DE69828964D1 - Aromatische maleimide und ihre verwendung als photoinitiatoren - Google Patents

Aromatische maleimide und ihre verwendung als photoinitiatoren

Info

Publication number
DE69828964D1
DE69828964D1 DE69828964T DE69828964T DE69828964D1 DE 69828964 D1 DE69828964 D1 DE 69828964D1 DE 69828964 T DE69828964 T DE 69828964T DE 69828964 T DE69828964 T DE 69828964T DE 69828964 D1 DE69828964 D1 DE 69828964D1
Authority
DE
Germany
Prior art keywords
photoinitiators
aromatic maleimides
maleimides
aromatic
irradiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69828964T
Other languages
English (en)
Other versions
DE69828964T2 (de
Inventor
W Miller
E Hoyle
Sonny Joensson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Southern Mississippi
Albemarle Corp
Original Assignee
University of Southern Mississippi
Albemarle Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Southern Mississippi, Albemarle Corp filed Critical University of Southern Mississippi
Application granted granted Critical
Publication of DE69828964D1 publication Critical patent/DE69828964D1/de
Publication of DE69828964T2 publication Critical patent/DE69828964T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
    • C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
    • C07D207/448—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
    • C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
    • C07D207/448—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
    • C07D207/452—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
    • C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
    • C07D207/456—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to other ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1063—Esters of polycondensation macromers of alcohol terminated polyethers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Pyrrole Compounds (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Fats And Perfumes (AREA)
DE69828964T 1997-05-27 1998-05-26 Aromatische maleimide und ihre verwendung als photoinitiatoren Expired - Fee Related DE69828964T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US4772997P 1997-05-27 1997-05-27
US47729P 1997-05-27
PCT/US1998/010655 WO1998054134A1 (en) 1997-05-27 1998-05-26 Aromatic maleimides and their use as photoinitiators

Publications (2)

Publication Number Publication Date
DE69828964D1 true DE69828964D1 (de) 2005-03-17
DE69828964T2 DE69828964T2 (de) 2006-03-30

Family

ID=21950610

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69828964T Expired - Fee Related DE69828964T2 (de) 1997-05-27 1998-05-26 Aromatische maleimide und ihre verwendung als photoinitiatoren

Country Status (11)

