DE69927854D1 - Verfahren zur herstellung eines siliziumkarbid-komposits - Google Patents

Verfahren zur herstellung eines siliziumkarbid-komposits

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Publication number
DE69927854D1
DE69927854D1 DE69927854T DE69927854T DE69927854D1 DE 69927854 D1 DE69927854 D1 DE 69927854D1 DE 69927854 T DE69927854 T DE 69927854T DE 69927854 T DE69927854 T DE 69927854T DE 69927854 D1 DE69927854 D1 DE 69927854D1
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Germany
Prior art keywords
infiltrant
infiltration process
silicon carbide
infiltration
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69927854T
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English (en)
Other versions
DE69927854T2 (de
Inventor
Michael Waggoner
R Rossing
A Richmond
A Aghajanian
L Mccormick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M Cubed Technologies Inc
Original Assignee
M Cubed Technologies Inc
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Publication date
Application filed by M Cubed Technologies Inc filed Critical M Cubed Technologies Inc
Publication of DE69927854D1 publication Critical patent/DE69927854D1/de
Application granted granted Critical
Publication of DE69927854T2 publication Critical patent/DE69927854T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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DE69927854T 1999-07-23 1999-07-23 Verfahren zur herstellung eines siliziumkarbid-komposits Expired - Lifetime DE69927854T2 (de)

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JP4136380B2 (ja) 2001-12-21 2008-08-20 日本碍子株式会社 高熱伝導性含Si材料及びその製造方法
US20030198749A1 (en) * 2002-04-17 2003-10-23 Applied Materials, Inc. Coated silicon carbide cermet used in a plasma reactor
JP4261130B2 (ja) * 2002-06-18 2009-04-30 株式会社東芝 シリコン/炭化ケイ素複合材料
US20030233977A1 (en) * 2002-06-20 2003-12-25 Yeshwanth Narendar Method for forming semiconductor processing components
JP3960933B2 (ja) * 2003-03-18 2007-08-15 日本碍子株式会社 高熱伝導性放熱材及びその製造方法
JP4552103B2 (ja) * 2003-04-21 2010-09-29 Toto株式会社 窒化珪素コンポジット、及び窒化珪素コンポジットの製造方法
JP4577639B2 (ja) * 2003-09-29 2010-11-10 Toto株式会社 シリコンセラミックスコンポジットおよびシリコンセラミックスコンポジットの製造方法
US7335331B1 (en) 2005-03-01 2008-02-26 Husnay Dana M Method for making ceramic plates
JP5300493B2 (ja) * 2006-02-24 2013-09-25 エム キューブド テクノロジーズ, インコーポレイテッド 金属間化合物含有複合体、及びそれを製造するための方法
EP1996530B1 (de) 2006-02-24 2012-12-19 M Cubed Technologies Inc. Verfahren zur herstellung von verbundwerkstoffkörper mit intermetallen
JP2009113477A (ja) 2007-10-15 2009-05-28 Taiheiyo Randamu Kk セラミックス成形体とその製造方法
JP5177793B2 (ja) * 2007-12-27 2013-04-10 独立行政法人物質・材料研究機構 炭化ケイ素の製造方法
JP6132586B2 (ja) * 2013-02-22 2017-05-24 株式会社フジコー SiC成形体の製造方法
US20160001526A1 (en) * 2013-02-27 2016-01-07 Kyocera Corporation Ceramic joined body and flow passage body
FR3008968B1 (fr) * 2013-07-23 2016-12-09 Herakles Procede de fabrication de pieces en materiau composite par impregnation a basse temperature de fusion
US9123661B2 (en) 2013-08-07 2015-09-01 Lam Research Corporation Silicon containing confinement ring for plasma processing apparatus and method of forming thereof
DE102014216433A1 (de) * 2014-08-19 2016-02-25 Schunk Kohlenstofftechnik Gmbh Verfahren zur Herstellung eines Formkörpers sowie Formkörper
JP6489775B2 (ja) * 2014-08-21 2019-03-27 株式会社フジコー SiC成形体の製造方法及びSiC成形体の加工方法
CN105349827A (zh) * 2015-10-30 2016-02-24 苏州列治埃盟新材料技术转移有限公司 一种碳化硅增强无铅锡铜合金棒及其制备方法
CN114714245A (zh) * 2016-04-06 2022-07-08 M丘比德技术公司 化学-机械平面化垫调节器
DE102017217292A1 (de) * 2017-09-28 2019-03-28 Sgl Carbon Se Keramisches Bauteil
CN109748595B (zh) * 2017-11-01 2021-10-22 航天特种材料及工艺技术研究所 一种混合渗剂、用途及反应熔渗制备方法
CN113185297B (zh) * 2021-04-27 2023-06-27 湖北中烟工业有限责任公司 电加热用陶瓷材料及其应用
CN114031415B (zh) * 2021-10-29 2022-08-02 中广核研究院有限公司 碳化硅接头及其金属渗透连接方法
CN114180967B (zh) * 2021-12-30 2023-01-31 浙江立泰复合材料股份有限公司 一种中空陶瓷材料及其制备方法

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US5509555A (en) * 1994-06-03 1996-04-23 Massachusetts Institute Of Technology Method for producing an article by pressureless reactive infiltration
EP0798280B1 (de) * 1996-03-29 2001-09-12 Kabushiki Kaisha Toshiba Keramikmatrix-Verbundwerkstoff und Verfahren zur Herstellung desselben
DE19711831C2 (de) * 1997-03-21 2000-07-13 Daimler Chrysler Ag Schmelzinfiltrierte faserverstärkte Verbundkeramik und Verfahren zur Herstellung einer solchen

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EP1200370A1 (de) 2002-05-02
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EP1200370B1 (de) 2005-10-19
CN1216830C (zh) 2005-08-31
WO2001007377A1 (en) 2001-02-01
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