HK1007905A1 - Scanning lithography system with opposing motion - Google Patents
Scanning lithography system with opposing motionInfo
- Publication number
- HK1007905A1 HK1007905A1 HK98109020A HK98109020A HK1007905A1 HK 1007905 A1 HK1007905 A1 HK 1007905A1 HK 98109020 A HK98109020 A HK 98109020A HK 98109020 A HK98109020 A HK 98109020A HK 1007905 A1 HK1007905 A1 HK 1007905A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- lithography system
- opposing motion
- scanning lithography
- scanning
- opposing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/008—Systems specially adapted to form image relays or chained systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/410,601 US5815245A (en) | 1995-03-22 | 1995-03-22 | Scanning lithography system with opposing motion |
PCT/US1996/003300 WO1996029632A1 (en) | 1995-03-22 | 1996-03-19 | Scanning lithography system with opposing motion |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1007905A1 true HK1007905A1 (en) | 1999-04-30 |
Family
ID=23625437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK98109020A HK1007905A1 (en) | 1995-03-22 | 1998-07-07 | Scanning lithography system with opposing motion |
Country Status (8)
Country | Link |
---|---|
US (1) | US5815245A (de) |
EP (1) | EP0815494B1 (de) |
JP (1) | JPH11502942A (de) |
KR (1) | KR100331063B1 (de) |
CA (1) | CA2215852A1 (de) |
DE (1) | DE69604905T2 (de) |
HK (1) | HK1007905A1 (de) |
WO (1) | WO1996029632A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
DE19903807A1 (de) * | 1998-05-05 | 1999-11-11 | Zeiss Carl Fa | Beleuchtungssystem insbesondere für die EUV-Lithographie |
TW405062B (en) * | 1999-02-18 | 2000-09-11 | Asm Lithography Bv | Lithographic projection apparatus |
US6555829B1 (en) | 2000-01-10 | 2003-04-29 | Applied Materials, Inc. | High precision flexure stage |
US6381077B1 (en) * | 2000-04-05 | 2002-04-30 | Ultratech Stepper, Inc. | Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate |
US6511791B1 (en) | 2000-04-28 | 2003-01-28 | International Business Machines Corporation | Multiple exposure process for formation of dense rectangular arrays |
US6451508B1 (en) | 2000-04-28 | 2002-09-17 | International Business Machines Corporation | Plural interleaved exposure process for increased feature aspect ratio in dense arrays |
US6645677B1 (en) * | 2000-09-18 | 2003-11-11 | Micronic Laser Systems Ab | Dual layer reticle blank and manufacturing process |
JP3728301B2 (ja) * | 2003-05-30 | 2005-12-21 | 株式会社オーク製作所 | 投影光学系 |
JP4195674B2 (ja) * | 2004-03-31 | 2008-12-10 | 株式会社オーク製作所 | 投影光学系および投影露光装置 |
JP5571967B2 (ja) * | 2010-01-27 | 2014-08-13 | 株式会社オーク製作所 | 投影光学系と投影露光装置 |
NL2015012A (en) * | 2014-07-24 | 2016-06-27 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3819265A (en) * | 1972-08-02 | 1974-06-25 | Bell Telephone Labor Inc | Scanning projection printer apparatus and method |
US4171870A (en) * | 1977-05-06 | 1979-10-23 | Bell Telephone Laboratories, Incorporated | Compact image projection apparatus |
US4458302A (en) * | 1981-06-03 | 1984-07-03 | Hitachi, Ltd. | Reflection type optical focusing apparatus |
US4585337A (en) * | 1985-01-14 | 1986-04-29 | Phillips Edward H | Step-and-repeat alignment and exposure system |
US4748477A (en) * | 1985-04-30 | 1988-05-31 | Canon Kabushiki Kaisha | Exposure apparatus |
US4749867A (en) * | 1985-04-30 | 1988-06-07 | Canon Kabushiki Kaisha | Exposure apparatus |
US4924257A (en) * | 1988-10-05 | 1990-05-08 | Kantilal Jain | Scan and repeat high resolution projection lithography system |
US5168306A (en) * | 1989-04-04 | 1992-12-01 | Asahi Kogaku Kogyo Kabushiki Kaisha | Exposure apparatus |
US5506684A (en) * | 1991-04-04 | 1996-04-09 | Nikon Corporation | Projection scanning exposure apparatus with synchronous mask/wafer alignment system |
US5298939A (en) * | 1991-11-04 | 1994-03-29 | Swanson Paul A | Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
JP3141471B2 (ja) * | 1991-12-25 | 2001-03-05 | 株式会社ニコン | ディスク媒体の製造方法、及び製造装置、並びに露光方法及び露光装置 |
US5559529A (en) * | 1992-02-26 | 1996-09-24 | Rockwell International | Discrete media display device and method for efficiently drawing lines on same |
US5285236A (en) * | 1992-09-30 | 1994-02-08 | Kanti Jain | Large-area, high-throughput, high-resolution projection imaging system |
US5401934A (en) * | 1993-03-08 | 1995-03-28 | International Business Machines Corporation | Lens system for scanning laser apparatus |
JPH07142325A (ja) * | 1993-06-23 | 1995-06-02 | Nikon Corp | 位置合わせ装置 |
US5557469A (en) * | 1994-10-28 | 1996-09-17 | Ultratech Stepper, Inc. | Beamsplitter in single fold optical system and optical variable magnification method and system |
-
1995
- 1995-03-22 US US08/410,601 patent/US5815245A/en not_active Expired - Fee Related
-
1996
- 1996-03-19 KR KR1019970706613A patent/KR100331063B1/ko not_active IP Right Cessation
- 1996-03-19 EP EP96907202A patent/EP0815494B1/de not_active Expired - Lifetime
- 1996-03-19 JP JP8528463A patent/JPH11502942A/ja active Pending
- 1996-03-19 CA CA002215852A patent/CA2215852A1/en not_active Abandoned
- 1996-03-19 WO PCT/US1996/003300 patent/WO1996029632A1/en active IP Right Grant
- 1996-03-19 DE DE69604905T patent/DE69604905T2/de not_active Expired - Fee Related
-
1998
- 1998-07-07 HK HK98109020A patent/HK1007905A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100331063B1 (ko) | 2002-11-23 |
CA2215852A1 (en) | 1996-09-26 |
JPH11502942A (ja) | 1999-03-09 |
EP0815494B1 (de) | 1999-10-27 |
WO1996029632A1 (en) | 1996-09-26 |
US5815245A (en) | 1998-09-29 |
EP0815494A1 (de) | 1998-01-07 |
KR19980703210A (ko) | 1998-10-15 |
DE69604905D1 (de) | 1999-12-02 |
DE69604905T2 (de) | 2000-02-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20040319 |
|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |