DE69901049T2 - Polybenzoxazolharz und Vorläufer davon - Google Patents

Polybenzoxazolharz und Vorläufer davon

Info

Publication number
DE69901049T2
DE69901049T2 DE69901049T DE69901049T DE69901049T2 DE 69901049 T2 DE69901049 T2 DE 69901049T2 DE 69901049 T DE69901049 T DE 69901049T DE 69901049 T DE69901049 T DE 69901049T DE 69901049 T2 DE69901049 T2 DE 69901049T2
Authority
DE
Germany
Prior art keywords
precursors
polybenzoxazole resin
polybenzoxazole
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69901049T
Other languages
English (en)
Other versions
DE69901049D1 (de
Inventor
Hidenori Saito
Michio Nakajima
Tsuyoshi Watanabe
Maki Tokuhiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Publication of DE69901049D1 publication Critical patent/DE69901049D1/de
Application granted granted Critical
Publication of DE69901049T2 publication Critical patent/DE69901049T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/22Polybenzoxazoles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49894Materials of the insulating layers or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/5329Insulating materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0046Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676Single layer compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
DE69901049T 1998-09-29 1999-09-28 Polybenzoxazolharz und Vorläufer davon Expired - Fee Related DE69901049T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27518598 1998-09-29

Publications (2)

Publication Number Publication Date
DE69901049D1 DE69901049D1 (de) 2002-04-25
DE69901049T2 true DE69901049T2 (de) 2002-11-21

Family

ID=17551874

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69901049T Expired - Fee Related DE69901049T2 (de) 1998-09-29 1999-09-28 Polybenzoxazolharz und Vorläufer davon

Country Status (8)

Country Link
US (1) US6204356B1 (de)
EP (1) EP0990673B1 (de)
KR (1) KR20000023465A (de)
CN (1) CN1215049C (de)
DE (1) DE69901049T2 (de)
MY (1) MY116046A (de)
SG (1) SG104255A1 (de)
TW (1) TW495524B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19961103C2 (de) * 1999-12-17 2002-03-14 Infineon Technologies Ag Dielektrische Füllung von elektrischen Verdrahtungsebenen und Verfahren zur Herstellung einer elektrischen Verdrahtung
WO2002024785A1 (fr) * 2000-09-21 2002-03-28 Sumitomo Bakelite Company, Ltd. Precurseur de resine resistant a la chaleur, resine resistante a la chaleur, couche isolante isolant et dispositif semiconducteur
KR20040020970A (ko) * 2001-07-27 2004-03-09 히다치 가세고교 가부시끼가이샤 광학용 수지 및 그 용도
EP1429765A2 (de) 2001-09-14 2004-06-23 Methylgene, Inc. Histone deacetylase-hemmer
JP2004107621A (ja) * 2002-07-25 2004-04-08 Polymatech Co Ltd ポリベンザゾール前駆体フィルム、ポリベンザゾールフィルム及びそれらの製造方法
EP2011842B1 (de) * 2006-03-03 2014-02-26 PI R & D Co., Ltd. Photoempfindliche farbe für den siebdruck und verfahren zur herstellung eines positiven reliefmusters unter deren verwendung
CN101535377B (zh) * 2006-10-24 2011-09-14 住友电木株式会社 双(氨基苯酚)衍生物及其制造方法以及聚酰胺树脂类、正型感光性树脂组合物、保护膜、层间绝缘膜、半导体装置和显示元件
US8357753B2 (en) * 2007-07-18 2013-01-22 Cda Processing Limited Liability Company Screen-printable encapsulants based on polyhydroxyamides that thermally convert to polybenzoxazoles
US8270145B2 (en) * 2007-12-04 2012-09-18 Cda Processing Limited Liability Company Screen-printable encapsulants based on soluble polybenzoxazoles
CN101215472B (zh) * 2008-01-15 2010-06-02 东华大学 含氟的芳杂环液晶聚合物及其制备方法
KR100932765B1 (ko) * 2008-02-28 2009-12-21 한양대학교 산학협력단 폴리이미드-폴리벤조옥사졸 공중합체, 이의 제조방법, 및이를 포함하는 기체 분리막
CA2640517A1 (en) * 2008-05-19 2009-11-19 Industry-University Cooperation Foundation, Hanyang University Polyamic acids dope composition, preparation method of hollow fiber using the same and hollow fiber prepared therefrom
US8013103B2 (en) * 2008-10-10 2011-09-06 Industry-University Cooperation Foundation, Hanyang University Polymer compounds and a preparation method thereof
US8487064B2 (en) 2008-10-10 2013-07-16 Industry-University Cooperation Foundation, Hanyang University Polymer compounds and a preparation method thereof
US8536299B2 (en) 2008-12-08 2013-09-17 University Of Dayton Rigid-rod copolymer compositions and the polymeric fibers fabricated from those compositions for enhanced flame resistance
CN103682364B (zh) * 2013-12-27 2016-06-01 上海孚赛特新材料股份有限公司 锂电池负极的胶粘剂及其制备的锂电池负极材料及锂电池
KR20170012238A (ko) * 2014-05-28 2017-02-02 아지노모토 가부시키가이샤 폴리에테르케톤 화합물
CN107474251A (zh) * 2017-08-18 2017-12-15 南京工业大学 一种膜电容器复合介电薄膜的制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62207332A (ja) 1986-03-06 1987-09-11 Central Glass Co Ltd ポリベンズオキサゾ−ル及びその製造方法
JPH0755984B2 (ja) 1986-06-20 1995-06-14 セントラル硝子株式会社 芳香族ポリアミドの製造方法
GB2188936B (en) 1986-03-06 1988-12-21 Central Glass Co Ltd Aromatic polyamides and polybenoxazoles having diphenylhexafluoropropane units
US4939215A (en) * 1987-11-24 1990-07-03 Hoechst Celanese Corporation Heat resistant polybenzoxazole from bis-((aminohydroxyphenyl)hexafluoroisopropyl)diphenyl ether
EP0459395B1 (de) * 1990-05-29 1999-08-18 Sumitomo Bakelite Company Limited Positiv arbeitende lichtempfindliche Harzzusammensetzung
US5322916A (en) * 1993-03-16 1994-06-21 The Dow Chemical Company Method for the preparation of amide oligomers and polybenzazole polymers therefrom
US5422416A (en) 1993-06-30 1995-06-06 The Dow Chemical Company Process for the synthesis of polybenzazole polymers
US5492996A (en) * 1995-02-21 1996-02-20 The United States Of America As Represented By The Secretary Of The Air Force Alcohol soluble benzazole polymers
US5493005A (en) * 1995-02-21 1996-02-20 The United States Of America As Represented By The Secretary Of The Air Force Hydroxy-pendent benzoxazole copolymers
US5498784A (en) * 1995-02-21 1996-03-12 The United States Of America As Represented By The Secretary Of The Air Force Phosphonic acid-pendent benzoxazole copolymers
EP0905170B1 (de) 1997-09-24 2013-10-30 Qimonda AG Polybenzoxazol- und Polybenzothiazol-Vorstufen
JP2000128985A (ja) * 1998-10-28 2000-05-09 Sumitomo Bakelite Co Ltd ポリベンゾオキサゾール前駆体及び樹脂
JP2000290374A (ja) * 1999-04-09 2000-10-17 Central Glass Co Ltd 含フッ素ポリベンゾオキサゾール

Also Published As

Publication number Publication date
DE69901049D1 (de) 2002-04-25
TW495524B (en) 2002-07-21
EP0990673A2 (de) 2000-04-05
CN1215049C (zh) 2005-08-17
EP0990673B1 (de) 2002-03-20
CN1254710A (zh) 2000-05-31
MY116046A (en) 2003-10-31
KR20000023465A (ko) 2000-04-25
EP0990673A3 (de) 2000-09-20
SG104255A1 (en) 2004-06-21
US6204356B1 (en) 2001-03-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee