JP4568431B2 - ビームシールドを備えた電子ビーム開口要素 - Google Patents

ビームシールドを備えた電子ビーム開口要素 Download PDF

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Publication number
JP4568431B2
JP4568431B2 JP2000570812A JP2000570812A JP4568431B2 JP 4568431 B2 JP4568431 B2 JP 4568431B2 JP 2000570812 A JP2000570812 A JP 2000570812A JP 2000570812 A JP2000570812 A JP 2000570812A JP 4568431 B2 JP4568431 B2 JP 4568431B2
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JP
Japan
Prior art keywords
electron beam
aperture element
trap chamber
electron
element according
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Expired - Fee Related
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JP2000570812A
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English (en)
Japanese (ja)
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JP2002525800A (ja
JP2002525800A5 (enExample
Inventor
タオ チャン
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ライカ マイクロシステムズ リトグラフィー リミテッド
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Publication of JP2002525800A publication Critical patent/JP2002525800A/ja
Publication of JP2002525800A5 publication Critical patent/JP2002525800A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP2000570812A 1998-09-16 1999-09-13 ビームシールドを備えた電子ビーム開口要素 Expired - Fee Related JP4568431B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9820205.4 1998-09-16
GB9820205A GB2341720A (en) 1998-09-16 1998-09-16 Electron beam aperture element with beam sheilding
PCT/EP1999/006770 WO2000016370A1 (en) 1998-09-16 1999-09-13 Electron beam aperture element with beam shielding

Publications (3)

Publication Number Publication Date
JP2002525800A JP2002525800A (ja) 2002-08-13
JP2002525800A5 JP2002525800A5 (enExample) 2010-04-02
JP4568431B2 true JP4568431B2 (ja) 2010-10-27

Family

ID=10838977

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000570812A Expired - Fee Related JP4568431B2 (ja) 1998-09-16 1999-09-13 ビームシールドを備えた電子ビーム開口要素

Country Status (5)

Country Link
EP (1) EP1121704B1 (enExample)
JP (1) JP4568431B2 (enExample)
DE (1) DE69932067T2 (enExample)
GB (1) GB2341720A (enExample)
WO (1) WO2000016370A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6750981B2 (ja) * 2016-08-25 2020-09-02 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム露光装置
CN110536535B (zh) * 2019-07-12 2020-06-19 西安交通大学 一种用于高能粒子加速器的束屏
EP3879557A1 (en) * 2020-03-09 2021-09-15 ASML Netherlands B.V. Aperture body, flood column and charged particle tool

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE903017C (de) * 1951-01-31 1954-02-01 Sueddeutsche Lab G M B H Herstellung kleiner Kugeln aus hochschmelzbaren Materialien
JPS5935501B2 (ja) * 1979-07-25 1984-08-29 株式会社日立製作所 電子線装置
JPS59203353A (ja) * 1983-05-06 1984-11-17 Sony Corp 電子ビ−ム発生装置
DE3407050A1 (de) * 1984-02-27 1985-09-05 Siemens AG, 1000 Berlin und 8000 München Korpuskelbeschleunigende elektrode
DE3666897D1 (en) * 1985-03-28 1989-12-14 Philips Nv Electron beam apparatus comprising an integrated anode/beam blanking unit
EP0308560A1 (fr) * 1987-09-22 1989-03-29 Universite De Reims Champagne Ardenne Canon à particules électriques permettant l'émission pulsée de particules d'énergie déterminée
EP0344646B1 (en) * 1988-06-01 1998-09-30 IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. Ion beam lithography
WO1991006393A1 (fr) * 1989-11-01 1991-05-16 Vladimir Omarovich Tokarev Dispositif de protection contre les depots se formant sur la cathode d'un pistolet de soudage par bombardement electronique et surles parois d'une enceinte a vide
US5493116A (en) * 1993-10-26 1996-02-20 Metrologix, Inc. Detection system for precision measurements and high resolution inspection of high aspect ratio structures using particle beam devices
US5838006A (en) * 1996-10-17 1998-11-17 Etec Systems, Inc. Conical baffle for reducing charging drift in a particle beam system

Also Published As

Publication number Publication date
WO2000016370A1 (en) 2000-03-23
EP1121704A1 (en) 2001-08-08
GB2341720A (en) 2000-03-22
JP2002525800A (ja) 2002-08-13
DE69932067T2 (de) 2007-01-11
GB9820205D0 (en) 1998-11-11
DE69932067D1 (de) 2006-08-03
EP1121704B1 (en) 2006-06-21

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