DE69717575D1 - Verfahren und Vorrichtungen zum Messen der Abweichung einer Oberfläche - Google Patents

Verfahren und Vorrichtungen zum Messen der Abweichung einer Oberfläche

Info

Publication number
DE69717575D1
DE69717575D1 DE69717575T DE69717575T DE69717575D1 DE 69717575 D1 DE69717575 D1 DE 69717575D1 DE 69717575 T DE69717575 T DE 69717575T DE 69717575 T DE69717575 T DE 69717575T DE 69717575 D1 DE69717575 D1 DE 69717575D1
Authority
DE
Germany
Prior art keywords
deviation
measuring
methods
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69717575T
Other languages
English (en)
Other versions
DE69717575T2 (de
Inventor
Mikihiko Ishii
Takashi Gemma
Katsuya Miyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17500159&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69717575(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of DE69717575D1 publication Critical patent/DE69717575D1/de
Publication of DE69717575T2 publication Critical patent/DE69717575T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/255—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring radius of curvature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Geometry (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69717575T 1996-09-20 1997-09-18 Verfahren und Vorrichtungen zum Messen der Abweichung einer Oberfläche Revoked DE69717575T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27144796A JP3613906B2 (ja) 1996-09-20 1996-09-20 波面収差測定装置
JP27144796 1996-09-20

Publications (2)

Publication Number Publication Date
DE69717575D1 true DE69717575D1 (de) 2003-01-16
DE69717575T2 DE69717575T2 (de) 2004-01-08

Family

ID=17500159

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69717575T Revoked DE69717575T2 (de) 1996-09-20 1997-09-18 Verfahren und Vorrichtungen zum Messen der Abweichung einer Oberfläche

Country Status (4)

Country Link
US (1) US6008904A (de)
EP (1) EP0831298B1 (de)
JP (1) JP3613906B2 (de)
DE (1) DE69717575T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3730831B2 (ja) * 2000-03-31 2006-01-05 パイオニア株式会社 収差測定装置及び調整装置
DE10125785A1 (de) 2001-05-26 2002-11-28 Zeiss Carl Verfahren zur Absolutkalibrierung eines Interferometers
US8968279B2 (en) 2003-03-06 2015-03-03 Amo Manufacturing Usa, Llc Systems and methods for qualifying and calibrating a beam delivery system
JP4229782B2 (ja) * 2003-09-05 2009-02-25 オリンパス株式会社 波面収差測定装置
US7928351B1 (en) * 2004-05-10 2011-04-19 Lockheed Martin Corporation Near field diversity method for estimation and correction of aberrations
DE102004063600B4 (de) * 2004-12-30 2007-05-31 Db Systems Gmbh Verfahren zur Erfassung von Leistungsentgelten für Reisen in öffentlichen Verkehrsmitteln
US7545511B1 (en) 2006-01-13 2009-06-09 Applied Science Innovations, Inc. Transmitted wavefront metrology of optics with high aberrations
US8743373B1 (en) 2006-01-13 2014-06-03 Applied Science Innovations, Inc. Metrology of optics with high aberrations
US8018602B1 (en) 2006-01-13 2011-09-13 Applied Science Innovations, Inc. Metrology of optics with high aberrations
US7811280B2 (en) * 2006-01-26 2010-10-12 Amo Manufacturing Usa, Llc. System and method for laser ablation calibration
FR2926636B1 (fr) * 2008-01-18 2010-09-17 Imagine Optic Instrument et procede de caracterisation d'un systeme optique
JP2010102745A (ja) * 2008-10-21 2010-05-06 Pulstec Industrial Co Ltd レーザ光の波面収差測定方法
CN102261985B (zh) * 2011-06-13 2012-12-12 中国科学院长春光学精密机械与物理研究所 光学系统波像差标定装置及该装置测试误差的标定方法
RU2491525C1 (ru) * 2012-01-23 2013-08-27 Российская Федерация, от имени которой выступает Министерство промышленности и торговли РФ Метод интерферометрического контроля на рабочей длине волны качества изображения и дисторсии оптических систем
WO2019147936A1 (en) * 2018-01-26 2019-08-01 Vanderbilt University Systems and methods for non-destructive evaluation of optical material properties and surfaces
JP6539812B1 (ja) * 2018-07-18 2019-07-10 ナルックス株式会社 レンズの検査方法
CN108956098B (zh) * 2018-07-27 2020-08-28 莱特巴斯光学仪器（镇江）有限公司 一种用于平凸非球面透镜波前测试中的消倾斜装置及方法
US11493751B2 (en) 2019-01-23 2022-11-08 Vanderbilt University Systems and methods for compact optical relay
DE102019204578A1 (de) * 2019-04-01 2020-10-01 Carl Zeiss Meditec Ag Prüfvorrichtung und Verfahren zur Vermessung der Homogenität eines optischen Elements

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH073323B2 (ja) * 1985-11-29 1995-01-18 株式会社ニコン 干渉装置
US4917498A (en) * 1987-06-15 1990-04-17 Geary Joseph M Arrangement for testing grazing hyperboloids and similar reflective solid bodies for shape deviations
JP2576576B2 (ja) * 1988-03-25 1997-01-29 キヤノン株式会社 干渉測定方法及びそれを利用したフィゾー干渉測定装置
JP2631134B2 (ja) * 1988-07-13 1997-07-16 株式会社トプコン 計算機ホログラムを利用した非球面形状測定用干渉計
US5018861A (en) * 1989-06-22 1991-05-28 Quantametrics Inc. Methods and means for full-surface interferometric testing of grazing incidence mirrors
JPH0448201A (ja) * 1990-06-15 1992-02-18 Olympus Optical Co Ltd 干渉測定装置
JP3517903B2 (ja) * 1993-06-21 2004-04-12 株式会社ニコン 干渉計
JPH07167630A (ja) * 1993-10-14 1995-07-04 Asahi Optical Co Ltd 干渉測定装置および干渉測定方法
DE4416786A1 (de) * 1994-05-09 1995-11-16 Berliner Inst Fuer Optik Gmbh Verfahren zur Kalibrierung eines Interferometers zur Zylinderprüfung sowie Vorrichtung zur Durchführung des Verfahrens

Also Published As

Publication number Publication date
JP3613906B2 (ja) 2005-01-26
DE69717575T2 (de) 2004-01-08
EP0831298A2 (de) 1998-03-25
EP0831298A3 (de) 1999-12-15
JPH1096679A (ja) 1998-04-14
EP0831298B1 (de) 2002-12-04
US6008904A (en) 1999-12-28

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8363 Opposition against the patent
8331 Complete revocation