DE69729541D1 - Verwendung eines Lösungsmittelgemisches zur Walzenbeschichtung einer strahlungsempfindlichen Zusammensetzung - Google Patents

Verwendung eines Lösungsmittelgemisches zur Walzenbeschichtung einer strahlungsempfindlichen Zusammensetzung

Info

Publication number
DE69729541D1
DE69729541D1 DE69729541T DE69729541T DE69729541D1 DE 69729541 D1 DE69729541 D1 DE 69729541D1 DE 69729541 T DE69729541 T DE 69729541T DE 69729541 T DE69729541 T DE 69729541T DE 69729541 D1 DE69729541 D1 DE 69729541D1
Authority
DE
Germany
Prior art keywords
radiation
solvent mixture
sensitive composition
roller coating
roller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69729541T
Other languages
English (en)
Other versions
DE69729541T2 (de
Inventor
Kenji Susukida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
Clariant Finance BVI Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Finance BVI Ltd filed Critical Clariant Finance BVI Ltd
Application granted granted Critical
Publication of DE69729541D1 publication Critical patent/DE69729541D1/de
Publication of DE69729541T2 publication Critical patent/DE69729541T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
DE69729541T 1996-12-26 1997-12-18 Verwendung eines Lösungsmittelgemisches zur Walzenbeschichtung einer strahlungsempfindlichen Zusammensetzung Expired - Fee Related DE69729541T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP34757896 1996-12-26
JP34757896A JPH10186638A (ja) 1996-12-26 1996-12-26 ロールコート用放射線感応性組成物

Publications (2)

Publication Number Publication Date
DE69729541D1 true DE69729541D1 (de) 2004-07-22
DE69729541T2 DE69729541T2 (de) 2005-06-30

Family

ID=18391171

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69729541T Expired - Fee Related DE69729541T2 (de) 1996-12-26 1997-12-18 Verwendung eines Lösungsmittelgemisches zur Walzenbeschichtung einer strahlungsempfindlichen Zusammensetzung

Country Status (6)

Country Link
EP (1) EP0851298B1 (de)
JP (1) JPH10186638A (de)
KR (1) KR19980064669A (de)
CN (1) CN1191993A (de)
DE (1) DE69729541T2 (de)
SG (1) SG55431A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100455652B1 (ko) * 1999-09-06 2004-11-06 삼성전자주식회사 포지티브형 포토레지스트 막의 제조방법
US6737212B1 (en) 1999-10-07 2004-05-18 Clariant Finance (Bvi) Limited Photosensitive composition
JP2005290093A (ja) * 2004-03-31 2005-10-20 Nippon Zeon Co Ltd 架橋性樹脂組成物、積層体及びその製造方法並びに電子部品
FR2885536B1 (fr) 2005-05-12 2007-07-27 Roquette Freres Composition a base d'ethers de dianhydrohexitol pour le traitement d'une matiere autre que le corps humain
JP4647418B2 (ja) * 2005-07-19 2011-03-09 ダイセル化学工業株式会社 レジスト組成物
JP4752556B2 (ja) * 2005-09-22 2011-08-17 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
CN101296999A (zh) * 2005-10-28 2008-10-29 东丽株式会社 硅氧烷树脂组合物及其制造方法
JP2016045236A (ja) * 2014-08-20 2016-04-04 Jsr株式会社 着色組成物、着色硬化膜及び表示素子

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1324548A (en) * 1970-11-25 1973-07-25 Du Pont Photosensitive compositions comprising bis-diazonium salts
JPS62169163A (ja) * 1986-01-22 1987-07-25 Fuji Photo Film Co Ltd 感光性平版印刷版の製造方法
US4845008A (en) * 1986-02-20 1989-07-04 Fuji Photo Film Co., Ltd. Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
EP0536086A1 (de) * 1991-10-03 1993-04-07 Ciba-Geigy Ag Photoempfindliche Gemische
US5342734A (en) * 1992-02-25 1994-08-30 Morton International, Inc. Deep UV sensitive photoresist resistant to latent image decay

Also Published As

Publication number Publication date
DE69729541T2 (de) 2005-06-30
KR19980064669A (ko) 1998-10-07
CN1191993A (zh) 1998-09-02
EP0851298B1 (de) 2004-06-16
JPH10186638A (ja) 1998-07-14
SG55431A1 (en) 1998-12-21
EP0851298A1 (de) 1998-07-01

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: AZ ELECTRONIC MATERIALS USA CORP., SOMERVILLE, N.J

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU

8339 Ceased/non-payment of the annual fee