DE69508033T2 - Aerosolverfahren zur Herstellung eines planaren Wellenleiters - Google Patents
Aerosolverfahren zur Herstellung eines planaren WellenleitersInfo
- Publication number
- DE69508033T2 DE69508033T2 DE69508033T DE69508033T DE69508033T2 DE 69508033 T2 DE69508033 T2 DE 69508033T2 DE 69508033 T DE69508033 T DE 69508033T DE 69508033 T DE69508033 T DE 69508033T DE 69508033 T2 DE69508033 T2 DE 69508033T2
- Authority
- DE
- Germany
- Prior art keywords
- production
- planar waveguide
- aerosol process
- aerosol
- waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/10—Non-chemical treatment
- C03B37/14—Re-forming fibres or filaments, i.e. changing their shape
- C03B37/15—Re-forming fibres or filaments, i.e. changing their shape with heat application, e.g. for making optical fibres
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/20—Nitrogen oxides; Oxyacids of nitrogen; Salts thereof
- C01B21/48—Methods for the preparation of nitrates in general
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
- C03B2201/36—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers doped with rare earth metals and aluminium, e.g. Er-Al co-doped
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/34—Liquid, e.g. mist or aerosol
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/331,460 US5622750A (en) | 1994-10-31 | 1994-10-31 | Aerosol process for the manufacture of planar waveguides |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69508033D1 DE69508033D1 (de) | 1999-04-08 |
DE69508033T2 true DE69508033T2 (de) | 1999-08-05 |
Family
ID=23294076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69508033T Expired - Fee Related DE69508033T2 (de) | 1994-10-31 | 1995-10-18 | Aerosolverfahren zur Herstellung eines planaren Wellenleiters |
Country Status (5)
Country | Link |
---|---|
US (1) | US5622750A (de) |
EP (1) | EP0709487B1 (de) |
JP (1) | JP3249905B2 (de) |
KR (1) | KR100360290B1 (de) |
DE (1) | DE69508033T2 (de) |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5958361A (en) * | 1993-03-19 | 1999-09-28 | Regents Of The University Of Michigan | Ultrafine metal oxide powders by flame spray pyrolysis |
DE69633066D1 (de) | 1995-12-19 | 2004-09-09 | Corning Inc | Verfahren und vorrichtung zur herstellung eines quarzglases durch verbrennung von flüssigen reagentien |
US6312656B1 (en) * | 1995-12-19 | 2001-11-06 | Corning Incorporated | Method for forming silica by combustion of liquid reactants using oxygen |
EP0888398A4 (de) | 1996-12-16 | 1999-09-29 | Corning Inc | Germanium dotierter silicaeinsatz und verfahren |
DE19725955C1 (de) * | 1997-06-19 | 1999-01-21 | Heraeus Quarzglas | Verfahren zur Herstellung eines Quarzglasrohlings und dafür geeignete Vorrichtung |
JP3617586B2 (ja) * | 1997-07-08 | 2005-02-09 | 株式会社東海 | バーナー用炎色部材の製造方法および炎色素材 |
US5979185A (en) * | 1997-07-16 | 1999-11-09 | Corning Incorporated | Method and apparatus for forming silica by combustion of liquid reactants using a heater |
US6193936B1 (en) * | 1998-11-09 | 2001-02-27 | Nanogram Corporation | Reactant delivery apparatuses |
US6952504B2 (en) * | 2001-12-21 | 2005-10-04 | Neophotonics Corporation | Three dimensional engineering of planar optical structures |
US20060147369A1 (en) * | 1997-07-21 | 2006-07-06 | Neophotonics Corporation | Nanoparticle production and corresponding structures |
US6788866B2 (en) | 2001-08-17 | 2004-09-07 | Nanogram Corporation | Layer materials and planar optical devices |
US6506493B1 (en) | 1998-11-09 | 2003-01-14 | Nanogram Corporation | Metal oxide particles |
US6919054B2 (en) * | 2002-04-10 | 2005-07-19 | Neophotonics Corporation | Reactant nozzles within flowing reactors |
US20090075083A1 (en) * | 1997-07-21 | 2009-03-19 | Nanogram Corporation | Nanoparticle production and corresponding structures |
US7575784B1 (en) | 2000-10-17 | 2009-08-18 | Nanogram Corporation | Coating formation by reactive deposition |
US5930439A (en) * | 1997-10-01 | 1999-07-27 | Northern Telecom Limited | Planar optical waveguide |
ID25479A (id) * | 1997-12-19 | 2000-10-05 | Corning Inc | Pembakar dan metoda untuk memproduksi arang oksida logam |
KR100320604B1 (ko) * | 1998-02-04 | 2002-04-22 | 제성호 | 고급산화이용고효율활성오니폐수처리장치및그방법 |
US6360562B1 (en) | 1998-02-24 | 2002-03-26 | Superior Micropowders Llc | Methods for producing glass powders |
US6260385B1 (en) * | 1998-08-07 | 2001-07-17 | Corning Incorporated | Method and burner for forming silica-containing soot |
US6672106B1 (en) | 1998-08-07 | 2004-01-06 | Corning Incorporated | Method and apparatus for forming soot for the manufacture of glass |
ZA994171B (en) * | 1998-08-07 | 2000-03-28 | Corning Inc | Method and apparatus for forming soot for the manufacture of glass. |
DE60022191D1 (de) * | 1999-07-02 | 2005-09-29 | Ngimat Co | Verfahren zur beschichtung von keramiken mittels ccvd |
US6328807B1 (en) | 1999-12-14 | 2001-12-11 | Corning Incorporated | Chuck heater for improved planar deposition process |
AU1340701A (en) | 1999-12-16 | 2001-06-25 | Corning Incorporated | Optical gain fibers |
US6402985B1 (en) * | 2000-03-17 | 2002-06-11 | The United States Of America As Represented By The Secretary Of The Navy | Method for preparing efficient low voltage phosphors and products produced thereby |
US7058245B2 (en) * | 2000-04-04 | 2006-06-06 | Waveguide Solutions, Inc. | Integrated optical circuits |
US6777374B2 (en) * | 2000-07-18 | 2004-08-17 | The United States Of America As Represented By The Environmental Protection Agency | Process for photo-induced selective oxidation of organic chemicals to alcohols, ketones and aldehydes using flame deposited nano-structured photocatalyst |
EP1333935A4 (de) * | 2000-10-17 | 2008-04-02 | Nanogram Corp | Herstellung eines überzugs durch reaktive abscheidung |
AU2002239458A1 (en) * | 2000-10-26 | 2002-06-11 | Nanogram Corporation | Multilayered optical structures |
FI111939B (fi) * | 2000-12-05 | 2003-10-15 | Liekki Oy | Menetelmä ja laitteisto lasipinnoitteen valmistamiseksi |
US7003984B2 (en) * | 2001-04-30 | 2006-02-28 | Verrillon, Inc. | Hybrid manufacturing process for optical fibers |
US6947651B2 (en) * | 2001-05-10 | 2005-09-20 | Georgia Tech Research Corporation | Optical waveguides formed from nano air-gap inter-layer dielectric materials and methods of fabrication thereof |
US6917511B1 (en) | 2001-08-14 | 2005-07-12 | Neophotonics Corporation | Reactive deposition for the formation of chip capacitors |
JP4644830B2 (ja) * | 2003-03-26 | 2011-03-09 | 独立行政法人理化学研究所 | 誘電体絶縁薄膜の製造方法 |
US8865271B2 (en) * | 2003-06-06 | 2014-10-21 | Neophotonics Corporation | High rate deposition for the formation of high quality optical coatings |
US7521097B2 (en) * | 2003-06-06 | 2009-04-21 | Nanogram Corporation | Reactive deposition for electrochemical cell production |
DE102004019575A1 (de) * | 2004-04-20 | 2005-11-24 | Innovent E.V. Technologieentwicklung | Verfahren zur Herstellung von transmissionsverbessernden und/oder reflexionsmindernden optischen Schichten |
EP2282198A1 (de) * | 2004-11-24 | 2011-02-09 | Sensirion Holding AG | Method zur Erzeugung einer Schicht auf einem Substrat |
US7491431B2 (en) * | 2004-12-20 | 2009-02-17 | Nanogram Corporation | Dense coating formation by reactive deposition |
US7272273B2 (en) | 2005-01-21 | 2007-09-18 | Neophotonics Corporation | Photodetector coupled to a planar waveguide |
US8069690B2 (en) * | 2005-12-16 | 2011-12-06 | Ofs Fitel, Llc | Apparatus and method for fabricating glass bodies using an aerosol delivery system |
CN101680091A (zh) * | 2007-06-15 | 2010-03-24 | 纳克公司 | 反应性气流沉积和无机箔的合成 |
US20090233105A1 (en) * | 2008-03-13 | 2009-09-17 | Remington Jr Michael P | Composite coatings comprising hollow and/or shell like metal oxide particles deposited via combustion deposition |
US8795773B2 (en) | 2008-03-13 | 2014-08-05 | Guardian Industries Corp. | Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition |
US20090311423A1 (en) * | 2008-06-12 | 2009-12-17 | Guardian Industries Corp. | Surface-assisted combustion deposition deposited coatings, and/or methods of making the same |
GB2478307A (en) * | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
RU2474849C1 (ru) * | 2011-07-27 | 2013-02-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Санкт-Петербургский национальный исследовательский университет информационных технологий, механики и оптики" (НИУ ИТМО) | Способ изготовления планарного волновода |
CA2946465C (en) | 2015-11-12 | 2022-03-29 | Delta Faucet Company | Ozone generator for a faucet |
CN108463437B (zh) | 2015-12-21 | 2022-07-08 | 德尔塔阀门公司 | 包括消毒装置的流体输送系统 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3873339A (en) * | 1972-03-30 | 1975-03-25 | Corning Glass Works | Method of forming optical waveguide circuit path |
DE2254491C3 (de) * | 1972-11-07 | 1975-04-17 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Beschichten von Oberflächen an Werkstücken durch Aufspritzen von im Lichtbogen aufgeschmolzenen Schichtstoffen, sowie Anordnung zur Durchführung des Verfahrens |
US3883336A (en) * | 1974-01-11 | 1975-05-13 | Corning Glass Works | Method of producing glass in a flame |
US4173305A (en) * | 1978-03-10 | 1979-11-06 | Corning Glass Works | System for delivering materials to deposition site on optical waveguide blank |
DE2907731A1 (de) * | 1979-02-28 | 1980-09-04 | Siemens Ag | Verfahren zur herstellung eines glasfaser-lichtwellenleiters |
JPS60108338A (ja) * | 1983-11-15 | 1985-06-13 | Nippon Telegr & Teleph Corp <Ntt> | 光フアイバ母材の製造方法 |
-
1994
- 1994-10-31 US US08/331,460 patent/US5622750A/en not_active Expired - Lifetime
-
1995
- 1995-10-18 DE DE69508033T patent/DE69508033T2/de not_active Expired - Fee Related
- 1995-10-18 EP EP95307424A patent/EP0709487B1/de not_active Expired - Lifetime
- 1995-10-30 KR KR1019950038058A patent/KR100360290B1/ko not_active IP Right Cessation
- 1995-10-31 JP JP28231795A patent/JP3249905B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69508033D1 (de) | 1999-04-08 |
US5622750A (en) | 1997-04-22 |
EP0709487A1 (de) | 1996-05-01 |
JPH08225957A (ja) | 1996-09-03 |
KR960014038A (ko) | 1996-05-22 |
JP3249905B2 (ja) | 2002-01-28 |
KR100360290B1 (ko) | 2003-01-24 |
EP0709487B1 (de) | 1999-03-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |