DE69514851D1 - Interatomares Messverfahren - Google Patents

Interatomares Messverfahren

Info

Publication number
DE69514851D1
DE69514851D1 DE69514851T DE69514851T DE69514851D1 DE 69514851 D1 DE69514851 D1 DE 69514851D1 DE 69514851 T DE69514851 T DE 69514851T DE 69514851 T DE69514851 T DE 69514851T DE 69514851 D1 DE69514851 D1 DE 69514851D1
Authority
DE
Germany
Prior art keywords
interatomic
measurement method
measurement
interatomic measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69514851T
Other languages
English (en)
Other versions
DE69514851T2 (de
Inventor
Tetsuo Ohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of DE69514851D1 publication Critical patent/DE69514851D1/de
Publication of DE69514851T2 publication Critical patent/DE69514851T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
    • G01Q10/04—Fine scanning or positioning
    • G01Q10/06—Circuits or algorithms therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/003—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring position, not involving coordinate determination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/34—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/04—Display or data processing devices
    • G01Q30/06—Display or data processing devices for error compensation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/85—Scanning probe control process
    • Y10S977/851—Particular movement or positioning of scanning tip

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
DE69514851T 1994-03-22 1995-03-21 Interatomares Messverfahren Expired - Lifetime DE69514851T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21605794A 1994-03-22 1994-03-22

Publications (2)

Publication Number Publication Date
DE69514851D1 true DE69514851D1 (de) 2000-03-09
DE69514851T2 DE69514851T2 (de) 2000-10-12

Family

ID=22805495

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69514851T Expired - Lifetime DE69514851T2 (de) 1994-03-22 1995-03-21 Interatomares Messverfahren

Country Status (6)

Country Link
US (1) US5589686A (de)
EP (1) EP0674170B1 (de)
JP (1) JP2983876B2 (de)
KR (1) KR100407202B1 (de)
DE (1) DE69514851T2 (de)
TW (1) TW275130B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4432304C2 (de) * 1994-09-10 1996-10-17 Forschungszentrum Juelich Gmbh Verfahren zum Scannen einer Probenoberfläche mit einer Rastersonde eines Rastersondenmikroskops
JP3581475B2 (ja) * 1995-02-13 2004-10-27 キヤノン株式会社 情報処理装置
US5744799A (en) * 1996-05-20 1998-04-28 Ohara; Tetsuo Apparatus for and method of real-time nanometer-scale position measurement of the sensor of a scanning tunneling microscope or other sensor scanning atomic or other undulating surfaces
JP2960013B2 (ja) * 1996-07-29 1999-10-06 慧 清野 移動物体の検出用目盛及びこれを用いた移動物体の検出装置
US6518570B1 (en) * 1998-04-03 2003-02-11 Brookhaven Science Associates Sensing mode atomic force microscope
US6079254A (en) * 1998-05-04 2000-06-27 International Business Machines Corporation Scanning force microscope with automatic surface engagement and improved amplitude demodulation
US6169281B1 (en) 1998-07-29 2001-01-02 International Business Machines Corporation Apparatus and method for determining side wall profiles using a scanning probe microscope having a probe dithered in lateral directions
US6639686B1 (en) * 2000-04-13 2003-10-28 Nanowave, Inc. Method of and apparatus for real-time continual nanometer scale position measurement by beam probing as by laser beams and the like of atomic and other undulating surfaces such as gratings or the like relatively moving with respect to the probing beams
US7414250B1 (en) 2004-11-30 2008-08-19 Northwestern University Cryogenic variable temperature vacuum scanning tunneling microscope
KR20060070960A (ko) * 2004-12-21 2006-06-26 엘지전자 주식회사 위치센서를 포함하는 원자력현미경을 이용한 나노정보저장 장치
US7430484B2 (en) * 2006-03-31 2008-09-30 Tetsuo Ohara Signal processing method and apparatus for use in real-time subnanometer scale position measurements with the aid of probing sensors and beams scanning periodically undulating surfaces such as gratings and diffraction patterns generated thereby, and the like
JP2008191062A (ja) * 2007-02-07 2008-08-21 Jeol Ltd 走査型プローブ顕微鏡
FR2959823B1 (fr) * 2010-05-07 2013-05-17 Centre Nat Rech Scient Microscope a force atomique fonctionnant en mode circulaire, dispositif permettant sa mise en oeuvre et procede de mesure
CN101949957B (zh) * 2010-09-10 2013-04-17 东华大学 一种采用半导体纳米线作为探针精确移动纳米线的方法
CN102354391B (zh) * 2011-09-26 2013-07-24 武汉理工大学 基于全向搜索机制变异函数的最优遥感尺度选择方法
WO2015085316A1 (en) * 2013-12-07 2015-06-11 Bruker Nano, Inc. Force measurement with real-time baseline determination
US10041856B2 (en) * 2016-03-01 2018-08-07 Cleveland Electric Laboratories Company Method and apparatus for measuring physical displacement
US11079405B1 (en) * 2020-05-05 2021-08-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for detecting ferroelectric signal

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH643397A5 (de) * 1979-09-20 1984-05-30 Ibm Raster-tunnelmikroskop.
US4618767A (en) * 1985-03-22 1986-10-21 International Business Machines Corporation Low-energy scanning transmission electron microscope
USRE33387E (en) * 1985-11-26 1990-10-16 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
EP0646913B1 (de) * 1987-08-25 1999-01-13 Canon Kabushiki Kaisha Tunnelstromkodierer
US4823004A (en) * 1987-11-24 1989-04-18 California Institute Of Technology Tunnel and field effect carrier ballistics
DE69002503T2 (de) * 1989-03-29 1994-03-03 Canon Kk Kantendetektor.
JP2775464B2 (ja) * 1989-04-27 1998-07-16 キヤノン株式会社 位置検出装置
JP2686645B2 (ja) * 1989-05-08 1997-12-08 キヤノン株式会社 走査型トンネル電流検出装置
JP3132567B2 (ja) * 1989-11-08 2001-02-05 株式会社日立製作所 走査型探針顕微装置
US5085070A (en) * 1990-02-07 1992-02-04 At&T Bell Laboratories Capacitive force-balance system for measuring small forces and pressures
US5171992A (en) * 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
JPH05151925A (ja) * 1991-11-26 1993-06-18 Jeol Ltd 表面分析装置
JP3000500B2 (ja) * 1992-09-02 2000-01-17 セイコーインスツルメンツ株式会社 原子間力顕微鏡
US5426302A (en) * 1993-04-28 1995-06-20 Board Of Regents, University Of Texas Optically guided macroscopic-scan-range/nanometer resolution probing system
US5406832A (en) * 1993-07-02 1995-04-18 Topometrix Corporation Synchronous sampling scanning force microscope

Also Published As

Publication number Publication date
DE69514851T2 (de) 2000-10-12
EP0674170B1 (de) 2000-02-02
TW275130B (de) 1996-05-01
US5589686A (en) 1996-12-31
EP0674170A1 (de) 1995-09-27
KR100407202B1 (ko) 2004-03-18
KR950034391A (ko) 1995-12-28
JPH0882522A (ja) 1996-03-26
JP2983876B2 (ja) 1999-11-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee
8370 Indication of lapse of patent is to be deleted