DE69932067T2 - Aperturblende mit strahlabschirmung für elektronenstrahl - Google Patents
Aperturblende mit strahlabschirmung für elektronenstrahl Download PDFInfo
- Publication number
- DE69932067T2 DE69932067T2 DE69932067T DE69932067T DE69932067T2 DE 69932067 T2 DE69932067 T2 DE 69932067T2 DE 69932067 T DE69932067 T DE 69932067T DE 69932067 T DE69932067 T DE 69932067T DE 69932067 T2 DE69932067 T2 DE 69932067T2
- Authority
- DE
- Germany
- Prior art keywords
- aperture element
- chamber
- element according
- passage opening
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000000903 blocking effect Effects 0.000 claims description 31
- 238000010894 electron beam technology Methods 0.000 claims description 22
- 230000000694 effects Effects 0.000 claims description 3
- 230000001902 propagating effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 230000001154 acute effect Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9820205 | 1998-09-16 | ||
| GB9820205A GB2341720A (en) | 1998-09-16 | 1998-09-16 | Electron beam aperture element with beam sheilding |
| PCT/EP1999/006770 WO2000016370A1 (en) | 1998-09-16 | 1999-09-13 | Electron beam aperture element with beam shielding |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69932067D1 DE69932067D1 (de) | 2006-08-03 |
| DE69932067T2 true DE69932067T2 (de) | 2007-01-11 |
Family
ID=10838977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69932067T Expired - Lifetime DE69932067T2 (de) | 1998-09-16 | 1999-09-13 | Aperturblende mit strahlabschirmung für elektronenstrahl |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1121704B1 (enExample) |
| JP (1) | JP4568431B2 (enExample) |
| DE (1) | DE69932067T2 (enExample) |
| GB (1) | GB2341720A (enExample) |
| WO (1) | WO2000016370A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6750981B2 (ja) * | 2016-08-25 | 2020-09-02 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム露光装置 |
| CN110536535B (zh) * | 2019-07-12 | 2020-06-19 | 西安交通大学 | 一种用于高能粒子加速器的束屏 |
| EP3879557A1 (en) * | 2020-03-09 | 2021-09-15 | ASML Netherlands B.V. | Aperture body, flood column and charged particle tool |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE903017C (de) * | 1951-01-31 | 1954-02-01 | Sueddeutsche Lab G M B H | Herstellung kleiner Kugeln aus hochschmelzbaren Materialien |
| JPS5935501B2 (ja) * | 1979-07-25 | 1984-08-29 | 株式会社日立製作所 | 電子線装置 |
| JPS59203353A (ja) * | 1983-05-06 | 1984-11-17 | Sony Corp | 電子ビ−ム発生装置 |
| DE3407050A1 (de) * | 1984-02-27 | 1985-09-05 | Siemens AG, 1000 Berlin und 8000 München | Korpuskelbeschleunigende elektrode |
| DE3666897D1 (en) * | 1985-03-28 | 1989-12-14 | Philips Nv | Electron beam apparatus comprising an integrated anode/beam blanking unit |
| EP0308560A1 (fr) * | 1987-09-22 | 1989-03-29 | Universite De Reims Champagne Ardenne | Canon à particules électriques permettant l'émission pulsée de particules d'énergie déterminée |
| ATE171812T1 (de) * | 1988-06-01 | 1998-10-15 | Ims Ionen Mikrofab Syst | Ionenstrahllithographie |
| WO1991006393A1 (fr) * | 1989-11-01 | 1991-05-16 | Vladimir Omarovich Tokarev | Dispositif de protection contre les depots se formant sur la cathode d'un pistolet de soudage par bombardement electronique et surles parois d'une enceinte a vide |
| US5493116A (en) * | 1993-10-26 | 1996-02-20 | Metrologix, Inc. | Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices |
| US5838006A (en) * | 1996-10-17 | 1998-11-17 | Etec Systems, Inc. | Conical baffle for reducing charging drift in a particle beam system |
-
1998
- 1998-09-16 GB GB9820205A patent/GB2341720A/en not_active Withdrawn
-
1999
- 1999-09-13 DE DE69932067T patent/DE69932067T2/de not_active Expired - Lifetime
- 1999-09-13 JP JP2000570812A patent/JP4568431B2/ja not_active Expired - Fee Related
- 1999-09-13 EP EP99969178A patent/EP1121704B1/en not_active Expired - Lifetime
- 1999-09-13 WO PCT/EP1999/006770 patent/WO2000016370A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| GB9820205D0 (en) | 1998-11-11 |
| JP4568431B2 (ja) | 2010-10-27 |
| DE69932067D1 (de) | 2006-08-03 |
| EP1121704A1 (en) | 2001-08-08 |
| JP2002525800A (ja) | 2002-08-13 |
| GB2341720A (en) | 2000-03-22 |
| WO2000016370A1 (en) | 2000-03-23 |
| EP1121704B1 (en) | 2006-06-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |