DE69711049T2 - Starres fenster für vakuumanwendungen - Google Patents

Starres fenster für vakuumanwendungen

Info

Publication number
DE69711049T2
DE69711049T2 DE69711049T DE69711049T DE69711049T2 DE 69711049 T2 DE69711049 T2 DE 69711049T2 DE 69711049 T DE69711049 T DE 69711049T DE 69711049 T DE69711049 T DE 69711049T DE 69711049 T2 DE69711049 T2 DE 69711049T2
Authority
DE
Germany
Prior art keywords
vacuum applications
rigid window
rigid
window
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69711049T
Other languages
English (en)
Other versions
DE69711049D1 (de
Inventor
A Meyer
R Ciarlo
R Myers
Hao-Lin Chen
George Wakalopulos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California
American International Technologies Inc
Original Assignee
University of California
American International Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of California, American International Technologies Inc filed Critical University of California
Application granted granted Critical
Publication of DE69711049D1 publication Critical patent/DE69711049D1/de
Publication of DE69711049T2 publication Critical patent/DE69711049T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H01J33/02—Details
    • H01J33/04—Windows
DE69711049T 1996-07-19 1997-07-18 Starres fenster für vakuumanwendungen Expired - Fee Related DE69711049T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/684,166 US6002202A (en) 1996-07-19 1996-07-19 Rigid thin windows for vacuum applications
PCT/US1997/012507 WO1998003353A1 (en) 1996-07-19 1997-07-18 Rigid thin windows for vacuum applications

Publications (2)

Publication Number Publication Date
DE69711049D1 DE69711049D1 (de) 2002-04-18
DE69711049T2 true DE69711049T2 (de) 2002-10-24

Family

ID=24746944

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69711049T Expired - Fee Related DE69711049T2 (de) 1996-07-19 1997-07-18 Starres fenster für vakuumanwendungen

Country Status (7)

Country Link
US (1) US6002202A (de)
EP (1) EP0912351B1 (de)
JP (1) JP2000517461A (de)
KR (1) KR20000067881A (de)
AU (1) AU3884997A (de)
DE (1) DE69711049T2 (de)
WO (1) WO1998003353A1 (de)

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US6107202A (en) * 1998-09-14 2000-08-22 Taiwan Semiconductor Manufacturing Company Passivation photoresist stripping method to eliminate photoresist extrusion after alloy
US6345497B1 (en) 2000-03-02 2002-02-12 The Regents Of The University Of California NOx reduction by electron beam-produced nitrogen atom injection
DE10010583A1 (de) * 2000-03-03 2001-09-06 Atmel Germany Gmbh Verfahren zur Strukturierung und Reinigung von silizidierten Siliziumscheiben
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US6896850B2 (en) 2001-03-26 2005-05-24 Kumetrix, Inc. Silicon nitride window for microsampling device and method of construction
JP4401691B2 (ja) * 2003-06-13 2010-01-20 株式会社オクテック 電子ビーム照射管の電子ビーム透過窓の製造方法
JP2005003564A (ja) * 2003-06-13 2005-01-06 Ushio Inc 電子ビーム管および電子ビーム取り出し用窓
US6803570B1 (en) * 2003-07-11 2004-10-12 Charles E. Bryson, III Electron transmissive window usable with high pressure electron spectrometry
US20050268567A1 (en) * 2003-07-31 2005-12-08 Mattson Technology, Inc. Wedge-shaped window for providing a pressure differential
US7145988B2 (en) * 2003-12-03 2006-12-05 General Electric Company Sealed electron beam source
US7295015B2 (en) * 2004-02-19 2007-11-13 Brooks Automation, Inc. Ionization gauge
US7030619B2 (en) * 2004-02-19 2006-04-18 Brooks Automation, Inc. Ionization gauge
WO2007008216A2 (en) * 2004-07-29 2007-01-18 California Institute Of Technology Low stress, ultra-thin, uniform membrane, methods of fabricating same and incorporation into detection devices
DE102004039197B4 (de) 2004-08-12 2010-06-17 Siltronic Ag Verfahren zur Herstellung von dotierten Halbleiterscheiben aus Silizium
US7197116B2 (en) * 2004-11-16 2007-03-27 General Electric Company Wide scanning x-ray source
WO2009035727A2 (en) * 2007-05-18 2009-03-19 State Of Oregon Acting By And Through The State Board Of Higher Educ.On Behalf Of The Univ.Of Oregon Tem grids for determination of structure-property relationships in nanotechnology
WO2006127736A2 (en) * 2005-05-23 2006-11-30 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon Silicon substrates with thermal oxide windows for transmission electron microscopy
US7432177B2 (en) * 2005-06-15 2008-10-07 Applied Materials, Inc. Post-ion implant cleaning for silicon on insulator substrate preparation
US20090160309A1 (en) * 2005-10-15 2009-06-25 Dirk Burth Electron beam exit window
US7709820B2 (en) * 2007-06-01 2010-05-04 Moxtek, Inc. Radiation window with coated silicon support structure
US7737424B2 (en) 2007-06-01 2010-06-15 Moxtek, Inc. X-ray window with grid structure
JP5037241B2 (ja) * 2007-07-04 2012-09-26 スパンション エルエルシー 半導体装置の製造方法及び半導体装置の製造装置
DE102007031549B4 (de) * 2007-07-06 2021-07-08 Robert Bosch Gmbh Vorrichtung aus einkristallinem Silizium und Verfahren zur Herstellung einer Vorrichtung aus einkristallinem Silizium
US7768267B2 (en) * 2007-07-11 2010-08-03 Brooks Automation, Inc. Ionization gauge with a cold electron source
US9305735B2 (en) 2007-09-28 2016-04-05 Brigham Young University Reinforced polymer x-ray window
US20100285271A1 (en) 2007-09-28 2010-11-11 Davis Robert C Carbon nanotube assembly
US8498381B2 (en) 2010-10-07 2013-07-30 Moxtek, Inc. Polymer layer on X-ray window
US8247971B1 (en) 2009-03-19 2012-08-21 Moxtek, Inc. Resistively heated small planar filament
US7983394B2 (en) 2009-12-17 2011-07-19 Moxtek, Inc. Multiple wavelength X-ray source
WO2011112612A1 (en) 2010-03-08 2011-09-15 Alliance For Sustainable Energy, Llc Boron, bismuth co-doping of gallium arsenide and other compounds for photonic and heterojunction bipolar transistor devices
FI20105626A0 (fi) * 2010-06-03 2010-06-03 Hs Foils Oy Erittäin ohut berylliumikkuna ja menetelmä sen valmistamiseksi
DE102010046100A1 (de) * 2010-09-21 2012-03-22 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Strahlungseintrittsfenster für einen Strahlungsdetektor
US8526574B2 (en) 2010-09-24 2013-09-03 Moxtek, Inc. Capacitor AC power coupling across high DC voltage differential
US8804910B1 (en) 2011-01-24 2014-08-12 Moxtek, Inc. Reduced power consumption X-ray source
US8750458B1 (en) 2011-02-17 2014-06-10 Moxtek, Inc. Cold electron number amplifier
US8929515B2 (en) 2011-02-23 2015-01-06 Moxtek, Inc. Multiple-size support for X-ray window
US9076628B2 (en) 2011-05-16 2015-07-07 Brigham Young University Variable radius taper x-ray window support structure
US8989354B2 (en) 2011-05-16 2015-03-24 Brigham Young University Carbon composite support structure
US9174412B2 (en) 2011-05-16 2015-11-03 Brigham Young University High strength carbon fiber composite wafers for microfabrication
JP6245794B2 (ja) * 2011-07-29 2017-12-13 キヤノン株式会社 遮蔽格子の製造方法
US8761344B2 (en) 2011-12-29 2014-06-24 Moxtek, Inc. Small x-ray tube with electron beam control optics
EP2817818B1 (de) * 2012-02-15 2017-05-31 HS Foils OY Verfahren und anordnung zur herstellung eines strahlungsfensters
WO2013138258A1 (en) 2012-03-11 2013-09-19 Mark Larson Improved radiation window with support structure
US9173623B2 (en) 2013-04-19 2015-11-03 Samuel Soonho Lee X-ray tube and receiver inside mouth
JP2018506024A (ja) * 2014-12-19 2018-03-01 エナジー サイエンシーズ，インコーポレイティド 非一様断面を有する電子ビームウィンドウタイル
GB2556258B (en) 2015-06-19 2021-07-14 Larson Mark High-performance, low-stress support structure with membrane
US10170299B2 (en) * 2015-07-01 2019-01-01 Applied Materials, Inc. Method to reduce trap-induced capacitance in interconnect dielectric barrier stack
FI20155881A (fi) 2015-11-26 2017-05-27 Hs Foils Oy Menetelmä säteilyikkunan valmistamiseksi ja säteilyikkuna
CN105914121B (zh) * 2016-04-26 2019-05-14 苏州原位芯片科技有限责任公司 三角形单晶硅支撑粱结构式x射线氮化硅窗口构造及其制备方法
WO2018118288A1 (en) * 2016-12-22 2018-06-28 Applied Materials, Inc. Sibn film for conformal hermetic dielectric encapsulation without direct rf exposure to underlying structure material
TW202226296A (zh) * 2020-08-27 2022-07-01 美商布魯克奈米公司 用於ｘ射線偵測器使用的氮化矽ｘ射線窗和製造的方法
US11410838B2 (en) 2020-09-03 2022-08-09 Thermo Finnigan Llc Long life electron multiplier

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US4515876A (en) * 1982-07-17 1985-05-07 Nippon Telegraph & Telephone Public Corp. X-Ray lithography mask and method for fabricating the same
US4468282A (en) * 1982-11-22 1984-08-28 Hewlett-Packard Company Method of making an electron beam window
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US5509046A (en) * 1994-09-06 1996-04-16 Regents Of The University Of California Cooled window for X-rays or charged particles
JP3649743B2 (ja) * 1996-06-12 2005-05-18 ウシオ電機株式会社 陽極の窓領域が薄いモノリシックシリコン膜により形成される化学線源

Also Published As

Publication number Publication date
EP0912351B1 (de) 2002-03-13
US6002202A (en) 1999-12-14
AU3884997A (en) 1998-02-10
WO1998003353A1 (en) 1998-01-29
EP0912351A4 (de) 1999-05-06
EP0912351A1 (de) 1999-05-06
JP2000517461A (ja) 2000-12-26
KR20000067881A (ko) 2000-11-25
DE69711049D1 (de) 2002-04-18

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee