DE69427314D1 - Hydrophobes Siliciumdioxidpulver Verfahren zu seiner Herstellung und Entwickler für Elektrophotographie - Google Patents
Hydrophobes Siliciumdioxidpulver Verfahren zu seiner Herstellung und Entwickler für ElektrophotographieInfo
- Publication number
- DE69427314D1 DE69427314D1 DE69427314T DE69427314T DE69427314D1 DE 69427314 D1 DE69427314 D1 DE 69427314D1 DE 69427314 T DE69427314 T DE 69427314T DE 69427314 T DE69427314 T DE 69427314T DE 69427314 D1 DE69427314 D1 DE 69427314D1
- Authority
- DE
- Germany
- Prior art keywords
- electrophotography
- developer
- preparation
- silica powder
- hydrophobic silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 2
- 230000002209 hydrophobic effect Effects 0.000 title 1
- 239000000843 powder Substances 0.000 title 1
- 239000000377 silicon dioxide Substances 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/16—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer formed of particles, e.g. chips, powder or granules
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09716—Inorganic compounds treated with organic compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/90—Other properties not specified above
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2995—Silane, siloxane or silicone coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2998—Coated including synthetic resin or polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Developing Agents For Electrophotography (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1645493A JP3318997B2 (ja) | 1993-02-03 | 1993-02-03 | 疎水性シリカ粉体、その製法および電子写真用現像剤 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69427314D1 true DE69427314D1 (de) | 2001-07-05 |
DE69427314T2 DE69427314T2 (de) | 2002-02-28 |
Family
ID=11916703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1994627314 Expired - Lifetime DE69427314T2 (de) | 1993-02-03 | 1994-02-02 | Hydrophobes Siliciumdioxidpulver Verfahren zu seiner Herstellung und Entwickler für Elektrophotographie |
Country Status (4)
Country | Link |
---|---|
US (1) | US5486420A (de) |
EP (1) | EP0609870B1 (de) |
JP (1) | JP3318997B2 (de) |
DE (1) | DE69427314T2 (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4419234A1 (de) * | 1994-06-01 | 1995-12-07 | Wacker Chemie Gmbh | Verfahren zur Silylierung von anorganischen Oxiden |
DE69520328T2 (de) * | 1994-11-08 | 2001-08-23 | Canon Kk | Toner für die Entwicklung elektrostatischer Bilder, Zwei-Komponenten-Entwickler, Entwicklungsmethode, Bilderzeugungsverfahren, Hitzefixierverfahren und Verfahren zur Herstellung von Tonern |
JP3229174B2 (ja) * | 1995-08-21 | 2001-11-12 | 日本アエロジル株式会社 | 表面改質金属酸化物微粉末およびその製造方法 |
US5959005A (en) * | 1996-04-26 | 1999-09-28 | Degussa-Huls Aktiengesellschaft | Silanized silica |
US5989768A (en) * | 1997-03-06 | 1999-11-23 | Cabot Corporation | Charge-modified metal oxides with cyclic silazane and electrostatographic systems incorporating same |
US5955232A (en) * | 1997-07-22 | 1999-09-21 | Cabot Corporation | Toners containing positively chargeable modified pigments |
DE19756831A1 (de) * | 1997-12-19 | 1999-07-01 | Wacker Chemie Gmbh | Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt |
US6190815B1 (en) * | 1998-08-11 | 2001-02-20 | Xerox Corporation | Toner compositions |
US6099971A (en) * | 1998-09-09 | 2000-08-08 | Plaskolite, Inc. | Polysiloxane abrasion and static resistant coating |
US6218067B1 (en) | 1998-11-06 | 2001-04-17 | Cabot Corporation | Toners containing chargeable modified pigments |
US6323260B1 (en) * | 1998-11-20 | 2001-11-27 | Bayer Inc. | Process for hydrophobicizing particles and their use in dispersions |
JP4343378B2 (ja) | 1999-02-22 | 2009-10-14 | キヤノン株式会社 | トナーの製造方法、及び画像形成方法 |
EP1249475B1 (de) * | 1999-12-24 | 2005-03-16 | Nippon Aerosil Co., Ltd. | Oberflächenmodifiziertes anorganisches oxidpulver, verfahren zur herstellung desselben und verwendung desselben |
JP4512872B2 (ja) * | 2000-03-31 | 2010-07-28 | 日本アエロジル株式会社 | 表面改質シリカ微粉末とその製造方法 |
EP1156373A1 (de) | 2000-05-17 | 2001-11-21 | Heidelberger Druckmaschinen Aktiengesellschaft | Elektrophotophotographische Entwicklerzusammensetzung und Verfahren zur Entwicklung elektrostatischer Bilder |
JP3964617B2 (ja) | 2000-11-14 | 2007-08-22 | 株式会社巴川製紙所 | 負帯電性非磁性一成分トナー及びその現像方法 |
DE10109484A1 (de) * | 2001-02-28 | 2002-09-12 | Degussa | Oberflächenmodifizierte, dotierte, pyrogen hergestellte Oxide |
JP3814489B2 (ja) * | 2001-03-28 | 2006-08-30 | 株式会社巴川製紙所 | 非磁性一成分現像用トナー |
US6783908B2 (en) | 2002-05-20 | 2004-08-31 | Nexpress Solutions, Llc | Surface-treated toner particles, process for forming, and electrostatographic developer containing same |
US7052541B2 (en) * | 2002-06-19 | 2006-05-30 | Board Of Regents, The University Of Texas System | Color compositions |
IL157437A0 (en) * | 2003-07-14 | 2004-03-28 | Superseal Ltd Superseal Ltd | Hydrophobic aggregate and applications thereof |
CN1308401C (zh) * | 2004-10-14 | 2007-04-04 | 武汉理工大学 | 疏水性无机/有机复合微粒子的制造方法 |
EP1807347B1 (de) * | 2004-10-20 | 2014-01-22 | Cabot Corporation | Verfahren zur hertstellung von hydrophoben siliciumdioxid direkt aus einer wässrigen dispersion von kolloidalem siliciumdioxid |
US7425235B2 (en) * | 2005-02-11 | 2008-09-16 | The Board Of Regents Of The University Of Texas System | Color compositions and methods of manufacture |
JP4743845B2 (ja) * | 2005-04-15 | 2011-08-10 | テイカ株式会社 | 疎水性正帯電シリカ微粉末、その製造方法ならびにそれを外添剤として添加した静電潜像現像用トナー |
CA2615514A1 (en) * | 2005-06-17 | 2006-12-28 | The Board Of Regents Of The University Of Texas System | Organic/inorganic lewis acid composite materials |
DE102007033448A1 (de) | 2007-07-18 | 2009-01-22 | Wacker Chemie Ag | Hochdisperse Metalloxide mit einer hohen positiven Oberflächenladung |
KR101277415B1 (ko) | 2008-05-16 | 2013-06-20 | 캐논 가부시끼가이샤 | 소수성 무기 미립자 및 토너 |
US20110244382A1 (en) | 2010-04-06 | 2011-10-06 | Christopher Alyson M | Hydrophobic silica particles and method of producing same |
JP5906635B2 (ja) * | 2011-09-26 | 2016-04-20 | 富士ゼロックス株式会社 | シリカ粒子分散液の製造方法 |
WO2013148241A1 (en) | 2012-03-26 | 2013-10-03 | Cabot Corporation | Treated fumed silica |
KR101872868B1 (ko) * | 2017-03-07 | 2018-07-02 | (주)윈스 | 전기전도도가 우수한 전도성 세라믹 조성물 |
JP6968632B2 (ja) * | 2017-09-07 | 2021-11-17 | 扶桑化学工業株式会社 | 疎水性シリカ粉末 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52135739A (en) * | 1976-05-10 | 1977-11-14 | Toshiba Corp | Developing agent for electrostatic image |
JPS6023863A (ja) * | 1983-07-19 | 1985-02-06 | Canon Inc | 画像形成方法 |
JPS61273557A (ja) * | 1985-05-29 | 1986-12-03 | Canon Inc | 正荷電性現像剤 |
JPS6373271A (ja) * | 1986-09-17 | 1988-04-02 | Canon Inc | 正帯電性現像剤 |
DE3707226A1 (de) * | 1987-03-06 | 1988-09-15 | Wacker Chemie Gmbh | Verfahren zur herstellung von hochdispersem metalloxid mit ammoniumfunktionellem organopolysiloxan modifizierter oberflaeche als positiv steuerndes ladungsmittel fuer toner |
JP2630946B2 (ja) * | 1987-05-29 | 1997-07-16 | 東レ・ダウコーニング・シリコーン株式会社 | 正帯電性樹脂粉末の流動性向上剤 |
US4950634A (en) * | 1988-02-11 | 1990-08-21 | Dow Corning Corporation | Method for producing dual zone materials by use of an organosilane mixture |
JP2810389B2 (ja) * | 1988-11-17 | 1998-10-15 | キヤノン株式会社 | 正帯電性現像剤 |
JP2502353B2 (ja) * | 1988-11-22 | 1996-05-29 | キヤノン株式会社 | 反転現像用現像剤 |
US5013585A (en) * | 1989-06-13 | 1991-05-07 | Shin-Etsu Chemical Co., Ltd. | Method for the preparation of surface-modified silica particles |
JP2992591B2 (ja) * | 1989-12-18 | 1999-12-20 | ジーイー東芝シリコーン株式会社 | シリカコア―シリコーンシェル体、これを分散含有するエマルジョンおよびエマルジョンの製造方法 |
AU652138B2 (en) * | 1990-01-16 | 1994-08-18 | Nippon Zeon Co., Ltd. | Non-magnetic one-component developer |
-
1993
- 1993-02-03 JP JP1645493A patent/JP3318997B2/ja not_active Expired - Lifetime
-
1994
- 1994-02-02 DE DE1994627314 patent/DE69427314T2/de not_active Expired - Lifetime
- 1994-02-02 EP EP94101578A patent/EP0609870B1/de not_active Expired - Lifetime
- 1994-02-03 US US08/191,435 patent/US5486420A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0609870A1 (de) | 1994-08-10 |
EP0609870B1 (de) | 2001-05-30 |
US5486420A (en) | 1996-01-23 |
JPH06227810A (ja) | 1994-08-16 |
JP3318997B2 (ja) | 2002-08-26 |
DE69427314T2 (de) | 2002-02-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |