DE69819792D1 - Verfahren zur Herstellung einer imprägnierten Kathode - Google Patents
Verfahren zur Herstellung einer imprägnierten KathodeInfo
- Publication number
- DE69819792D1 DE69819792D1 DE69819792T DE69819792T DE69819792D1 DE 69819792 D1 DE69819792 D1 DE 69819792D1 DE 69819792 T DE69819792 T DE 69819792T DE 69819792 T DE69819792 T DE 69819792T DE 69819792 D1 DE69819792 D1 DE 69819792D1
- Authority
- DE
- Germany
- Prior art keywords
- electron emitting
- sintered body
- porous metal
- emitting material
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
- H01J9/042—Manufacture, activation of the emissive part
- H01J9/047—Cathodes having impregnated bodies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
- H01J1/28—Dispenser-type cathodes, e.g. L-cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
- H01J9/042—Manufacture, activation of the emissive part
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Solid Thermionic Cathode (AREA)
- Powder Metallurgy (AREA)
- Inert Electrodes (AREA)
- Secondary Cells (AREA)
- Cold Cathode And The Manufacture (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18402397 | 1997-07-09 | ||
JP18402397A JP3696720B2 (ja) | 1997-07-09 | 1997-07-09 | 含浸型陰極とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69819792D1 true DE69819792D1 (de) | 2003-12-18 |
DE69819792T2 DE69819792T2 (de) | 2004-09-30 |
Family
ID=16146001
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69819792T Expired - Fee Related DE69819792T2 (de) | 1997-07-09 | 1998-07-04 | Verfahren zur Herstellung einer imprägnierten Kathode |
DE69817702T Expired - Fee Related DE69817702T2 (de) | 1997-07-09 | 1998-07-04 | Imprägnierte Kathode und Verfahren zu ihrer Herstellung |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69817702T Expired - Fee Related DE69817702T2 (de) | 1997-07-09 | 1998-07-04 | Imprägnierte Kathode und Verfahren zu ihrer Herstellung |
Country Status (8)
Country | Link |
---|---|
US (3) | US6376975B1 (de) |
EP (2) | EP1267377B1 (de) |
JP (1) | JP3696720B2 (de) |
KR (2) | KR100308218B1 (de) |
CN (2) | CN1139093C (de) |
AT (2) | ATE254336T1 (de) |
DE (2) | DE69819792T2 (de) |
TW (1) | TW393657B (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0831512A4 (de) * | 1995-06-09 | 1999-02-10 | Toshiba Kk | Vorratskathodenstruktur, kathodensubstrat für diese stuktur, elektronenkanonenstruktur unter verwendung dieser struktur und elektronenröhre |
JPH11339633A (ja) * | 1997-11-04 | 1999-12-10 | Sony Corp | 含浸型陰極およびその製造方法、並びに電子銃および電子管 |
KR100508038B1 (ko) * | 1998-03-12 | 2005-11-03 | 삼성전자주식회사 | 계조 전압을 조절하는 액정 표시 장치용 구동회로 |
KR100696458B1 (ko) * | 2000-10-06 | 2007-03-19 | 삼성에스디아이 주식회사 | 전자관용 음극 및 그 제조방법 |
FR2840450A1 (fr) * | 2002-05-31 | 2003-12-05 | Thomson Licensing Sa | Corps cathodo-emissif pour cathode impregnee de tube electronique |
CN101297452A (zh) * | 2005-09-14 | 2008-10-29 | 力特保险丝有限公司 | 充气式电涌放电器、激活化合物、点火条及相应方法 |
GB0618411D0 (en) * | 2006-09-19 | 2006-11-01 | Univ Surrey | Thermo-electric propulsion device, method of operating a thermo-electric propulsion device and spacecraft |
JP5423240B2 (ja) * | 2009-08-24 | 2014-02-19 | パナソニック株式会社 | 閃光放電管用電極及び閃光放電管 |
CN102315062B (zh) * | 2010-07-07 | 2013-08-07 | 中国科学院电子学研究所 | 一种长寿命覆膜浸渍钡钨阴极及其制备方法 |
CN104766774A (zh) * | 2015-04-16 | 2015-07-08 | 成都国光电气股份有限公司 | 一种阴极发射体 |
CN107564783B (zh) * | 2017-09-05 | 2019-12-03 | 中国科学院电子学研究所 | 热场发射阴极及其制备方法、及应用其的真空电子器件 |
CN114203500A (zh) * | 2021-11-29 | 2022-03-18 | 北京航空航天大学 | 发射基体组件的制备方法、发射基体组件和电子枪 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL93663C (de) * | 1954-12-24 | |||
US2878409A (en) | 1957-04-29 | 1959-03-17 | Philips Corp | Dispenser-type cathode and method of making |
US3257703A (en) | 1961-09-29 | 1966-06-28 | Texas Instruments Inc | Composite electrode materials, articles made therefrom and methods of making the same |
US3238596A (en) | 1962-10-23 | 1966-03-08 | Sperry Rand Corp | Method of fabricating a matrix cathode |
DE1764260A1 (de) | 1968-05-04 | 1971-07-01 | Telefunken Patent | Verfahren zum Herstellen einer Vorratskathode |
US3879830A (en) | 1971-06-30 | 1975-04-29 | Gte Sylvania Inc | Cathode for electron discharge device having highly adherent emissive coating of nickel and nickel coated carbonates |
JPS50103967A (de) | 1974-01-14 | 1975-08-16 | ||
DE2808134A1 (de) * | 1978-02-25 | 1979-08-30 | Licentia Gmbh | Vorratskathode |
JPS5652835A (en) | 1979-10-01 | 1981-05-12 | Hitachi Ltd | Impregnated cathode |
FR2494035A1 (fr) * | 1980-11-07 | 1982-05-14 | Thomson Csf | Cathode thermo-electronique pour tube hyperfrequences et tube incorporant une telle cathode |
JPS5834539A (ja) * | 1981-08-21 | 1983-03-01 | Nec Corp | 含浸型陰極 |
JPS5887735A (ja) | 1981-11-19 | 1983-05-25 | Sony Corp | 含浸型陰極の製法 |
US4478590A (en) * | 1981-12-28 | 1984-10-23 | North American Philips Consumer Electronics Corp. | Depression cathode structure for cathode ray tubes having surface smoothness and method for producing same |
KR910002969B1 (ko) | 1987-06-12 | 1991-05-11 | 미쓰비시전기주식회사 | 전자관음극(cathode for an electron tube) |
JPH0690907B2 (ja) | 1988-02-02 | 1994-11-14 | 三菱電機株式会社 | 電子管用陰極 |
JPH0337176A (ja) * | 1989-06-30 | 1991-02-18 | Ngk Insulators Ltd | 反応焼結窒化珪素焼結体及びその製造方法 |
US4957463A (en) | 1990-01-02 | 1990-09-18 | The United States Of America As Represented By The Secretary Of The Army | Method of making a long life high current density cathode from tungsten and iridium powders using a quaternary compound as the impregnant |
JPH0574324A (ja) | 1991-09-11 | 1993-03-26 | Mitsubishi Electric Corp | 電子管用陰極 |
KR930009170B1 (ko) | 1991-10-24 | 1993-09-23 | 삼성전관 주식회사 | 함침형 음극의 제조방법 |
JP3378275B2 (ja) | 1992-09-18 | 2003-02-17 | 株式会社東芝 | 多孔質焼結基体、その製造方法およびそれを用いた含浸型陰極 |
JPH06111711A (ja) * | 1992-09-30 | 1994-04-22 | Sony Corp | 含浸型陰極 |
JPH07105835A (ja) | 1993-10-07 | 1995-04-21 | Sony Corp | 酸化物陰極の形成方法 |
US5982083A (en) | 1995-02-23 | 1999-11-09 | Samsung Display Devices Co., Ltd. | Cathode for electron tube |
EP0831512A4 (de) * | 1995-06-09 | 1999-02-10 | Toshiba Kk | Vorratskathodenstruktur, kathodensubstrat für diese stuktur, elektronenkanonenstruktur unter verwendung dieser struktur und elektronenröhre |
JPH0982233A (ja) | 1995-09-18 | 1997-03-28 | Hitachi Ltd | 電子放射物質層を有する陰極を備えた電子管 |
-
1997
- 1997-07-09 JP JP18402397A patent/JP3696720B2/ja not_active Expired - Fee Related
-
1998
- 1998-07-01 TW TW087110627A patent/TW393657B/zh not_active IP Right Cessation
- 1998-07-04 EP EP02018387A patent/EP1267377B1/de not_active Expired - Lifetime
- 1998-07-04 AT AT02018387T patent/ATE254336T1/de not_active IP Right Cessation
- 1998-07-04 AT AT98112364T patent/ATE249092T1/de not_active IP Right Cessation
- 1998-07-04 DE DE69819792T patent/DE69819792T2/de not_active Expired - Fee Related
- 1998-07-04 DE DE69817702T patent/DE69817702T2/de not_active Expired - Fee Related
- 1998-07-04 EP EP98112364A patent/EP0890972B1/de not_active Expired - Lifetime
- 1998-07-06 US US09/110,792 patent/US6376975B1/en not_active Expired - Fee Related
- 1998-07-09 CN CNB981159656A patent/CN1139093C/zh not_active Expired - Fee Related
- 1998-07-09 KR KR1019980027678A patent/KR100308218B1/ko not_active IP Right Cessation
- 1998-07-09 CN CNA031016146A patent/CN1516213A/zh active Pending
-
2000
- 2000-02-09 US US09/501,040 patent/US6306003B1/en not_active Expired - Fee Related
-
2001
- 2001-01-25 US US09/769,601 patent/US6705913B2/en not_active Expired - Fee Related
- 2001-05-23 KR KR1020010028354A patent/KR100411461B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1516213A (zh) | 2004-07-28 |
US6306003B1 (en) | 2001-10-23 |
ATE254336T1 (de) | 2003-11-15 |
US20010019239A1 (en) | 2001-09-06 |
CN1139093C (zh) | 2004-02-18 |
KR100308218B1 (ko) | 2001-12-17 |
ATE249092T1 (de) | 2003-09-15 |
KR100411461B1 (ko) | 2003-12-18 |
JP3696720B2 (ja) | 2005-09-21 |
EP0890972A1 (de) | 1999-01-13 |
EP1267377A1 (de) | 2002-12-18 |
DE69817702T2 (de) | 2004-07-15 |
CN1205538A (zh) | 1999-01-20 |
DE69817702D1 (de) | 2003-10-09 |
US6705913B2 (en) | 2004-03-16 |
TW393657B (en) | 2000-06-11 |
EP1267377B1 (de) | 2003-11-12 |
JPH1131451A (ja) | 1999-02-02 |
KR19990013735A (ko) | 1999-02-25 |
US6376975B1 (en) | 2002-04-23 |
EP0890972B1 (de) | 2003-09-03 |
DE69819792T2 (de) | 2004-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |