DE69727574T2 - Magnetfeldfühler und verfahren zur herstellung eines magnetfeldfühlers - Google Patents
Magnetfeldfühler und verfahren zur herstellung eines magnetfeldfühlers Download PDFInfo
- Publication number
- DE69727574T2 DE69727574T2 DE69727574T DE69727574T DE69727574T2 DE 69727574 T2 DE69727574 T2 DE 69727574T2 DE 69727574 T DE69727574 T DE 69727574T DE 69727574 T DE69727574 T DE 69727574T DE 69727574 T2 DE69727574 T2 DE 69727574T2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- magnetic
- exchange
- sensor
- nio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 80
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000000034 method Methods 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 19
- 238000004544 sputter deposition Methods 0.000 claims description 15
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 10
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- 230000004907 flux Effects 0.000 claims description 9
- 238000000889 atomisation Methods 0.000 claims description 8
- 238000005137 deposition process Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 34
- 238000006073 displacement reaction Methods 0.000 description 14
- 229910000889 permalloy Inorganic materials 0.000 description 14
- 229910015136 FeMn Inorganic materials 0.000 description 9
- 230000005415 magnetization Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000003795 desorption Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 241000238366 Cephalopoda Species 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 241001125671 Eretmochelys imbricata Species 0.000 description 1
- 229910000914 Mn alloy Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 230000005290 antiferromagnetic effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000559 atomic spectroscopy Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005358 geomagnetic field Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- DALUDRGQOYMVLD-UHFFFAOYSA-N iron manganese Chemical compound [Mn].[Fe] DALUDRGQOYMVLD-UHFFFAOYSA-N 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004018 waxing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
- Y10T428/1107—Magnetoresistive
- Y10T428/1121—Multilayer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP96201884 | 1996-07-05 | ||
| EP96201884 | 1996-07-05 | ||
| PCT/IB1997/000657 WO1998001762A2 (en) | 1996-07-05 | 1997-06-06 | A magnetic field sensor and a method of manufacturing such a sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69727574D1 DE69727574D1 (de) | 2004-03-18 |
| DE69727574T2 true DE69727574T2 (de) | 2004-12-16 |
Family
ID=8224149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69727574T Expired - Fee Related DE69727574T2 (de) | 1996-07-05 | 1997-06-06 | Magnetfeldfühler und verfahren zur herstellung eines magnetfeldfühlers |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5904996A (enExample) |
| EP (1) | EP0910800B1 (enExample) |
| JP (1) | JP2000500292A (enExample) |
| DE (1) | DE69727574T2 (enExample) |
| WO (1) | WO1998001762A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69722860T2 (de) * | 1996-01-31 | 2004-05-19 | Koninklijke Philips Electronics N.V. | Magnetkopf mit magnetoresistivem sensor und mit den magnetkopf versehende abtastvorrichtung |
| US6184680B1 (en) * | 1997-03-28 | 2001-02-06 | Tdk Corporation | Magnetic field sensor with components formed on a flexible substrate |
| WO1999001778A1 (en) * | 1997-07-01 | 1999-01-14 | Koninklijke Philips Electronics N.V. | Magnetic field sensor |
| US6472868B1 (en) * | 1998-08-05 | 2002-10-29 | Minebea Co., Ltd. | Magnetic impedance element having at least two thin film-magnetic cores |
| US6306311B1 (en) | 1999-11-01 | 2001-10-23 | Headway Technologies, Inc. | Method to make a high data rate stitched writer for a giant magneto-resistive head |
| DE10028640B4 (de) * | 2000-06-09 | 2005-11-03 | Institut für Physikalische Hochtechnologie e.V. | Wheatstonebrücke, beinhaltend Brückenelemente, bestehend aus einem Spin-Valve-System, sowie ein Verfahren zu deren Herstellung |
| FR2845075B1 (fr) * | 2002-09-27 | 2005-08-05 | Thales Sa | Microcommutateurs a actuation electrostatique a faible temps de reponse et commutation de puissance et procede de realisation associe |
| JP2004356338A (ja) * | 2003-05-28 | 2004-12-16 | Res Inst Electric Magnetic Alloys | 薄膜磁気センサ及びその製造方法 |
| JP2004363157A (ja) * | 2003-06-02 | 2004-12-24 | Res Inst Electric Magnetic Alloys | 薄膜磁気センサ及びその製造方法 |
| US20040246649A1 (en) * | 2003-06-03 | 2004-12-09 | Mks Instruments, Inc. | Flow control valve with magnetic field sensor |
| US10816615B2 (en) * | 2017-05-19 | 2020-10-27 | Asahi Kasei Microdevices Corporation | Magnetic sensor |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0594243A3 (en) * | 1992-10-19 | 1994-09-21 | Philips Electronics Nv | Magnetic field sensor |
| US5446613A (en) * | 1994-02-28 | 1995-08-29 | Read-Rite Corporation | Magnetic head assembly with MR sensor |
| JPH08129721A (ja) * | 1994-09-08 | 1996-05-21 | Sumitomo Metal Ind Ltd | ＮｉＯ反強磁性膜の製造方法並びに磁気抵抗効果素子の製造方法とその素子 |
| JP2738312B2 (ja) * | 1994-09-08 | 1998-04-08 | 日本電気株式会社 | 磁気抵抗効果膜およびその製造方法 |
| JP2748876B2 (ja) * | 1995-01-27 | 1998-05-13 | 日本電気株式会社 | 磁気抵抗効果膜 |
| JPH0983039A (ja) * | 1995-09-14 | 1997-03-28 | Nec Corp | 磁気抵抗効果素子 |
-
1997
- 1997-06-06 JP JP10504968A patent/JP2000500292A/ja not_active Ceased
- 1997-06-06 EP EP97923275A patent/EP0910800B1/en not_active Expired - Lifetime
- 1997-06-06 WO PCT/IB1997/000657 patent/WO1998001762A2/en not_active Ceased
- 1997-06-06 DE DE69727574T patent/DE69727574T2/de not_active Expired - Fee Related
- 1997-06-19 US US08/879,165 patent/US5904996A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO1998001762A2 (en) | 1998-01-15 |
| EP0910800A2 (en) | 1999-04-28 |
| EP0910800B1 (en) | 2004-02-11 |
| JP2000500292A (ja) | 2000-01-11 |
| US5904996A (en) | 1999-05-18 |
| DE69727574D1 (de) | 2004-03-18 |
| WO1998001762A3 (en) | 1999-04-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |