Electronic device on substrate with cavity and mitigated parasitic leakage path
JP4797772B2 (ja) * 2006-04-20 2011-10-19 パナソニック電工株式会社 Baw共振器
JP5036215B2 (ja) * 2006-05-19 2012-09-26 日本碍子株式会社 圧電薄膜共振子及び圧電薄膜共振子の共振周波数の調整方法
US7791435B2 (en) 2007-09-28 2010-09-07 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Single stack coupled resonators having differential output
DE102008003820B4 (de) * 2008-01-10 2013-01-17 Epcos Ag Frontendschaltung
US7855618B2 (en) 2008-04-30 2010-12-21 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Bulk acoustic resonator electrical impedance transformers
US7732977B2 (en) 2008-04-30 2010-06-08 Avago Technologies Wireless Ip (Singapore) Transceiver circuit for film bulk acoustic resonator (FBAR) transducers
JP2009296265A (ja) * 2008-06-04 2009-12-17 Japan Radio Co Ltd 弾性表面波デバイスの中心周波数調整方法及び弾性表面波デバイスの製造方法並びに弾性表面波デバイス。
WO2010061479A1 (ja) * 2008-11-28 2010-06-03 富士通株式会社 弾性波デバイス、およびその製造方法
US8248185B2 (en) 2009-06-24 2012-08-21 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Acoustic resonator structure comprising a bridge
US8902023B2 (en) 2009-06-24 2014-12-02 Avago Technologies General Ip (Singapore) Pte. Ltd. Acoustic resonator structure having an electrode with a cantilevered portion
US8193877B2 (en) 2009-11-30 2012-06-05 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Duplexer with negative phase shifting circuit
JP5617523B2 (ja) * 2009-12-08 2014-11-05 株式会社村田製作所 積層型圧電薄膜フィルタの製造方法
US9243316B2 (en) 2010-01-22 2016-01-26 Avago Technologies General Ip (Singapore) Pte. Ltd. Method of fabricating piezoelectric material with selected c-axis orientation
US8796904B2 (en) 2011-10-31 2014-08-05 Avago Technologies General Ip (Singapore) Pte. Ltd. Bulk acoustic resonator comprising piezoelectric layer and inverse piezoelectric layer
US8962443B2 (en) 2011-01-31 2015-02-24 Avago Technologies General Ip (Singapore) Pte. Ltd. Semiconductor device having an airbridge and method of fabricating the same
US9083302B2 (en) 2011-02-28 2015-07-14 Avago Technologies General Ip (Singapore) Pte. Ltd. Stacked bulk acoustic resonator comprising a bridge and an acoustic reflector along a perimeter of the resonator
US9148117B2 (en) 2011-02-28 2015-09-29 Avago Technologies General Ip (Singapore) Pte. Ltd. Coupled resonator filter comprising a bridge and frame elements
US9048812B2 (en) 2011-02-28 2015-06-02 Avago Technologies General Ip (Singapore) Pte. Ltd. Bulk acoustic wave resonator comprising bridge formed within piezoelectric layer
US9203374B2 (en) 2011-02-28 2015-12-01 Avago Technologies General Ip (Singapore) Pte. Ltd. Film bulk acoustic resonator comprising a bridge
US9136818B2 (en) 2011-02-28 2015-09-15 Avago Technologies General Ip (Singapore) Pte. Ltd. Stacked acoustic resonator comprising a bridge
US9425764B2 (en) 2012-10-25 2016-08-23 Avago Technologies General Ip (Singapore) Pte. Ltd. Accoustic resonator having composite electrodes with integrated lateral features
US9154112B2 (en) 2011-02-28 2015-10-06 Avago Technologies General Ip (Singapore) Pte. Ltd. Coupled resonator filter comprising a bridge
US9444426B2 (en) 2012-10-25 2016-09-13 Avago Technologies General Ip (Singapore) Pte. Ltd. Accoustic resonator having integrated lateral feature and temperature compensation feature
US8575820B2 (en) 2011-03-29 2013-11-05 Avago Technologies General Ip (Singapore) Pte. Ltd. Stacked bulk acoustic resonator
US8350445B1 (en) 2011-06-16 2013-01-08 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Bulk acoustic resonator comprising non-piezoelectric layer and bridge
US8922302B2 (en) 2011-08-24 2014-12-30 Avago Technologies General Ip (Singapore) Pte. Ltd. Acoustic resonator formed on a pedestal
US10135415B2 (en) * 2015-12-18 2018-11-20 Texas Instruments Incorporated Method to reduce frequency distribution of bulk acoustic wave resonators during manufacturing
CH716605A1 (fr) * 2019-09-16 2021-03-31 Richemont Int Sa Procédé de fabrication d'une pluralité de résonateurs sur une plaquette.
CN113810014A (zh) * 2021-09-23 2021-12-17 武汉敏声新技术有限公司 叉指型体声波谐振器及滤波器

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1566009A1 (de) * 1967-08-26 1971-02-18 Telefunken Patent Mechanisches Frequenzfilter und Verfahren zu seiner Herstellung
JPS60170312A (ja) * 1984-02-14 1985-09-03 Matsushima Kogyo Co Ltd 圧電発振片の製造方法
US4638536A (en) * 1986-01-17 1987-01-27 The United States Of America As Represented By The Secretary Of The Army Method of making a resonator having a desired frequency from a quartz crystal resonator plate
JPH0316308A (ja) * 1989-06-13 1991-01-24 Murata Mfg Co Ltd 圧電共振子の製造方法
US5382930A (en) * 1992-12-21 1995-01-17 Trw Inc. Monolithic multipole filters made of thin film stacked crystal filters
US6051907A (en) * 1996-10-10 2000-04-18 Nokia Mobile Phones Limited Method for performing on-wafer tuning of thin film bulk acoustic wave resonators (FBARS)
US5894647A (en) * 1997-06-30 1999-04-20 Tfr Technologies, Inc. Method for fabricating piezoelectric resonators and product
US6081171A (en) 1998-04-08 2000-06-27 Nokia Mobile Phones Limited Monolithic filters utilizing thin film bulk acoustic wave devices and minimum passive components for controlling the shape and width of a passband response
US6307447B1 (en) * 1999-11-01 2001-10-23 Agere Systems Guardian Corp. Tuning mechanical resonators for electrical filter
US6339276B1 (en) * 1999-11-01 2002-01-15 Agere Systems Guardian Corp. Incremental tuning process for electrical resonators based on mechanical motion

Also Published As

Publication number Publication date
JP4171241B2 (ja) 2008-10-22
JP2003050584A (ja) 2003-02-21
EP1258990A2 (en) 2002-11-20
EP1258990B1 (en) 2007-11-21
US6441702B1 (en) 2002-08-27
EP1258990A3 (en) 2004-02-04

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