ATA5895A - Magnetron-zerstäubervorrichtung - Google Patents

Magnetron-zerstäubervorrichtung

Info

Publication number
ATA5895A
ATA5895A AT0005895A AT5895A ATA5895A AT A5895 A ATA5895 A AT A5895A AT 0005895 A AT0005895 A AT 0005895A AT 5895 A AT5895 A AT 5895A AT A5895 A ATA5895 A AT A5895A
Authority
AT
Austria
Prior art keywords
magnetron
sprayer
magnetron sprayer
Prior art date
Application number
AT0005895A
Other languages
English (en)
Other versions
AT402944B (de
Original Assignee
Sony Disc Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Disc Technology Inc filed Critical Sony Disc Technology Inc
Publication of ATA5895A publication Critical patent/ATA5895A/de
Application granted granted Critical
Publication of AT402944B publication Critical patent/AT402944B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Electrostatic Spraying Apparatus (AREA)
AT0005895A 1994-01-19 1995-01-17 Magnetron-zerstäubervorrichtung AT402944B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00395094A JP3398452B2 (ja) 1994-01-19 1994-01-19 スパッタリング装置

Publications (2)

Publication Number Publication Date
ATA5895A true ATA5895A (de) 1997-02-15
AT402944B AT402944B (de) 1997-09-25

Family

ID=11571399

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0005895A AT402944B (de) 1994-01-19 1995-01-17 Magnetron-zerstäubervorrichtung

Country Status (4)

Country Link
US (1) US6159350A (de)
JP (1) JP3398452B2 (de)
AT (1) AT402944B (de)
GB (1) GB2286201B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19614600C1 (de) * 1996-04-13 1997-04-24 Singulus Technologies Gmbh Vorrichtung zum Maskieren und Abdecken von Substraten
US5800687A (en) * 1996-04-13 1998-09-01 Singulus Technologies Gmbh Device for masking or covering substrates
JP3096258B2 (ja) * 1997-07-18 2000-10-10 芝浦メカトロニクス株式会社 毎葉式マグネトロンスパッタ装置
US7125462B2 (en) 2002-06-18 2006-10-24 Centre Luxembourgeois De Recherches Pour Le Verre Et Al Ceramique S.A. (C.R.V.C.) Method of making vehicle windshield using coating mask
JP4653419B2 (ja) * 2004-05-17 2011-03-16 芝浦メカトロニクス株式会社 真空処理装置
JP4653418B2 (ja) * 2004-05-17 2011-03-16 芝浦メカトロニクス株式会社 真空処理装置および光ディスクの製造方法
US7815782B2 (en) * 2006-06-23 2010-10-19 Applied Materials, Inc. PVD target
WO2008108349A1 (ja) * 2007-03-06 2008-09-12 Shibaura Mechatronics Corporation プラズマ処理装置
CN103114273B (zh) * 2013-03-08 2015-01-28 浙江蓝特光学股份有限公司 一种利用磁控溅射镀膜机镀外缘全封闭带的工艺

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4469719A (en) * 1981-12-21 1984-09-04 Applied Magnetics-Magnetic Head Divison Corporation Method for controlling the edge gradient of a layer of deposition material
JPS61113141A (ja) * 1984-11-06 1986-05-31 Toshiba Ii M I Kk 情報記録媒体の製造システム
JPS62116761A (ja) * 1985-11-15 1987-05-28 Sanyo Electric Co Ltd マスキング装置
DE3735284A1 (de) * 1987-10-17 1989-04-27 Leybold Ag Vorrichtung nach dem karussell-prinzip zum beschichten von substraten
DE3912295C2 (de) * 1989-04-14 1997-05-28 Leybold Ag Katodenzerstäubungsanlage
DE3919147C2 (de) * 1989-06-12 1998-01-15 Leybold Ag Verfahren zum Beschichten eines Kunststoffsubstrats mit Aluminium
GB2235808A (en) * 1989-08-11 1991-03-13 Ernest Peter Small Optically readable data carriers
DE4020659C2 (de) * 1990-06-29 1997-09-11 Leybold Ag Katodenzerstäubungsvorrichtung
EP0496036B1 (de) * 1991-01-25 1994-12-14 Sony Corporation Zerstäubungsvorrichtung
JP2725944B2 (ja) * 1991-04-19 1998-03-11 インターナショナル・ビジネス・マシーンズ・コーポレイション 金属層堆積方法
US5174880A (en) * 1991-08-05 1992-12-29 Hmt Technology Corporation Magnetron sputter gun target assembly with distributed magnetic field
DE4128340C2 (de) * 1991-08-27 1999-09-23 Leybold Ag Zerstäubungskathodenanordnung nach dem Magnetron-Prinzip für die Beschichtung einer kreisringförmigen Beschichtungsfläche
JPH0578833A (ja) * 1991-09-20 1993-03-30 Shibaura Eng Works Co Ltd スパツタリング装置

Also Published As

Publication number Publication date
JPH07207428A (ja) 1995-08-08
GB9500594D0 (en) 1995-03-01
GB2286201A (en) 1995-08-09
GB2286201B (en) 1997-04-16
AT402944B (de) 1997-09-25
US6159350A (en) 2000-12-12
JP3398452B2 (ja) 2003-04-21

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Legal Events

Date Code Title Description
EFA Change in the company name
ELJ Ceased due to non-payment of the annual fee