DE69712128T2 - Optische Halbleiterkomponente sowie Verfahren zu ihrer Herstellung - Google Patents

Optische Halbleiterkomponente sowie Verfahren zu ihrer Herstellung

Info

Publication number
DE69712128T2
DE69712128T2 DE69712128T DE69712128T DE69712128T2 DE 69712128 T2 DE69712128 T2 DE 69712128T2 DE 69712128 T DE69712128 T DE 69712128T DE 69712128 T DE69712128 T DE 69712128T DE 69712128 T2 DE69712128 T2 DE 69712128T2
Authority
DE
Germany
Prior art keywords
production
optical semiconductor
semiconductor component
optical
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69712128T
Other languages
English (en)
Other versions
DE69712128D1 (de
Inventor
Zuoying Lisa Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Application granted granted Critical
Publication of DE69712128D1 publication Critical patent/DE69712128D1/de
Publication of DE69712128T2 publication Critical patent/DE69712128T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/093—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by photoelectric pick-up
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P1/00—Details of instruments
    • G01P1/02—Housings
    • G01P1/023—Housings for acceleration measuring devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
    • G01P2015/0811—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
    • G01P2015/0814—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for translational movement of the mass, e.g. shuttle type

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Pressure Sensors (AREA)
  • Light Receiving Elements (AREA)
DE69712128T 1996-05-28 1997-05-12 Optische Halbleiterkomponente sowie Verfahren zu ihrer Herstellung Expired - Fee Related DE69712128T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/654,514 US5936294A (en) 1996-05-28 1996-05-28 Optical semiconductor component and method of fabrication

Publications (2)

Publication Number Publication Date
DE69712128D1 DE69712128D1 (de) 2002-05-29
DE69712128T2 true DE69712128T2 (de) 2002-10-02

Family

ID=24625183

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69712128T Expired - Fee Related DE69712128T2 (de) 1996-05-28 1997-05-12 Optische Halbleiterkomponente sowie Verfahren zu ihrer Herstellung

Country Status (5)

Country Link
US (1) US5936294A (de)
EP (1) EP0810440B1 (de)
JP (1) JP4579352B2 (de)
KR (1) KR100528553B1 (de)
DE (1) DE69712128T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL122947A (en) * 1998-01-15 2001-03-19 Armament Dev Authority State O Micro-electro-opto-mechanical inertial sensor with integrative optical sensing
DE19825298C2 (de) * 1998-06-05 2003-02-13 Fraunhofer Ges Forschung Verfahren zur Herstellung einer Sensoranordnung und Sensoranordnung
US6710348B1 (en) 1998-06-30 2004-03-23 Robert Bosch Gmbh Apparatus for sensing electromagnetic radiation
DE19923606A1 (de) * 1998-06-30 2000-01-13 Bosch Gmbh Robert Vorrichtung zur Erfassung elektromagnetischer Strahlung
US6494095B1 (en) * 2000-03-28 2002-12-17 Opticnet, Inc. Micro electromechanical switch for detecting acceleration or decelaration
JP3453557B2 (ja) * 2000-12-11 2003-10-06 キヤノン株式会社 通信ネットワークを用いた光半導体素子の品質信頼性情報提供システム
US6550330B1 (en) * 2001-03-14 2003-04-22 The United States Of America As Represented By The Secretary Of The Navy Differential amplification for micro-electro-mechanical ultra-sensitive accelerometer
US6581465B1 (en) * 2001-03-14 2003-06-24 The United States Of America As Represented By The Secretary Of The Navy Micro-electro-mechanical systems ultra-sensitive accelerometer
US7222534B2 (en) * 2005-03-31 2007-05-29 Pgs Americas, Inc. Optical accelerometer, optical inclinometer and seismic sensor system using such accelerometer and inclinometer
US7516659B2 (en) * 2006-05-11 2009-04-14 Avago Technologies General Ip (Singapore) Pte. Ltd. Inertial force sensor
US7808618B1 (en) * 2008-01-09 2010-10-05 The Charles Stark Draper Laboratory, Inc. Methods and apparatus for providing a semiconductor optical flexured mass accelerometer
CN101545921B (zh) * 2008-03-25 2011-12-14 鸿富锦精密工业（深圳）有限公司 加速度计
US20090308158A1 (en) * 2008-06-13 2009-12-17 Bard Arnold D Optical Accelerometer
US8205497B1 (en) * 2009-03-05 2012-06-26 Sandia Corporation Microelectromechanical inertial sensor
TWI451089B (zh) * 2009-11-12 2014-09-01 Pixart Imaging Inc 光學式偵測方法、光學式微機電偵測計、及其製法
WO2012143408A2 (de) * 2011-04-18 2012-10-26 Österreichische Akademie der Wissenschaften Verfahren zur optomechanischen erfassung und wandlung eines mechanischen, elektrostatischen, magnetostatischen oder elektrodynamischen eingangssignales in amplitudenmodulierte elektromagnetische strahlungs-ausgangssignale und daraus strahlungs-sensorisch gebildete elektrische ausgangssignale mithilfe einer opto-mechanisch gebildeten übertragungsfunktion sowie vorrichtung zur durchführung dieses verfahrens
US8783106B1 (en) 2011-12-13 2014-07-22 Sandia Corporation Micromachined force-balance feedback accelerometer with optical displacement detection
US20150323379A1 (en) * 2014-05-07 2015-11-12 Mao-Jen Wu Optical Inertial Sensing Module

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4322829A (en) * 1980-09-11 1982-03-30 Dynamic Systems, Inc. Fiber optic accelerometer and method of measuring inertial force
GB2094974B (en) * 1981-03-12 1984-11-14 Mitutoyo Mfg Co Ltd Photoelectric encoder device
US4428234A (en) * 1982-03-25 1984-01-31 Walker Clifford G Phase detection laser accelerometer
JPH0664084B2 (ja) * 1985-04-16 1994-08-22 シュルンベルジェ オーバーシーズ エス．エイ． 光感震器
DE3518383C1 (de) * 1985-05-22 1986-12-04 Boge Gmbh, 5208 Eitorf Beschleunigungsmesser
US4879470A (en) * 1987-01-16 1989-11-07 Canon Kabushiki Kaisha Photoelectric converting apparatus having carrier eliminating means
US5428996A (en) * 1990-12-24 1995-07-04 Litton Systems, Inc. Hinge assembly for integrated accelerometer
JP3300060B2 (ja) * 1992-10-22 2002-07-08 キヤノン株式会社 加速度センサー及びその製造方法
US5559358A (en) * 1993-05-25 1996-09-24 Honeywell Inc. Opto-electro-mechanical device or filter, process for making, and sensors made therefrom
US5488864A (en) * 1994-12-19 1996-02-06 Ford Motor Company Torsion beam accelerometer with slotted tilt plate

Also Published As

Publication number Publication date
US5936294A (en) 1999-08-10
KR970077750A (ko) 1997-12-12
EP0810440A3 (de) 1997-12-10
JPH1090298A (ja) 1998-04-10
EP0810440B1 (de) 2002-04-24
KR100528553B1 (ko) 2006-01-27
DE69712128D1 (de) 2002-05-29
JP4579352B2 (ja) 2010-11-10
EP0810440A2 (de) 1997-12-03

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Legal Events

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8328 Change in the person/name/address of the agent

Free format text: SCHUMACHER & WILLSAU, PATENTANWALTSSOZIETAET, 80335 MUENCHEN

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee