DE69942886D1 - Hochauflösendes Anti-Streuungs-Röntgenstrahlungsgitter und Laser-Herstellungsverfahren - Google Patents

Hochauflösendes Anti-Streuungs-Röntgenstrahlungsgitter und Laser-Herstellungsverfahren

Info

Publication number
DE69942886D1
DE69942886D1 DE69942886T DE69942886T DE69942886D1 DE 69942886 D1 DE69942886 D1 DE 69942886D1 DE 69942886 T DE69942886 T DE 69942886T DE 69942886 T DE69942886 T DE 69942886T DE 69942886 D1 DE69942886 D1 DE 69942886D1
Authority
DE
Germany
Prior art keywords
scatter
manufacturing process
ray grid
laser manufacturing
resolution anti
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69942886T
Other languages
English (en)
Inventor
Renato Guida
James Wilson Rose
Kenneth Paul Zarnoch
Gary John Thumann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Application granted granted Critical
Publication of DE69942886D1 publication Critical patent/DE69942886D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Measurement Of Radiation (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Laser Beam Processing (AREA)
DE69942886T 1998-06-26 1999-06-25 Hochauflösendes Anti-Streuungs-Röntgenstrahlungsgitter und Laser-Herstellungsverfahren Expired - Lifetime DE69942886D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/105,788 US6177237B1 (en) 1998-06-26 1998-06-26 High resolution anti-scatter x-ray grid and laser fabrication method

Publications (1)

Publication Number Publication Date
DE69942886D1 true DE69942886D1 (de) 2010-12-09

Family

ID=22307782

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69942886T Expired - Lifetime DE69942886D1 (de) 1998-06-26 1999-06-25 Hochauflösendes Anti-Streuungs-Röntgenstrahlungsgitter und Laser-Herstellungsverfahren

Country Status (4)

Country Link
US (2) US6177237B1 (de)
EP (1) EP0967619B1 (de)
JP (1) JP4270650B2 (de)
DE (1) DE69942886D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6450684B2 (en) * 1999-12-24 2002-09-17 Canon Kabushiki Kaisha Radiographic apparatus, radiographic table and radiographic system
JP3987676B2 (ja) * 2000-07-10 2007-10-10 株式会社日立メディコ Ｘ線計測装置
GB0020180D0 (en) 2000-08-17 2000-10-04 Imerys Minerals Ltd Kaolin products and their production
US6470072B1 (en) 2000-08-24 2002-10-22 General Electric Company X-ray anti-scatter grid
KR100414046B1 (ko) * 2001-02-23 2004-01-13 노정희 엑스레이 그리드의 납 배열구조
FR2830976B1 (fr) * 2001-10-17 2004-01-09 Ge Med Sys Global Tech Co Llc Grilles anti-diffusantes a faible attenuation et procede de fabrication de telles grilles
US6912266B2 (en) * 2002-04-22 2005-06-28 Siemens Aktiengesellschaft X-ray diagnostic facility having a digital X-ray detector and a stray radiation grid
DE10354811B4 (de) 2003-11-21 2012-09-27 Siemens Ag Streustrahlenraster, insbesondere für medizinische Röngteneinrichtungen, sowie Verfahren zu seiner Herstellung
JP5059521B2 (ja) * 2007-08-29 2012-10-24 株式会社放電精密加工研究所 散乱線除去グリッドの製造方法
US8265228B2 (en) 2010-06-28 2012-09-11 General Electric Company Anti-scatter X-ray grid device and method of making same
US9230702B2 (en) * 2012-08-17 2016-01-05 General Electric Company System and method for reducing grid line image artifacts
US9076563B2 (en) 2013-06-03 2015-07-07 Zhengrong Ying Anti-scatter collimators for detector systems of multi-slice X-ray computed tomography systems
JP2015203571A (ja) 2014-04-10 2015-11-16 株式会社フジキン 散乱ｘ線除去用グリッドの製造方法
CN106618617B (zh) 2015-10-30 2021-12-21 通用电气公司 X射线探测器及其制造方法
WO2019167145A1 (ja) * 2018-02-27 2019-09-06 株式会社ＡＮＳｅｅＮ コリメータ、放射線検出装置、及び放射線検査装置
US11139088B2 (en) 2019-06-12 2021-10-05 alephFS—Systems for Imaging Grid for X-ray imaging
EP3796335A1 (de) 2019-09-18 2021-03-24 Koninklijke Philips N.V. Röntgenstrahlenstreuraster

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE207347C (de)
DD207347A1 (de) * 1982-05-03 1984-02-29 Joerg Neumann Anordnung zur materialabtragung mittels laserstrahlung
GB8722085D0 (en) * 1987-09-19 1987-10-28 Cambridge Consultants Ink jet nozzle manufacture
JPH04297899A (ja) * 1991-03-27 1992-10-21 Toshiba Corp コリメータ製造方法及び該製造方法で得るコリメータ
US5231655A (en) * 1991-12-06 1993-07-27 General Electric Company X-ray collimator
US5378137A (en) * 1993-05-10 1995-01-03 Hewlett-Packard Company Mask design for forming tapered inkjet nozzles
US5416821A (en) * 1993-05-10 1995-05-16 Trw Inc. Grid formed with a silicon substrate
EP0677985B1 (de) * 1994-04-14 1999-05-26 Hewlett-Packard GmbH Verfahren zur Herstellung von Leiterplatten
US5538817A (en) * 1994-06-17 1996-07-23 Litel Instruments Gray level imaging masks and methods for encoding same
US5569399A (en) * 1995-01-20 1996-10-29 General Electric Company Lasing medium surface modification
US5768022A (en) * 1995-03-08 1998-06-16 Brown University Research Foundation Laser diode having in-situ fabricated lens element
US5581592A (en) 1995-03-10 1996-12-03 General Electric Company Anti-scatter X-ray grid device for medical diagnostic radiography
US5557650A (en) 1995-03-10 1996-09-17 General Electric Company Method for fabricating an anti-scatter X-ray grid device for medical diagnostic radiography
JPH09159910A (ja) * 1995-12-04 1997-06-20 Olympus Optical Co Ltd 対物レンズ
US5855835A (en) * 1996-09-13 1999-01-05 Hewlett Packard Co Method and apparatus for laser ablating a nozzle member
JPH10193618A (ja) * 1996-11-13 1998-07-28 Canon Inc 液体噴射記録ヘッドおよびその製造方法
JPH10319221A (ja) * 1997-05-14 1998-12-04 Ricoh Co Ltd 光学素子及び光学素子の製造方法

Also Published As

Publication number Publication date
EP0967619A3 (de) 2003-08-13
US6733266B1 (en) 2004-05-11
EP0967619B1 (de) 2010-10-27
EP0967619A2 (de) 1999-12-29
US6177237B1 (en) 2001-01-23
JP4270650B2 (ja) 2009-06-03
JP2000065995A (ja) 2000-03-03

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