DE69915282T2 - Vorrichtung zur erzeugung eines magnetischen feldes innerhalb eines gefässes - Google Patents

Vorrichtung zur erzeugung eines magnetischen feldes innerhalb eines gefässes Download PDF

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Publication number
DE69915282T2
DE69915282T2 DE69915282T DE69915282T DE69915282T2 DE 69915282 T2 DE69915282 T2 DE 69915282T2 DE 69915282 T DE69915282 T DE 69915282T DE 69915282 T DE69915282 T DE 69915282T DE 69915282 T2 DE69915282 T2 DE 69915282T2
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DE
Germany
Prior art keywords
magnetic field
room
space
plasma
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69915282T
Other languages
German (de)
English (en)
Other versions
DE69915282D1 (de
Inventor
Pascal Sortais
Claude Bieth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PANTECHNIK
PANTECHNIK CAEN
Original Assignee
PANTECHNIK
PANTECHNIK CAEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PANTECHNIK, PANTECHNIK CAEN filed Critical PANTECHNIK
Publication of DE69915282D1 publication Critical patent/DE69915282D1/de
Application granted granted Critical
Publication of DE69915282T2 publication Critical patent/DE69915282T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/10—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)
DE69915282T 1998-05-26 1999-05-26 Vorrichtung zur erzeugung eines magnetischen feldes innerhalb eines gefässes Expired - Fee Related DE69915282T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9806579A FR2779315B1 (fr) 1998-05-26 1998-05-26 Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte
FR9806579 1998-05-26
PCT/FR1999/001223 WO1999062307A1 (fr) 1998-05-26 1999-05-26 Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte

Publications (2)

Publication Number Publication Date
DE69915282D1 DE69915282D1 (de) 2004-04-08
DE69915282T2 true DE69915282T2 (de) 2005-03-10

Family

ID=9526695

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69915282T Expired - Fee Related DE69915282T2 (de) 1998-05-26 1999-05-26 Vorrichtung zur erzeugung eines magnetischen feldes innerhalb eines gefässes

Country Status (6)

Country Link
EP (1) EP1080613B1 (fr)
JP (1) JP2002517078A (fr)
AU (1) AU3831399A (fr)
DE (1) DE69915282T2 (fr)
FR (1) FR2779315B1 (fr)
WO (1) WO1999062307A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8374662B2 (en) * 2010-03-22 2013-02-12 The Boeing Company Particle trap employing a high temperature superconductor and an associated method of trapping particles
JP6642612B2 (ja) * 2018-04-12 2020-02-05 日新イオン機器株式会社 イオン源、イオンビーム照射装置及びイオン源の運転方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1244975B (de) * 1963-01-09 1967-07-20 Siemens Ag Anordnung zur Erzeugung von magnetischen Stabilisierungsfeldern fuer Hochtemperatur-Plasmaentladungen
JPS6410555A (en) * 1987-07-03 1989-01-13 Jeol Ltd Focus ion beam device
JPS6432634A (en) * 1987-07-29 1989-02-02 Hitachi Ltd Plasma treater

Also Published As

Publication number Publication date
DE69915282D1 (de) 2004-04-08
EP1080613A1 (fr) 2001-03-07
EP1080613B1 (fr) 2004-03-03
FR2779315A1 (fr) 1999-12-03
FR2779315B1 (fr) 2000-08-18
AU3831399A (en) 1999-12-13
JP2002517078A (ja) 2002-06-11
WO1999062307A1 (fr) 1999-12-02

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8339 Ceased/non-payment of the annual fee