DE69917261D1 - Photoinitiatoren und ihre verwendungen - Google Patents
Photoinitiatoren und ihre verwendungenInfo
- Publication number
- DE69917261D1 DE69917261D1 DE69917261T DE69917261T DE69917261D1 DE 69917261 D1 DE69917261 D1 DE 69917261D1 DE 69917261 T DE69917261 T DE 69917261T DE 69917261 T DE69917261 T DE 69917261T DE 69917261 D1 DE69917261 D1 DE 69917261D1
- Authority
- DE
- Germany
- Prior art keywords
- photoinitiators
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
- A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
- A61K6/887—Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/45—Anti-settling agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP98810501 | 1998-05-29 | ||
EP98810501 | 1998-05-29 | ||
PCT/EP1999/003458 WO1999062961A1 (en) | 1998-05-29 | 1999-05-20 | Novel photoinitiators and their applications |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69917261D1 true DE69917261D1 (de) | 2004-06-17 |
DE69917261T2 DE69917261T2 (de) | 2004-09-09 |
Family
ID=8236118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69917261T Expired - Lifetime DE69917261T2 (de) | 1998-05-29 | 1999-05-20 | Photoinitiatoren und ihre Verwendungen |
Country Status (6)
Country | Link |
---|---|
US (1) | US6458864B1 (de) |
EP (1) | EP1086145B1 (de) |
JP (1) | JP4975211B2 (de) |
AU (1) | AU4363999A (de) |
DE (1) | DE69917261T2 (de) |
WO (1) | WO1999062961A1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1333790A (zh) | 1998-12-31 | 2002-01-30 | 西巴特殊化学品控股有限公司 | 含atrp聚合物的颜料组合物 |
WO2000068218A1 (en) * | 1999-05-10 | 2000-11-16 | Ciba Specialty Chemicals Holding Inc. | Novel photoinitiators and their applications |
DE10039212A1 (de) * | 2000-08-11 | 2002-02-21 | Tesa Ag | Verfahren zur Herstellung haftklebriger Polyacrylate unter Verwendung mercaptofunktionalisierter Photoinitiatoren |
DE10149084A1 (de) * | 2001-10-05 | 2003-06-18 | Tesa Ag | UV-vernetzbare Acrylathaftschmelzhaftkleber mit enger Molekulargewichtsverteilung |
US6908952B2 (en) * | 2003-03-21 | 2005-06-21 | 3M Innovative Properties Company | Ring-opened azlactone photoiniferters for radical polymerization |
JP5159097B2 (ja) * | 2006-09-22 | 2013-03-06 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法及び印刷物 |
WO2008070737A1 (en) * | 2006-12-05 | 2008-06-12 | University Of Southern Mississippi | Benzophenone/thioxanthone derivatives and their use in photopolymerizable compositions |
JP5136035B2 (ja) * | 2007-12-11 | 2013-02-06 | コニカミノルタホールディングス株式会社 | インクジェットインク及びインクジェット記録方法 |
JP5441574B2 (ja) * | 2009-09-08 | 2014-03-12 | 富士フイルム株式会社 | 水性インク組成物、インクセット、およびインクジェット画像形成方法 |
JP5955832B2 (ja) | 2010-03-22 | 2016-07-20 | ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング | マクロ光開始剤およびそれらの硬化性組成物 |
JP5455818B2 (ja) * | 2010-06-29 | 2014-03-26 | 富士フイルム株式会社 | インク組成物、インクセット及び画像形成方法 |
AT514594B1 (de) | 2013-09-06 | 2015-02-15 | Durst Phototech Digital Tech | Photoinitiator |
US10005851B2 (en) * | 2014-08-01 | 2018-06-26 | Adeka Corporation | Polymerization initiator and radically polymerizable composition containing same |
TWI677492B (zh) * | 2018-07-17 | 2019-11-21 | 奇鈦科技股份有限公司 | 液態光引發化合物及其應用 |
CN109988262B (zh) * | 2019-04-03 | 2020-07-14 | 北京化工大学 | 一种聚合大分子光引发剂及其制备方法 |
CN109970727B (zh) * | 2019-04-03 | 2021-04-06 | 北京化工大学 | 一种长波长可聚合光引发剂及其制备方法 |
CN109988268B (zh) * | 2019-04-03 | 2020-08-04 | 北京化工大学 | 一种共聚合大分子光引发剂及其制备方法 |
CN110003365B (zh) * | 2019-04-03 | 2020-06-09 | 北京化工大学 | 一种大分子光引发剂及其制备方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0088050B1 (de) * | 1982-02-26 | 1986-09-03 | Ciba-Geigy Ag | Photohärtbare gefärbte Massen |
DE3738567A1 (de) * | 1987-03-12 | 1988-09-22 | Merck Patent Gmbh | Coreaktive fotoinitiatoren |
US5314962A (en) * | 1987-04-07 | 1994-05-24 | Mitsubishi Petrochemical Company Limited | ABA type block copolymers |
US5190989A (en) * | 1987-06-23 | 1993-03-02 | Mitsubishi Petrochemical Company Limited | Hydrophilic group-containing AB-type block copolymer |
DE3816304A1 (de) * | 1988-05-13 | 1989-11-23 | Merck Patent Gmbh | Fotoinitiator-copolymere |
US5057619A (en) * | 1989-08-14 | 1991-10-15 | Minnesota Mining And Manufacturing Co. | Siloxane iniferter compounds, block copolymers made therewith and a method of making the block copolymers |
JP2845973B2 (ja) * | 1989-09-04 | 1999-01-13 | 三菱化学株式会社 | ジチオカーバメート基含有ポリエステル |
JP3112702B2 (ja) * | 1991-06-13 | 2000-11-27 | 積水化学工業株式会社 | ポリマー型光重合開始剤、その製法および使用法 |
JP3346486B2 (ja) * | 1993-03-29 | 2002-11-18 | 大日本インキ化学工業株式会社 | 含フッ素ブロック共重合体の製造方法 |
US5942555A (en) * | 1996-03-21 | 1999-08-24 | Surmodics, Inc. | Photoactivatable chain transfer agents and semi-telechelic photoactivatable polymers prepared therefrom |
JP3730719B2 (ja) * | 1996-08-12 | 2006-01-05 | 積水化学工業株式会社 | ブロック共重合体の製造方法 |
TW452575B (en) | 1996-12-06 | 2001-09-01 | Ciba Sc Holding Ag | New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators |
-
1999
- 1999-05-20 JP JP2000552170A patent/JP4975211B2/ja not_active Expired - Fee Related
- 1999-05-20 AU AU43639/99A patent/AU4363999A/en not_active Abandoned
- 1999-05-20 US US09/701,457 patent/US6458864B1/en not_active Expired - Fee Related
- 1999-05-20 EP EP99926340A patent/EP1086145B1/de not_active Expired - Lifetime
- 1999-05-20 WO PCT/EP1999/003458 patent/WO1999062961A1/en active IP Right Grant
- 1999-05-20 DE DE69917261T patent/DE69917261T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2002517522A (ja) | 2002-06-18 |
US6458864B1 (en) | 2002-10-01 |
EP1086145B1 (de) | 2004-05-12 |
JP4975211B2 (ja) | 2012-07-11 |
EP1086145A1 (de) | 2001-03-28 |
WO1999062961A1 (en) | 1999-12-09 |
AU4363999A (en) | 1999-12-20 |
DE69917261T2 (de) | 2004-09-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN |
|
8327 | Change in the person/name/address of the patent owner |
Owner name: CIBA HOLDING INC., BASEL, CH |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC |