DE69508812T2 - Sulfoniumsalz und chemisch verstärkte Positivresistzusammensetzungen - Google Patents

Sulfoniumsalz und chemisch verstärkte Positivresistzusammensetzungen

Info

Publication number
DE69508812T2
DE69508812T2 DE69508812T DE69508812T DE69508812T2 DE 69508812 T2 DE69508812 T2 DE 69508812T2 DE 69508812 T DE69508812 T DE 69508812T DE 69508812 T DE69508812 T DE 69508812T DE 69508812 T2 DE69508812 T2 DE 69508812T2
Authority
DE
Germany
Prior art keywords
positive resist
chemically amplified
sulfonium salt
amplified positive
resist compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69508812T
Other languages
English (en)
Other versions
DE69508812D1 (de
Inventor
Watanabe Satoshi
Ohsawa Youichi
Ishihara C O Spec Ch Toshinobu
Maruyama Kazumasa
Takeda Yoshihumi
Shimada Junji
Takemura Katsuya
Fujio Yagihashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2617194A external-priority patent/JP2896629B2/ja
Priority claimed from JP6317626A external-priority patent/JP2827938B2/ja
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE69508812D1 publication Critical patent/DE69508812D1/de
Application granted granted Critical
Publication of DE69508812T2 publication Critical patent/DE69508812T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C333/00—Derivatives of thiocarbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C333/14—Dithiocarbamic acids; Derivatives thereof
    • C07C333/18—Esters of dithiocarbamic acids
    • C07C333/20—Esters of dithiocarbamic acids having nitrogen atoms of dithiocarbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/16—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C317/22—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
DE69508812T 1994-01-28 1995-01-24 Sulfoniumsalz und chemisch verstärkte Positivresistzusammensetzungen Expired - Lifetime DE69508812T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2617194A JP2896629B2 (ja) 1994-01-28 1994-01-28 ビス（ｐ−ｔｅｒｔ−ブトキシフェニル）スルホキシド
JP8235994 1994-03-29
JP9556094 1994-04-08
JP6317626A JP2827938B2 (ja) 1994-03-29 1994-11-28 新規スルホニウム塩及び化学増幅ポジ型レジスト材料

Publications (2)

Publication Number Publication Date
DE69508812D1 DE69508812D1 (de) 1999-05-12
DE69508812T2 true DE69508812T2 (de) 1999-11-04

Family

ID=27458445

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69508812T Expired - Lifetime DE69508812T2 (de) 1994-01-28 1995-01-24 Sulfoniumsalz und chemisch verstärkte Positivresistzusammensetzungen

Country Status (5)

Country Link
US (2) US5633409A (de)
EP (1) EP0665220B1 (de)
KR (1) KR100246709B1 (de)
DE (1) DE69508812T2 (de)
TW (1) TW354388B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2719748B2 (ja) * 1993-02-08 1998-02-25 信越化学工業株式会社 新規なオニウム塩及びそれを用いたポジ型レジスト材料
DE19533607A1 (de) * 1995-09-11 1997-03-13 Basf Ag Positivarbeitendes strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen
TW436663B (en) * 1995-11-02 2001-05-28 Shinetsu Chemical Co Sulfonium salts and chemically amplified positive resist compositions
DE59806493D1 (de) * 1997-04-23 2003-01-16 Infineon Technologies Ag Chemisch verstärkter Resist
KR100279497B1 (ko) * 1998-07-16 2001-02-01 박찬구 술포늄 염의 제조방법
US6143467A (en) * 1998-10-01 2000-11-07 Arch Specialty Chemicals, Inc. Photosensitive polybenzoxazole precursor compositions
JP3941268B2 (ja) * 1998-11-10 2007-07-04 Ｊｓｒ株式会社 感放射線性樹脂組成物
US6416928B1 (en) * 1999-10-06 2002-07-09 Shin-Etsu Chemical Co., Ltd. Onium salts, photoacid generators, resist compositions, and patterning process
US20030108810A1 (en) * 2001-08-22 2003-06-12 Williamson Sue Ellen Deodorizing agent for sulfur- or nitrogen-containing salt photoinitiators
US6703192B1 (en) * 2003-02-28 2004-03-09 Eastman Kodak Company Photographic peracid bleaching composition, processing kit, and method of use
CN100381421C (zh) * 2003-10-21 2008-04-16 和光纯药工业株式会社 三芳基锍盐的制造方法
US20050148679A1 (en) * 2003-12-29 2005-07-07 Chingfan Chiu Aryl sulfonium salt, polymerizable composition and polymerization method of the same
JP4524234B2 (ja) * 2005-09-26 2010-08-11 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
WO2013099998A1 (ja) * 2011-12-28 2013-07-04 Jsr株式会社 感放射線性樹脂組成物、重合体、化合物及び化合物の製造方法
CN103012227A (zh) * 2013-01-04 2013-04-03 同济大学 一种高光生酸量子产率硫鎓盐类光生酸剂、制备方法及其应用
CN108314692B (zh) * 2017-01-17 2022-03-22 固安鼎材科技有限公司 一种多官能单体化合物及其制备方法和感光性树脂组合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2833827A (en) * 1955-01-17 1958-05-06 Bayer Ag Tri (3, 5-di lower alkyl-4-hydroxy phenyl)-sulfonium chlorides and method of preparing same
US3723534A (en) * 1971-05-28 1973-03-27 Monsanto Co Aryl methyl phenacyl sulfonium tetrafluoroborates
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
JPS6112725A (ja) * 1984-06-27 1986-01-21 Toshiba Corp 光重合性エポキシ樹脂組成物
JPS63223002A (ja) * 1987-03-13 1988-09-16 Yokohama Rubber Co Ltd:The 重合用触媒
US5220037A (en) * 1989-07-22 1993-06-15 Basf Aktiengesellschaft Sulfonium salts and use thereof
DE3924299A1 (de) * 1989-07-22 1991-01-31 Basf Ag Neue sulfoniumsalze und deren verwendung
US5164278A (en) * 1990-03-01 1992-11-17 International Business Machines Corporation Speed enhancers for acid sensitized resists
US5314929A (en) * 1992-08-10 1994-05-24 Isp Investments Inc. Rapidly curable vinyl ether release coatings
JP2719748B2 (ja) * 1993-02-08 1998-02-25 信越化学工業株式会社 新規なオニウム塩及びそれを用いたポジ型レジスト材料
JPH06236036A (ja) * 1993-02-08 1994-08-23 Shin Etsu Chem Co Ltd ポジ型レジスト材料
US5346803A (en) * 1993-09-15 1994-09-13 Shin-Etsu Chemical Co., Ltd. Photoresist composition comprising a copolymer having a di-t-butyl fumarate

Also Published As

Publication number Publication date
DE69508812D1 (de) 1999-05-12
US5633409A (en) 1997-05-27
KR100246709B1 (ko) 2000-03-15
EP0665220B1 (de) 1999-04-07
US5691112A (en) 1997-11-25
KR950032084A (ko) 1995-12-20
TW354388B (en) 1999-03-11
EP0665220A1 (de) 1995-08-02

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