Country Link
US (2) US6153662A (de)
EP (1) EP0984931B1 (de)
JP (1) JP2002500670A (de)
KR (1) KR20010012992A (de)
CN (1) CN1263524A (de)
AT (1) ATE288894T1 (de)
AU (1) AU7597598A (de)
BR (1) BR9809495A (de)
CA (1) CA2290737A1 (de)
DE (1) DE69828964T2 (de)
WO (1) WO1998054134A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002502056A (ja) * 1998-01-30 2002-01-22 ファースト・ケミカル・コーポレイション マレイミドを含む光重合組成物およびその使用方法
DE60136592D1 (de) * 2000-06-19 2009-01-02 Toagosei Co Ltd Vernetzbare Harzzusammensetzungen
US6593389B1 (en) * 2001-04-05 2003-07-15 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Polyimides by photochemical cyclopolymerization
KR100465445B1 (ko) * 2001-07-31 2005-01-13 삼성전자주식회사 액정배향막용 광배향재
US6596786B2 (en) * 2001-08-17 2003-07-22 Alcatel Radiation-curable coating composition including oligomeric photoinitiator and/or oligomeric adhesion promoter
US20080103222A1 (en) * 2002-04-26 2008-05-01 Albemarle Corporation New Class of Amine Coinitiators in Photoinitiated Polymerizations
US20040198859A1 (en) * 2003-04-03 2004-10-07 Nguyen Chau K. Photopolymerization systems and their use
US20060293404A1 (en) * 2003-04-24 2006-12-28 Santobianco John G New class of amine coinitiators in photoinitiated polymerizations
US20060009539A1 (en) * 2004-07-12 2006-01-12 Herr Donald E Maleimide-based radiation curable compositions
US7786183B2 (en) * 2005-06-20 2010-08-31 Dow Global Technologies Inc. Coated glass articles
US7781493B2 (en) 2005-06-20 2010-08-24 Dow Global Technologies Inc. Protective coating for window glass
US7955696B2 (en) 2006-12-19 2011-06-07 Dow Global Technologies Llc Composites and methods for conductive transparent substrates
CN101563412B (zh) 2006-12-19 2014-07-16 陶氏环球技术公司 用于改进涂料组合物的促粘添加剂和方法
US7939161B2 (en) * 2006-12-19 2011-05-10 Dow Global Technologies Llc Encapsulated panel assemblies and methods for making same
EP2225339B1 (de) 2007-12-18 2016-06-29 Dow Global Technologies LLC Schutzbeschichtung für fenstergläser mit verstärkter haftung an glasbindungshaftmittel
JP2009214428A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp 平版印刷版原版および平版印刷方法
CN102492320B (zh) * 2011-12-05 2014-01-15 中昊北方涂料工业研究设计院有限公司 耐高温光纤用快速固化聚酰亚胺涂料
JP5895297B2 (ja) * 2012-02-10 2016-03-30 国立大学法人京都工芸繊維大学 蛍光体およびその利用
CN113582905B (zh) * 2021-09-06 2022-12-09 福建师范大学泉港石化研究院 一种酰亚胺类衍生物及其制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3129225A (en) * 1961-06-07 1964-04-14 Us Vitamin Pharm Corp Novel 4-oxy-3-maleimidyl betaines
US3729814A (en) * 1967-04-04 1973-05-01 Gen Electric Method for making a composite
US3850955A (en) * 1972-11-17 1974-11-26 Dow Chemical Co N-(trifluoromethyl-and trifluoromethylhalophenyl)maleimides
US3890270A (en) * 1974-04-10 1975-06-17 Tenneco Chem Polyvinyl halide resin compositions
DE2919841A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
DE2919823A1 (de) * 1979-05-16 1980-11-20 Siemens Ag N-azidosulfonylaryl-maleinimide sowie deren verwendung
DE3069448D1 (en) * 1979-05-18 1984-11-22 Ciba Geigy Ag Photocrosslinkable copolymers, photosensitive recording material containing them, its utilisation in the production of photographic pictures and process for the production of photographic pictures
US4416975A (en) * 1981-02-04 1983-11-22 Ciba-Geigy Corporation Photopolymerization process employing compounds containing acryloyl groups and maleimide groups
US4544621A (en) * 1982-05-19 1985-10-01 Ciba Geigy Corporation Photocrosslinkable water-soluble polymers, containing maleimidyl and quaternary ammonium groups process for their preparation and use thereof
US4656292A (en) * 1982-05-19 1987-04-07 Ciba-Geigy Corporation 2,3-dimethylmaleimido-alkyl haloacetates
US5026625A (en) * 1987-12-01 1991-06-25 Ciba-Geigy Corporation Titanocenes, the use thereof, and n-substituted fluoroanilines
US4886842A (en) * 1988-03-04 1989-12-12 Loctite Corporation Epoxy-amine compositions employing unsaturated imides
CA2020378A1 (en) * 1989-07-28 1991-01-29 Sangya Jain Maleimide containing, negative working deep uv photoresist
US5171655A (en) * 1989-08-03 1992-12-15 Fuji Photo Film Co., Ltd. Photohardenable light-sensitive composition
JPH0384016A (ja) * 1989-08-28 1991-04-09 Showa Highpolymer Co Ltd 光硬化可能な組成物
US5196550A (en) * 1990-04-30 1993-03-23 The B. F. Goodrich Company Maleimido group containing monomers
JP3008475B2 (ja) * 1990-10-24 2000-02-14 大日本インキ化学工業株式会社 光ファイバ被覆用紫外線硬化型樹脂組成物
US5446073A (en) * 1993-03-31 1995-08-29 Fusion Systems Corporation Photopolymerization process employing a charge transfer complex without a photoinitiator
US6025409A (en) * 1996-02-29 2000-02-15 Dsm N.V. Radiation curable coating composition
US6034150A (en) * 1996-08-23 2000-03-07 University Of Southern Mississippi Polymerization processes using aliphatic maleimides

Also Published As

Publication number Publication date
EP0984931A1 (de) 2000-03-15
WO1998054134A1 (en) 1998-12-03
CN1263524A (zh) 2000-08-16
KR20010012992A (ko) 2001-02-26
DE69828964T2 (de) 2006-03-30
US6150431A (en) 2000-11-21
ATE288894T1 (de) 2005-02-15
EP0984931B1 (de) 2005-02-09
AU7597598A (en) 1998-12-30
US6153662A (en) 2000-11-28
JP2002500670A (ja) 2002-01-08
CA2290737A1 (en) 1998-12-03
BR9809495A (pt) 2000-10-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee