DK1031639T3 - Anordning til gasströmssputtering - Google Patents

Anordning til gasströmssputtering

Info

Publication number
DK1031639T3
DK1031639T3 DK00103783T DK00103783T DK1031639T3 DK 1031639 T3 DK1031639 T3 DK 1031639T3 DK 00103783 T DK00103783 T DK 00103783T DK 00103783 T DK00103783 T DK 00103783T DK 1031639 T3 DK1031639 T3 DK 1031639T3
Authority
DK
Denmark
Prior art keywords
cathode
gas flow
cavity
anode
chamber
Prior art date
Application number
DK00103783T
Other languages
Danish (da)
English (en)
Inventor
Paolo Milani
Paolo Giuseppe Carlo Piseri
Emanuele Barborini
Original Assignee
Ist Naz Fisica Della Materia
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ist Naz Fisica Della Materia filed Critical Ist Naz Fisica Della Materia
Application granted granted Critical
Publication of DK1031639T3 publication Critical patent/DK1031639T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Glass Compositions (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
DK00103783T 1999-02-26 2000-02-23 Anordning til gasströmssputtering DK1031639T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT1999GE000020A IT1310029B1 (it) 1999-02-26 1999-02-26 Vaporizzatore a microplasma pulsato.

Publications (1)

Publication Number Publication Date
DK1031639T3 true DK1031639T3 (da) 2007-06-18

Family

ID=11355260

Family Applications (1)

Application Number Title Priority Date Filing Date
DK00103783T DK1031639T3 (da) 1999-02-26 2000-02-23 Anordning til gasströmssputtering

Country Status (8)

Country Link
US (1) US6392188B1 (fr)
EP (1) EP1031639B1 (fr)
AT (1) ATE354686T1 (fr)
DE (1) DE60033458T2 (fr)
DK (1) DK1031639T3 (fr)
ES (1) ES2282065T3 (fr)
IT (1) IT1310029B1 (fr)
PT (1) PT1031639E (fr)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6972115B1 (en) 1999-09-03 2005-12-06 American Inter-Metallics, Inc. Apparatus and methods for the production of powders
DE10061743A1 (de) * 2000-01-17 2001-07-19 Siemens Ag Verfahren zur Verbesserung der optischen Trennung von Leuchtstoffschichten
EP1416363A3 (fr) * 2002-10-31 2006-07-26 eSpeed, Inc. Clavier pour système de transactions
US6965629B2 (en) * 2003-09-24 2005-11-15 Nanotechnologies, Inc. Method and apparatus for initiating a pulsed arc discharge for nanopowder synthesis
US7012214B2 (en) * 2003-09-24 2006-03-14 Nanotechnologies, Inc. Nanopowder synthesis using pulsed arc discharge and applied magnetic field
US7460225B2 (en) * 2004-03-05 2008-12-02 Vassili Karanassios Miniaturized source devices for optical and mass spectrometry
US20080006521A1 (en) * 2004-06-07 2008-01-10 Nanotechnologies, Inc. Method for initiating a pulsed arc discharge for nanopowder synthesis
JP3930495B2 (ja) * 2004-06-16 2007-06-13 三菱重工業株式会社 ニッケル超微粒子分散液体ナトリウムの製造方法、装置、液体ナトリウムの漏洩検出方法
US20110229579A1 (en) * 2005-07-21 2011-09-22 Roberta Carbone Support Having Nanostructured Titanium Dioxide Film And Uses Thereof
US20070272664A1 (en) * 2005-08-04 2007-11-29 Schroder Kurt A Carbon and Metal Nanomaterial Composition and Synthesis
EP1818110A1 (fr) 2006-02-14 2007-08-15 The European Community, represented by the European Commission Matériau fonctionnalisé ainsi que la production de celui-ci
US7951276B2 (en) * 2006-06-08 2011-05-31 The Board Of Trustees Of The University Of Illinois Cluster generator
ATE518970T1 (de) * 2008-02-01 2011-08-15 Applied Materials Inc Doppelbeschichtungsvorrichtung mit verbesserter trennplatte
WO2010083852A1 (fr) 2009-01-26 2010-07-29 Tethis S.R.L. Dispositif microfluidique fonctionnalisé pour immunofluorescence
TWI412052B (zh) * 2009-07-14 2013-10-11 Univ Nat Central 以奈米粒子產生離子源之方法
RU2685564C1 (ru) * 2018-01-09 2019-04-22 Всеволод Германович Кизнер Способ синтеза наночастиц металлов осаждением на пористый углеродный материал
CN109759601A (zh) * 2019-01-25 2019-05-17 大连理工大学 激光蒸发多腔体金属/碳纳米粉体连续生产方法
DE102019135749B4 (de) * 2019-12-23 2024-02-08 Ri Research Instruments Gmbh Lichtbogen-Beschichtungsanordnung und Verfahren
CN115870096B (zh) * 2023-03-04 2023-05-16 常州华福环境科技股份有限公司 一种袋式除尘器用吹扫电磁脉冲阀

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1356769A (en) * 1973-03-27 1974-06-12 Cit Alcatel Apparatus and method for depositing thin layers on a substrate
US3962062A (en) * 1974-12-09 1976-06-08 Northern Electric Company Limited Sputtered dielectric thin films
US4610718A (en) * 1984-04-27 1986-09-09 Hitachi, Ltd. Method for manufacturing ultra-fine particles
DE3809734C1 (fr) * 1988-03-23 1989-05-03 Helmut Prof. Dr. 7805 Boetzingen De Haberland
US5425231A (en) * 1993-07-02 1995-06-20 Burton; Rodney L. Gas fed pulsed electric thruster
US5537005A (en) * 1994-05-13 1996-07-16 Hughes Aircraft High-current, low-pressure plasma-cathode electron gun
US5587093A (en) * 1995-06-02 1996-12-24 Electric Propulsion Laboratory, Inc. Safe potential arc channel enhanced arc head
US5591313A (en) * 1995-06-30 1997-01-07 Tabco Technologies, Inc. Apparatus and method for localized ion sputtering

Also Published As

Publication number Publication date
US6392188B1 (en) 2002-05-21
ES2282065T3 (es) 2007-10-16
PT1031639E (pt) 2007-05-31
IT1310029B1 (it) 2002-02-05
DE60033458D1 (de) 2007-04-05
EP1031639B1 (fr) 2007-02-21
DE60033458T2 (de) 2007-10-31
ITGE990020A1 (it) 2000-08-26
ATE354686T1 (de) 2007-03-15
EP1031639A1 (fr) 2000-08-30

Similar Documents

Publication Publication Date Title
DK1031639T3 (da) Anordning til gasströmssputtering
WO2000068451A3 (fr) Source de vaporisation anionique a magnetron
WO2004027825A3 (fr) Source de plasma a faisceau
WO2002095362A3 (fr) Procede et appareil destines a une electronebulisation regulee par retroaction
WO2002098188A9 (fr) Ioniseur non producteur de poussiere a decharge de flux d'air ionise
JPS60175351A (ja) Ｘ線発生装置およびｘ線露光法
MY139877A (en) Lower electrode design for higher uniformity
AU6589398A (en) Plasma processing system utilizing combined anode/ion source
MXPA03007666A (es) Soplete de plasma contacto inicial.
WO2002043116A3 (fr) Attaque de caracteristiques a rapport de forme eleve dans un substrat
EP1179833A3 (fr) Détecteur de particules
US5640009A (en) Fast atom beam source
PT1356496E (pt) Dispositivo para a evaporação de materiais para revestir objectos
KR20030045652A (ko) 기판의 대전을 억제하기 위한 이온빔 조사장치 및 방법
EP1026723A3 (fr) Dispositif de revêtement sous vide
KR940007214A (ko) 음극 스퍼터링 및 마이크로파 조사를 이용한 플라즈마 발생 장치
US20030011956A1 (en) Negative ion generator
DE50313006D1 (de) Hochfrequenz-Elektronenquelle, insbesondere Neutralisator
WO1999028520A3 (fr) Dispositif de traitement de pieces dans un plasma basse pression
SG133405A1 (en) Vacuum arc evaporation apparatus
CA2391911A1 (fr) Appareil de traitement au plasma avec paroi conductrice d'electricite
KR20030044220A (ko) 유전장벽방전을 이용한 플라즈마 용사 장치 및 그 장치를이용한 표면 처리 방법
WO2004088706A3 (fr) Lampe ultraviolette
JPH06124673A (ja) イオン注入装置におけるプラズマ発生方法
EP1045423A3 (fr) Canon à électrons