DE69418729T2 - Zerstäubungsverfahren und ein zerstäubungstarget - Google Patents

Zerstäubungsverfahren und ein zerstäubungstarget

Info

Publication number
DE69418729T2
DE69418729T2 DE69418729T DE69418729T DE69418729T2 DE 69418729 T2 DE69418729 T2 DE 69418729T2 DE 69418729 T DE69418729 T DE 69418729T DE 69418729 T DE69418729 T DE 69418729T DE 69418729 T2 DE69418729 T2 DE 69418729T2
Authority
DE
Germany
Prior art keywords
spraying
target
spraying method
spraying target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69418729T
Other languages
German (de)
English (en)
Other versions
DE69418729D1 (de
Inventor
Steven Hurwitt
Israel Wagner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of DE69418729D1 publication Critical patent/DE69418729D1/de
Application granted granted Critical
Publication of DE69418729T2 publication Critical patent/DE69418729T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3473—Composition uniformity or desired gradient

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE69418729T 1994-03-28 1994-11-28 Zerstäubungsverfahren und ein zerstäubungstarget Expired - Lifetime DE69418729T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21873194A 1994-03-28 1994-03-28
PCT/US1994/013759 WO1995026566A1 (en) 1994-03-28 1994-11-28 Sputtering target erosion profile control for collimated deposition

Publications (2)

Publication Number Publication Date
DE69418729D1 DE69418729D1 (de) 1999-07-01
DE69418729T2 true DE69418729T2 (de) 1999-12-30

Family

ID=22816287

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69418729T Expired - Lifetime DE69418729T2 (de) 1994-03-28 1994-11-28 Zerstäubungsverfahren und ein zerstäubungstarget

Country Status (8)

Country Link
EP (1) EP0753201B1 (es)
JP (1) JPH09512588A (es)
KR (1) KR100326506B1 (es)
AU (1) AU1263395A (es)
CA (1) CA2186505A1 (es)
DE (1) DE69418729T2 (es)
TW (1) TW278206B (es)
WO (1) WO1995026566A1 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5985581B2 (ja) * 2014-11-05 2016-09-06 株式会社東芝 処理装置及びコリメータ

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR900001825B1 (ko) * 1984-11-14 1990-03-24 가부시끼가이샤 히다찌세이사꾸쇼 성막 지향성을 고려한 스퍼터링장치
US4824544A (en) * 1987-10-29 1989-04-25 International Business Machines Corporation Large area cathode lift-off sputter deposition device
JP2627651B2 (ja) * 1988-10-17 1997-07-09 アネルバ株式会社 マグネトロンスパッタリング装置
US5130005A (en) * 1990-10-31 1992-07-14 Materials Research Corporation Magnetron sputter coating method and apparatus with rotating magnet cathode
DE69129081T2 (de) * 1990-01-29 1998-07-02 Varian Associates Gerät und Verfahren zur Niederschlagung durch einen Kollimator

Also Published As

Publication number Publication date
DE69418729D1 (de) 1999-07-01
KR100326506B1 (ko) 2002-06-24
KR970702570A (ko) 1997-05-13
AU1263395A (en) 1995-10-17
CA2186505A1 (en) 1995-10-05
EP0753201B1 (en) 1999-05-26
TW278206B (es) 1996-06-11
EP0753201A1 (en) 1997-01-15
WO1995026566A1 (en) 1995-10-05
JPH09512588A (ja) 1997-12-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition