AU3831399A - Device for generating a magnetic field inside a chamber - Google Patents

Device for generating a magnetic field inside a chamber

Info

Publication number
AU3831399A
AU3831399A AU38313/99A AU3831399A AU3831399A AU 3831399 A AU3831399 A AU 3831399A AU 38313/99 A AU38313/99 A AU 38313/99A AU 3831399 A AU3831399 A AU 3831399A AU 3831399 A AU3831399 A AU 3831399A
Authority
AU
Australia
Prior art keywords
chamber
generating
magnetic field
field inside
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU38313/99A
Other languages
English (en)
Inventor
Claude Bieth
Pascal Sortais
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PANTECHNIK
Original Assignee
PANTECHNIK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PANTECHNIK filed Critical PANTECHNIK
Publication of AU3831399A publication Critical patent/AU3831399A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/10—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied magnetic fields only, e.g. Q-machines, Yin-Yang, base-ball

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)
AU38313/99A 1998-05-26 1999-05-26 Device for generating a magnetic field inside a chamber Abandoned AU3831399A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9806579 1998-05-26
FR9806579A FR2779315B1 (fr) 1998-05-26 1998-05-26 Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte
PCT/FR1999/001223 WO1999062307A1 (fr) 1998-05-26 1999-05-26 Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte

Publications (1)

Publication Number Publication Date
AU3831399A true AU3831399A (en) 1999-12-13

Family

ID=9526695

Family Applications (1)

Application Number Title Priority Date Filing Date
AU38313/99A Abandoned AU3831399A (en) 1998-05-26 1999-05-26 Device for generating a magnetic field inside a chamber

Country Status (6)

Country Link
EP (1) EP1080613B1 (fr)
JP (1) JP2002517078A (fr)
AU (1) AU3831399A (fr)
DE (1) DE69915282T2 (fr)
FR (1) FR2779315B1 (fr)
WO (1) WO1999062307A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8374662B2 (en) * 2010-03-22 2013-02-12 The Boeing Company Particle trap employing a high temperature superconductor and an associated method of trapping particles
JP6642612B2 (ja) * 2018-04-12 2020-02-05 日新イオン機器株式会社 イオン源、イオンビーム照射装置及びイオン源の運転方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1244975B (de) * 1963-01-09 1967-07-20 Siemens Ag Anordnung zur Erzeugung von magnetischen Stabilisierungsfeldern fuer Hochtemperatur-Plasmaentladungen
JPS6410555A (en) * 1987-07-03 1989-01-13 Jeol Ltd Focus ion beam device
JPS6432634A (en) * 1987-07-29 1989-02-02 Hitachi Ltd Plasma treater

Also Published As

Publication number Publication date
FR2779315A1 (fr) 1999-12-03
DE69915282T2 (de) 2005-03-10
EP1080613B1 (fr) 2004-03-03
EP1080613A1 (fr) 2001-03-07
JP2002517078A (ja) 2002-06-11
FR2779315B1 (fr) 2000-08-18
WO1999062307A1 (fr) 1999-12-02
DE69915282D1 (de) 2004-04-08

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase