DE69831774D1 - Nahinfrarot-empfindliche abbildbare/photopolymerisierbare Zusammensetzungen, Media und verbundene Verfahren - Google Patents

Nahinfrarot-empfindliche abbildbare/photopolymerisierbare Zusammensetzungen, Media und verbundene Verfahren

Info

Publication number
DE69831774D1
DE69831774D1 DE69831774T DE69831774T DE69831774D1 DE 69831774 D1 DE69831774 D1 DE 69831774D1 DE 69831774 T DE69831774 T DE 69831774T DE 69831774 T DE69831774 T DE 69831774T DE 69831774 D1 DE69831774 D1 DE 69831774D1
Authority
DE
Germany
Prior art keywords
media
related processes
infrared sensitive
photopolymerizable compositions
sensitive imageable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69831774T
Other languages
English (en)
Other versions
DE69831774T2 (de
Inventor
Gregory Charles Weed
Dietrich Max Fabricius
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE69831774D1 publication Critical patent/DE69831774D1/de
Publication of DE69831774T2 publication Critical patent/DE69831774T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00—Colour separation; Correction of tonal value
    • G03F3/10—Checking the colour or tonal value of separation negatives or positives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C2200/00—Details
    • G03C2200/37—Leuco dye
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/16—X-ray, infrared, or ultraviolet ray processes
    • G03C5/164—Infrared processes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452—Solder masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
DE69831774T 1997-07-03 1998-01-16 Nahinfrarot-empfindliche abbildbare/photopolymerisierbare Zusammensetzungen, Media und verbundene Verfahren Expired - Lifetime DE69831774T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US88824297A 1997-07-03 1997-07-03
US888242 1997-07-03

Publications (2)

Publication Number Publication Date
DE69831774D1 true DE69831774D1 (de) 2006-02-16
DE69831774T2 DE69831774T2 (de) 2006-07-13

Family

ID=25392830

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69831774T Expired - Lifetime DE69831774T2 (de) 1997-07-03 1998-01-16 Nahinfrarot-empfindliche abbildbare/photopolymerisierbare Zusammensetzungen, Media und verbundene Verfahren

Country Status (3)

Country Link
EP (1) EP0889363B1 (de)
JP (1) JP4156069B2 (de)
DE (1) DE69831774T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6309792B1 (en) * 2000-02-18 2001-10-30 Kodak Polychrome Graphics Llc IR-sensitive composition and use thereof for the preparation of printing plate precursors
TWI255393B (en) * 2000-03-21 2006-05-21 Hitachi Chemical Co Ltd Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern and process for producing printed wiring board
JP4373624B2 (ja) * 2000-09-04 2009-11-25 富士フイルム株式会社 感熱性組成物、それを用いた平版印刷版原版及びスルホニウム塩化合物
US6884568B2 (en) 2000-10-17 2005-04-26 Kodak Polychrome Graphics, Llc Stabilized infrared-sensitive polymerizable systems
US7056639B2 (en) 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
US6702437B2 (en) * 2001-08-23 2004-03-09 Fuji Photo Film Co., Ltd. Image recording material
US7700258B2 (en) 2003-01-24 2010-04-20 Hewlett-Packard Development Company, L.P. Color forming compositions with improved marking sensitivity and image contrast and associated methods
US7462443B2 (en) 2003-09-05 2008-12-09 Hewlett-Packard Development Company, L.P. Leuco dye-containing coating compositions
US7329630B2 (en) 2003-09-05 2008-02-12 Hewlett-Packard Development Company, L.P. Stabilizers and anti-fade agents for use in infrared sensitive leuco dye compositions
US20050233246A1 (en) * 2004-04-16 2005-10-20 Eugene Boden Novel optical storage materials, methods of making the storage materials, and methods for storing and reading data
EP1614541A3 (de) 2004-07-08 2006-06-07 Agfa-Gevaert Verfahren zur Herstellung einer lithographischen Druckplatte
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
JP4208145B2 (ja) * 2004-11-12 2009-01-14 富士フイルム株式会社 パターン形成用組成物、パターン形成材料、及びパターン形成装置並びにパターン形成方法
JP4524235B2 (ja) * 2005-03-29 2010-08-11 富士フイルム株式会社 平版印刷版原版
JP5284110B2 (ja) * 2007-02-16 2013-09-11 国立大学法人 東京大学 蛍光プローブ
JP6498936B2 (ja) * 2012-12-19 2019-04-10 株式会社Adeka 着色感光性組成物
JP7748474B2 (ja) 2021-04-01 2025-10-02 アグフア－ゲヴエルト，ナームローゼ・フエンノートシヤツプ Ｎｉｒ吸収カプセル
KR102563872B1 (ko) * 2021-06-21 2023-08-04 (주)이녹스첨단소재 디스플레이용 접착시트 및 이를 포함하는 디스플레이
DE102021006273B4 (de) 2021-12-21 2024-06-13 Lohmann Gmbh & Co. Kg Indikatormischung
TWI883599B (zh) 2022-10-21 2025-05-11 日商旭化成股份有限公司 感光性樹脂組成物、感光性樹脂積層體、及光阻圖案之形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636459A (en) * 1985-03-06 1987-01-13 Fuji Photo Film Co., Ltd. Photopolymerizable compositions
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
CA2033821A1 (en) * 1990-01-12 1991-07-13 Evan D. Laganis Photopolymerizable compositions sensitive to longer wavelength visible actinic radiation
DE4240141A1 (de) * 1992-11-28 1994-06-01 Du Pont Deutschland Kennzeichenbares Photoresistmaterial
JPH08297364A (ja) * 1995-04-25 1996-11-12 Toppan Printing Co Ltd 画像形成シート、画像形成方法および簡易校正刷り

Also Published As

Publication number Publication date
EP0889363B1 (de) 2005-10-05
JPH11149154A (ja) 1999-06-02
DE69831774T2 (de) 2006-07-13
JP4156069B2 (ja) 2008-09-24
EP0889363A1 (de) 1999-01-07

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