DE69514305D1 - Verbesserungen in oder bezüglich mikroelektrischen Anordnungen - Google Patents

Verbesserungen in oder bezüglich mikroelektrischen Anordnungen

Info

Publication number
DE69514305D1
DE69514305D1 DE69514305T DE69514305T DE69514305D1 DE 69514305 D1 DE69514305 D1 DE 69514305D1 DE 69514305 T DE69514305 T DE 69514305T DE 69514305 T DE69514305 T DE 69514305T DE 69514305 D1 DE69514305 D1 DE 69514305D1
Authority
DE
Germany
Prior art keywords
regarding
microelectric devices
microelectric
devices
regarding microelectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69514305T
Other languages
English (en)
Other versions
DE69514305T2 (de
Inventor
Bernard M Kulwicki
Robert Tsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of DE69514305D1 publication Critical patent/DE69514305D1/de
Application granted granted Critical
Publication of DE69514305T2 publication Critical patent/DE69514305T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors
    • H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
    • H01L28/56—Capacitors with a dielectric comprising a perovskite structure material the dielectric comprising two or more layers, e.g. comprising buffer layers, seed layers, gradient layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/40—Capacitors
    • H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/43—Electric condenser making

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Memories (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Inorganic Insulating Materials (AREA)
  • Semiconductor Integrated Circuits (AREA)
DE69514305T 1994-09-30 1995-09-29 Verbesserungen in oder bezüglich mikroelektrischen Anordnungen Expired - Fee Related DE69514305T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/315,454 US6331325B1 (en) 1994-09-30 1994-09-30 Barium strontium titanate (BST) thin films using boron

Publications (2)

Publication Number Publication Date
DE69514305D1 true DE69514305D1 (de) 2000-02-10
DE69514305T2 DE69514305T2 (de) 2000-08-10

Family

ID=23224510

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69514305T Expired - Fee Related DE69514305T2 (de) 1994-09-30 1995-09-29 Verbesserungen in oder bezüglich mikroelektrischen Anordnungen

Country Status (5)

Country Link
US (2) US6331325B1 (de)
EP (1) EP0705918B1 (de)
JP (1) JPH08239264A (de)
DE (1) DE69514305T2 (de)
TW (1) TW301767B (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
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JPH1050960A (ja) * 1996-07-26 1998-02-20 Texas Instr Japan Ltd 強誘電体キャパシタ及び強誘電体メモリ装置と、これらの製造方法
DE19630883A1 (de) * 1996-07-31 1998-02-05 Philips Patentverwaltung Bauteil mit einem Kondensator
US6251720B1 (en) 1996-09-27 2001-06-26 Randhir P. S. Thakur High pressure reoxidation/anneal of high dielectric constant materials
US5910880A (en) 1997-08-20 1999-06-08 Micron Technology, Inc. Semiconductor circuit components and capacitors
US6178082B1 (en) * 1998-02-26 2001-01-23 International Business Machines Corporation High temperature, conductive thin film diffusion barrier for ceramic/metal systems
US6162744A (en) * 1998-02-28 2000-12-19 Micron Technology, Inc. Method of forming capacitors having high-K oxygen containing capacitor dielectric layers, method of processing high-K oxygen containing dielectric layers, method of forming a DRAM cell having having high-K oxygen containing capacitor dielectric layers
US6191443B1 (en) 1998-02-28 2001-02-20 Micron Technology, Inc. Capacitors, methods of forming capacitors, and DRAM memory cells
US6730559B2 (en) * 1998-04-10 2004-05-04 Micron Technology, Inc. Capacitors and methods of forming capacitors
US6156638A (en) 1998-04-10 2000-12-05 Micron Technology, Inc. Integrated circuitry and method of restricting diffusion from one material to another
US6165834A (en) * 1998-05-07 2000-12-26 Micron Technology, Inc. Method of forming capacitors, method of processing dielectric layers, method of forming a DRAM cell
US6255186B1 (en) 1998-05-21 2001-07-03 Micron Technology, Inc. Methods of forming integrated circuitry and capacitors having a capacitor electrode having a base and a pair of walls projecting upwardly therefrom
FI108375B (fi) 1998-09-11 2002-01-15 Asm Microchemistry Oy Menetelmõ eristõvien oksidiohutkalvojen valmistamiseksi
US20060219157A1 (en) * 2001-06-28 2006-10-05 Antti Rahtu Oxide films containing titanium
JP2000236075A (ja) * 1999-02-12 2000-08-29 Sony Corp 誘電体キャパシタの製造方法および半導体記憶装置の製造方法
TW577857B (en) * 1999-07-14 2004-03-01 Winbond Electronics Corp A method for growing a barium titanate layer
US6780704B1 (en) * 1999-12-03 2004-08-24 Asm International Nv Conformal thin films over textured capacitor electrodes
US7005695B1 (en) 2000-02-23 2006-02-28 Micron Technology, Inc. Integrated circuitry including a capacitor with an amorphous and a crystalline high K capacitor dielectric region
US20050191765A1 (en) * 2000-08-04 2005-09-01 Cem Basceri Thin film capacitor with substantially homogenous stoichiometry
US6617266B2 (en) 2001-04-12 2003-09-09 Applied Materials, Inc. Barium strontium titanate annealing process
US6900498B2 (en) * 2001-05-08 2005-05-31 Advanced Technology Materials, Inc. Barrier structures for integration of high K oxides with Cu and Al electrodes
US6917511B1 (en) * 2001-08-14 2005-07-12 Neophotonics Corporation Reactive deposition for the formation of chip capacitors
US6534326B1 (en) * 2002-03-13 2003-03-18 Sharp Laboratories Of America, Inc. Method of minimizing leakage current and improving breakdown voltage of polycrystalline memory thin films
US7011726B1 (en) * 2004-09-27 2006-03-14 Intel Corporation Method of fabricating thin dielectric film and thin film capacitor including the dielectric film
JP2007234726A (ja) * 2006-02-28 2007-09-13 Sony Corp 半導体装置および半導体装置の製造方法
US7582549B2 (en) 2006-08-25 2009-09-01 Micron Technology, Inc. Atomic layer deposited barium strontium titanium oxide films
US20090035946A1 (en) * 2007-07-31 2009-02-05 Asm International N.V. In situ deposition of different metal-containing films using cyclopentadienyl metal precursors
US8383525B2 (en) * 2008-04-25 2013-02-26 Asm America, Inc. Plasma-enhanced deposition process for forming a metal oxide thin film and related structures
US20110293830A1 (en) 2010-02-25 2011-12-01 Timo Hatanpaa Precursors and methods for atomic layer deposition of transition metal oxides
US9062390B2 (en) 2011-09-12 2015-06-23 Asm International N.V. Crystalline strontium titanate and methods of forming the same
TW201342678A (zh) * 2011-11-01 2013-10-16 Stephen R Forrest 製備用於有機感光裝置之金屬基板表面之方法
KR102621751B1 (ko) 2016-06-02 2024-01-05 삼성전자주식회사 반도체 장치 및 그 제조 방법
US11329389B2 (en) * 2018-07-26 2022-05-10 Board Of Regents, The University Of Texas System Method for fabricating a hyperbolic metamaterial having a near-zero refractive index in the optical regime
KR102623548B1 (ko) * 2018-09-19 2024-01-10 삼성전자주식회사 집적회로 장치
KR20220030010A (ko) * 2020-09-02 2022-03-10 삼성전자주식회사 반도체 소자 및 이를 포함하는 반도체 장치

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59125B2 (ja) * 1978-10-20 1984-01-05 ティーディーケイ株式会社 非直線性誘電体素子
US4379854A (en) * 1981-02-06 1983-04-12 Erie Technological Products, Inc. Low temperature firing (1800°-2100° F.) of barium titanate with flux (lead titanate-bismuth titanate-zinc oxide and boron oxide)
US4408254A (en) * 1981-11-18 1983-10-04 International Business Machines Corporation Thin film capacitors
US4485094A (en) * 1983-01-28 1984-11-27 Westinghouse Electric Corp. Method of making ABO3 of the cubic perovskite structure
US4863883A (en) * 1986-05-05 1989-09-05 Cabot Corporation Doped BaTiO3 based compositions
US4959089A (en) * 1988-05-03 1990-09-25 Alfred University Process for preparing a barium titanate film
US4963390A (en) * 1988-10-05 1990-10-16 The Aerospace Corporation Metallo-organic solution deposition (MOSD) of transparent, crystalline ferroelectric films
US4988650A (en) * 1989-06-23 1991-01-29 Murata Manufacturing Co., Ltd. Auxiliary agent for sintering ceramic material
DE4017518A1 (de) * 1990-05-31 1991-12-05 Philips Patentverwaltung Verfahren zur herstellung von monolayer-kondensatoren
JP2613722B2 (ja) * 1991-09-27 1997-05-28 日本碍子株式会社 低温焼成用誘電体磁器組成物の製造法
US5368834A (en) * 1993-08-13 1994-11-29 Texas Instruments Incorporated Method for producing titanate powder and product made thereby
US5378667A (en) * 1993-12-10 1995-01-03 Korea Institute Of Science And Technology Intercrystalline semiconductive ceramic capacitor

Also Published As

Publication number Publication date
TW301767B (de) 1997-04-01
US5617290A (en) 1997-04-01
EP0705918A2 (de) 1996-04-10
EP0705918B1 (de) 2000-01-05
DE69514305T2 (de) 2000-08-10
EP0705918A3 (de) 1997-08-13
JPH08239264A (ja) 1996-09-17
US6331325B1 (en) 2001-12-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee