DE69416744D1 - Photoinitiatoren-Zusammensetzungen und photoempfindliche Materialien, die sie enthalten - Google Patents

Photoinitiatoren-Zusammensetzungen und photoempfindliche Materialien, die sie enthalten

Info

Publication number
DE69416744D1
DE69416744D1 DE69416744T DE69416744T DE69416744D1 DE 69416744 D1 DE69416744 D1 DE 69416744D1 DE 69416744 T DE69416744 T DE 69416744T DE 69416744 T DE69416744 T DE 69416744T DE 69416744 D1 DE69416744 D1 DE 69416744D1
Authority
DE
Germany
Prior art keywords
materials containing
photosensitive materials
photoinitiator compositions
photoinitiator
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69416744T
Other languages
English (en)
Other versions
DE69416744T2 (de
Inventor
Makoto Kaji
Yasunori Kojima
Shigeki Katogi
Masataka Nunomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Application granted granted Critical
Publication of DE69416744D1 publication Critical patent/DE69416744D1/de
Publication of DE69416744T2 publication Critical patent/DE69416744T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
DE1994616744 1993-07-28 1994-07-28 Photoinitiatoren-Zusammensetzungen und photoempfindliche Materialien, die sie enthalten Expired - Fee Related DE69416744T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP18598393 1993-07-28
JP20927593 1993-08-24
JP24135893 1993-09-28
JP1413294 1994-02-08
JP1650694 1994-02-10
JP1795194 1994-02-15

Publications (2)

Publication Number Publication Date
DE69416744D1 true DE69416744D1 (de) 1999-04-08
DE69416744T2 DE69416744T2 (de) 1999-07-01

Family

ID=27548494

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994616744 Expired - Fee Related DE69416744T2 (de) 1993-07-28 1994-07-28 Photoinitiatoren-Zusammensetzungen und photoempfindliche Materialien, die sie enthalten

Country Status (3)

Country Link
EP (1) EP0636939B1 (de)
KR (1) KR0147207B1 (de)
DE (1) DE69416744T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5629354A (en) * 1995-02-28 1997-05-13 Eastman Kodak Company Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator
JP3441246B2 (ja) * 1995-06-07 2003-08-25 富士写真フイルム株式会社 光重合性組成物
DE59802875D1 (de) * 1997-06-30 2002-03-14 Siemens Ag Initiatoren für die kationische Polymerisation
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
CN100528838C (zh) 2001-06-11 2009-08-19 西巴特殊化学品控股有限公司 具有复合结构的肟酯光引发剂
CN114516925B (zh) * 2022-02-06 2023-07-14 海南师范大学 一种基于含氮杂环酮类化合物的光聚合引发体系及其光聚合方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2640470B2 (ja) * 1987-08-19 1997-08-13 旭化成工業株式会社 新しい感光性組成物
JPH04120542A (ja) * 1990-09-12 1992-04-21 Hitachi Ltd 感光性耐熱重合体組成物
JPH0519475A (ja) * 1991-07-12 1993-01-29 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
DE69320397T2 (de) * 1992-04-13 1999-03-11 Mitsubishi Rayon Co Photopolymerisierbare Zusammensetzung

Also Published As

Publication number Publication date
KR0147207B1 (ko) 1998-08-17
EP0636939A2 (de) 1995-02-01
DE69416744T2 (de) 1999-07-01
KR950003263A (ko) 1995-02-16
EP0636939B1 (de) 1999-03-03
EP0636939A3 (de) 1995-04-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee