DE69813059D1 - Dunnschicht-Fluoropolymer enthaltendes elektronisches System - Google Patents

Dunnschicht-Fluoropolymer enthaltendes elektronisches System

Info

Publication number
DE69813059D1
DE69813059D1 DE69813059T DE69813059T DE69813059D1 DE 69813059 D1 DE69813059 D1 DE 69813059D1 DE 69813059 T DE69813059 T DE 69813059T DE 69813059 T DE69813059 T DE 69813059T DE 69813059 D1 DE69813059 D1 DE 69813059D1
Authority
DE
Germany
Prior art keywords
thin layer
electronic system
system containing
containing thin
layer fluoropolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69813059T
Other languages
English (en)
Other versions
DE69813059T2 (de
Inventor
Atsushi Watakabe
Jun-Ichi Tayanagi
Masayuki Tamura
Haruhisa Miyake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of DE69813059D1 publication Critical patent/DE69813059D1/de
Application granted granted Critical
Publication of DE69813059T2 publication Critical patent/DE69813059T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F14/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F14/18—Monomers containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/48—Isomerisation; Cyclisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/14—Integrated circuits
    • H01L2924/141—Analog devices
    • H01L2924/1423—Monolithic Microwave Integrated Circuit [MMIC]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/14—Integrated circuits
    • H01L2924/143—Digital devices
    • H01L2924/1433—Application-specific integrated circuit [ASIC]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/032—Organic insulating material consisting of one material
    • H05K1/034—Organic insulating material consisting of one material containing halogen
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
DE1998613059 1997-01-31 1998-01-30 Dunnschicht-Fluoropolymer enthaltendes elektronisches System Expired - Fee Related DE69813059T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1916597 1997-01-31
JP20185297 1997-07-28

Publications (2)

Publication Number Publication Date
DE69813059D1 true DE69813059D1 (de) 2003-05-15
DE69813059T2 DE69813059T2 (de) 2003-11-27

Family

ID=26355994

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1998613059 Expired - Fee Related DE69813059T2 (de) 1997-01-31 1998-01-30 Dunnschicht-Fluoropolymer enthaltendes elektronisches System

Country Status (5)

Country Link
US (1) US6203912B1 (de)
EP (1) EP0856529B1 (de)
KR (1) KR19980070980A (de)
DE (1) DE69813059T2 (de)
TW (1) TW416260B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5866711A (en) * 1996-09-13 1999-02-02 E. I. Du Pont De Nemours And Company Fluorocyanate and fluorocarbamate monomers and polymers thereof
JP4547735B2 (ja) * 1999-07-14 2010-09-22 ダイキン工業株式会社 含フッ素重合体の硬化方法
JP4343354B2 (ja) * 1999-11-02 2009-10-14 Ａｇｃセイミケミカル株式会社 半田用フラックス這い上がり防止剤組成物とその用途
WO2002084346A1 (fr) * 2001-04-10 2002-10-24 Asahi Glass Company, Limited Guide d'ondes optique
US7129009B2 (en) * 2002-05-14 2006-10-31 E. I. Du Pont De Nemours And Company Polymer-liquid compositions useful in ultraviolet and vacuum ultraviolet uses
US6956085B2 (en) * 2003-02-14 2005-10-18 3M Innovative Properties Company Fluoroelastomer compositions
JP2005075880A (ja) 2003-08-29 2005-03-24 Du Pont Mitsui Fluorochem Co Ltd 低帯電性熱溶融性フッ素樹脂組成物
KR100670778B1 (ko) 2004-10-11 2007-01-17 한국전자통신연구원 트리아진 그룹을 갖는 유기 반도체 소자용 화합물과, 이를포함하는 유기 반도체 박막 및 유기 반도체 소자와,이들의 제조 방법
CN101056946B (zh) * 2004-11-11 2011-05-04 株式会社钟化 固化性组合物
KR101209046B1 (ko) * 2005-07-27 2012-12-06 삼성디스플레이 주식회사 박막트랜지스터 기판과 박막트랜지스터 기판의 제조방법
EP1930385A4 (de) * 2005-08-30 2009-11-11 Asahi Glass Co Ltd Wässriges oberflächenbehandlungsmittel und oberflächenbehandelte konstruktion
US7388054B2 (en) * 2005-12-23 2008-06-17 3M Innovative Properties Company Fluoropolymer curing co-agent compositions
US20090018275A1 (en) 2007-01-26 2009-01-15 Greene, Tweed Of Delaware, Inc. Method of Bonding Perfluoroelastomeric Materials to a Surface
WO2011046770A1 (en) * 2009-10-14 2011-04-21 Lockheed Martin Corporation Serviceable conformal em shield
US8947889B2 (en) 2010-10-14 2015-02-03 Lockheed Martin Corporation Conformal electromagnetic (EM) detector
WO2013085864A2 (en) 2011-12-06 2013-06-13 3M Innovative Properties Company Fluorinated oligomers having pendant functional groups
US9528028B2 (en) 2013-04-30 2016-12-27 Cheil Industries, Inc. Method for preparing modified silica film and modified silica film prepared from the same
JP6134576B2 (ja) * 2013-04-30 2017-05-24 サムスン エスディアイ カンパニー，リミテッドＳａｍｓｕｎｇ Ｓｄｉ Ｃｏ．，Ｌｔｄ． 改質シリカ膜の製造方法、塗工液、及び改質シリカ膜

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4281092A (en) * 1978-11-30 1981-07-28 E. I. Du Pont De Nemours And Company Vulcanizable fluorinated copolymers
JPS5759850A (en) 1980-09-30 1982-04-10 Daikin Ind Ltd Polyfluoroallyl ether and its preparation and use
US4599386A (en) 1984-10-18 1986-07-08 E. I. Du Pont De Nemours And Company Heat stable tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymers
JPH01123849A (ja) * 1987-11-10 1989-05-16 Asahi Glass Co Ltd 積層材用樹脂組成物及びその金属箔張積層板
JPH04252206A (ja) * 1991-01-28 1992-09-08 Matsushita Electric Works Ltd Ｓ−トリアジン環含有ポリマーの製法
TW222650B (de) 1991-04-01 1994-04-21 Dow Corning
US5498657A (en) * 1993-08-27 1996-03-12 Asahi Glass Company Ltd. Fluorine-containing polymer composition
US5447993A (en) 1994-04-19 1995-09-05 E. I. Du Pont De Nemours And Company Perfluoroelastomer curing
JP3398492B2 (ja) * 1994-10-21 2003-04-21 日本メクトロン株式会社 含フッ素エラストマー組成物

Also Published As

Publication number Publication date
EP0856529B1 (de) 2003-04-09
TW416260B (en) 2000-12-21
KR19980070980A (ko) 1998-10-26
US6203912B1 (en) 2001-03-20
DE69813059T2 (de) 2003-11-27
EP0856529A1 (de) 1998-08-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee