DE69604905T2 - System für abtastlithographie mit gegenbewegung - Google Patents

System für abtastlithographie mit gegenbewegung

Info

Publication number
DE69604905T2
DE69604905T2 DE69604905T DE69604905T DE69604905T2 DE 69604905 T2 DE69604905 T2 DE 69604905T2 DE 69604905 T DE69604905 T DE 69604905T DE 69604905 T DE69604905 T DE 69604905T DE 69604905 T2 DE69604905 T2 DE 69604905T2
Authority
DE
Germany
Prior art keywords
counterflow
lithography
counterflow lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69604905T
Other languages
English (en)
Other versions
DE69604905D1 (de
Inventor
Timothy Thomas
Paul Allen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Etec Systems Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of DE69604905D1 publication Critical patent/DE69604905D1/de
Application granted granted Critical
Publication of DE69604905T2 publication Critical patent/DE69604905T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
DE69604905T 1995-03-22 1996-03-19 System für abtastlithographie mit gegenbewegung Expired - Fee Related DE69604905T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/410,601 US5815245A (en) 1995-03-22 1995-03-22 Scanning lithography system with opposing motion
PCT/US1996/003300 WO1996029632A1 (en) 1995-03-22 1996-03-19 Scanning lithography system with opposing motion

Publications (2)

Publication Number Publication Date
DE69604905D1 DE69604905D1 (de) 1999-12-02
DE69604905T2 true DE69604905T2 (de) 2000-02-03

Family

ID=23625437

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69604905T Expired - Fee Related DE69604905T2 (de) 1995-03-22 1996-03-19 System für abtastlithographie mit gegenbewegung

Country Status (8)

Country Link
US (1) US5815245A (de)
EP (1) EP0815494B1 (de)
JP (1) JPH11502942A (de)
KR (1) KR100331063B1 (de)
CA (1) CA2215852A1 (de)
DE (1) DE69604905T2 (de)
HK (1) HK1007905A1 (de)
WO (1) WO1996029632A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
DE19903807A1 (de) * 1998-05-05 1999-11-11 Zeiss Carl Fa Beleuchtungssystem insbesondere für die EUV-Lithographie
TW405062B (en) * 1999-02-18 2000-09-11 Asm Lithography Bv Lithographic projection apparatus
US6555829B1 (en) 2000-01-10 2003-04-29 Applied Materials, Inc. High precision flexure stage
US6381077B1 (en) * 2000-04-05 2002-04-30 Ultratech Stepper, Inc. Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate
US6511791B1 (en) 2000-04-28 2003-01-28 International Business Machines Corporation Multiple exposure process for formation of dense rectangular arrays
US6451508B1 (en) 2000-04-28 2002-09-17 International Business Machines Corporation Plural interleaved exposure process for increased feature aspect ratio in dense arrays
US6645677B1 (en) 2000-09-18 2003-11-11 Micronic Laser Systems Ab Dual layer reticle blank and manufacturing process
JP3728301B2 (ja) * 2003-05-30 2005-12-21 株式会社オーク製作所 投影光学系
JP4195674B2 (ja) * 2004-03-31 2008-12-10 株式会社オーク製作所 投影光学系および投影露光装置
JP5571967B2 (ja) * 2010-01-27 2014-08-13 株式会社オーク製作所 投影光学系と投影露光装置
WO2016012174A1 (en) * 2014-07-24 2016-01-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3819265A (en) * 1972-08-02 1974-06-25 Bell Telephone Labor Inc Scanning projection printer apparatus and method
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
EP0066295B1 (de) * 1981-06-03 1986-02-05 Hitachi, Ltd. Optisches Reflektor-Fokussiergerät
US4585337A (en) * 1985-01-14 1986-04-29 Phillips Edward H Step-and-repeat alignment and exposure system
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
US4748477A (en) * 1985-04-30 1988-05-31 Canon Kabushiki Kaisha Exposure apparatus
US4924257A (en) * 1988-10-05 1990-05-08 Kantilal Jain Scan and repeat high resolution projection lithography system
US5168306A (en) * 1989-04-04 1992-12-01 Asahi Kogaku Kogyo Kabushiki Kaisha Exposure apparatus
US5506684A (en) * 1991-04-04 1996-04-09 Nikon Corporation Projection scanning exposure apparatus with synchronous mask/wafer alignment system
US5298939A (en) * 1991-11-04 1994-03-29 Swanson Paul A Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
JP3141471B2 (ja) * 1991-12-25 2001-03-05 株式会社ニコン ディスク媒体の製造方法、及び製造装置、並びに露光方法及び露光装置
US5559529A (en) * 1992-02-26 1996-09-24 Rockwell International Discrete media display device and method for efficiently drawing lines on same
US5285236A (en) * 1992-09-30 1994-02-08 Kanti Jain Large-area, high-throughput, high-resolution projection imaging system
US5401934A (en) * 1993-03-08 1995-03-28 International Business Machines Corporation Lens system for scanning laser apparatus
JPH07142325A (ja) * 1993-06-23 1995-06-02 Nikon Corp 位置合わせ装置
US5557469A (en) * 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system

Also Published As

Publication number Publication date
KR19980703210A (ko) 1998-10-15
CA2215852A1 (en) 1996-09-26
WO1996029632A1 (en) 1996-09-26
KR100331063B1 (ko) 2002-11-23
HK1007905A1 (en) 1999-04-30
DE69604905D1 (de) 1999-12-02
EP0815494B1 (de) 1999-10-27
EP0815494A1 (de) 1998-01-07
US5815245A (en) 1998-09-29
JPH11502942A (ja) 1999-03-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee